Isolation with offset deep well implants
    72.
    发明授权
    Isolation with offset deep well implants 有权
    隔离与偏移深井植入物

    公开(公告)号:US08034699B2

    公开(公告)日:2011-10-11

    申请号:US12464206

    申请日:2009-05-12

    CPC classification number: H01L29/1083 H01L21/26513 H01L21/823892

    Abstract: A method implants impurities into well regions of transistors. The method prepares a first mask over a substrate and performs a first shallow well implant through the first mask to implant first-type impurities to a first depth of the substrate. The first mask is removed and a second mask is prepared over the substrate. The method performs a second shallow well implant through the second mask to implant second-type impurities to the first depth of the substrate and then removes the second mask. A third mask is prepared over the substrate. The third mask has openings smaller than openings in the first mask and the second mask. A first deep well implant is performed through the third mask to implant the first-type impurities to a second depth of the substrate, the second depth of the substrate being greater than the first depth of the substrate. The third mask is removed and a fourth mask is prepared over the substrate, the fourth mask has openings smaller than the openings in the first mask and the second mask. Then, a second deep well implant is performed through the fourth mask to implant the second-type impurities to the second depth of the substrate.

    Abstract translation: 一种方法是将杂质掺入晶体管的阱区。 该方法在衬底上制备第一掩模,并且通过第一掩模执行第一浅阱注入,以将第一类型杂质注入到衬底的第一深度。 去除第一个掩模,并在衬底上制备第二个掩模。 该方法通过第二掩模执行第二浅井注入,以将第二类型杂质植入衬底的第一深度,然后移除第二掩模。 在衬底上制备第三个掩模。 第三掩模具有比第一掩模和第二掩模中的开口小的开口。 通过第三掩模执行第一深孔注入,以将第一类型的杂质注入衬底的第二深度,衬底的第二深度大于衬底的第一深度。 去除第三掩模并在衬底上制备第四掩模,第四掩模具有小于第一掩模和第二掩模中的开口的开口。 然后,通过第四掩模进行第二深孔注入,以将第二类型的杂质植入到衬底的第二深度。

    Pixel sensor cell for collecting electrons and holes
    75.
    发明授权
    Pixel sensor cell for collecting electrons and holes 有权
    用于收集电子和空穴的像素传感器单元

    公开(公告)号:US07732841B2

    公开(公告)日:2010-06-08

    申请号:US12172309

    申请日:2008-07-14

    Abstract: The present invention is a pixel sensor cell and method of making the same. The pixel sensor cell approximately doubles the available signal for a given quanta of light. The device of the present invention utilizes the holes produced by impinging photons in a pixel sensor cell circuit. A pixel sensor cell having reduced complexity includes an n-type collection well region formed beneath a surface of a substrate for collecting electrons generated by electromagnetic radiation impinging on the pixel sensor cell and a p-type collection well region formed beneath the surface of the substrate for collecting holes generated by the impinging photons. A circuit structure having a first input is coupled to the n-type collection well region and a second input is coupled to the p-type collection well region, wherein an output signal of the pixel sensor cell is the magnitude of the difference of a signal of the first input and a signal of the second input.

    Abstract translation: 本发明是像素传感器单元及其制造方法。 像素传感器单元对于给定的光量大约使可用信号加倍。 本发明的器件利用通过在像素传感器单元电路中照射光子而产生的空穴。 具有降低的复杂度的像素传感器单元包括形成在基板的表面下面的n型收集阱区域,用于收集由电子辐射照射在像素传感器单元上​​产生的电子以及形成在基板表面下方的p型收集阱区域 用于收集由撞击光子产生的孔。 具有第一输入的电路结构耦合到n型收集阱区域,而第二输入端耦合到p型收集阱区域,其中像素传感器单元的输出信号是信号的差值的大小 的第一输入和第二输入的信号。

    High efficiency CMOS image sensor pixel employing dynamic voltage supply
    78.
    发明授权
    High efficiency CMOS image sensor pixel employing dynamic voltage supply 有权
    采用动态电压源的高效率CMOS图像传感器像素

    公开(公告)号:US07655966B2

    公开(公告)日:2010-02-02

    申请号:US12050967

    申请日:2008-03-19

    CPC classification number: H04N5/361 G06F17/5063 H04N5/359 H04N5/3745

    Abstract: A global shutter compatible pixel circuit comprising a reset gate (RG) transistor is provided in which a dynamic voltage is applied to the drain of the reset gate transistor in order to reduce a floating diffusion (FD) leakage therethrough during signal hold time. The drain voltage of the reset gate transistor is held at a lower voltage than a circuit supply voltage to minimize the off-state leakage through the RG transistor, thus reducing the change in the voltage at the floating diffusion during the signal hold time. In addition, a design structure for such a circuit providing a dynamic voltage to the drain of a reset gate of a pixel circuit is also provided.

    Abstract translation: 提供了包括复位栅极(RG)晶体管的全局快门兼容像素电路,其中动态电压被施加到复位栅极晶体管的漏极,以便减少在信号保持时间期间通过其的浮动扩散(FD)泄漏。 复位栅极晶体管的漏极电压保持在比电路电源电压更低的电压,以最小化通过RG晶体管的截止状态泄漏,从而减少信号保持时间期间浮动扩散时的电压变化。 此外,还提供了用于向像素电路的复位栅极的漏极提供动态电压的这种电路的设计结构。

    Light shield for CMOS imager
    79.
    发明授权
    Light shield for CMOS imager 有权
    CMOS成像器的屏蔽

    公开(公告)号:US07633106B2

    公开(公告)日:2009-12-15

    申请号:US11164072

    申请日:2005-11-09

    CPC classification number: H01L27/14623 H01L27/14685

    Abstract: The present invention provides a light shield for shielding the floating diffusion of a complementary metal-oxide semiconductor (CMOS) imager. In accordance with an embodiment of the present invention, there is provided a pixel sensor cell including: a device region formed on a substrate; and a first layer of material forming a sidewall adjacent to a side of the device region for blocking electromagnetic radiation from the device region.

    Abstract translation: 本发明提供一种用于屏蔽互补金属氧化物半导体(CMOS)成像器的浮动扩散的遮光罩。 根据本发明的实施例,提供了一种像素传感器单元,包括:形成在基板上的器件区域; 以及形成与所述器件区域的一侧相邻的侧壁的第一材料层,用于阻挡来自所述器件区域的电磁辐射。

    Pixel sensor cell having a pinning layer surrounding collection well regions for collecting electrons and holes
    80.
    发明授权
    Pixel sensor cell having a pinning layer surrounding collection well regions for collecting electrons and holes 失效
    像素传感器单元具有围绕用于收集电子和空穴的收集阱区的钉扎层

    公开(公告)号:US07633042B2

    公开(公告)日:2009-12-15

    申请号:US12172306

    申请日:2008-07-14

    Abstract: The present invention is a pixel sensor cell and method of making the same. The pixel sensor cell approximately doubles the available signal for a given quanta of light. The device of the present invention utilizes the holes produced by impinging photons in a pixel sensor cell circuit. A pixel sensor cell having reduced complexity includes an n-type collection well region formed beneath a surface of a substrate for collecting electrons generated by electromagnetic radiation impinging on the pixel sensor cell and a p-type collection well region formed beneath the surface of the substrate for collecting holes generated by the impinging photons. A circuit structure having a first input is coupled to the n-type collection well region and a second input is coupled to the p-type collection well region, wherein an output signal of the pixel sensor cell is the magnitude of the difference of a signal of the first input and a signal of the second input.

    Abstract translation: 本发明是像素传感器单元及其制造方法。 像素传感器单元对于给定的光量大约使可用信号加倍。 本发明的器件利用通过在像素传感器单元电路中照射光子而产生的空穴。 具有降低的复杂度的像素传感器单元包括形成在基板的表面下面的n型收集阱区域,用于收集由电子辐射照射在像素传感器单元上​​产生的电子以及形成在基板表面下方的p型收集阱区域 用于收集由撞击光子产生的孔。 具有第一输入的电路结构耦合到n型收集阱区域,而第二输入端耦合到p型收集阱区域,其中像素传感器单元的输出信号是信号的差值的大小 的第一输入和第二输入的信号。

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