公开(公告)号：US09076989B2

公开(公告)日：2015-07-07

申请号：US13976422

申请日：2011-12-20

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/56 ,  H05B33/04 ,  H05B33/10 ,  H01L21/02 ,  H01L51/00 ,  C23C14/04 ,  C23C16/04 ,  H01L27/32

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C16/042 ,  H01L21/02104 ,  H01L27/3211 ,  H01L51/0011 ,  H01L2227/323 ,  H01L2251/566 ,  H05B33/04 ,  H05B33/10

摘要： A masking film (13) is formed so as to have an opening in a display region (R1) (luminescent region) and a sealing region. Subsequently, luminescent layers (8R, 8G, and 8B) having a stripe pattern are formed. Then, the masking film (13) is peeled off, so that the luminescent layers (8R, 8G, and 8B) patterned with high resolution are provided.

摘要翻译： 掩模膜（13）形成为在显示区域（R1）（发光区域）和密封区域中具有开口。 随后，形成具有条纹图案的发光层（8R，8G，8B）。 然后，剥离掩模膜（13），从而提供以高分辨率图案化的发光层（8R，8G，8B）。

公开(公告)号：US09055653B2

公开(公告)日：2015-06-09

申请号：US13637627

申请日：2011-02-10

申请人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato ,  Satoshi Inoue

发明人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato ,  Satoshi Inoue

IPC分类号： C23C14/24 ,  C23C14/04 ,  H05B33/10 ,  C23C14/12 ,  C23C14/22 ,  H01L27/32 ,  H01L51/56 ,  H01L51/00

CPC分类号： H05B33/10 ,  C23C14/042 ,  C23C14/044 ,  C23C14/12 ,  C23C14/225 ,  C23C14/24 ,  H01L27/3211 ,  H01L51/0011 ,  H01L51/56

摘要： A deposition apparatus 50 forms a thin film 3 in a predetermined pattern on a substrate 10 for an organic EL display. A first correction plate 81 and a second correction plate 82 are placed between a shadow mask 60 and a deposition source 53 that emits deposition particles. Each of the correction plates 81, 82 has a plurality of blade plates 83 and a frame 84 that supports the plurality of blade plates 83. The blade plates 83 are placed so as to be tilted with respect to the shadow mask 60, and to extend parallel to each other with an opening 86 between adjoining ones of the blade plates 83 as viewed in a direction perpendicular the deposition mask 60.

摘要翻译： 沉积装置50在用于有机EL显示器的基板10上以预定图案形成薄膜3。 第一校正板81和第二校正板82被放置在荫罩60和发射沉积颗粒的沉积源53之间。 每个校正板81,82具有多个叶片83和支撑多个叶片板83的框架84.叶片板83相对于荫罩60倾斜放置，并且延伸 在与沉积掩模60垂直的方向上观察时，在相邻的刮板83之间具有开口86，彼此平行。

公开(公告)号：US08951816B2

公开(公告)日：2015-02-10

申请号：US13635201

申请日：2011-02-28

申请人： Rena Tsuruoka ,  Hisao Ikeda ,  Takuya Tsurume ,  Tohru Sonoda ,  Satoshi Inoue

发明人： Rena Tsuruoka ,  Hisao Ikeda ,  Takuya Tsurume ,  Tohru Sonoda ,  Satoshi Inoue

IPC分类号： H01L21/00 ,  H01L51/00 ,  C23C14/04 ,  H01L51/56

CPC分类号： H01L51/0013 ,  C23C14/04 ,  C23C14/048 ,  H01L51/56

摘要： One embodiment of the present invention is a film forming method comprising: arranging a surface of a film formation substrate 10 including an absorption layer 12 on a first substrate 11 and a material layer 13 containing a film formation material and a surface of a film-formation target substrate 20 including a first layer 23 over a second substrate 22, so as to face each other; forming a second layer 13a containing the film formation material over the first layer 23 by performing first heat treatment on the material layer 13; and forming a third layer 13b containing the film formation material over the second layer 13a by performing second heat treatment on the material layer 13. In the second heat treatment, energy with a density higher than that in the first heat treatment is applied to the material layer.

摘要翻译： 本发明的一个实施方案是一种成膜方法，其包括：将包含吸收层12的成膜基板10的表面布置在第一基板11和包含成膜材料的材料层13和膜形成表面 目标基板20包括第二基板22上的第一层23，以便彼此面对; 通过对材料层13进行第一次热处理，在第一层23上形成含有成膜材料的第二层13a; 并在第二层13a上形成含有成膜材料的第三层13b，在材料层13上进行第二热处理。在第二热处理中，将密度高于第一热处理的能量施加到材料 层。

公开(公告)号：US08900675B2

公开(公告)日：2014-12-02

申请号：US13635227

申请日：2011-02-28

申请人： Takahiro Ibe ,  Tomoya Aoyama ,  Rena Tsuruoka ,  Satoshi Inoue ,  Tohru Sonoda

发明人： Takahiro Ibe ,  Tomoya Aoyama ,  Rena Tsuruoka ,  Satoshi Inoue ,  Tohru Sonoda

IPC分类号： B05D3/06 ,  H01L51/56 ,  C23C14/12 ,  C23C14/28 ,  H05B33/10 ,  H01L51/00 ,  C23C14/56 ,  H01L51/50

CPC分类号： H05B33/10 ,  C23C14/048 ,  C23C14/12 ,  C23C14/28 ,  C23C14/564 ,  H01L51/0027 ,  H01L51/5012 ,  H01L51/56

摘要： One embodiment of the present invention is a deposition method for forming a layer 13a containing a deposition material on a deposition target surface of a second substrate, comprising the steps of forming an absorbing layer 12 over one surface of a first substrate 11; forming a material layer 13 containing the deposition material over the absorbing layer; performing first heat treatment on the material layer from the other surface of the first substrate to a temperature lower than the sublimation temperature of the deposition material so as to remove an impurity 14 in the material layer 13; disposing the one surface of the first substrate and the deposition target surface of the second substrate to face each other; and performing second heat treatment on the material layer from the other surface of the first substrate.

摘要翻译： 本发明的一个实施方案是用于在第二基底的沉积靶表面上形成含有沉积材料的层13a的沉积方法，包括以下步骤：在第一基底11的一个表面上形成吸收层12; 在吸收层上形成含有沉积材料的材料层13; 在所述材料层上从所述第一基板的另一表面进行第一热处理至低于所述沉积材料的升华温度的温度，以除去所述材料层13中的杂质14; 将第一基板的一个表面和第二基板的沉积目标表面布置成彼此面对; 以及从所述第一基板的另一表面对所述材料层进行第二热处理。

公开(公告)号：US08877443B2

公开(公告)日：2014-11-04

申请号：US13320674

申请日：2010-05-17

申请人： Satoshi Inoue ,  Tomohiko Urano ,  Yasuyoshi Ouchi ,  Masataka Shiraki

发明人： Satoshi Inoue ,  Tomohiko Urano ,  Yasuyoshi Ouchi ,  Masataka Shiraki

IPC分类号： C12Q1/68 ,  C07H21/04 ,  A61K31/496 ,  A61K31/198 ,  C07K16/18 ,  G01N33/68 ,  A61K38/04 ,  A61K31/5377 ,  C07K14/705 ,  A61K31/519 ,  C12N15/85 ,  A61K45/06

CPC分类号： A61K31/198 ,  A01K2217/052 ,  A01K2217/075 ,  A01K2267/0362 ,  A61K31/496 ,  A61K31/519 ,  A61K31/5377 ,  A61K38/04 ,  A61K45/06 ,  C07K14/705 ,  C07K16/18 ,  C07K2317/34 ,  C12N15/8509 ,  C12Q1/6883 ,  C12Q2600/136 ,  C12Q2600/156 ,  C12Q2600/172 ,  G01N33/6893 ,  G01N2500/00 ,  G01N2800/044 ,  A61K2300/00

摘要： It is an object of the present invention to provide a method of evaluating whether or not a subject has a predisposition to obesity or an obesity-related condition or disease, a kit for conducting the method, an anti-obesity drug having an effect of preventing or treating obesity or an obesity-related condition or disease, a method of screening the anti-obesity drug, a non-human animal having a deficiency in the gene associated with obesity, and an adipose tissue or adipocyte of the animal.The method of evaluating a predisposition to obesity of the present invention is a method of evaluating whether or not a subject has a predisposition to obesity or an obesity-related condition or disease. The method includes the step of detecting a copy number variation (CNV) in intron 1 of SLC25A24 gene or a gene polymorphism having a linkage disequilibrium relationship with the CNV in a sample containing a human gene of the subject. If the CNV in intron 1 of the SLC25A24 gene is 0, the subject may be evaluated to have a predisposition to obesity or an obesity-related condition or disease.

摘要翻译： 本发明的目的是提供一种评估受试者是否具有肥胖或肥胖相关病症或疾病倾向的方法，用于进行该方法的试剂盒，具有预防作用的抗肥胖药物 或治疗肥胖或肥胖相关病症或疾病，筛选抗肥胖药物的方法，与肥胖相关基因缺陷的非人动物以及动物的脂肪组织或脂肪细胞。 评估本发明的肥胖倾向的方法是评估受试者是否具有肥胖或肥胖相关病症或疾病倾向的方法。 该方法包括检测SLC25A24基因的内含子1中的拷贝数变异（CNV）或在含有受试者的人类基因的样品中与CNV具有连锁不平衡关系的基因多态性的步骤。 如果SLC25A24基因的内含子1中的CNV为0，则可以评估受试者对肥胖或肥胖相关病症或疾病的易感性。

公开(公告)号：US08770267B2

公开(公告)日：2014-07-08

申请号：US11904585

申请日：2007-09-27

申请人： Hisao Nagashima ,  Masaaki Tanaka ,  Satoshi Inoue ,  Hiroshi Mieda ,  Seiji Inoue ,  Katsuya Komaki

发明人： Hisao Nagashima ,  Masaaki Tanaka ,  Satoshi Inoue ,  Hiroshi Mieda ,  Seiji Inoue ,  Katsuya Komaki

IPC分类号： B22F3/11 ,  F28D15/00 ,  F28D7/10 ,  F28D7/02 ,  F25B17/08 ,  F25B15/12 ,  F25B15/00 ,  B21D53/06 ,  B23P15/26 ,  F25B35/04 ,  F28D7/16 ,  F28F13/00

CPC分类号： F28D7/16 ,  B22F3/11 ,  F25B35/04 ,  F28F13/003 ,  Y10T29/49384

摘要： An adsorption module has heat medium pipes through which a fluid flows, a porous heat transferring member, and adsorbent. The porous heat transferring member is a sintered body formed by sintering a metallic material that is in a form of one of powders, particles and fibers, and has pores for allowing an adsorbed medium to pass through. The porous heat transferring member is disposed on peripheries of the heat medium pipes and bonded to outer surfaces of the heat medium pipes by sintering. The adsorbent is disposed in the pores. The porous heat transferring member further has an adsorbed medium passage for allowing the adsorbed medium to pass through. The adsorbed medium passage is located between the heat medium pipes, and extends straight and parallel to axes of the heat medium pipes.

摘要翻译： 吸附模块具有流体流过的热介质管，多孔传热构件和吸附剂。 多孔传热部件是通过烧结粉末，颗粒和纤维之一形式的金属材料形成的烧结体，并且具有允许吸附介质通过的孔。 多孔传热构件设置在热介质管的周边，并通过烧结与热介质管的外表面接合。 吸附剂设置在孔中。 多孔传热构件还具有用于允许吸附介质通过的吸附介质通道。 吸附介质通道位于热介质管之间，并直线延伸并平行于热介质管道的轴线。

公开(公告)号：US08673077B2

公开(公告)日：2014-03-18

申请号：US13984283

申请日：2012-03-02

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： C23C16/00 ,  H01L21/31

CPC分类号： H01L51/5012 ,  C23C14/042 ,  C23C14/243 ,  C23C14/564 ,  H01L51/0011 ,  H01L51/56 ,  H05B33/10

摘要： Vapor deposition particles (91) discharged from at least one vapor deposition source opening (61) pass through a plurality of limiting openings (82) of a limiting unit (80) and a plurality of mask openings (71) of a vapor deposition mask (70), and adhere to a substrate (10) that relatively moves along a second direction (10a) so as to form a coating film. The limiting unit includes a plurality of plate members stacked on one another. Accordingly, it is possible to efficiently form a vapor deposition coating film in which edge blurring is suppressed on a large-sized substrate at a low cost.

摘要翻译： 从至少一个气相沉积源开口（61）排出的气相沉积颗粒（91）通过限制单元（80）的多个限制开口（82）和气相沉积掩模的多个掩模开口（71） 70），并且粘附到沿着第二方向（10a）相对移动以形成涂膜的基板（10）。 限制单元包括彼此堆叠的多个板构件。 因此，可以以低成本有效地形成在大尺寸基板上抑制边缘模糊的气相沉积涂膜。

公开(公告)号：US08628904B2

公开(公告)日：2014-01-14

申请号：US12509054

申请日：2009-07-24

申请人： Moegi Iguchi ,  Satoshi Inoue ,  Koutarou Yoshihara ,  Masahiro Takagi

发明人： Moegi Iguchi ,  Satoshi Inoue ,  Koutarou Yoshihara ,  Masahiro Takagi

IPC分类号： G03G9/00

CPC分类号： G03G9/1133 ,  G03G9/1075 ,  G03G15/0868 ,  G03G15/0879

摘要： The present invention provides a carrier for replenishment including an associated particle in which single particles each having a core material and a resin layer covering the core material, are bound via the resin layer, the carrier being used in a developer for replenishment of a trickle development system, and the system including performing development while the developer for replenishment is replenished, upon development of a latent image on a latent image holding member using a development unit.

摘要翻译： 本发明提供了一种用于补充的载体，其包括相关联的颗粒，其中每个具有芯材料的单个颗粒和覆盖芯材料的树脂层经由树脂层结合，载体用于显影剂中用于补充涓流发展 系统，以及在使用显影单元在潜像保持构件上开发潜像时，补充补充显影剂时进行开发的系统。

公开(公告)号：US20140004641A1

公开(公告)日：2014-01-02

申请号：US14004896

申请日：2012-03-09

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/56

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H05B33/10

摘要： A vapor deposition device (1) performs a vapor deposition treatment to form a luminescent layer (47) having a predetermined pattern on a film formation substrate (40). The vapor deposition device includes: a nozzle (13) having a plurality of injection holes (16) from which vapor deposition particles (17), which constitute the luminescent layer, are injected toward the film formation substrate when the vapor deposition treatment is carried out; and a plurality of control plates (20) provided between the nozzle and the film formation substrate and restricting an incident angle, with respect to the film formation substrate, of the vapor deposition particles injected from the plurality of injection holes. The nozzle includes: a nozzle main body (14b) in a container shape having an opening (14c) on a surface thereof on a film formation substrate side and (ii) a plurality of blocks (15) covering the opening and separated from each other, each of the plurality of blocks having the plurality of injection holes. The above arrangement allows a vapor-deposited film pattern to be formed with high definition.

摘要翻译： 蒸镀装置（1）进行蒸镀处理，在成膜基板（40）上形成具有规定图案的发光层（47）。 气相沉积装置包括：具有多个喷射孔（16）的喷嘴（13），当进行气相沉积处理时，构成发光层的气相沉积颗粒（17）从该注入孔喷射到成膜基底 ; 以及设置在喷嘴和成膜基板之间的多个控制板（20），并且限制从多个喷射孔喷射的气相沉积颗粒相对于成膜基板的入射角。 喷嘴包括：容器形状的喷嘴主体（14b），其在成膜基板侧的表面上具有开口（14c），和（ii）覆盖开口并分离的多个块体（15） 所述多个块中的每个具有所述多个喷射孔。 上述布置允许以高清晰度形成气相沉积膜图案。

公开(公告)号：US20130291796A1

公开(公告)日：2013-11-07

申请号：US13980875

申请日：2012-01-13

申请人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

发明人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

IPC分类号： C23C16/448 ,  C23C16/04

CPC分类号： C23C16/448 ,  C23C14/243 ,  C23C16/042 ,  G03B37/06 ,  H01L51/0008

摘要： A crucible (50) of the present invention includes: an opening (55a) from which vapor deposition particles are injected toward a film formation substrate on which a film is to be formed; a focal point member (54a), provided so as to face the opening (55a), which reflects vapor deposition particles injected from the opening (55a); and a revolution paraboloid (55b) which reflects, toward the film formation substrate, vapor deposition particles which have been reflected by the focal point member (54a).

摘要翻译： 本发明的坩埚（50）包括：朝向要在其上形成膜的成膜基板上注入蒸镀颗粒的开口（55a） 设置成面对开口（55a）的焦点部件（54a），其反射从开口（55a）喷射的气相沉积粒子; 以及向所述成膜基板反射已被所述焦点部件（54a）反射的气相沉积粒子的旋转抛物面（55b）。