公开(公告)号：US20120077810A1

公开(公告)日：2012-03-29

申请号：US13262096

申请日：2010-03-29

Applicant: Qi Chen ,  Mingxiang Cui ,  Bin Hu ,  Shuangxi Hu ,  Zhifa Pu ,  Philip E. Sanderson ,  Richard Soll ,  Xue Tang ,  Jiabing Wang ,  Yongjin Yan ,  Jinfeng Yao ,  Hongjie Zhang

Inventor： Qi Chen ,  Mingxiang Cui ,  Bin Hu ,  Shuangxi Hu ,  Zhifa Pu ,  Philip E. Sanderson ,  Richard Soll ,  Xue Tang ,  Jiabing Wang ,  Yongjin Yan ,  Jinfeng Yao ,  Hongjie Zhang

IPC: A61K31/5377 ,  A61K31/519 ,  A61P35/00 ,  C07D487/04

CPC classification number: A61K31/44 ,  C07D487/04

Abstract: The instant invention provides for substituted fused pyrimidine compounds that inhibit Akt activity. In particular, the compounds disclosed selectively inhibit one or two of the Akt isoforms. The invention also provides for compositions comprising such inhibitory compounds and methods of inhibiting Akt activity by administering the compound to a patient in need of treatment of cancer.

Abstract translation: 本发明提供抑制Akt活性的取代的稠合嘧啶化合物。 特别地，所公开的化合物选择性地抑制一种或两种Akt同种型。 本发明还提供了包含这种抑制化合物的组合物和通过将该化合物给予需要治疗癌症的患者来抑制Akt活性的方法。

公开(公告)号：US08112726B2

公开(公告)日：2012-02-07

申请号：US12316064

申请日：2008-12-09

Applicant: Bin Hu ,  Vivek Singh ,  Yan Borodovsky

Inventor： Bin Hu ,  Vivek Singh ,  Yan Borodovsky

IPC: G06F17/50 ,  G03F1/00 ,  G03C5/00

CPC classification number: G03F7/70283 ,  G03F1/32 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/705

Abstract: The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.

Abstract translation: 本发明公开了一种设计一组两个平铺掩模的方法，以及掩模，包括：第一瓦片，第一瓦片对于光是透明的，第一瓦片具有15％的第一特征线性尺寸或 较少的波长的光; 第二瓦片，所述第二瓦片对于所述光是透明的，所述第二瓦片具有光的波长的15％或更小的第二特征线性尺寸; 以及第三瓦片，所述第三瓦片对于所述光不透明，所述第三瓦片具有光的波长的15％以下的第三特征线性尺寸。

公开(公告)号：US20120003901A1

公开(公告)日：2012-01-05

申请号：US12828766

申请日：2010-07-01

Applicant: Bin Hu ,  Abhishek Singh ,  Gert Moyaerts ,  Deepak Mahulikar ,  Richard Wen

Inventor： Bin Hu ,  Abhishek Singh ,  Gert Moyaerts ,  Deepak Mahulikar ,  Richard Wen

IPC: B24B1/00 ,  C09K13/04 ,  C09K13/00

CPC classification number: H01L21/30625 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/0475 ,  H01L21/31053 ,  H01L21/31055 ,  H01L21/3212 ,  H01L21/76819 ,  H01L29/66545

Abstract: The present disclosure is directed to a highly dilutable chemical mechanical polishing concentrate comprising an abrasive, an acid, a stabilizer, and water with a point-of-use pH ranging from 2.2-3.5 for planarizing current and next generation semiconductor integrated circuit FEOL/BEOL substrates.

Abstract translation: 本公开涉及一种高度可稀释的化学机械抛光浓缩物，其包含研磨剂，酸，稳定剂和水，其使用点pH为2.2-3.5，用于平坦化电流和下一代半导体集成电路FEOL / BEOL 底物。

公开(公告)号：US20110089143A1

公开(公告)日：2011-04-21

申请号：US12580868

申请日：2009-10-16

Applicant: Hyungjun Kim ,  Richard Wen ,  Bin Hu ,  Minae Tanaka ,  Deepak Mahulikar

Inventor： Hyungjun Kim ,  Richard Wen ,  Bin Hu ,  Minae Tanaka ,  Deepak Mahulikar

IPC: C23F1/18 ,  C09K13/00

CPC classification number: H01L21/30625 ,  C09G1/02 ,  H01L21/3212 ,  H01L21/7684

Abstract: The present disclosure provides a concentrate for use in chemical mechanical polishing slurries, and a method of diluting that concentrate to a point of use slurry. The concentrate comprises abrasive, complexing agent, and corrosion inhibitor, and the concentrate is diluted with water and oxidizer. These components are present in amounts such that the concentrate can be diluted at very high dilution ratios, without affecting the polishing performance.

Abstract translation: 本公开提供了用于化学机械抛光浆料的浓缩物，以及将该浓缩物稀释到使用点浆料的方法。 浓缩物包括研磨剂，络合剂和缓蚀剂，浓缩物用水和氧化剂稀释。 这些组分的存在量使得浓缩物可以以非常高的稀释比稀释，而不影响抛光性能。

公开(公告)号：US20090100400A1

公开(公告)日：2009-04-16

申请号：US12316085

申请日：2008-12-09

Applicant: Bin Hu ,  Vivek Singh ,  Yan Borodovsky

Inventor： Bin Hu ,  Vivek Singh ,  Yan Borodovsky

IPC: G06F17/50

CPC classification number: G03F7/70283 ,  G03F1/32 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/705

Abstract: The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.

Abstract translation: 本发明公开了一种设计一组两个平铺掩模的方法，以及掩模，包括：第一瓦片，第一瓦片对于光是透明的，第一瓦片具有15％的第一特征线性尺寸或 较少的波长的光; 第二瓦片，所述第二瓦片对于所述光是透明的，所述第二瓦片具有光的波长的15％或更小的第二特征线性尺寸; 以及第三瓦片，所述第三瓦片对于所述光不透明，所述第三瓦片具有光的波长的15％以下的第三特征线性尺寸。

公开(公告)号：US20090010387A1

公开(公告)日：2009-01-08

申请号：US12165846

申请日：2008-07-01

Applicant: Kejun Kang ,  Zhiqiang Chen ,  Yuanjing Li ,  Liming Wang ,  Yinong Liu ,  Shangmin Sun ,  Li Zhang ,  Yaohong Liu ,  Guang Yang ,  Qingjun Zhang ,  Wenguo Liu ,  Siyuan Liang ,  Zhenbin Guo ,  Bin Hu ,  Yanli Deng ,  Yucheng Wu

Inventor： Kejun Kang ,  Zhiqiang Chen ,  Yuanjing Li ,  Liming Wang ,  Yinong Liu ,  Shangmin Sun ,  Li Zhang ,  Yaohong Liu ,  Guang Yang ,  Qingjun Zhang ,  Wenguo Liu ,  Siyuan Liang ,  Zhenbin Guo ,  Bin Hu ,  Yanli Deng ,  Yucheng Wu

IPC: G01N23/04

CPC classification number: G01N23/04

Abstract: The present invention discloses an radiation imaging system, comprising: an accelerator for generating rays which penetrate through the objects to be inspected and an synchronous signal; a detector with a plurality of detecting modules, adapted for detecting rays; a signal processor for generating a selection signal according to the synchronous signal, so as to select a detecting module for detecting the rays; a data converter for converting the signal detected by said detecting module into digital data, and then buffering the digital data in said signal processor; and a communication controller connected to an image processor, adapted for transmitting the digital data buffered in said signal processor to said image processor. The system according to the present invention allows high-speed and stable data acquisition and data conversion and accurate and reliable data transmission, when the data amount is significant.

Abstract translation: 本发明公开了一种辐射成像系统，包括：用于产生穿过待检查物体的射线的加速器和同步信号; 具有多个检测模块的检测器，适于检测射线; 信号处理器，用于根据同步信号产生选择信号，以便选择用于检测光线的检测模块; 数据转换器，用于将由所述检测模块检测的信号转换为数字数据，然后在所述信号处理器中缓冲数字数据; 以及连接到图像处理器的通信控制器，适于将缓冲在所述信号处理器中的数字数据发送到所述图像处理器。 当数据量显着时，根据本发明的系统允许高速稳定的数据采集和数据转换以及准确可靠的数据传输。

公开(公告)号：US20080159840A1

公开(公告)日：2008-07-03

申请号：US11966053

申请日：2007-12-28

Applicant: Bin Hu ,  Wanquan Shen ,  Zhizhong Liang ,  Hua Peng ,  Shangmin Sun ,  Nan Jiang ,  Quanwei Song ,  Weirong Huang ,  Zhenbin Guo ,  Sheng Tang ,  Guang Yang

Inventor： Bin Hu ,  Wanquan Shen ,  Zhizhong Liang ,  Hua Peng ,  Shangmin Sun ,  Nan Jiang ,  Quanwei Song ,  Weirong Huang ,  Zhenbin Guo ,  Sheng Tang ,  Guang Yang

IPC: B66F7/00

CPC classification number: G01V5/0008

Abstract: The present invention relates to a trailer system, and particularly to a self-driving trailer system for a radiation imaging inspection system and a method for inspecting a vehicle by radiation imaging of a vehicle through the trailer system. The self-driving trailer system comprises two trailers symmetrical in structure. Each of the trailers comprises a driving device, running wheels, a trailer body, a carrying device, a lift cylinder, a balance wheel, and two pairs of guide wheels. The driving device, the running wheels, and the balance wheel are coupled with the trailer body. The carrying device is coupled with the trailer body through the lift cylinder. A front carrying arm and a rear carrying arm can clamp front wheels of a vehicle under inspection, and move upwards and downwards by the lift cylinder. The trailer system according to the present invention is smooth and reliable in operation and simple in structure, and is applicable to different diameters of wheels of container lorries under inspection and is convenient in operation.

Abstract translation: 拖车系统技术领域本发明涉及一种拖车系统，特别涉及用于放射线成像检查系统的自行车拖车系统和通过拖车系统通过车辆的辐射成像检查车辆的方法。 自行车拖车系统包括两个结构对称的拖车。 每个拖车包括驱动装置，行驶轮，拖车车身，运送装置，提升缸，摆轮和两对导向轮。 驱动装置，行驶轮和摆轮与拖车主体联接。 承载装置通过提升缸与拖车主体联接。 前承载臂和后承载臂可以夹紧检查车辆的前轮，并通过提升缸上下移动。 根据本发明的拖车系统操作平稳可靠，结构简单，适用于检查中集装箱货车的不同直径，操作方便。

公开(公告)号：US07325223B2

公开(公告)日：2008-01-29

申请号：US11096613

申请日：2005-03-31

Applicant: Bin Hu ,  Vivek Singh ,  Victor P. Bashurin ,  Yuri D. Bogunenko

Inventor： Bin Hu ,  Vivek Singh ,  Victor P. Bashurin ,  Yuri D. Bogunenko

IPC: G06F17/50

CPC classification number: G03F1/36

Abstract: Faster synthesis of photolithography mask modifications is described. In one embodiment, the invention includes synthesizing a first binary photolithography mask, developing perturbations to an estimated electric field generated by the first mask in use, and synthesizing a second binary photolithography mask by applying the perturbations to the first mask.

Abstract translation: 描述了更快的光刻掩模修改的合成。 在一个实施例中，本发明包括合成第一二进制光刻掩模，对使用中由第一掩模产生的估计电场产生扰动，以及通过将扰动应用于第一掩模来合成第二二进制光刻掩模。

公开(公告)号：US20070110215A1

公开(公告)日：2007-05-17

申请号：US10580870

申请日：2004-12-02

Applicant: Haifeng Hu ,  Yucheng Wu ,  Shangmin Sun ,  Zhiqiang Chen ,  Guang Yang ,  Zhengyu Bai ,  Rongxuan Liu ,  Hongliang Yang ,  Jianjun Su ,  Jiantao Wang ,  Yanjun Han ,  Bin Hu ,  Quanwei Song ,  Nan Jiang ,  Hua Peng ,  Jianmin Li ,  Wanquan Shen ,  Zhizhong Liang

Inventor： Haifeng Hu ,  Yucheng Wu ,  Shangmin Sun ,  Zhiqiang Chen ,  Guang Yang ,  Zhengyu Bai ,  Rongxuan Liu ,  Hongliang Yang ,  Jianjun Su ,  Jiantao Wang ,  Yanjun Han ,  Bin Hu ,  Quanwei Song ,  Nan Jiang ,  Hua Peng ,  Jianmin Li ,  Wanquan Shen ,  Zhizhong Liang

IPC: G01N23/04

CPC classification number: G01V5/0008 ,  G01N23/04

Abstract: A combined mobile container inspection system, comprising: a radiation source; a chassis; a rotatable deck provided at an end of the upper surface of said chassis and rotatable with respect to said chassis, provided with a parallelogram bracket formed by a hingedly-connected four-bar linkage mechanism, wherein the cross link of the parallelogram bracket extends to form a horizontal cross arm with detectors, the other end of said horizontal cross arm is connected with a vertical upright arm, which is vertical or parallel to said horizontal cross arm; and a sliding deck provided at the rear end of the rotatable deck and movable upwardly and downwardly, said sliding deck is provided, in turn, with the radiation source, the X-ray therefrom is always right in the face of the detectors provided in the horizontal cross arm and vertical upright arm, calibrator and collimator.

Abstract translation: 一种组合的移动式集装箱检查系统，包括：辐射源; 底盘; 可旋转的甲板，其设置在所述底盘的上表面的端部并相对于所述底盘旋转，设置有由铰链连接的四杆连杆机构形成的平行四边形支架，其中平行四边形支架的交叉连接件延伸形成 具有检测器的水平横臂，所述水平横臂的另一端与垂直或平行于所述水平横臂的垂直立臂连接; 以及设置在可旋转甲板的后端并可向上和向下移动的滑动板，所述滑动甲板依次设置有辐射源，其X射线始终位于设置在 水平交叉臂和垂直立臂，校准器和准直器。

公开(公告)号：US20070075292A1

公开(公告)日：2007-04-05

申请号：US11526132

申请日：2006-09-22

Applicant: Deepak Mahulikar ,  Yuhu Wang ,  Ken Delbridge ,  Gert Moyaerts ,  Saeed Mohseni ,  Nichole Koontz ,  Bin Hu ,  Liqing Wen

Inventor： Deepak Mahulikar ,  Yuhu Wang ,  Ken Delbridge ,  Gert Moyaerts ,  Saeed Mohseni ,  Nichole Koontz ,  Bin Hu ,  Liqing Wen

IPC: C23F1/14 ,  C09K13/00

CPC classification number: C23F3/04 ,  C01B33/1435 ,  C01B33/1485 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/80 ,  C09G1/02 ,  C09K3/1463 ,  C09K3/1472 ,  H01L21/31053 ,  H01L21/3212

Abstract: A method of chemical mechanical polishing a surface of a substrate including the step of: contacting the substrate and a composition including a plurality of colloidal silica particles having less than 200 ppb of each trace metal impurity, excluding potassium and sodium, have less than 2 ppm residual alcohol and wherein the cumulative concentration of the trace metal, excluding potassium and sodium, is in the range from about 0.5 to about 5 ppm; and a medium for suspending the particles; wherein the composition is an ultrapure colloidal silica dispersion; and wherein the contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.

Abstract translation: 一种对基材表面进行化学机械抛光的方法，包括以下步骤：使除了钾和钠之外的每种微量金属杂质含有少于200ppb的多种胶体二氧化硅颗粒的组合物接触，其含量小于2ppm 残余醇，其中不包括钾和钠的痕量金属的累积浓度在约0.5至约5ppm的范围内; 和用于悬浮颗粒的介质; 其中所述组合物是超纯胶体二氧化硅分散体; 并且其中所述接触在足以平坦化基底的温度和时间段内进行。