公开(公告)号：US09248465B2

公开(公告)日：2016-02-02

申请号：US14240096

申请日：2012-08-09

Applicant: Carlos Ribeiro

Inventor： Carlos Ribeiro

IPC: B05B15/12 ,  B05C11/00 ,  B05C15/00 ,  B05B15/04

CPC classification number: B05B15/1214 ,  B05B12/16 ,  B05B14/40 ,  B05B16/40 ,  B05C11/00 ,  B05C15/00 ,  Y02P70/36 ,  Y10S901/43

Abstract: The invention relates to a painting system which comprises a painting device (121) in the painting chamber (103), said painting device comprising a casing (113) that surrounds the workpiece support (107) such that paint droplets that are not deposited onto the workpieces are dripped onto the casing to a large extent and can thus be reused.

Abstract translation: 本发明涉及一种涂装系统，其包括在涂装室（103）中的涂装装置（121），所述涂装装置包括围绕工件支架（107）的外壳（113），使得未沉积在 工件在很大程度上滴到外壳上，因此可以重复使用。

公开(公告)号：US20150367615A1

公开(公告)日：2015-12-24

申请号：US14312061

申请日：2014-06-23

Applicant: Xerox Corporation

Inventor： Jing Zhou ,  Mandakini Kanungo ,  Nancy Y. Jia ,  Wei Hong

IPC: B32B37/00 ,  B32B37/18 ,  B32B37/04 ,  B32B37/10 ,  B05C11/00 ,  B32B37/06

CPC classification number: B32B37/0046 ,  B01L3/5023 ,  B01L2200/12 ,  B01L2300/069 ,  B01L2300/0864 ,  B01L2300/0887 ,  B01L2300/126 ,  B01L2300/161 ,  B05C11/00 ,  B30B15/062 ,  B30B15/064 ,  B32B37/04 ,  B32B37/06 ,  B32B37/10 ,  B32B37/18 ,  B32B2307/728 ,  B32B2307/73 ,  B32B2309/02 ,  B32B2535/00

Abstract: An apparatus for distributing a hydrophobic material in a hydrophilic substrate includes a first plate, a second plate, a heater operatively connected to the first plate and configured to heat the first plate to a first temperature that is greater than a second temperature of the second plate, and an actuator configured to move the first plate and second plate together with a hydrophilic substrate between the plates. The first plate and second plate form a temperature gradient to enable a hydrophobic material on one side of a hydrophilic substrate that faces the second plate to penetrate into the hydrophilic substrate towards the first plate.

Abstract translation: 用于在亲水基底中分配疏水材料的装置包括第一板，第二板，加热器，其可操作地连接到第一板，并且被配置为将第一板加热到大于第二板的第二温度的第一温度 以及构造成将第一板和第二板与亲水基板一起移动到板之间的致动器。 第一板和第二板形成温度梯度，以使亲水基底的面向第二板的一侧上的疏水材料朝向第一板渗入亲水基底。

公开(公告)号：US20150352589A1

公开(公告)日：2015-12-10

申请号：US14726814

申请日：2015-06-01

Applicant: The Procter & Gamble Company

Inventor： Darrell Ian Brown ,  Paul Anthony Kawka

IPC: B05C11/00 ,  B05C5/02 ,  B05D1/26

CPC classification number: B05C11/00 ,  A61F13/15577 ,  B05C5/0254 ,  B05D1/26 ,  B32B5/022 ,  B32B5/10 ,  B32B7/14 ,  B32B15/14 ,  B32B2307/51 ,  B32B2307/726 ,  B32B2555/00 ,  B32B2555/02

Abstract: The present disclosure involves methods and apparatuses for applying fluids onto an advancing substrate having an unconstrained caliper, Hs. The fluid application apparatus may include a slot die applicator and a substrate carrier, wherein the slot die applicator includes a slot opening, a first lip, and a second lip, the slot opening located between the first lip and the second lip. And the substrate carrier includes a base surface and a pattern element that includes a pattern surface and protrudes outward from the base surface. The substrate carrier is positioned adjacent the slot die applicator to define a minimum distance, Hg, between the pattern surface of the pattern element and the first lip and the second lip that is less than the unconstrained caliper, Hs, of the substrate. Embodiments of apparatuses may be configured to monitor; establish; maintain; and/or change the desired minimum distance, Hg, before and/or during operation.

Abstract translation: 本公开涉及用于将流体施加到具有无约束卡尺Hs的前进基底上的方法和装置。 流体施加装置可以包括狭槽模具施加器和基底托架，其中狭槽模具施加器包括狭槽开口，第一唇缘和第二唇缘，所述​​狭槽开口位于第一唇缘和第二唇缘之间。 并且基板载体包括基底表面和包括图案表面并从基面向外突出的图案元件。 衬底载体被定位成邻近狭缝模片施加器，以在图案元件的图案表面与第一唇缘和第二唇缘之间限定小于衬底的无约束厚度H s的最小距离Hg。 装置的实施例可以被配置为监视; 建立; 保持; 和/或在操作之前和/或期间改变所需的最小距离Hg。

公开(公告)号：US09177841B2

公开(公告)日：2015-11-03

申请号：US13624211

申请日：2012-09-21

Applicant: Samsung Display Co., Ltd.

Inventor： Gil-Hwan Yeo ,  Dong-Hwan Kim ,  Sung-Ku Baek ,  Chan-Uk Jon ,  Il-Sup Choi

IPC: B05B7/06 ,  B05C11/10 ,  B05C5/02 ,  B05D1/26 ,  H01L21/67 ,  B05B7/02 ,  G03F7/16 ,  G09G3/34 ,  B05C11/00 ,  B05B7/08 ,  B05C9/02 ,  G02B26/00

CPC classification number: H01L21/6715 ,  B05B7/025 ,  B05B7/061 ,  B05B7/0876 ,  B05C5/0254 ,  B05C5/027 ,  B05C9/02 ,  B05C11/00 ,  B05C11/1036 ,  G02B26/005 ,  G03F7/16 ,  G09G3/348

Abstract: An exemplary embodiment of the present invention discloses a coating apparatus including a stage configured to receive a substrate and a coating slit part. The coating slit part includes a guide member, a first body, a second body, and a discharge nozzle. The coating slit part is configured to dispose a coating material on the substrate.

Abstract translation: 本发明的一个示例性实施例公开了一种涂覆设备，其包括被配置为接收基底和涂布狭缝部分的台。 涂布狭缝部分包括引导构件，第一主体，第二主体和排出喷嘴。 涂布狭缝部构造成在基板上设置涂布材料。

公开(公告)号：US09064684B1

公开(公告)日：2015-06-23

申请号：US13607511

申请日：2012-09-07

Applicant: Collin K. L. Mui ,  Lakshminarayana Nittala ,  Nerissa Draeger

Inventor： Collin K. L. Mui ,  Lakshminarayana Nittala ,  Nerissa Draeger

IPC: B05C11/00 ,  H01L21/00 ,  H01L21/02 ,  B05C1/00

CPC classification number: H01L21/00 ,  B05C1/00 ,  B05C11/00 ,  C23C16/44 ,  C23C16/45523 ,  H01L21/02107 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02216 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/02312 ,  H01L21/02337 ,  H01L21/0234 ,  H01L21/02345

Abstract: Methods and apparatus for filling gaps on partially manufactured semiconductor substrates with dielectric material are provided. In certain embodiments, the methods include introducing a first process gas into the processing chamber and accumulating a second process gas in an accumulator maintained at a pressure level substantially highest than that of the processing chamber pressure level. The second process gas is then rapidly introduced from the accumulator into the processing chamber. An excess amount of the second process gas may be provided in the processing chamber during the introduction of the second process gas. Flowable silicon-containing films forms on a surface of the substrate to at least partially fill the gaps.

Abstract translation: 提供了用电介质材料在部分制造的半导体衬底上填充间隙的方法和装置。 在某些实施方案中，所述方法包括将第一工艺气体引入处理室并将第二工艺气体积聚在保持在基本上高于处理室压力水平的压力水平的蓄能器中。 然后将第二工艺气体从蓄能器快速地引入到处理室中。 在引入第二处理气体期间，可以在处理室中设置过量的第二处理气体。 可流动的含硅膜在基材的表面上形成以至少部分地填充间隙。

公开(公告)号：US09031429B2

公开(公告)日：2015-05-12

申请号：US13761580

申请日：2013-02-07

Applicant: Teruo Shimao ,  Toshie Shimao ,  Katsunori Takahashi ,  Kenji Tamaki ,  Kenichi Hayashi ,  Yumiko Izumiya ,  Kazutoshi Yoshimura

Inventor： Satoshi Shimao ,  Katsunori Takahashi ,  Kenji Tamaki ,  Kenichi Hayashi ,  Yumiko Izumiya ,  Kazutoshi Yoshimura

IPC: G03G21/00 ,  B05C11/00 ,  G03G7/00 ,  G03G8/00

CPC classification number: B05C11/00 ,  G03G7/00 ,  G03G7/0006 ,  G03G8/00

Abstract: A sheet of paper is set on a paper-supplying portion of a top surface gloss processing apparatus while its top surface is faced upward. A gloss level sensor measures gloss level of the top surface of the sheet of paper. Data of this measurement is compared with a previously set threshold value. Based on this comparison, it is determined whether or not the gloss processing has been performed on the top surface thereof. When determining that the gloss processing has been already performed, a warning message such that the gloss processing has been already performed on the top surface of the sheet, of paper is displayed on a screen. On the other hand, when determining that the gloss processing has not performed, the top surface gloss processing apparatus performs the gloss processing on the top surface thereof.

Abstract translation: 在上表面光泽处理装置的纸供给部分上面设置有一张纸，同时其顶面朝上。 光泽度传感器测量纸张顶表面的光泽度。 将该测量的数据与先前设定的阈值进行比较。 基于该比较，确定在其顶表面上是否进行光泽处理。 当确定已经执行光泽处理时，在屏幕上显示纸张的表面上已经执行了光泽处理的警告消息。 另一方面，当确定没有进行光泽处理时，顶面光泽处理装置在其顶表面上进行光泽处理。

公开(公告)号：US08978577B2

公开(公告)日：2015-03-17

申请号：US13444091

申请日：2012-04-11

Applicant: Ming-Lu Yang ,  Ya-Dong Zhang ,  Tian-En Zhang ,  Gao-Feng Du

Inventor： Ming-Lu Yang ,  Ya-Dong Zhang ,  Tian-En Zhang ,  Gao-Feng Du

IPC: B24B57/04 ,  B24B57/00 ,  B05C11/00 ,  B05C21/00 ,  B24B29/00

CPC classification number: B24B57/04 ,  B05C11/00 ,  B05C21/00 ,  B24B29/00

Abstract: A waxing device is used for applying a waxing treatment to a polishing wheel, and includes a supporting assembly, an adjusting assembly, a driving mechanism, a mounting assembly, a motor, a wax block and a resisting mechanism. The supporting assembly includes a sliding rail, and the adjusting assembly is slidably positioned on the sliding rail; the driving mechanism is mounted on the adjusting assembly; the mounting assembly includes a mounting member positioned on the driving mechanism; the motor is mounted on mounting member; the wax block is positioned on the motor and rotated by the motor; the resisting mechanism is positioned on the supporting assembly and resists the adjusting assembly for adjusting a pressure applied to the polishing wheel during the waxing process.

Abstract translation: 打蜡装置用于对抛光轮施加打蜡处理，并且包括支撑组件，调节组件，驱动机构，安装组件，马达，蜡块和抵抗机构。 支撑组件包括滑轨，并且调节组件可滑动地定位在滑轨上; 所述驱动机构安装在所述调整组件上; 所述安装组件包括定位在所述驱动机构上的安装构件; 电机安装在安装件上; 蜡块位于电机上并由电机旋转; 抵抗机构定位在支撑组件上，并抵抗调节组件以调节在打蜡过程中施加到抛光轮的压力。

公开(公告)号：US20150064350A1

公开(公告)日：2015-03-05

申请号：US14394221

申请日：2013-04-12

Applicant: Antoine Carrasco

Inventor： Antoine Carrasco

IPC: B05C3/08 ,  B05C11/00 ,  C09D195/00 ,  B05D1/18

CPC classification number: B05C3/08 ,  B01F13/1027 ,  B05C11/00 ,  B05D1/18 ,  B28C5/466 ,  C09D195/00 ,  E01C19/1027 ,  E01C19/1036

Abstract: The invention relates to a device for manufacturing hot-mix coated materials, e.g. materials coated with bitumen, the device comprising: an oven (1) comprising an enclosure (2) provided towards its two opposite ends with a main inlet (3) designed to receive granular materials and with a main outlet; and heater means (10) defining a combustion section (5) inside the enclosure (2), said enclosure (2) starting with said combustion section (5) and continuing with a drying section (6), and then with a mixing section (7); the device being characterized in that it is provided with a bypass outlet (11) and with an external mixer (12) that is connected to said bypass outlet (11), which outlet is fitted with a blocking system (15) allowing granular materials to pass towards the inlet (13) of the external mixer (12) and a closed position allowing granular materials to pass towards the mixing section (7).

Abstract translation: 本发明涉及用于制造热混合涂层材料的装置，例如， 涂覆有沥青的材料，该装置包括：烘箱（1），包括朝向其两个相对端设置的外壳（2），设有主入口（3），其设计成容纳颗粒材料和主出口; 以及在所述外壳（2）内部限定燃烧部分（5）的加热器装置（10），所述外壳（2）从所述燃烧部分（5）开始并与干燥部分（6）连续，然后与混合部分 7）; 该装置的特征在于它设置有旁路出口（11）以及与所述旁路出口（11）连接的外部混合器（12），该出口配有阻塞系统（15），允许颗粒材料 通过外部混合器（12）的入口（13）和允许颗粒材料通向混合部分（7）的关闭位置。

公开(公告)号：US20150053132A1

公开(公告)日：2015-02-26

申请号：US14533137

申请日：2014-11-05

Applicant: Yu-Cheng Huang

Inventor： Yu-Cheng Huang

IPC: B05C11/00 ,  B05C21/00 ,  C09J5/00 ,  B05C1/02

CPC classification number: B05C1/025 ,  A43D11/03 ,  A43D25/181 ,  B05C1/02 ,  B05C1/0813 ,  B05C1/0817 ,  B05C1/083 ,  B05C11/00 ,  B05C21/00 ,  B05D5/10 ,  B27G11/00 ,  C09J5/00

Abstract: An adhesive coating device is provided with an adhesive reservoir; two opposite adjustment rollers at bottom of the reservoir; a pattern roller between the adjustment rollers and having a pattern formed thereon; a resilient roller under the pattern roller; a roller member under the resilient roller; two pivotal, co-rotated links on a side of the reservoir and operatively connected to the adjustment rollers respectively; and a spring biased adjustment screw pivotably secured to an end of one link. Clockwise rotation of the adjustment screw rotates the links at different directions, thereby decreasing a gap between the pattern roller and each adjustment roller.

Abstract translation: 粘合剂涂布装置设置有粘合剂储存器; 储存器底部有两个相对的调节辊; 调节辊之间的图案辊，其上形成有图案; 在图案辊下方的弹性辊; 在弹性辊下方的辊构件; 两个枢转的，共同旋转的连接在容器的一侧并分别可操作地连接到调节辊; 以及可枢转地固定到一个连杆的端部的弹簧偏压调节螺钉。 调节螺钉的顺时针旋转使链节沿不同方向旋转，从而减小图案辊和每个调节辊之间的间隙。

公开(公告)号：US20150049346A1

公开(公告)日：2015-02-19

申请号：US14527128

申请日：2014-10-29

Applicant: Nordson Corporation

Inventor： Floriana Suriawidjaja ,  Todd S. Weston

IPC: G01B11/02 ,  G01C15/00 ,  G01B11/14

CPC classification number: G01B11/026 ,  B05B12/124 ,  B05C5/0225 ,  B05C11/00 ,  B05C11/1002 ,  B05C11/1015 ,  G01B11/0608 ,  G01B11/14 ,  G01C15/004 ,  Y10T29/49

Abstract: Apparatus and methods of determining a position of a height sensor in a dispensing system. The dispensing system includes a dispenser, height sensor, camera, and a calibration device configured to receive a signal from the height sensor. The calibration device may include an optical sensor that generates an alignment signal in response to receiving light from the height sensor and/or a fiducial that causes the height sensor to generate the alignment signal in response to a detected height change. The alignment signal is used to automatically determine the position at which the height sensor is aligned with the calibration device. The position of the height sensor relative to a camera is determined by aligning the camera with the calibration device and recording its position. The recorded coordinates of the camera are compared to the coordinates of the height sensor when the height sensor is automatically aligned with the calibration device.

Abstract translation: 确定分配系统中高度传感器位置的装置和方法。 分配系统包括分配器，高度传感器，相机和被配置为从高度传感器接收信号的校准装置。 校准装置可以包括光学传感器，其响应于接收来自高度传感器的光和/或基准而产生对准信号，该基准使得高度传感器响应于检测到的高度变化而产生对准信号。 对准信号用于自动确定高度传感器与校准装置对准的位置。 高度传感器相对于相机的位置通过将相机与校准装置对准并记录其位置来确定。 当高度传感器与校准装置自动对准时，相机的记录坐标与高度传感器的坐标进行比较。