公开(公告)号：US07164833B2

公开(公告)日：2007-01-16

申请号：US10670013

申请日：2003-09-24

申请人： Donald Jablonowski ,  David Kalish ,  Jinkee Kim ,  Robert Lingle, Jr.

发明人： Donald Jablonowski ,  David Kalish ,  Jinkee Kim ,  Robert Lingle, Jr.

IPC分类号： G02B6/02 ,  H01S3/30

CPC分类号： H04B10/2563 ,  C03B37/01211 ,  C03B2201/075 ,  C03B2203/22 ,  G02B6/02271 ,  G02B6/03611 ,  G02B6/03666 ,  H04B10/2916

摘要： An improved optical fiber design has been found to exhibit a relatively low attenuation at the wavelength of 1385 nm (the “water peak”), allowing for Raman amplification to be efficient and effective at wavelengths in the S-band range of 1460 to 1530 nm. An ultra-dry process is used to mate an inner core rod (core plus surrounding trench) with a cladding tube (ring region plus cladding layers) and provide a water peak loss on the order of 0.325 dB/km. The low water peak is combined with appropriate dispersion values and zero dispersion wavelength to form a fiber that supports transmission and Raman amplification in the S-, C- and L-bands of interest for optical transmission systems.

摘要翻译： 已经发现改进的光纤设计在1385nm波长（“水峰”）处呈现相当低的衰减，允许拉曼放大在1460至1530nm的S波段范围内的波长下有效和有效 。 使用超干法将内芯棒（芯加周围沟槽）与包层管（环区加覆层）配合，并提供大约0.325 dB / km的水峰值损耗。 将低水峰与适当的色散值和零色散波长组合以形成支持光传输系统感兴趣的S，C和L带中的透射和拉曼放大的光纤。

公开(公告)号：US20060204189A1

公开(公告)日：2006-09-14

申请号：US10567912

申请日：2004-08-03

申请人： Takashi Sasaki ,  Masaaki Hirano ,  Tomoyuki Yokokawa

发明人： Takashi Sasaki ,  Masaaki Hirano ,  Tomoyuki Yokokawa

IPC分类号： G02B6/02

CPC分类号： G02B6/03688 ,  C03B37/01807 ,  C03B37/01892 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2203/22 ,  C03C3/06 ,  C03C13/04 ,  G02B6/03611 ,  G02B6/03666

摘要： Methods of manufacturing an optical fiber preform and an optical fiber, and an optical fiber formed by this method of manufacturing an optical fiber are provided, the optical fiber preform having a desired refractive index profile and being capable of suppressing an increase in loss due to the absorption by OH groups. A pipe is formed by an inside vapor phase deposition method such that glass layer to be formed into a core and a glass layer to be formed into a part of a cladding pipe are deposited in a starting pipe, the glass layers each containing at least one of fluorine, germanium, phosphorous, and chlorine, the starting pipe being made of a silica glass having an outside diameter in the range of 20 to 150 mm and a wall thickness in the range of 2 to 8 mm. The pipe thus formed is collapsed to form a glass rod in which the concentration of hydroxyl groups is 10 weight ppm or less in a region from the surface of the glass rod to a depth of 1 mm therefrom.

摘要翻译： 提供了制造光纤预制棒和光纤的方法以及通过该光纤制造方法形成的光纤，所述光纤预制棒具有所需的折射率分布并且能够抑制由于 OH基吸收。 通过内部气相沉积方法形成管，使得要形成芯的玻璃层和待形成为包层管的一部分的玻璃层沉积在起始管中，每个玻璃层包含至少一个 的氟，锗，磷和氯，起始管由外径在20〜150mm，壁厚在2〜8mm的范围内的石英玻璃制成。 由此形成的管道在从玻璃棒的表面到其深度为1mm的区域中折叠形成玻璃棒，其中羟基的浓度为10重量ppm以下。

公开(公告)号：US20060183623A1

公开(公告)日：2006-08-17

申请号：US11398669

申请日：2006-04-06

申请人： Yoshiaki Ikuta ,  Noriyuki Agata

发明人： Yoshiaki Ikuta ,  Noriyuki Agata

IPC分类号： C03C3/06 ,  C03B37/07 ,  C03B37/018

CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  Y02P40/57

摘要： A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

摘要翻译： 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解氧分子或还原型 缺陷，其氯浓度最多为50ppm，OH基浓度为至多100ppm，并且其含有缺氧缺陷的浓度范围至多为5×10 14个/ cm 2以下 > 3％和至少1×10 3个缺陷/ cm 3。 氟浓度优选为100ppm以下。

公开(公告)号：US20060137398A1

公开(公告)日：2006-06-29

申请号：US11148764

申请日：2005-06-08

申请人： Daniel Bleaking ,  Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Pushkar Tandon ,  John Maxon ,  Kimberly Wilbert

发明人： Daniel Bleaking ,  Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Pushkar Tandon ,  John Maxon ,  Kimberly Wilbert

IPC分类号： C03B20/00 ,  C03C3/06

CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23

摘要： Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.

公开(公告)号：US20060059948A1

公开(公告)日：2006-03-23

申请号：US10535935

申请日：2003-11-28

申请人： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

发明人： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

IPC分类号： C03C25/64

CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

摘要： First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

摘要翻译： 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是生产具有245nm的吸收系数为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，其次是 烘烤，从而形成致密的玻璃体。

公开(公告)号：US20060037362A1

公开(公告)日：2006-02-23

申请号：US11198697

申请日：2005-08-05

申请人： Nicholas Borrelli ,  Charlene Smith ,  Johannes Moll

发明人： Nicholas Borrelli ,  Charlene Smith ,  Johannes Moll

IPC分类号： C03B19/09 ,  C03B32/00

CPC分类号： G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

摘要： Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

公开(公告)号：US06848277B2

公开(公告)日：2005-02-01

申请号：US10733009

申请日：2003-12-10

申请人： George Edward Berkey ,  Lisa Anne Moore ,  Michelle Diane Pierson

发明人： George Edward Berkey ,  Lisa Anne Moore ,  Michelle Diane Pierson

IPC分类号： C03B8/04 ,  C03B19/14 ,  C03B23/043 ,  C03B23/045 ,  C03B23/047 ,  C03B23/049 ,  C03B23/051 ,  C03B23/07 ,  C03C3/06 ,  C03C3/112 ,  C03C4/00 ,  G03F1/00 ,  H01L21/027 ,  C03B37/10 ,  C03B9/10

CPC分类号： C03C4/0085 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/043 ,  C03B23/045 ,  C03B23/051 ,  C03B23/07 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/50 ,  G03F1/60

摘要： The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

摘要翻译： 本发明是制造光刻光掩模和光掩模坯料的方法。 制造光刻光掩模和光掩模坯料的方法包括提供OH含量低于50ppm的氟氧化硅玻璃管。 该方法还包括切割氟氧化硅玻璃管，使氟氧化硅玻璃管扁平化，并将扁平切割的氟氧化硅玻璃管形成具有平坦表面的光掩模坯料。 本发明包括玻璃光刻掩模预制件。 玻璃光刻掩模预制件是具有OH含量<= 10ppm的纵向硅氧氟化物玻璃管，F wt。 ％浓度> = 0.5wt。 ％

公开(公告)号：US20050000253A1

公开(公告)日：2005-01-06

申请号：US10874456

申请日：2004-06-23

申请人： Kang Xie ,  Shuqiang Zhang ,  Qingrong Han ,  Tiejun Wang ,  Chenghou Tu ,  Raji Matai

发明人： Kang Xie ,  Shuqiang Zhang ,  Qingrong Han ,  Tiejun Wang ,  Chenghou Tu ,  Raji Matai

IPC分类号： C03B37/018

CPC分类号： C03B37/01892 ,  C03B37/01807 ,  C03B37/0183 ,  C03B37/01853 ,  C03B37/01861 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/31 ,  C03B2207/30 ,  C03B2207/32

摘要： The present invention directs to a method of manufacturing low water peak single mode optical fiber, which comprises performing deposition in a substrate tube using PCVD technology, whereby a deposited layer of a certain construction design is formed on the inner wall of the substrate tube, melt contracting the substrate tube into a solid core rod according to melt contraction technology, producing an optical fiber preform by combining the core rod and a jacket tube of low hydroxyl content by means of RIT technology or by depositing an outer cladding on the outer surface of the core rod using OVD technology, sending the optical fiber preform into a fiber drawing furnace to draw it into an optical fiber, wherein: in the PCVD technology, the content of impurities in a gas mixture of raw materials, which is characterized by the infrared spectrum transmissivity thereof, is required to a transmissivity of 90% or greater, the water content in O2 is 100 ppb or less, the water content in C2F6 is 1000 ppb or less, the hydroxyl content of the substrate tube is 1000 ppb or less, the dynamic leak rate of a deposition machine is 1.0×10−5 mbar·l/s or less; during melt contraction of the substrate tube, the dynamic leak rate of a melt contraction machine is 1.0×10−5 mbar·l/s or less; the hydroxyl content of the jacket tube of low hydroxyl content is required to be 10 ppm or less; the relative humidity of environment during the process of manufacture is 25% or less; the ratio of the cladding diameter to the core layer diameter (b/a value) in the waveguide structure of the optical fiber is from 2.0 to 7.0.

摘要翻译： 本发明涉及制造低水峰单模光纤的方法，其包括使用PCVD技术在衬底管中进行沉积，由此在衬底管的内壁上形成一定的结构设计的沉积层，熔化 根据熔体收缩技术将衬底管收缩成实心芯棒，通过RIT技术将芯棒和低羟基含量的护套管组合在一起，或通过在外部表面上沉积外包层来生产光纤预制棒 使用OVD技术将光纤预制棒发送到光纤拉丝炉中，将其拉入光纤中，其中：在PCVD技术中，原料气体混合物中的杂质含量，其特征在于红外光谱 透过率为90％以上，O 2的含水量为100ppb以下，C2F6的含水量 为1000ppb以下，基材管的羟基含量为1000ppb以下，沉积机的动态泄漏率为1.0×10 -5 mbar·l / s以下。 在基材管熔融收缩期间，熔体收缩机的动态泄漏率为1.0×10 -5 mbar·l / s以下; 低羟基含量的护套的羟基含量为10ppm以下; 制造过程中环境的相对湿度为25％以下; 光纤的波导结构中的包层直径与芯层直径的比（b / a值）为2.0〜7.0。

公开(公告)号：US20040261461A1

公开(公告)日：2004-12-30

申请号：US10489436

申请日：2004-03-09

发明人： Chan-Joo Lee ,  Lae-Hyuk Park ,  Jae-Sun Kim ,  Soon-Il Son

IPC分类号： C03B037/018

CPC分类号： C03B37/01853 ,  C03B37/01815 ,  C03B37/01884 ,  C03B2201/075 ,  C03B2201/31

摘要： Method for fabricating an optical fiber preform substantially without hydroxyl group in core includes forming clad layer having relatively low refractive index by depositing soot (SiO2, GeO2) to inner surface of quartz tube; and forming core layer having relatively high refractive index on clad layer, which includes (a) a base core layer forming step composed of generating soot by heating inside of quartz tube to 1000null C.-1400null C. with introducing reaction gases (SiCl4GeCl4) into quartz tube, accumulating soot on clad layer removing hydroxyl-groups (OH) and moisture from soot and tube by heating inside of quartz tube to 600null C.-1200null C. with introducing dehydration gases (He, Cl2; O2) into quartz tube, and sintering and vitrifying soot by heating quartz tube inside over 1700null C. with introducing dehydration gas (He, Cl2, O2); and (b) a step of forming at least one additional core layer on base core layer by repeating the accumulating/dehydrating/sintering of the step (a) at least one time.

摘要翻译： 用于制造基本上没有羟基的光纤预制件的方法包括通过将石墨（SiO 2，GeO 2）沉积到石英管的内表面上而形成具有相对较低折射率的覆层; 以及在包覆层上形成具有较高折射率的芯层，其包括：（a）通过在石英管内加热至1000℃-1400℃，通过引入反应气体（SiCl 4 GeCl 4 ）放入石英管中，通过在石英管内加热至600℃-1200℃，通过引入脱水气体（He，Cl2; O2），在包覆层上堆积煤烟，从烟灰和管中除去羟基（OH）和水分， 加入石英管，并通过加入脱水气体（He，Cl2，O2）将石英管加热到1700℃以上来烧结和玻璃化烟灰; 和（b）通过至少一次重复步骤（a）的累积/脱水/烧结，在基核心层上形成至少一个附加核心层的步骤。

公开(公告)号：US06817211B2

公开(公告)日：2004-11-16

申请号：US10342717

申请日：2003-01-13

申请人： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

发明人： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

IPC分类号： C03B2000

CPC分类号： G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

摘要： High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

摘要翻译： 公开了适用于在190nm以下的VUV波长区域中用于光刻应用的光掩模基板的高纯度直接沉积玻璃化硅氧氟化物玻璃。 本发明的直接沉积玻璃化硅氧氟化物玻璃在157nm波长附近是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是在真空紫外（VUV）波长区域中显示非常高的透射率的干直接沉积玻璃化硅氧氟化物玻璃，同时保持通常与高纯度熔融二氧化硅相关的优异的热和物理性能。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的玻璃化玻璃化氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子 氢和低氯水平。