Intra-semiconductor die communication via waveguide in a multi-die semiconductor package

    公开(公告)号:US11450629B2

    公开(公告)日:2022-09-20

    申请号:US16643554

    申请日:2017-09-29

    Abstract: An interposer layer includes an integral waveguide to facilitate high speed (e.g., greater than 80 GHz) communication between semiconductor dies in a semiconductor package. An interposer layer may include a waveguide member and a dielectric layer disposed adjacent at least a portion of an exterior perimeter of the waveguide member. The waveguide member includes a material having a first relative permittivity. The dielectric member includes a material having a second relative permittivity that is less than the first relative permittivity. The waveguide member and the dielectric member form an interposer layer having an upper surface and a lower surface. A first conductive sheet may be disposed proximate the upper surface of the interposer layer and a second conductive sheet may be disposed proximate the lower surface of the interposer layer.

    Dielectric-filled trench isolation of vias

    公开(公告)号:US11296031B2

    公开(公告)日:2022-04-05

    申请号:US16769548

    申请日:2018-03-30

    Abstract: An apparatus is provided which comprises: a substrate, the substrate comprising crystalline material, a first set of one or more contacts on a first substrate surface, a second set of one or more contacts on a second substrate surface, the second substrate surface opposite the first substrate surface, a first via through the substrate coupled with a first one of the first set of contacts and with a first one of the second set of contacts; a second via through the substrate coupled with a second one of the first set of contacts and with a second one of the second set of contacts, a trench in the substrate from the first substrate surface toward the second substrate surface, wherein the trench is apart from, and between, the first via and the second via, and dielectric material filling the trench. Other embodiments are also disclosed and claimed.

    Pin count socket having reduced pin count and pattern transformation

    公开(公告)号:US11212932B2

    公开(公告)日:2021-12-28

    申请号:US16888069

    申请日:2020-05-29

    Abstract: An interposer and method of providing spatial and arrangement transformation are described. An electronic system has an electronic package, a motherboard and an interposer between the package and the motherboard. The interposer has signal and ground contacts on opposing surfaces that are respectively connected. The contacts opposing the package has a higher signal to ground contact ratio than the contacts opposing the motherboard, as well as different arrangements. Ground shielding vias in the interposer, which are connected to a ground plane, electrically isolate the signals through the interposer. The package may be mounted on a shielded socket such that signal and ground pins are mounted respectively in signal and ground socket mountings, ground shielding vias are between the signal socket mountings, and the ground socket mountings contain plated socket housings.

    MULTI-LAYERED ADHESION PROMOTION FILMS

    公开(公告)号:US20210257309A1

    公开(公告)日:2021-08-19

    申请号:US16793951

    申请日:2020-02-18

    Abstract: Structures are described that include multi-layered adhesion promotion films over a conductive structure in a microelectronic package. The multi-layered aspect provides adhesion to surrounding dielectric material without a roughened surface of the conductive structure. Furthermore, the multi-layered aspect allows for materials with different dielectric constants to be used, the average of which can provide a closer match to the dielectric constant of the surrounding dielectric material. According to an embodiment, a first dielectric layer that includes at least one nitride material can provide good adhesion with the underlying conductive structure, while one or more subsequent dielectric layers that include at least one oxide material can provide different dielectric constant values (e.g., typically lower) compared to the first dielectric layer to bring the overall dielectric constant closer to that of a surrounding dielectric material. The first and second layers may be discrete layers or a single continuous layer with grading.

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