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公开(公告)号：US10684563B2
公开(公告)日：2020-06-16
申请号：US15761830
申请日：2018-02-19
Applicant: KLA-TENCOR CORPORATION
Inventor： Amnon Manassen , Andrew Hill , Nadav Gutman , Yossi Simon , Alexander Novikov , Eugene Maslovsky
Abstract: Metrology systems and methods are provided, which derive metrology target position on the wafer and possibly the target focus position during the movement of the wafer on the system's stage. The positioning data is derived before the target arrives its position (on-the-fly), sparing the time required in the prior art for the acquisition stage and increasing the throughput of the systems and methods. The collection channel may be split to provide for an additional moving-imaging channel comprising at least one TDI (time delay and integration) sensor with an associated analysis unit configured to derive wafer surface information, positioning and/or focusing information of the metrology targets with respect to the objective lens, during wafer positioning movements towards the metrology targets. Additional focusing-during-movement module and possibly feedbacking derived position and/or focus information to the stage may enhance the accuracy of the stopping of the stage.
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82.发明申请公开(公告)号：US20200159129A1
公开(公告)日：2020-05-21
申请号：US16491963
申请日：2019-08-05
Applicant: KLA-TENCOR CORPORATION
Inventor： Amnon Manassen , Yuri Paskover , Eran Amit
Abstract: Scatterometry overlay (SCOL) measurement methods, systems and targets are provided to enable efficient SCOL metrology with in-die targets. Methods comprise generating a signal matrix by: illuminating a SCOL target at multiple values of at least one illumination parameter, and at multiple spot locations on the target, wherein the illumination is at a NA (numerical aperture)>⅓ yielding a spot diameter
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公开(公告)号：US10444161B2
公开(公告)日：2019-10-15
申请号：US15608766
申请日：2017-05-30
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Daria Negri , Andrew V. Hill , Ohad Bachar , Vladimir Levinski , Yuri Paskover
Abstract: A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.
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公开(公告)号：US20190252270A1
公开(公告)日：2019-08-15
申请号：US16072657
申请日：2018-06-24
Applicant: KLA-TENCOR CORPORATION
Inventor： Choon Hoong Hoo , Fangren Ji , Amnon Manassen , Liran Yerushalmi , Antonio Mani , Allen Park , Stilian Pandev , Andrei Shchegrov , Jon Madsen
IPC: H01L21/66 , H01L23/544 , H01L21/67 , G06F17/50 , G06T7/00
CPC classification number: H01L22/12 , G03F7/20 , G06F17/5068 , G06F2217/12 , G06T7/001 , G06T2207/20216 , G06T2207/30148 , H01L21/67253 , H01L23/544 , H01L2223/54426
Abstract: A method and system for measuring overlay in a semiconductor manufacturing process comprise capturing an image of a feature in an article at a predetermined manufacturing stage, deriving a quantity of an image parameter from the image and converting the quantity into an overlay measurement. The conversion is by reference to an image parameter quantity derived from a reference image of a feature at the same predetermined manufacturing stage with known overlay (“OVL”). There is also disclosed a method of determining a device inspection recipe for use by an inspection tool comprising identifying device patterns as candidate device care areas that may be sensitive to OVL, deriving an OVL response for each identified pattern, correlating the OVL response with measured OVL, and selecting some or all of the device patterns as device care areas based on the correlation.
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公开(公告)号：US20190228518A1
公开(公告)日：2019-07-25
申请号：US15761830
申请日：2018-02-19
Applicant: KLA-TENCOR CORPORATION
Inventor： Amnon Manassen , Andrew Hill , Nadav Gutman , Yossi Simon , Alexander Novikov , Eugene Maslovsky
Abstract: Metrology systems and methods are provided, which derive metrology target position on the wafer and possibly the target focus position during the movement of the wafer on the system's stage. The positioning data is derived before the target arrives its position (on-the-fly), sparing the time required in the prior art for the acquisition stage and increasing the throughput of the systems and methods. The collection channel may be split to provide for an additional moving-imaging channel comprising at least one TDI (time delay and integration) sensor with an associated analysis unit configured to derive wafer surface information, positioning and/or focusing information of the metrology targets with respect to the objective lens, during wafer positioning movements towards the metrology targets. Additional focusing-during-movement module and possibly feedbacking derived position and/or focus information to the stage may enhance the accuracy of the stopping of the stage.
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Patent Agency Ranking
公开(公告)号：US10261014B2
公开(公告)日：2019-04-16
申请号：US14583447
申请日：2014-12-26
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Joel Seligson , Vladimir Levinski , Daniel Kandel , Yoel Feler , Barak Bringoltz , Amnon Manassen , Eliav Benisty
Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.
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公开(公告)号：US20190033501A1
公开(公告)日：2019-01-31
申请号：US15665911
申请日：2017-08-01
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Ohad Bachar , Avi Abramov , Amnon Manassen
Abstract: A spectral filter includes a curved filtering element including a concave surface forming a portion of a sphere. The concave surface may be positioned to receive light diverging from an output face of an optical fiber located at a first location proximate to a center of the sphere corresponding to the concave surface. The concave surface may transmit a first portion of a spectrum of the light. The concave surface may further reflect and focus a second portion of the spectrum to a second location proximate to the center of the sphere. The spectral filter may further include a collector to direct the second portion of the spectrum away from the output face of the optical fiber.
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公开(公告)号：US20180188663A1
公开(公告)日：2018-07-05
申请号：US15442111
申请日：2017-02-24
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Amnon Manassen , Eran Amit , Nuriel Amir , Liran Yerushalmi , Amit Shaked
CPC classification number: G03F7/70625 , G03F7/70633 , G03F7/70683
Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.
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89.发明申请公开(公告)号：US20180052099A1
公开(公告)日：2018-02-22
申请号：US15387180
申请日：2016-12-21
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Amnon Manassen , Ohad Bachar
CPC classification number: G01N21/255 , G01J1/0418 , G01J1/4257 , G01J3/0208 , G01J3/021 , G01J3/06 , G01J3/10 , G01J3/12 , G01J2001/4247 , G01J2003/069 , G01J2003/1213 , G01J2003/1217 , G01J2003/1221 , G01J2003/1234 , G01N2201/0666 , G01N2201/0668 , G01N2201/0675 , G01N2201/0683 , G03F7/70633
Abstract: A metrology system includes an illumination source to generate an illumination beam, a multi-channel spectral filter, a focusing element to direct illumination from the single optical column to a sample, and at least one detector to capture the illumination collected from the sample. The multi-channel spectral filter includes two or more filtering channels having two or more channel beam paths. The two or more filtering channels filter illumination propagating along the two or more channel beam paths based on two or more spectral transmissivity distributions. The multi-channel spectral filter further includes a channel selector to direct at least a portion of the illumination beam into at least one selected filtering channel to filter the illumination beam. The multi-channel spectral filter further includes at least one beam combiner to combine illumination from the two or more filtering channels to a single optical column.
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公开(公告)号：US09784987B2
公开(公告)日：2017-10-10
申请号：US14799132
申请日：2015-07-14
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Amnon Manassen , Barak Bringoltz , Ohad Bachar , Mark Ghinovker , Zeev Bomzon , Daniel Kandel
CPC classification number: G02B27/58 , G01B11/00 , G01N21/47 , G01N21/55 , G01N2201/06113 , G01N2201/068 , G03F7/70625 , G03F7/70633
Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.
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