公开(公告)号：US4278699A

公开(公告)日：1981-07-14

申请号：US762680

申请日：1977-01-26

申请人： Kiyoshi Yoshizawa ,  Kikuo Nojiro ,  Masamitsu Itoh ,  Hiroshi Kiuchi ,  Kazuo Horii

发明人： Kiyoshi Yoshizawa ,  Kikuo Nojiro ,  Masamitsu Itoh ,  Hiroshi Kiuchi ,  Kazuo Horii

IPC分类号： A23K1/16 ,  A23K1/18 ,  C12N1/00 ,  B21D39/00 ,  C07G17/00 ,  C12N1/20 ,  C12N1/38

CPC分类号： C12N1/00 ,  A23K20/10 ,  A23K50/30 ,  Y10S426/807 ,  Y10S435/839

摘要： Distillers solubles are purified by a centrifugal separation to a degree above 50,000, which is the product of g.times.minute, or a filtration with addition of a filter aid. The clarified matter is purified by a molecular sieve treatment, ultrafiltration, reverse osmosis or an organic solvent precipitation. The clarified matter or purified matter thus obtained is pulverized by spray drying, lyophilic drying or air drying.Said clarified matter, purified matter or pulverized matter is added to a fermentation medium or a feed as an available component.

摘要翻译： 蒸馏器可溶物通过离心分离纯化至50,000以上，这是gxminute的产物，或通过加入助滤剂进行过滤。 澄清物质通过分子筛处理，超滤，反渗透或有机溶剂沉淀纯化。 通过喷雾干燥，亲液干燥或空气干燥将由此获得的澄清物质或纯化物粉碎。 将所述澄清物质，纯化物质或粉碎物质作为可用组分加入到发酵培养基或饲料中。

公开(公告)号：US08758005B2

公开(公告)日：2014-06-24

申请号：US13115758

申请日：2011-05-25

申请人： Masamitsu Itoh ,  Shingo Kanamitsu

发明人： Masamitsu Itoh ,  Shingo Kanamitsu

IPC分类号： B29C59/16

CPC分类号： H01L21/0274 ,  B29C59/022 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/24479

摘要： According to one embodiment, an imprint mask includes a quartz plate. The quartz plate has a plurality of concave sections formed in part of an upper surface on the quartz plate, and impurities are contained in a portion between the concave sections in the quartz plate.

摘要翻译： 根据一个实施例，压印掩模包括石英板。 石英板具有在石英板的上表面的一部分上形成的多个凹部，在石英板的凹部之间的部分含有杂质。

公开(公告)号：US20120264067A1

公开(公告)日：2012-10-18

申请号：US13525712

申请日：2012-06-18

申请人： Masamitsu Itoh

发明人： Masamitsu Itoh

IPC分类号： G03F7/20

CPC分类号： G03F7/707 ,  G03F1/60 ,  G03F7/703 ,  G03F7/70433 ,  G03F7/70783 ,  Y10S438/975

摘要： There is disclosed a manufacturing method for exposure mask, which comprises acquiring a first information showing surface shape of surface of each of a plurality of mask substrates, and a second information showing the flatness of the surface of each of mask substrates before and after chucked on a mask stage of an exposure apparatus, forming a corresponding relation of each mask substrate, the first information and the second information, selecting the second information showing a desired flatness among the second information of the corresponding relation, and preparing another mask substrate having the same surface shape as the surface shape indicated by the first information in the corresponding relation with the selected second information, and forming a desired pattern on the above-mentioned another mask substrate.

摘要翻译： 公开了一种用于曝光掩模的制造方法，其包括获取表示多个掩模基板中的每一个的表面的表面形状的第一信息，以及示出在夹持之前和之后每个掩模基板的表面的平坦度的第二信息 曝光装置的掩模台，形成每个掩模基板的对应关系，第一信息和第二信息，选择表示对应关系的第二信息之间的期望的平坦度的第二信息，以及准备另一掩模基板 表面形状作为由与所选择的第二信息的对应关系中的第一信息指示的表面形状，并且在上述另一掩模基板上形成期望的图案。

公开(公告)号：US08222051B2

公开(公告)日：2012-07-17

申请号：US13177143

申请日：2011-07-06

申请人： Masamitsu Itoh

发明人： Masamitsu Itoh

IPC分类号： H01L21/00

CPC分类号： G03F7/707 ,  G03F1/60 ,  G03F7/703 ,  G03F7/70433 ,  G03F7/70783 ,  Y10S438/975

摘要： There is disclosed a manufacturing method for exposure mask, which comprises acquiring a first information showing surface shape of surface of each of a plurality of mask substrates, and a second information showing the flatness of the surface of each of mask substrates before and after chucked on a mask stage of an exposure apparatus, forming a corresponding relation of each mask substrate, the first information and the second information, selecting the second information showing a desired flatness among the second information of the corresponding relation, and preparing another mask substrate having the same surface shape as the surface shape indicated by the first information in the corresponding relation with the selected second information, and forming a desired pattern on the above-mentioned another mask substrate.

摘要翻译： 公开了一种用于曝光掩模的制造方法，其包括获取表示多个掩模基板中的每一个的表面的表面形状的第一信息，以及示出在夹持之前和之后每个掩模基板的表面的平坦度的第二信息 曝光装置的掩模台，形成每个掩模基板的对应关系，第一信息和第二信息，选择表示对应关系的第二信息之间的期望的平坦度的第二信息，以及准备另一掩模基板 表面形状作为由与所选择的第二信息的对应关系中的第一信息指示的表面形状，并且在上述另一掩模基板上形成期望的图案。

公开(公告)号：US07912275B2

公开(公告)日：2011-03-22

申请号：US12360929

申请日：2009-01-28

申请人： Hiroki Yamamoto ,  Masamitsu Itoh ,  Osamu Ikenaga ,  Shoji Mimotogi ,  Hideki Kanai ,  Yukiyasu Arisawa

发明人： Hiroki Yamamoto ,  Masamitsu Itoh ,  Osamu Ikenaga ,  Shoji Mimotogi ,  Hideki Kanai ,  Yukiyasu Arisawa

IPC分类号： G06K9/00 ,  G03F1/00

CPC分类号： G03F1/84

摘要： A method of evaluating a photo mask, includes measuring each dimension of a plurality of pattern portions of a mask pattern formed on a photo mask, obtaining an inter-pattern distance between the pattern portion and a pattern different from the pattern portion with respect to each of the pattern portions, obtaining a dimensional difference between the measured dimension of the pattern portion and a target dimension of the pattern portion with respect to each of the pattern portions, grouping the dimensional difference obtained for each pattern portion into a plurality of groups in accordance with the inter-pattern distance obtained for each pattern portion, obtaining an evaluation value based on the dimensional difference in each group with respect to each of the groups, and evaluating the photo mask based on the evaluation value.

摘要翻译： 一种评估光掩模的方法，包括测量形成在光掩模上的掩模图案的多个图案部分的每个尺寸，获得图案部分与不同于图案部分的图案之间的图案间距离 获得图形部分的测量尺寸与图案部分相对于每个图案部分的目标尺寸之间的尺寸差，将根据每个图案部分获得的尺寸差分成多组 对于每个图案部分获得的图案间距离，基于每个组中的每个组的尺寸差获得评估值，并且基于评估值来评估光罩。

公开(公告)号：US07904851B2

公开(公告)日：2011-03-08

申请号：US11878580

申请日：2007-07-25

申请人： Masamitsu Itoh ,  Takashi Hirano ,  Kazuya Fukuhara

发明人： Masamitsu Itoh ,  Takashi Hirano ,  Kazuya Fukuhara

IPC分类号： G06F17/50 ,  G03F1/00

CPC分类号： G06F17/5081 ,  G03F1/50

摘要： This invention discloses a photomask manufacturing method. A pattern dimensional map is generated by preparing a photomask in which a mask pattern is formed on a transparent substrate, and measuring a mask in-plane distribution of the pattern dimensions. A transmittance correction coefficient map is generated by dividing a pattern formation region into a plurality of subregions, and determining a transmittance correction coefficient for each of the plurality of subregions. The transmittance correction value of each subregion is calculated on the basis of the pattern dimensional map and the transmittance correction coefficient map. The transmittance of the transparent substrate corresponding to each subregion is changed on the basis of the transmittance correction value.

摘要翻译： 本发明公开了一种光掩模制造方法。 通过准备其中在透明基板上形成掩模图案并测量图案尺寸的掩模面内分布的光掩模来生成图案尺寸图。 通过将图案形成区域划分为多个子区域，并且确定多个子区域中的每个子区域的透射率校正系数来生成透射率校正系数图。 基于图案尺寸图和透射率校正系数图计算每个子区域的透射率校正值。 基于透射率校正值改变对应于每个子区域的透明基板的透射率。

公开(公告)号：US20100209829A1

公开(公告)日：2010-08-19

申请号：US12770062

申请日：2010-04-29

申请人： Masamitsu Itoh ,  Takashi Hirano ,  Kazuya Fukuhara

发明人： Masamitsu Itoh ,  Takashi Hirano ,  Kazuya Fukuhara

IPC分类号： G03F1/00

CPC分类号： G06F17/5081 ,  G03F1/50

摘要： This invention discloses a photomask manufacturing method. A pattern dimensional map is generated by preparing a photomask in which a mask pattern is formed on a transparent substrate, and measuring a mask in-plane distribution of the pattern dimensions. A transmittance correction coefficient map is generated by dividing a pattern formation region into a plurality of subregions, and determining a transmittance correction coefficient for each of the plurality of subregions. The transmittance correction value of each subregion is calculated on the basis of the pattern dimensional map and the transmittance correction coefficient map. The transmittance of the transparent substrate corresponding to each subregion is changed on the basis of the transmittance correction value.

摘要翻译： 本发明公开了一种光掩模制造方法。 通过准备其中在透明基板上形成掩模图案并测量图案尺寸的掩模面内分布的光掩模来生成图案尺寸图。 通过将图案形成区域划分为多个子区域，并且确定多个子区域中的每个子区域的透射率校正系数来生成透射率校正系数图。 基于图案尺寸图和透射率校正系数图计算每个子区域的透射率校正值。 基于透射率校正值改变对应于每个子区域的透明基板的透射率。

公开(公告)号：US20100075443A1

公开(公告)日：2010-03-25

申请号：US12553906

申请日：2009-09-03

申请人： Ikuo YONEDA ,  Tetsuro Nakasugi ,  Masamitsu Itoh ,  Ryoichi Inanami

发明人： Ikuo YONEDA ,  Tetsuro Nakasugi ,  Masamitsu Itoh ,  Ryoichi Inanami

IPC分类号： H01L21/66 ,  G06K9/00

CPC分类号： G01N21/956 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template.

摘要翻译： 一种用于对模板进行缺陷检查的模板检查方法，通过将用于形成图案的模板的图案形成表面靠近涂覆在平坦基板上的第一流体，将第一流体填充到模板的图案中，以及通过 在第一流体夹在模板和基板之间的状态下进行模板的光学观察，其中第一流体的光学常数与模板的光学常数之间的差异大于模板的光学常数之间的差异 空气和模板的光学常数。

公开(公告)号：US20100032566A1

公开(公告)日：2010-02-11

申请号：US12537414

申请日：2009-08-07

申请人： Yoshihiko Naito ,  Norio Kimura ,  Kenji Terao ,  Masahiro Hatakeyama ,  Masamitsu Itoh

发明人： Yoshihiko Naito ,  Norio Kimura ,  Kenji Terao ,  Masahiro Hatakeyama ,  Masamitsu Itoh

IPC分类号： G01N23/00

CPC分类号： G01N23/203 ,  G01N2223/652

摘要： A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.

摘要翻译： 基板表面检查方法检查在其表面上包括多种材料的基板上的缺陷。 检查方法包括：用电子束照射基板的表面，电子束的着陆能量设定为使得多种材料中的至少两种类型的材料之间的对比度在预定范围内; 检测由所述基板产生的电子以获得所述基板的表面图像，其中从所述至少两种类型的材料形成在其上的图案被消除或削弱; 并且通过将所述对象图像与所述表面图像中的背景图像区分开来的对比度检测作为缺陷来检测来自所获取的表面图像的缺陷。 通过使用细胞检查，可以容易且准确地检测出存在于基板表面上的缺陷。

公开(公告)号：US20100003830A1

公开(公告)日：2010-01-07

申请号：US12350394

申请日：2009-01-08

申请人： Masamitsu Itoh

发明人： Masamitsu Itoh

IPC分类号： H01L21/302 ,  B29C43/58 ,  G01B11/00

CPC分类号： G21K5/10 ,  B29C35/0894 ,  B29C37/0053 ,  B29C43/021 ,  B29C43/58 ,  B29C2043/025 ,  B29C2043/142 ,  B29C2043/3634 ,  B29C2043/5833 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/03 ,  G03F1/00 ,  G03F7/0002 ,  H01L21/02356

摘要： A pattern is formed on a mask substrate. Positional deviation information between an actual position of the pattern formed on the mask substrate and a design position decided at the time of designing the pattern is calculated. A heterogeneous layer of which a volume expands more greatly than that of surrounding mask substrate region is formed in a predetermined position within the mask substrate so that volume expansion of the heterogeneous layer according to the positional deviation information is achieved.

摘要翻译： 在掩模基板上形成图案。 计算形成在掩模基板上的图案的实际位置与设计图案时确定的设计位置之间的位置偏差信息。 在掩模基板内的预定位置形成体积比周围掩模基板区域更大地膨胀的异质层，从而实现根据位置偏差信息的异质层的体积膨胀。