公开(公告)号：US20060113474A1

公开(公告)日：2006-06-01

申请号：US11331222

申请日：2006-01-13

申请人： Hideo Todokoro ,  Makoto Ezumi ,  Yoichi Ose ,  Naomasa Suzuki

发明人： Hideo Todokoro ,  Makoto Ezumi ,  Yoichi Ose ,  Naomasa Suzuki

IPC分类号： G21K7/00 ,  G01N23/00

CPC分类号： H01J37/244 ,  G01N23/225 ,  G01R31/307 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/0535 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24585 ,  H01J2237/24592 ,  H01J2237/281 ,  H01J2237/2817

摘要： A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.

公开(公告)号：US07049591B2

公开(公告)日：2006-05-23

申请号：US11016849

申请日：2004-12-21

申请人： Hideo Todokoro ,  Makoto Ezumi ,  Yoichi Ose ,  Naomasa Suzuki

发明人： Hideo Todokoro ,  Makoto Ezumi ,  Yoichi Ose ,  Naomasa Suzuki

IPC分类号： H01J37/20

CPC分类号： H01J37/244 ,  G01N23/225 ,  G01R31/307 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/0535 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24585 ,  H01J2237/24592 ,  H01J2237/281 ,  H01J2237/2817

摘要： A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.

公开(公告)号：US20060022150A1

公开(公告)日：2006-02-02

申请号：US11189901

申请日：2005-07-27

申请人： Koichiro Takeuchi ,  Tohru Ishitani ,  Yoichi Ose

发明人： Koichiro Takeuchi ,  Tohru Ishitani ,  Yoichi Ose

IPC分类号： H01J1/50

CPC分类号： H01J37/09 ,  H01J37/3056 ,  H01J2237/0264 ,  H01J2237/31749

摘要： A focused ion beam apparatus and a focused ion beam irradiation method are disclosed. Even in the case where a magnetic field exists on the optical axis of an ion beam and the particular magnetic field undergoes a change, the ion beam is focused without separating the isotopes on the sample at the same ion beam spot position as if the magnetic field is not existent. A canceling magnetic field is generated on the optical axis of the ion beam from a canceling magnetic field generator thereby to offset the deflection of the ion beam due to the external magnetic field.

摘要翻译： 公开了一种聚焦离子束装置和聚焦离子束照射方法。 即使在离子束的光轴上存在磁场并且特定的磁场发生变化的情况下，也可以将离子束聚焦，而不会在相同的离子束点位置分离样品上的同位素，就像磁场 不存在 在来自消除磁场发生器的离子束的光轴上产生消除磁场，从而抵消由于外部磁场引起的离子束的偏转。

公开(公告)号：US06956211B2

公开(公告)日：2005-10-18

申请号：US10656166

申请日：2003-09-08

申请人： Mitsugu Sato ,  Hideo Todokoro ,  Yoichi Ose ,  Makoto Ezumi ,  Noriaki Arai ,  Takashi Doi

发明人： Mitsugu Sato ,  Hideo Todokoro ,  Yoichi Ose ,  Makoto Ezumi ,  Noriaki Arai ,  Takashi Doi

IPC分类号： G01Q10/00 ,  G01Q20/02 ,  G01Q30/02 ,  H01J3/14 ,  H01J29/70 ,  H01J37/153 ,  H01J37/28

CPC分类号： H01J37/153 ,  H01J2237/1506 ,  H01J2237/1534 ,  H01J2237/28

摘要： A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.

摘要翻译： 当束相对于样品倾斜时，带电粒子束装置的分辨率几乎不降低。 主光束4的轨迹被偏转器偏转或者被可动孔径改变，使得光束入射到多个透镜6和7的轴线上。 提供了一种用于控制光束的离轴轨迹的装置，使得当光束倾斜时由物镜7产生的像差可以被另一透镜6产生的像差消除。

公开(公告)号：US5756993A

公开(公告)日：1998-05-26

申请号：US754356

申请日：1996-11-22

申请人： Kiyomi Yoshinari ,  Yoichi Ose ,  Katsuhiro Nakagawa ,  Yoshiaki Kato

发明人： Kiyomi Yoshinari ,  Yoichi Ose ,  Katsuhiro Nakagawa ,  Yoshiaki Kato

IPC分类号： G01N27/62 ,  G01N30/72 ,  H01J49/02 ,  H01J49/06 ,  H01J49/22 ,  H01J49/42 ,  H01J49/26

CPC分类号： H01J49/025 ,  G01N30/72

摘要： A sample separated through a pre-processor part having a gas chromatography (GC) or a liquid chromatography (LC) and a moving bed eliminating part is ionized by an ion source and mass-analyzed by a mass-analyzing part. The mass-analyzed ions are deflected and focused by a deflecting portion and a focusing portion in a deflecting and focusing part, and is detected by an ion detecting part. The result of detection is processed by a data processing part.

摘要翻译： 通过具有气相色谱（GC）或液相色谱（LC）和移动床消除部分的预处理器部分分离的样品通过离子源离子化并通过质量分析部分进行质量分析。 质量分析的离子被偏转部分和聚焦部分偏转和聚焦在偏转和聚焦部分中，并由离子检测部分检测。 检测结果由数据处理部分处理。

公开(公告)号：US5466929A

公开(公告)日：1995-11-14

申请号：US20802

申请日：1993-02-22

申请人： Katsuhiko Sakai ,  Osamu Nasu ,  Yoichi Ose

发明人： Katsuhiko Sakai ,  Osamu Nasu ,  Yoichi Ose

IPC分类号： H01J37/02 ,  H01J37/30 ,  H05H3/00

CPC分类号： H01J37/026 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/3175

摘要： When a charged beam is irradiated on a sample, charge up of electric charge of the same polarity as that of the charged beam is built up on the sample surface. In order to neutralize the charge up electric charge, an apparatus for suppressing electrification of sample in charged beam irradiation apparatus is provided in which electric charge of opposite polarity to that of the charged beam is generated near the sample surface to neutralize the charged beam or charge up electric charge on the sample surface. The electric charge for neutralization is generated by admitting elecrtic charge from a plasma generation unit to the vicinity of the sample surface, ionizing gas generated from the sample surface by causing the charged beam to collide the gas or by irradiating electrons from an electron source on the sample surface. Especially when there is a possibility that impurities other than the electric charge for neutralization affect the sample adversely, an impurity generation source is blind folded with a cover so as not to be seen through from the sample and charged beam so that the impurities may be prevented from impinging upon the sample surface or intersecting the charged beam path.

摘要翻译： 当将带电束照射在样品上时，在样品表面上积累与带电束相同极性的电荷的充电。 为了中和充电电荷，提供了一种用于抑制带电束照射装置中的样品带电的装置，其中在样品表面附近产生与带电束的极性相反极性的电荷以中和充电的光束或电荷 样品表面上的电荷。 用于中和的电荷是通过将等离子体发生单元的电荷进入到样品表面附近而产生的，通过使带电的束撞击气体或通过在电子源上照射电子而从样品表面产生的电离电离 样品表面。 特别是当除了中和电荷以外的杂质有可能不利地影响样品时，杂质产生源被遮盖物盲目地折叠，从而不能从样品和带电束中透过，从而可以防止杂质 撞击在样品表面上或与带电光束相交。