METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE

    公开(公告)号:US20240049452A1

    公开(公告)日:2024-02-08

    申请号:US18204548

    申请日:2023-06-01

    发明人: YU-TING LIN

    IPC分类号: H10B12/00

    CPC分类号: H10B12/34 H10B12/053

    摘要: A method of manufacturing a semiconductor structure and a semiconductor structure are provided. The method includes: providing a sacrificial structure disposed on a substrate; arranging a photomask to cover the sacrificial structure, wherein the photomask includes a plurality of transparent portions, a plurality of central opaque portions, at least one first edge opaque portion and at least one second edge opaque portion between the first edge opaque portion and the central opaque portions; removing portions of the sacrificial structure to form a plurality of central openings, at least one first edge opening and at least one second edge opening through the central opaque portions, the first edge opaque portion, the second edge opaque portion and the transparent portions; and forming at least one edge word line on the substrate through the second edge opening and forming a plurality of central word lines on the substrate through the central openings.

    SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20240049451A1

    公开(公告)日:2024-02-08

    申请号:US17879971

    申请日:2022-08-03

    发明人: YU-TING LIN

    IPC分类号: H01L27/108

    CPC分类号: H01L27/10823 H01L27/10876

    摘要: A method of manufacturing a semiconductor structure and a semiconductor structure are provided. The method includes: providing a sacrificial structure disposed on a substrate; arranging a photomask to cover the sacrificial structure, wherein the photomask includes a plurality of transparent portions, a plurality of central opaque portions, at least one first edge opaque portion and at least one second edge opaque portion between the first edge opaque portion and the central opaque portions; removing portions of the sacrificial structure to form a plurality of central openings, at least one first edge opening and at least one second edge opening through the central opaque portions, the first edge opaque portion, the second edge opaque portion and the transparent portions; and forming at least one edge word line on the substrate through the second edge opening and forming a plurality of central word lines on the substrate through the central openings.

    ELECTRONIC DEVICE AND PHASE DETECTOR
    89.
    发明公开

    公开(公告)号:US20240044976A1

    公开(公告)日:2024-02-08

    申请号:US17881811

    申请日:2022-08-05

    发明人: WU-DER YANG

    IPC分类号: G01R31/317 H03K17/687

    CPC分类号: G01R31/31727 H03K17/6871

    摘要: An electronic device including a phase detector is provided. The phase detector includes a first transistor, a second transistor, a third transistor, a fourth transistor, and a first equalizer device. The first transistor has a first input terminal configured to receive a first signal. The second transistor has a second input terminal configured to receive a second signal. The third transistor is electrically connected to the first transistor and has a first output terminal. The fourth transistor is electrically connected to the second transistor and has a second output terminal. The first equalizer device is connected between the first output terminal and the second input terminal.

    ELECTRONIC DEVICE AND PHASE DETECTOR
    90.
    发明公开

    公开(公告)号:US20240044957A1

    公开(公告)日:2024-02-08

    申请号:US18208474

    申请日:2023-06-12

    发明人: WU-DER YANG

    IPC分类号: G01R25/00 H03K17/687

    CPC分类号: G01R25/00 H03K17/6871

    摘要: An electronic device and phase detector are provided. The phase detector includes a first input terminal, a second input terminal, a first input buffer, and a second input buffer. The first input buffer is electrically connected to the first input terminal. The second input buffer is electrically connected to the second input terminal.