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    COLLECTOR FOR USE WITH AN APPARATUS FOR TREATING WAFER-SHAPED ARTICLES
    81.
    发明申请
    COLLECTOR FOR USE WITH AN APPARATUS FOR TREATING WAFER-SHAPED ARTICLES 审中-公开
    收集器用于处理波形形状的装置

    公开(公告)号：US20140283935A1

    公开(公告)日：2014-09-25

    申请号：US13849072

    申请日：2013-03-22

    申请人： LAM RESEARCH AG

    发明人： Reinhold SCHWARZENBACHER ,  Ulrich TSCHINDERLE

    IPC分类号： H01L21/67

    CPC分类号： H01L21/67051 ,  Y10T137/8593

    摘要： A collector assembly for use with a spin chuck includes a base component, a top component and a first intermediate component configured to be fitted between the base component and the top component. The base, top and first intermediate components are configured so as to be interconnectable to form a process enclosure and so as to be separable from one another. The base component and the intermediate component each comprise collector wall segments such that when the base, top and first intermediate components are interfitted, the wall segments together define an outer side wall of the collector assembly.

    摘要翻译： 与旋转卡盘一起使用的收集器组件包括基部部件，顶部部件和构造成装配在基部部件和顶部部件之间的第一中间部件。 基部，顶部和第一中间部件被构造成可互连以形成过程外壳并且可彼此分离。 基部部件和中间部件各自包括收集器壁段，使得当基部，顶部和第一中间部件相互配合时，壁部分一起限定了收集器组件的外侧壁。

    Material transport apparatus and method
    85.
    发明授权
    Material transport apparatus and method 有权
    物料输送装置及方法

    公开(公告)号：US08776830B2

    公开(公告)日：2014-07-15

    申请号：US13156741

    申请日：2011-06-09

    申请人： Walter Chen ,  C. K. Hari Dharan

    发明人： Walter Chen ,  C. K. Hari Dharan

    IPC分类号： F04F1/06

    CPC分类号： F04F1/06 ,  Y10T137/0318 ,  Y10T137/2076 ,  Y10T137/2207 ,  Y10T137/8593

    摘要： An invention for transporting material is described. The material, which may be or include a liquid or particles, be transported floats on and flows on a more dense fluid. Standing waves may be induced in the more dense fluid, and devices are provided to either force the transported fluid in a direction, or to prevent the transported fluid from flowing in a direction counter to the flow direction. The inventive apparatus and method have the ability to transport fluids long distances with much less frictional losses than convention technology.

    摘要翻译： 描述了用于输送材料的发明。 可以是或包括液体或颗粒的材料被运输漂浮在更稠密的流体上并在其上流动。 可能在更密集的流体中引起驻波，并且提供装置以迫使输送的流体沿一个方向，或者防止输送的流体在与流动方向相反的方向上流动。 本发明的装置和方法能够以比常规技术更少的摩擦损失来远距离输送流体。

    Microfluidic Devices and Methods of Fabrication
    86.
    发明申请
    Microfluidic Devices and Methods of Fabrication 有权
    微流体装置和制造方法

    公开(公告)号：US20140191438A1

    公开(公告)日：2014-07-10

    申请号：US14187673

    申请日：2014-02-24

    申请人： Christopher T. Fourkas ,  John T. Fourkas

    发明人： John T. Fourkas ,  Christopher N. LaFratta

    IPC分类号： B29C39/36

    CPC分类号： B29C39/36 ,  B29C33/3857 ,  B29C33/405 ,  B29C39/006 ,  B29L2031/756 ,  Y10T137/2224 ,  Y10T137/8593 ,  Y10T137/85938

    摘要： The present invention relates to microfluidic devices that comprise a 3-D microfluidic network of microchannels of arbitrary complexity and to a method for fabricating such devices. In particular, the invention relates to a method of forming microfluidic devices having 3-D microfluidic networks that contain open or closed loop microchannels using a single-step molding process without the need for layer-by-layer fabrication, and to the resultant microfluidic devices. The networks of such microfluidic devices may comprise one or more microchannel circuits which may be discrete or interconnected.

    摘要翻译： 本发明涉及包含具有任意复杂性的微通道的3-D微流体网络的微流体装置以及制造这种装置的方法。 特别地，本发明涉及一种形成具有3-D微流体网络的微流体装置的方法，所述微流体网络包含使用单步模制工艺而不需要逐层制造的开环或闭环微通道，以及所产生的微流体装置 。 这种微流体装置的网络可以包括一个或多个可以是离散的或互连的微通道电路。

    Fluid stream powered pulse generating fluidic oscillator
    87.
    发明授权
    Fluid stream powered pulse generating fluidic oscillator 有权
    流体动力脉冲产生流体振荡器

    公开(公告)号：US08770229B2

    公开(公告)日：2014-07-08

    申请号：US13107848

    申请日：2011-05-13

    申请人： Shridhar Gopalan ,  Kerrie Allen ,  Gregory Russell ,  Jerry Thurber

    发明人： Shridhar Gopalan ,  Kerrie Allen ,  Gregory Russell ,  Jerry Thurber

    IPC分类号： F15C1/08 ,  B05B1/08

    CPC分类号： F15C1/22 ,  A61H9/0007 ,  A61H2201/5051 ,  A61H2201/5056 ,  Y10T137/0396 ,  Y10T137/2262 ,  Y10T137/2267 ,  Y10T137/8593

    摘要： A fluidic device which produces fluid pulses having a selected pulse repetition frequency, pulse duration, pulse peak pressure and pulse peak flow rate includes first, second and third fluid flow controlling channels or lumens which converge in a junction, defining a “Y” configuration having a base leg and right and left diverging arms. The first leg portion has a fluid input and terminates downstream at the Y junction of the base and the two diverging arms. The first leg has converging walls which reduce the cross sectional area of the flow to thereby increase the fluid velocity to make a fluid jet. The second or right leg, begins at the Y junction and terminates distally in an enclosed, fluid-tight container having a selected blind volume. The third, or left leg, begins at the Y junction and terminates distally in a fluid outlet passage having a selected cross-sectional area.

    摘要翻译： 产生具有所选择的脉冲重复频率，脉冲持续时间，脉冲峰值压力和脉冲峰值流速的流体脉冲的流体装置包括在连接处会聚的第一，第二和第三流体流动控制通道或流体，限定了具有“Y” 一个基部的腿和左右分叉的手臂。 第一腿部具有流体输入并且终止于底部和两个发散臂的Y连接处的下游。 第一腿具有会聚壁，其减小流动的横截面积，从而增加流体速度以形成流体射流。 第二个或右腿从Y连接开始，并且在远离的位置终止于一个封闭的，流体密封的具有选定的盲卷的容器中。 第三个或左腿从Y连接点开始，并在具有选定横截面积的流体出口通道中远端终止。

    PIPELINE SYSTEM AND DRAINAGE CONTAINER FOR RECEIVING LIQUID FLOWING THROUGH A PIPELINE SYSTEM
    88.
    发明申请
    PIPELINE SYSTEM AND DRAINAGE CONTAINER FOR RECEIVING LIQUID FLOWING THROUGH A PIPELINE SYSTEM 审中-公开
    通过管道系统接收液体的管道系统和排水容器

    公开(公告)号：US20140182720A1

    公开(公告)日：2014-07-03

    申请号：US14198691

    申请日：2014-03-06

    申请人： BASF SE

    发明人： Jürgen Wortmann ,  Michael Lutz ,  Katharina Kaleta ,  Kerstin Schierle-Arndt ,  Stephan Maurer ,  Michael Ladenberger

    IPC分类号： F15D1/02

    CPC分类号： F24S40/60 ,  F24S23/74 ,  F24S23/80 ,  Y02E10/45 ,  Y10T137/8593

    摘要： The invention relates to a pipeline system, comprising at least one pipeline loop (9) which is connected at one end to a converger (7) and at a second end to a distributor (5), wherein the converger (7) and the distributor (5) are arranged above one another, and when the converger (7) lies on top pressurized gas can be fed into the converger and the distributor (5) is connected to a drainage container (21), and when the distributor (5) lies on top pressurized gas can be fed into the distributor (5) and the converger (7) is connected to a drainage container (21), the drainage container (21) lying lower than the converger (7) and the distributor (5).The invention furthermore relates to a drainage container (21) for receiving a liquid flowing through a pipeline system (3), wherein the drainage container (21) is connected to the pipeline system (3) via an immersion pipe (33) projecting into the drainage container (21), wherein a siphon (41) is formed in the immersion pipe (33), between the pipeline system (3) and the drainage container (21), and the immersion pipe (33) is heatable, the siphon (41) being closed by solidified material (43) during operation of the pipeline system (3).

    摘要翻译： 本发明涉及一种管道系统，其包括至少一个管道回路（9），该管道回路在一端连接到收敛器（7），并且在第二端连接到分配器（5），其中所述收敛器（7）和分配器 （5）彼此并排设置，并且当收敛器（7）位于顶部加压气体上时，可以将其馈送到收敛器中，并且分配器（5）连接到排水容器（21），并且当分配器（5） 位于顶部加压气体上的可以被供给到分配器（5）中，并且收敛器（7）连接到排水容器（21），排水容器（21）位于收敛器（7）和分配器（5）的下方， 。 本发明还涉及一种用于接收流过管道系统（3）的液体的排水容器（21），其中排水容器（21）经由浸入管（33）连接到管道系统（3） 排水容器（21），其中在浸入管（33）中在管道系统（3）和排水容器（21）之间形成虹吸（41），并且浸入管（33）是可加热的，虹吸管 41）在管道系统（3）的操作期间由固化材料（43）封闭。

    RADICAL SOURCE DESIGN FOR REMOTE PLASMA ATOMIC LAYER DEPOSITION
    89.
    发明申请
    RADICAL SOURCE DESIGN FOR REMOTE PLASMA ATOMIC LAYER DEPOSITION 审中-公开
    用于远程等离子体原子层沉积的辐射源设计

    公开(公告)号：US20140179114A1

    公开(公告)日：2014-06-26

    申请号：US13842054

    申请日：2013-03-15

    申请人： Bart J. van Schravendijk

    发明人： Bart J. van Schravendijk

    IPC分类号： H01L21/02 ,  C23C16/455

    CPC分类号： C23C16/455 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/45565 ,  Y10T137/8593

    摘要： A radical source for supplying radicals during atomic layer deposition semiconductor processing operations is provided. The radical source may include a remote volume, a baffle volume, and a baffle that partitions the remote volume from the baffle volume. The baffle volume and the remote volume may be fluidly connected through the baffle via a plurality of baffle holes. The baffle may be offset from a faceplate with a plurality of first gas distribution holes fluidly connected with the baffle volume. A baffle gas inlet may be fluidly connected with the baffle volume, and a first process gas inlet may be fluidly connected with the remote volume. Baffle gas may be flowed into the baffle volume to prevent radicalized first process gas in the remote volume from flowing through the baffle volume and the faceplate.

    摘要翻译： 提供了在原子层沉积半导体处理操作期间提供自由基的根源。 激进源可以包括远程容积，挡板体积和将远程容积与挡板体积分隔开的挡板。 挡板体积和远端体积可以通过多个挡板通过挡板流体连接。 挡板可以从具有与挡板体积流体连接的多个第一气体分配孔的面板偏移。 挡板气体入口可以与挡板体积流体连接，并且第一工艺气体入口可以与远程容积流体连接。 挡板气体可以流入挡板体积，以防止远处体积中的自发化的第一工艺气体流过挡板体积和面板。