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    MULTI-WAVEGUIDE LIGHT FIELD DISPLAY
    1.
    发明申请
    MULTI-WAVEGUIDE LIGHT FIELD DISPLAY 有权

    公开(公告)号：US20220035091A1

    公开(公告)日：2022-02-03

    申请号：US17451366

    申请日：2021-10-19

    申请人： Molecular Imprints, Inc.

    发明人： Frank Y. Xu ,  Michael Nevin Miller ,  Kang Luo ,  Vikramjit Singh ,  Michael Klug

    IPC分类号： F21V8/00

    摘要： A multi-waveguide optical structure, including multiple waveguides stacked to intercept light passing sequentially through each waveguide, each waveguide associated with a differing color and a differing depth of plane, each waveguide including: a first adhesive layer, a substrate having a first index of refraction, and a patterned layer positioned such that the first adhesive layer is between the patterned layer and the substrate, the first adhesive layer providing adhesion between the patterned layer and the substrate, the patterned layer having a second index of refraction less than the first index of refraction, the patterned layer defining a diffraction grating, wherein a field of view associated with the waveguide is based on the first and the second indices of refraction.

    Controlling template surface composition in nano-imprint lithography
    3.
    发明授权
    Controlling template surface composition in nano-imprint lithography 有权
    在纳米压印光刻中控制模板表面组成

    公开(公告)号：US09323143B2

    公开(公告)日：2016-04-26

    申请号：US12364979

    申请日：2009-02-03

    申请人： Frank Y. Xu ,  Weijun Liu

    发明人： Frank Y. Xu ,  Weijun Liu

    IPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/24802

    摘要： A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer.

    摘要翻译： 纳米压印光刻工艺包括在基本无机纳米压印光刻模板的表面上形成多个羟基，加热模板，并使模板表面上预选择的羟基百分数与单体 官能的非氟化合物，以在纳米压印光刻模板的表面上形成单层涂层。 涂布的模板可以与设置在纳米压印光刻基材上的可聚合组合物接触，并且可聚合组合物固化以形成图案化层。 将涂覆的模板与图案化层分离。

    Nanoimprint lithography processes for forming nanoparticles
    10.
    发明授权
    Nanoimprint lithography processes for forming nanoparticles 有权
    用于形成纳米颗粒的纳米压印光刻工艺

    公开(公告)号：US08802747B2

    公开(公告)日：2014-08-12

    申请号：US13017259

    申请日：2011-01-31

    申请人： Frank Y. Xu ,  Sidlgata V. Sreenivasan ,  Shuqiang Yang

    发明人： Frank Y. Xu ,  Sidlgata V. Sreenivasan ,  Shuqiang Yang

    IPC分类号： B29D11/00 ,  C08F20/06 ,  B23P15/00 ,  B29C35/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.

    摘要翻译： 用于形成纳米颗粒的光刻方法包括在多层基板上图案化牺牲材料。 在一些情况下，将图案转移到多层基板的可移除层或其中，并且将功能材料设置在多层基板的可移除层上并固化。 然后去除功能材料的至少一部分以暴露可移除层的突起，并且功能材料的柱从可除去的层释放以产生纳米颗粒。 在其他情况下，多层基板包括功能材料，并且图案被转移到多层基板的可移除层中或其中。 去除牺牲层，并且功能材料的柱从可除去的层中释放出来以产生纳米颗粒。