摘要:
A device for treating substrates by a treating liquid has at least one rotatably supported support roller which a substrate to be treated rests on during operation. The support roller has a hollow cylinder having a porous rigid material which the substrate to be treated rests on during operation. The device is configured to deliver, during operation, treating liquid via the interior of the hollow cylinder of the at least one support roller through the porous rigid material to the external surface of the hollow cylinder in order to treat at least one surface of the substrate by the treating liquid. The device is configured to treat several substrates in the form of plate-shaped separate wafers arranged one behind the other and/or next to one another in the device, by the treating liquid and to transport the substrates in a transport plane during the treatment.
摘要:
A system and a corresponding method for simultaneous rotation and levitation of a substrate during deposition and/or etching of the substrate are disclosed. The system comprises a carrier located below the substrate, wherein the carrier comprises at least two gas inlets to provide gas to a bottom surface of the substrate to levitate the substrate above the carrier. The system further comprises at least one holding member connected to the carrier and being configured to restrict horizontal drifting of the substrate.
摘要:
A method for separating bonded substrates and a respective apparatus used for that method is disclosed. The method comprises positioning the bonded substrates (1) in an evacuable chamber (2) by respective means, detaching a space (10) from that evacuable chamber by means of a sealing arrangement (4) so that said space comprises a partial area of the substrates with at least one gap (5) between the bonded substrates (1), lowering the pressure in the vacuum chamber (2) while maintaining the pressure in the space (10), thereby causing the bonded substrates to separate.
摘要:
A target for a cathode sputtering device for producing coatings on a substrate (27) by a sputtering cathode (2), which can be introduced into a vacuum chamber, the target having a center axis (44) and being dynamically balanced with respect to the center axis (44) and having a back surface (40) and a target surface (41), the target surface (41) being spaced from the back surface and being concave as a new target surface. The target surface (41) is formed by at least two concentric target surface portions which are inclined with respect to each other, the target surface portions including an outer, radially inwardly extending target surface portion (49, 76) enlarging conically away from the center axis in a direction away from the back surface, and an inner, radially outwardly extending target surface portion (78') narrowing conically toward the center axis in the direction away from the back surface. The target surface (41) has a radially outer edge delimited by an axially projecting edge (72) being inclined with respect to the center axis (44). A concentric target surface intermediate portion (50) extending in a plane perpendicular to the center axis (44) is provided between the outer target surface portion (49) and the axially projecting edge (72).
摘要:
The present invention is directed to a method as well as to a machine for producing a starting material for a silicon solar cell with passivated contacts.
摘要:
A treatment system (100) comprises a process chamber (101) for dynamic or static treatment of at least one substrate. An inductively coupled plasma source, ICP source (120, 120′), comprises at least one inductor (130a, 130b) extending along the longitudinal direction of the ICP source (120, 120′), a gas supply device (141, 142) for one or a plurality of process gases, and a gas directing arrangement (150) disposed in the process chamber (101), said gas directing arrangement (150) extending along the longitudinal direction of the ICP source (120, 120′) and partially surrounding the at least one inductor (130a, 130b).
摘要:
A treatment machine comprises a chamber for the treatment of one substrate or a plurality of substrates. A rotatably supported temperature-controlled shaft (30) defines a cylindrical, gas-tight hollow space. A heating arrangement (40, 50) is provided for electrically heating at least a part of the shaft (30) arranged in the chamber. The heating arrangement (40, 50) comprises an accommodation mandrel (40) for accommodating at least one electrical heating element (50), said accommodation mandrel (40) being arranged in a non-rotating manner and extending into the hollow space of the shaft (30). An outer surface of the accommodation mandrel (40) is spaced apart from an inner surface of the shaft (30) by a gap.
摘要:
A continuous system for transmitting accelerating forces and decelerating forces by interlocking, consisting of at least one carrier system having at least two connecting elements, a plurality of transport systems arranged one behind the other, wherein each transport system has a cam drum or cylindrical cam having a helical groove and the connecting elements of the carrier system are suitable for interlockingly engaging with the groove of the cam drum, and at least one motor, which drives the cam drums.
摘要:
An object (1) is identified based on the unique, characteristic, optical properties (10) before the object is processed in a facility (3). In addition, a clear identification is assigned to the object (1). All production data and process parameters for all facilities (3) through which the object (1) passes are stored together with the identification in an electronic data processing means (6). After the object (1) has passed through a facility (3), the object (1) can be identified again based on its unique, characteristic, optical properties (10). Thus, it can be examined whether the system for tracking the object (1) within a production facility (3) functions without errors. Alternatively, the new identification can also be used to assign a new identification to an object (1) for which the unique, characteristic, optical properties (10) have changed during the production process.