公开(公告)号：US20080105657A1

公开(公告)日：2008-05-08

申请号：US11592237

申请日：2006-11-03

申请人： Jin-Yu Wu ,  Ming-Ruesy Tsai ,  Shang-Feng Huang ,  Ding-Guey Tsai ,  Shin-Wu Wei ,  Chi-Fong Ai

发明人： Jin-Yu Wu ,  Ming-Ruesy Tsai ,  Shang-Feng Huang ,  Ding-Guey Tsai ,  Shin-Wu Wei ,  Chi-Fong Ai

IPC分类号： C25D17/16

CPC分类号： H01J37/32871 ,  H01J37/32055 ,  H01J37/32623 ,  H01J2237/022

摘要： A plasma source is designed with a starting rod to reduce target vapor shielding. A curve ion duct has reverse thorns on its inner wall to filter macroparticles in plasma. The curve ion duct has duct segments and each duct segment has an individual electricity. The present invention increases ion amount, acquires a film through high energy ions, and obtains enhanced film adhesion and film quality.

摘要翻译： 等离子体源设计有起始杆以减少目标蒸气屏蔽。 曲线离子管在其内壁上具有反向刺，以在等离子体中过滤大颗粒。 曲线离子管道具有管道段，每个管道段具有单独的电力。 本发明增加离子量，通过高能离子获得膜，并且获得增强的膜附着力和膜质量。

公开(公告)号：US20120255492A1

公开(公告)日：2012-10-11

申请号：US13080874

申请日：2011-04-06

申请人： Mien-Win Wu ,  Ding-Guey Tsai ,  Hwei-Lang Chang ,  Deng-Lain Lin ,  Cheng-Chang Hsieh ,  Chi-Fong Ai

发明人： Mien-Win Wu ,  Ding-Guey Tsai ,  Hwei-Lang Chang ,  Deng-Lain Lin ,  Cheng-Chang Hsieh ,  Chi-Fong Ai

IPC分类号： C23C16/513 ,  C23C16/458 ,  C23C16/50 ,  C23C16/453

CPC分类号： C23C16/545 ,  C23C16/0245 ,  C23C16/4401 ,  C23C16/45512 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/513 ,  H01J37/32366 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/32761 ,  H01J37/32825 ,  H01J37/32853

摘要： An apparatus provides large area atmospheric pressure plasma enhanced chemical vapor deposition without contaminations in its electrode assembly and deposited films. The apparatus consists of a large area vertical planar nitrogen plasma activation electrode assembly and its high voltage power supply, a large area vertical planar nitrogen plasma deposition electrode assembly and its high voltage power supply, a long-line uniform precursor jet apparatus, a roll-to-roll apparatus for substrate movement, and a sub-atmospheric pressure deposition chamber and its pumping apparatus. Not only can the deposited film contaminations in the electrode assembly interior and the debris of the deposited films from exterior of the electrode assembly and the air aerosols in the deposition chamber be completely prevented, but a large area roll-to-roll uniform deposition can also be achieved to meet a roll-to-roll continuous production, so as to achieve improved film quality, increased production throughput and reduced manufacturing cost.

摘要翻译： 一种装置在其电极组件和沉积膜中提供大面积的大气压等离子体增强化学气相沉积而没有污染。 该装置由大面积垂直平面氮等离子体激活电极组件及其高压电源，大面积垂直平面氮等离子体沉积电极组件及其高压电源，长线均匀前驱体喷射装置， 用于基板移动的滚动装置和次大气压力沉积室及其抽吸装置。 不仅可以完全防止电极组件内部的沉积膜污染物和电极组件外部沉积膜的碎屑和沉积室中的空气气溶胶，而且大面积的卷对卷均匀沉积也可以 实现卷对卷连续生产，从而达到提高胶片质量，提高生产量和降低制造成本的目的。

公开(公告)号：US20090197014A1

公开(公告)日：2009-08-06

申请号：US12068249

申请日：2008-02-04

申请人： Jin-Yu Wu ,  Chun-Han Wang ,  Ding-Guey Tsai ,  Ming-Ruesy Tsai ,  Chi-Fong Ai

发明人： Jin-Yu Wu ,  Chun-Han Wang ,  Ding-Guey Tsai ,  Ming-Ruesy Tsai ,  Chi-Fong Ai

IPC分类号： H05H1/24 ,  B05C11/00

CPC分类号： H01J37/32522 ,  C23C16/27 ,  C23C16/271 ,  C23C16/4411 ,  C23C16/4412 ,  C23C16/45523 ,  C23C16/45565 ,  C23C16/52 ,  H01J37/32009 ,  H01J2237/3321

摘要： There is a disclosed apparatus for coating diamond on work pieces via hot filament chemical vapor deposition. The apparatus includes a chamber, a pump for pumping air from the chamber, a pressure controller for con trolling the pressure in the chamber, a grid disposed in the chamber, a grid-bias power supply for providing a positive bias to the grid, a holder for carrying the work pieces, a holder-bias power supply for providing a negative bias to the holder, filaments provided between the grid and the carrier, a filament power supply for energizing the filaments to heat up, a programmable temperature controller for controlling the temperature in the chamber and a pipe for transferring reaction gas into the chamber.

摘要翻译： 公开了一种用于通过热丝化学气相沉积在工件上涂覆金刚石的公开的装置。 该装置包括：腔室，用于从腔室抽空气的泵，用于控制腔室内的压力的压力控制器，设置在腔室中的格栅，用于向栅格提供正偏压的栅极偏置电源; 用于承载工件的保持器，用于向保持器提供负偏压的保持器偏置电源，设置在电网和载体之间的灯丝，用于使灯丝加热的灯丝电源，用于控制灯丝的可编程温度控制器 室内的温度和用于将反应气体输送到室中的管道。