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1.发明申请Apparatus of triple-electrode dielectric barrier discharge at atmospheric pressure 审中-公开大气压下三电极介质阻挡放电装置公开(公告)号：US20080060579A1
公开(公告)日：2008-03-13
申请号：US11510824
申请日：2006-08-28
Applicant: Cheng-Chang Hsieh , Mien-Win Wu , Chi-Fong Ai
Inventor： Cheng-Chang Hsieh , Mien-Win Wu , Chi-Fong Ai
IPC: C23C16/00
CPC classification number: H01J37/32825 , H01J37/32009 , H01J37/32348 , H01J37/32587
Abstract: A dielectric barrier discharge uses three electrodes at an atmospheric pressure. A wide discharge gap can be used and an enhanced plasma density can be achieved so that thick materials can be processed and its processing speed can also be greatly improved.
Abstract translation: 电介质阻挡放电在大气压下使用三个电极。 可以使用宽的放电间隙，并且可以实现增强的等离子体密度，使得可以处理厚的材料并且还可以极大地改善其加工速度。
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2.发明申请Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus 审中-公开大面积大气压等离子体增强化学气相沉积装置公开(公告)号：US20120255492A1
公开(公告)日：2012-10-11
申请号：US13080874
申请日：2011-04-06
Applicant: Mien-Win Wu , Ding-Guey Tsai , Hwei-Lang Chang , Deng-Lain Lin , Cheng-Chang Hsieh , Chi-Fong Ai
Inventor： Mien-Win Wu , Ding-Guey Tsai , Hwei-Lang Chang , Deng-Lain Lin , Cheng-Chang Hsieh , Chi-Fong Ai
IPC: C23C16/513 , C23C16/458 , C23C16/50 , C23C16/453
CPC classification number: C23C16/545 , C23C16/0245 , C23C16/4401 , C23C16/45512 , C23C16/45565 , C23C16/50 , C23C16/513 , H01J37/32366 , H01J37/3244 , H01J37/32449 , H01J37/32568 , H01J37/32761 , H01J37/32825 , H01J37/32853
Abstract: An apparatus provides large area atmospheric pressure plasma enhanced chemical vapor deposition without contaminations in its electrode assembly and deposited films. The apparatus consists of a large area vertical planar nitrogen plasma activation electrode assembly and its high voltage power supply, a large area vertical planar nitrogen plasma deposition electrode assembly and its high voltage power supply, a long-line uniform precursor jet apparatus, a roll-to-roll apparatus for substrate movement, and a sub-atmospheric pressure deposition chamber and its pumping apparatus. Not only can the deposited film contaminations in the electrode assembly interior and the debris of the deposited films from exterior of the electrode assembly and the air aerosols in the deposition chamber be completely prevented, but a large area roll-to-roll uniform deposition can also be achieved to meet a roll-to-roll continuous production, so as to achieve improved film quality, increased production throughput and reduced manufacturing cost.
Abstract translation: 一种装置在其电极组件和沉积膜中提供大面积的大气压等离子体增强化学气相沉积而没有污染。 该装置由大面积垂直平面氮等离子体激活电极组件及其高压电源，大面积垂直平面氮等离子体沉积电极组件及其高压电源，长线均匀前驱体喷射装置， 用于基板移动的滚动装置和次大气压力沉积室及其抽吸装置。 不仅可以完全防止电极组件内部的沉积膜污染物和电极组件外部沉积膜的碎屑和沉积室中的空气气溶胶，而且大面积的卷对卷均匀沉积也可以 实现卷对卷连续生产，从而达到提高胶片质量，提高生产量和降低制造成本的目的。
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公开(公告)号：US20100218896A1
公开(公告)日：2010-09-02
申请号：US11898356
申请日：2007-09-11
Applicant: Chi-fong Ai , Mien-Win Wu , Cheng-Chang Hsieh
Inventor： Chi-fong Ai , Mien-Win Wu , Cheng-Chang Hsieh
CPC classification number: C23C16/509 , C23C16/452 , H01J37/32348 , H01J37/32825 , H05H1/2406 , H05H2001/2412 , H05H2001/2425
Abstract: An atmospheric pressure plasma reactor includes a high-voltage electrode, a common grounded electrode, a bias electrode and at least one dielectric layer. The high-voltage electrode is connected to a high-voltage power supply. The common grounded electrode is used with the high-voltage electrode to discharge and therefore produce planar atmospheric plasma from reactive gas. The bias electrode is used to generate bias for attracting the ions of the planar atmospheric pressure plasma. The dielectric layer is used to suppress undesirable arc discharge during the discharging.
Abstract translation: 大气压等离子体反应器包括高压电极，公共接地电极，偏置电极和至少一个电介质层。 高压电极连接到高压电源。 公共接地电极与高电压电极一起使用以放电，因此从反应气体产生平面大气等离子体。 偏置电极用于产生用于吸引平面大气压等离子体的离子的偏压。 电介质层用于抑制放电期间的不期望的电弧放电。
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4.发明授权公开(公告)号：US08778080B2
公开(公告)日：2014-07-15
申请号：US12124685
申请日：2008-05-21
Applicant: Mien-Win Wu , Tien-Hsiang Hsueh , Cheng-Chang Hsieh , Chi-fong Ai
Inventor： Mien-Win Wu , Tien-Hsiang Hsueh , Cheng-Chang Hsieh , Chi-fong Ai
CPC classification number: C08F2/52 , B05D1/18 , B05D3/0446 , B05D3/144 , B05D3/147 , B05D7/04 , B05D2252/02
Abstract: Disclosed is an atmospheric-pressure double-plasma graft polymerization apparatus. The apparatus includes a workbench, an initial roller of a roll-to-roll device, an atmospheric-pressure plasma activation device, a peroxide formation device, a coating and grafting device, a drying device, a graft polymerization and curing device, a curing device and a final roller of a roll-to-roll device. The devices are sequentially provided on the workbench.
Abstract translation: 公开了一种大气压双等离子体接枝聚合装置。 该装置包括工作台，卷对卷装置的初始辊，大气压等离子体激活装置，过氧化物形成装置，涂覆和接枝装置，干燥装置，接枝聚合和固化装置，固化 装置和卷对卷装置的最终辊。 设备依次设置在工作台上。
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Patent Agency Ranking
公开(公告)号：US08142608B2
公开(公告)日：2012-03-27
申请号：US11898356
申请日：2007-09-11
Applicant: Chi-fong Ai , Mien-Win Wu , Cheng-Chang Hsieh
Inventor： Chi-fong Ai , Mien-Win Wu , Cheng-Chang Hsieh
CPC classification number: C23C16/509 , C23C16/452 , H01J37/32348 , H01J37/32825 , H05H1/2406 , H05H2001/2412 , H05H2001/2425
Abstract: An atmospheric pressure plasma reactor includes a high-voltage electrode, a common grounded electrode, a bias electrode and at least one dielectric layer. The high-voltage electrode is connected to a high-voltage power supply. The common grounded electrode is used with the high-voltage electrode to discharge and therefore produce planar atmospheric plasma from reactive gas. The bias electrode is used to generate bias for attracting the ions of the planar atmospheric pressure plasma. The dielectric layer is used to suppress undesirable arc discharge during the discharging.
Abstract translation: 大气压等离子体反应器包括高压电极，公共接地电极，偏置电极和至少一个电介质层。 高压电极连接到高压电源。 公共接地电极与高电压电极一起使用以放电，因此从反应气体产生平面大气等离子体。 偏置电极用于产生用于吸引平面大气压等离子体的离子的偏压。 电介质层用于抑制放电期间的不期望的电弧放电。
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6.发明申请Structure and its Method for Hydrophobic and Oleophobic Modification of Polymeric Materials with Atmospheric Plasmas 失效具有大气等离子体的聚合材料的疏水性和疏水性改性的结构及其方法公开(公告)号：US20110045200A1
公开(公告)日：2011-02-24
申请号：US12545664
申请日：2009-08-21
Applicant: Tien-Hsiang Hsueh , Mien-Win Wu , Chi-Fong Ai
Inventor： Tien-Hsiang Hsueh , Mien-Win Wu , Chi-Fong Ai
IPC: C08J7/18
CPC classification number: B05D3/142 , C08J7/18 , C08J2427/12 , D06M10/025 , D06M14/18 , D06M14/22 , D06M14/26 , D06M14/28 , D06M14/32 , D06M14/34 , D06M2200/11 , D06M2200/12
Abstract: The present invention fabricates a hydrophobic and oleophobic polymer fabric through two stages of modification using atmospheric plasmas. The modified fabric has a rough surface and a fluorocarbon functional group having the lowest surface free energy. The fabric has a grafted fluorocarbon monomer layer to enhance the graft efficiency of the fluorocarbon functional groups and its wash fastness. The atmospheric plasmas can be mass produced and less expensively. Hence, the present invention can rapidly modify surfaces of polymeric materials with low cost and good environment protection.
Abstract translation: 本发明通过使用大气等离子体的两个修改阶段制造疏水和疏油聚合物织物。 改性织物具有粗糙表面和具有最低表面自由能的氟碳官能团。 织物具有接枝的氟碳单体层，以提高碳氟化合物官能团的接枝效率及其耐洗牢度。 大气等离子体可以批量生产，而且成本较低。 因此，本发明可以以低成本和良好的环境保护快速地改变聚合物材料的表面。
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7.发明授权Method for hydrophobic and oleophobic modification of polymeric materials with atmospheric plasmas 失效具有大气等离子体的聚合材料疏水和疏油改性的方法公开(公告)号：US08414980B2
公开(公告)日：2013-04-09
申请号：US12545664
申请日：2009-08-21
Applicant: Tien-Hsiang Hsueh , Mien-Win Wu , Chi-Fong Ai
Inventor： Tien-Hsiang Hsueh , Mien-Win Wu , Chi-Fong Ai
IPC: C08J7/18
CPC classification number: B05D3/142 , C08J7/18 , C08J2427/12 , D06M10/025 , D06M14/18 , D06M14/22 , D06M14/26 , D06M14/28 , D06M14/32 , D06M14/34 , D06M2200/11 , D06M2200/12
Abstract: A method of fabricating hydrophobic and oleophobic polymer fabric through two stages of modification using atmospheric plasmas including (a) moving a substrate into an atmospheric plasma area, generating an atmospheric filamentary discharge plasma with a first plasma working gas to obtain a first rough surface of said substrate, (b) exposing plasma treated substrate to air to obtain highly active peroxide on said first rough surface of said substrate, (c) immersing said substrate in a solution of fluorocarbon compound and processing a first stage of graft of a fluorocarbon monomer or oligomer on said substrate to obtain a grafted fluorocarbon monomer or oligomer layer on said first rough surface of said substrate, (d) processing a second stage of graft a fluorocarbon functional group to said grafted fluorocarbon monomer or oligomer layer by generating a carbon tetrafluoride plasma from a second plasma working gas and irradiating said carbon tetrafluoride plasma on said grafted fluorocarbon monomer or oligomer layer; and (e) curing and drying said substrate.
Abstract translation: 一种通过使用大气等离子体的两个阶段的修饰制造疏水和疏油聚合物织物的方法，包括：（a）将基底移动到大气等离子体区域，用第一等离子体工作气体产生大气丝状放电等离子体，以获得所述 （b）将等离子体处理的基板暴露于空气中以在所述基板的所述第一粗糙表面上获得高活性过氧化物，（c）将所述基材浸入氟碳化合物溶液中，并处理氟碳单体或低聚物的第一接枝段 在所述基板上在所述基板的所述第一粗糙表面上获得接枝的碳氟单体或低聚物层，（d）通过从所述基板上生成碳氟化合物单体或低聚物层， 第二等离子体工作气体，并且在所述接枝的氟碳上照射所述四氟化碳等离子体 单体或低聚物层; 和（e）固化和干燥所述基材。
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8.发明申请Apparatus and Method for Double-Plasma Graft Polymerization at Atmospheric Pressure 失效在大气压下双等离子体接枝聚合的装置和方法公开(公告)号：US20090291226A1
公开(公告)日：2009-11-26
申请号：US12124685
申请日：2008-05-21
Applicant: Mien-Win WU , Tien-Hsiang Hsueh , Cheng-Chang Hsieh , Chi-fong Ai
Inventor： Mien-Win WU , Tien-Hsiang Hsueh , Cheng-Chang Hsieh , Chi-fong Ai
IPC: C08F2/46 , C23C16/513
CPC classification number: C08F2/52 , B05D1/18 , B05D3/0446 , B05D3/144 , B05D3/147 , B05D7/04 , B05D2252/02
Abstract: Disclosed is a n atmospheric-pressure double-plasma graft polymerization apparatus. The apparatus includes a workbench, an initial roller of a roll-to-roll device, an atmospheric-pressure plasma activation device, a peroxide formation device, a coating and grafting device, a drying device, a graft polymerization and curing device, a curing device and a final roller of a roll-to-roll device. The devices are sequentially provided on the workbench.
Abstract translation: 公开了一种n大气压双等离子体接枝聚合装置。 该装置包括工作台，卷对卷装置的初始辊，大气压等离子体激活装置，过氧化物形成装置，涂覆和接枝装置，干燥装置，接枝聚合和固化装置，固化 装置和卷对卷装置的最终辊。 设备依次设置在工作台上。
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9.发明申请Method and apparatus for glow discharge plasma treatment of flexible material at atmospheric pressure 审中-公开用于在大气压力下对柔性材料进行辉光放电等离子体处理的方法和装置公开(公告)号：US20070154650A1
公开(公告)日：2007-07-05
申请号：US11320609
申请日：2005-12-30
Applicant: Mien-Win Wu , Cheng-Chang Hsieh , Chi-Fong Ai , Kuo-Chuan Cheng , Tien-Hsiang Hsuch
Inventor： Mien-Win Wu , Cheng-Chang Hsieh , Chi-Fong Ai , Kuo-Chuan Cheng , Tien-Hsiang Hsuch
CPC classification number: H01J37/32825 , B29C59/14 , H01J37/32348 , H01J37/3244 , H01J37/3277 , H05H1/2406 , H05H2001/2412 , H05H2240/10
Abstract: Abstract of the disclosure The present invention provides a method and an apparatus for a glow discharge plasma surface treatment of flexible sheet materials under atmospheric pressure. The apparatus comprises electrodes, a single plasma-gas flow channel, uniform gas inlet-and-outlet devices, gas-seal devices for the horizontal movements of sheet materials and reel devices, so as to attain an uniform distribution of plasma gases in the gap between electrodes. As a result, not only a great amount of expensive plasma gas is saved, but also an uniform glow discharge plasma is generated at the lowest input power to obtain a good quality of uniform plasma treatment with continuous processing and high production.
Abstract translation: 发明内容本发明提供一种用于在大气压下对柔性片材进行辉光放电等离子体表面处理的方法和装置。 该装置包括电极，单个等离子体气体流动通道，均匀的气体入口和出口装置，用于片材和卷轴装置的水平运动的气体密封装置，以便获得等离子体气体在间隙中的均匀分布 电极之间。 结果，不仅节省了大量昂贵的等离子体气体，而且在最低输入功率下产生均匀的辉光放电等离子体，以通过连续加工和高产量获得均匀等离子体处理的良好质量。
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