公开(公告)号：US08835257B2

公开(公告)日：2014-09-16

申请号：US13312176

申请日：2011-12-06

申请人： Young-Pil Kim ,  Hyung-Ik Lee ,  Woo-Sung Jeon ,  Ki-Hong Kim ,  Jung-Yun Won ,  In-Sun Jung

发明人： Young-Pil Kim ,  Hyung-Ik Lee ,  Woo-Sung Jeon ,  Ki-Hong Kim ,  Jung-Yun Won ,  In-Sun Jung

IPC分类号： H01L21/762 ,  H01L27/105 ,  H01L27/108

CPC分类号： H01L27/1052 ,  H01L21/76224 ,  H01L27/10876

摘要： A method including forming an isolation trench; forming first and second liners on the isolation trench; filling the isolation trench an insulating material to form an isolation region and an active region; forming a preliminary gate trench including a first region across the isolation region to expose the first liner, the second liner, and the insulating material, and a second region across the active region to expose a portion of the substrate, the first region having a first sidewall with a planar shape, and the second region having a second sidewall with a concave central area such that an interface between the first and second regions has a pointed portion; removing a portion of the first liner exposed by the first region to form a dent having a first depth by which the pointed portion protrudes; removing the pointed portion to form a gate trench; and forming a gate electrode.

摘要翻译： 一种包括形成隔离沟槽的方法; 在隔离槽上形成第一和第二衬垫; 将绝缘沟槽填充绝缘材料以形成隔离区域和有源区域; 形成包括隔离区域的第一区域的初步栅极沟槽，以露出第一衬垫，第二衬垫和绝缘材料，以及横跨有源区域的第二区域以暴露衬底的一部分，第一区域具有第一 侧壁具有平面形状，并且所述第二区域具有第二侧壁，所述第二侧壁具有凹形中心区域，使得所述第一和第二区域之间的界面具有尖锐部分; 去除由所述第一区域暴露的所述第一衬垫的一部分以形成具有所述尖部突出的第一深度的凹陷; 去除尖部以形成栅沟; 并形成栅电极。

公开(公告)号：US20070172732A1

公开(公告)日：2007-07-26

申请号：US11602636

申请日：2006-11-20

申请人： In-sun Jung ,  Young-gyoon Ryu ,  Seok-soo Lee

发明人： In-sun Jung ,  Young-gyoon Ryu ,  Seok-soo Lee

IPC分类号： H01M4/58 ,  C23C14/34

CPC分类号： H01M10/052 ,  C23C14/165 ,  H01M4/0421 ,  H01M4/1395 ,  H01M4/386 ,  Y10T29/49108

摘要： An anode active material is provided. The anode active material includes a silicon thin film containing crystalline silicon having a Raman shift in a Raman spectrum ranging from about 490 to about 500 cm−1 and a full width at half maximum (FWHM) ranging from about 10 to about 30 cm−1. The volume of the anode active material does not change significantly during charging and discharging. Thus, a lithium battery employing the anode active material has an excellent capacity retention rate and a longer cycle lifetime.

摘要翻译： 提供阳极活性材料。 阳极活性材料包括含有拉曼光谱的结晶硅的硅薄膜，其拉曼光谱范围为约490至约500cm -1，半峰全宽（FWHM）为约 10至约30cm -1。 负极活性物质的体积在充放电期间不会显着变化。 因此，使用负极活性物质的锂电池具有优异的容量保持率和更长的循环寿命。

公开(公告)号：US20070134880A1

公开(公告)日：2007-06-14

申请号：US11636139

申请日：2006-12-08

申请人： Min-Gu Kang ,  Ki-Hong Kim ,  Jin-Bum Kim ,  Jung-Yun Won ,  In-Sun Jung

发明人： Min-Gu Kang ,  Ki-Hong Kim ,  Jin-Bum Kim ,  Jung-Yun Won ,  In-Sun Jung

IPC分类号： H01L21/336

CPC分类号： H01L29/66628 ,  H01L21/0242 ,  H01L21/02458 ,  H01L21/02491 ,  H01L21/0254 ,  H01L21/0262 ,  H01L21/02636 ,  H01L21/02642 ,  H01L21/02664 ,  H01L21/26513 ,  H01L27/10873 ,  H01L29/517

摘要： Methods of manufacturing a field effect transistor include forming a gate pattern on a substrate. A gate spacer is formed on a sidewall of the gate pattern. A first layer is formed from a surface of the substrate and contacting the gate spacer using a first selective epitaxial growth (SEG) process at a first temperature. A second layer is formed from a surface of the first layer and contacting the gate spacer using a second SEG process at a second temperature. The second temperature is lower than the first temperature. The first and second layers define elevated source/drain regions.

摘要翻译： 制造场效应晶体管的方法包括在衬底上形成栅极图案。 栅极间隔物形成在栅极图案的侧壁上。 第一层由衬底的表面形成并且在第一温度下使用第一选择性外延生长（SEG）工艺与栅极间隔物接触。 第二层由第一层的表面形成，并在第二温度下使用第二SEG工艺与栅极间隔物接触。 第二个温度低于第一个温度。 第一和第二层限定升高的源极/漏极区域。

公开(公告)号：US07700225B2

公开(公告)日：2010-04-20

申请号：US10922919

申请日：2004-08-23

申请人： In-Sun Jung ,  Jin-Hwan Park

发明人： In-Sun Jung ,  Jin-Hwan Park

IPC分类号： H01M6/00 ,  H01M10/00 ,  H01M4/62 ,  H01M4/02 ,  C08F14/18 ,  C08F144/18 ,  C08F214/18

CPC分类号： H01M10/052 ,  C08F14/22 ,  H01M4/04 ,  H01M4/0402 ,  H01M4/0404 ,  H01M4/0409 ,  H01M4/0416 ,  H01M4/13 ,  H01M4/133 ,  H01M4/134 ,  H01M4/136 ,  H01M4/139 ,  H01M4/621 ,  H01M4/623 ,  H01M4/625 ,  H01M4/626 ,  H01M4/661

摘要： A lithium battery binder includes polyvinylidenefluoride(PVDF) having an IR absorption peak ratio of Iγ in a range from 0.35 to 1.00, wherein Iγ is equal to I820-850/I860-880 where I820-850 is a peak height resulting from a CH2 rocking band in γ-phase PVDF and I860-880 is a peak height resulting from backbones in α- and γ-phase PVDF. The lithium battery containing the cathode and/or the anode which incorporates the binder improves the charge/discharge characteristics and the lifespan characteristics of a lithium battery.

摘要翻译： 锂电池粘合剂包括IR吸收峰值比为Iγ在0.35至1.00的范围内的聚偏二氟乙烯（PVDF），其中Iγ等于I820-850 / I860-880，其中I820-850是由CH2摇摆产生的峰高 γ相PVDF中的带和I860-880是由α-和γ相PVDF中的骨架产生的峰高。 包含结合有粘合剂的阴极和/或阳极的锂电池改善了锂电池的充电/放电特性和使用寿命特性。

公开(公告)号：US07595246B2

公开(公告)日：2009-09-29

申请号：US11636139

申请日：2006-12-08

申请人： Min-Gu Kang ,  Ki-Hong Kim ,  Jin-Bum Kim ,  Jung-Yun Won ,  In-Sun Jung

发明人： Min-Gu Kang ,  Ki-Hong Kim ,  Jin-Bum Kim ,  Jung-Yun Won ,  In-Sun Jung

IPC分类号： H01L21/336

CPC分类号： H01L29/66628 ,  H01L21/0242 ,  H01L21/02458 ,  H01L21/02491 ,  H01L21/0254 ,  H01L21/0262 ,  H01L21/02636 ,  H01L21/02642 ,  H01L21/02664 ,  H01L21/26513 ,  H01L27/10873 ,  H01L29/517

摘要： Methods of manufacturing a field effect transistor include forming a gate pattern on a substrate. A gate spacer is formed on a sidewall of the gate pattern. A first layer is formed from a surface of the substrate and contacting the gate spacer using a first selective epitaxial growth (SEG) process at a first temperature. A second layer is formed from a surface of the first layer and contacting the gate spacer using a second SEG process at a second temperature. The second temperature is lower than the first temperature. The first and second layers define elevated source/drain regions.

摘要翻译： 制造场效应晶体管的方法包括在衬底上形成栅极图案。 栅极间隔物形成在栅极图案的侧壁上。 第一层由衬底的表面形成并且在第一温度下使用第一选择性外延生长（SEG）工艺与栅极间隔物接触。 第二层由第一层的表面形成，并在第二温度下使用第二SEG工艺与栅极间隔物接触。 第二个温度低于第一个温度。 第一层和第二层限定升高的源/漏区。

公开(公告)号：US06465680B2

公开(公告)日：2002-10-15

申请号：US09884440

申请日：2001-06-20

申请人： Byeong No Lee ,  In-Sun Jung ,  Eun Joo Jang

发明人： Byeong No Lee ,  In-Sun Jung ,  Eun Joo Jang

IPC分类号： C07C6966

CPC分类号： C07C67/313 ,  C07C67/37 ,  C07C69/38 ,  C07C69/716 ,  C07C69/675

摘要： A process for preparing a malonic acid monoester or &bgr;-ketoester from an epoxide includes the steps of reacting an epoxide with carbon monoxide and an alcohol in the presence of a catalytic amount of a cobalt compound and at least one promoter to produce a &bgr;-hydroxyester, separating the &bgr;-hydroxyester from the cobalt compound and the promoter, and oxidizing the &bgr;-hydroxyester to produce a malonic acid monoester or &bgr;-ketoester.

摘要翻译： 从环氧化物制备丙二酸单酯或β-酮酯的方法包括以下步骤：在催化量的钴化合物和至少一种助催化剂的存在下使环氧化物与一氧化碳和醇反应，生成β-羟基酯 将β-羟基酯与钴化合物和助催化剂分离，并氧化β-羟基酯以产生丙二酸单酯或β-酮酯。

公开(公告)号：US06365734B1

公开(公告)日：2002-04-02

申请号：US09605635

申请日：2000-06-28

申请人： Kimoon Kim ,  Jaheon Kim ,  In-Sun Jung ,  Soo-Young Kim ,  Eunsung Lee ,  Jin-Koo Kang

发明人： Kimoon Kim ,  Jaheon Kim ,  In-Sun Jung ,  Soo-Young Kim ,  Eunsung Lee ,  Jin-Koo Kang

IPC分类号： C07D24504

CPC分类号： C07D245/04 ,  B01D53/34 ,  B01D53/50 ,  B01D53/56 ,  B01D53/62 ,  B01J31/0237 ,  B01J31/0247 ,  B01J31/0249 ,  B01J31/0251 ,  C02F1/58 ,  C07D487/22 ,  Y02C10/08

摘要： Cucurbituril derivatives, their preparation methods and uses. The cucurbituril derivatives have the formula (1) where X is O, S or NH; R1 and R2 are independently selected from the group consisting of hydrogen, alkyl groups of 1 to 30 carbon atoms, alkenyl groups of 1 to 30 carbon atoms, alkynyl groups of 1 to 30 carbon atoms, alkylthio groups of 1 to 30 carbon atoms, alkylcarboxyl groups of 1 to 30 carbon atoms, hydroxyalkyl groups of 1 to 30 carbon atoms, alkylsilyl groups of 1 to 30 carbon atoms, alkoxy groups of 1 to 30 carbon atoms, haloalkyl groups of 1 to 30 carbon atoms, nitro group, alkylamine groups of 1 to 30 carbon atoms, amine group, aminoalkyl groups of 1 to 30 carbon atoms, unsubstituted cycloalkyl groups of 5 to 30 carbon atoms, cycloalkyl groups of 4 to 30 carbon atoms with hetero atoms, unsubstituted aryl groups of 6 to 30 carbon atoms, and aryl groups of 6 to 30 carbon atoms with hetero atoms; and n is an integer from 4 to 20, wherein the cucurbituril derivatives having the formula (1), where n=6, R1=H, R2=H and X=O, and n=5, R1=CH3, R2=H and X=O, are excluded. The cucurbituril derivatives are easily prepared as a mixture by one of the three new methods, and each cucurbituril derivative can be separated from the mixture by fractional crystallization. The cucurbituril derivatives having the formula (1) or their mixtures are very useful in removing dyes and heavy metal ions dissolved in water or waste water.

摘要翻译： 葫芦素衍生物，其制备方法和用途。 葫芦巴衍生物具有式（1）其中X是O，S或NH; R1和R2独立地选自氢，1〜30个碳原子的烷基，1〜30个碳原子的烯基，1〜30个碳原子的炔基，1〜30个碳原子的烷硫基，烷基羧基 1〜30个碳原子的基团，1〜30个碳原子的羟基烷基，1〜30个碳原子的烷基甲硅烷基，1〜30个碳原子的烷氧基，1〜30个碳原子的卤代烷基，硝基， 1至30个碳原子，胺基，1至30个碳原子的氨基烷基，5至30个碳原子的未取代环烷基，4至30个碳原子的杂原子环烷基，6至30个碳原子的未取代芳基， 和具有6-10个碳原子的杂原子的芳基; n为4〜20的整数，式中，n = 6，R1 = H，R2 = H，X = O，n = 5，R1 = CH3，R2 = H的葫芦巴脲衍生物 和X = O。 通过三种新方法之一容易地制备葫芦巴脲衍生物作为混合物，并且可以通过分级结晶从混合物中分离出每种葫芦巴脲衍生物。 具有式（1）的葫芦巴衍生物或其混合物非常适用于去除溶于水或废水中的染料和重金属离子。

公开(公告)号：US06639069B2

公开(公告)日：2003-10-28

申请号：US10092468

申请日：2002-03-08

申请人： Kimoon Kim ,  Jaheon Kim ,  In-Sun Jung ,  Soo-Young Kim ,  Eunsung Lee ,  Jin-Koo Kang

发明人： Kimoon Kim ,  Jaheon Kim ,  In-Sun Jung ,  Soo-Young Kim ,  Eunsung Lee ,  Jin-Koo Kang

IPC分类号： C07D24504

CPC分类号： C07D245/04 ,  B01D53/34 ,  B01D53/50 ,  B01D53/56 ,  B01D53/62 ,  B01J31/0237 ,  B01J31/0247 ,  B01J31/0249 ,  B01J31/0251 ,  C02F1/58 ,  C07D487/22 ,  Y02C10/08

摘要： Cucurbituril derivatives, their preparation methods and uses. The cucurbituril derivatives have the formula (1) where X is O, S or NH; R1 and R2 are independently selected from the group consisting of hydrogen, alkyl groups of 1 to 30 carbon atoms, alkenyl groups of 1 to 30 carbon atoms, alkynyl groups of 1 to 30 carbon atoms, alkylthio groups of 1 to 30 carbon atoms, alkylcarboxyl groups of 1 to 30 carbon atoms, hydroxyalkyl groups of 1 to 30 carbon atoms, alkylsilyl groups of 1 to 30 carbon atoms, alkoxy groups of 1 to 30 carbon atoms, haloalkyl groups of 1 to 30 carbon atoms, nitro group, alkylamine groups of 1 to 30 carbon atoms, amine group, aminoalkyl groups of 1 to 30 carbon atoms, unsubstituted cycloalkyl groups of 5 to 30 carbon atoms, cycloalkyl groups of 4 to 30 carbon atoms with hetero atoms, unsubstituted aryl groups of 6 to 30 carbon atoms, and aryl groups of 6 to 30 carbon atoms with hetero atoms; and n is an integer from 4 to 20, wherein the cucurbituril derivatives having the formula (1), where n=6, R1=H, R2=H and X=O, and n=5, R1=CH3, R2=H and X=O, are excluded. The cucurbituril derivatives are easily prepared as a mixture by one of the three new methods, and each cucurbituril derivative can be separated from the mixture by fractional crystallization. The cucurbituril derivatives having the formula (1) or their mixtures are very useful in removing dyes and heavy metal ions dissolved in water or waste water.

摘要翻译： 葫芦素衍生物，其制备方法和用途。 葫芦巴衍生物具有式（1）其中X是O，S或NH; R1和R2独立地选自氢，1〜30个碳原子的烷基，1〜30个碳原子的烯基，1〜30个碳原子的炔基，1〜30个碳原子的烷硫基，烷基羧基 1〜30个碳原子的基团，1〜30个碳原子的羟基烷基，1〜30个碳原子的烷基甲硅烷基，1〜30个碳原子的烷氧基，1〜30个碳原子的卤代烷基，硝基， 1至30个碳原子，胺基，1至30个碳原子的氨基烷基，5至30个碳原子的未取代环烷基，4至30个碳原子的杂原子环烷基，6至30个碳原子的未取代芳基， 和具有6-10个碳原子的杂原子的芳基; n为4〜20的整数，式中，n = 6，R1 = H，R2 = H，X = O，n = 5，R1 = CH3，R2 = H的葫芦巴脲衍生物 和X = O。 通过三种新方法之一容易地制备葫芦巴脲衍生物作为混合物，并且可以通过分级结晶从混合物中分离出每种葫芦巴脲衍生物。 具有式（1）的葫芦巴衍生物或其混合物非常适用于去除溶于水或废水中的染料和重金属离子。

公开(公告)号：US06617478B2

公开(公告)日：2003-09-09

申请号：US10212671

申请日：2002-08-06

申请人： Byeong No Lee ,  In Sun Jung ,  Eun Joo Jang ,  Jung Ho Lee ,  Hyung Rok Kim ,  Yo Han Han

发明人： Byeong No Lee ,  In Sun Jung ,  Eun Joo Jang ,  Jung Ho Lee ,  Hyung Rok Kim ,  Yo Han Han

IPC分类号： C07C2700

CPC分类号： B01J23/72 ,  B01J21/08 ,  B01J23/8892 ,  B01J37/0009 ,  B01J37/03 ,  B01J37/18 ,  C07C29/149 ,  C07C31/205

摘要： A process for preparing a 1,3-alkandiol from a 3-hydroxyester, comprises preparing a catalyst by adding an alkaline precipitator to an aqueous copper salt solution to form copper hydroxide particles, and aging the particles following the addition of a colloidal silica thereto; activating the catalyst by reduction with a H2 gas or a H2-containing gas and applying a pressure of about 5 psig to about 2000 psig at a temperature of about 100° C. to about 250° C. in the presence of an activation solvent; and hydrogenating a 3-hydroxyester in a liquid phase slurry with a H2 gas or a H2-containing gas and applying a pressure of about 50 psig to about 3000 psig at a temperature of about 100° C. to about 250° C. in the presence of the activated catalyst and a reaction solvent, whereby a 1,3-alkanediol can be selectively prepared from a 3-hydroxyester with a high yield.

摘要翻译： 从3-羟基酯制备1,3-二醇的方法包括通过向铜盐水溶液中加入碱性沉淀器来制备催化剂以形成氢氧化铜颗粒，并且在加入胶体二氧化硅后使颗粒老化; 通过用H 2气体或含H 2气体还原并在约100psi至约250℃的温度下在活化溶剂的存在下施加约5psig至约2000psig的压力来活化催化剂; 并用氢气或含H 2气体在液相浆料中氢化3-羟基酯，并在约100℃至约250℃的温度下施加约50psig至约3000psig的压力 存在活化的催化剂和反应溶剂，从而可以高产率从3-羟基酯选择性地制备1,3-链烷二醇。

公开(公告)号：US20100197089A1

公开(公告)日：2010-08-05

申请号：US12699491

申请日：2010-02-03

申请人： Jin-Bum Kim ,  Yu-Gyun Shin ,  Jung-Yun Won ,  In-Sun Jung ,  Jun-Ho Lee

发明人： Jin-Bum Kim ,  Yu-Gyun Shin ,  Jung-Yun Won ,  In-Sun Jung ,  Jun-Ho Lee

IPC分类号： H01L21/8238

CPC分类号： H01L21/823814 ,  H01L21/28518 ,  H01L21/28525 ,  H01L21/2855 ,  H01L21/32053 ,  H01L21/76814 ,  H01L21/76838 ,  H01L21/76843 ,  H01L21/76855 ,  H01L21/76897 ,  H01L21/823871 ,  H01L23/53238 ,  H01L23/53266 ,  H01L29/665 ,  H01L29/66636 ,  H01L2924/0002 ,  H01L2924/00

摘要： Methods of fabricating semiconductor devices include forming a transistor on and/or in a semiconductor substrate, wherein the transistor includes a source/drain region and a gate pattern disposed on a channel region adjacent the source/drain region. An insulating layer is formed on the transistor and patterned to expose the source/drain region. A semiconductor source layer is formed on the exposed source/drain region and on an adjacent portion of the insulating layer. A metal source layer is formed on the semiconductor source layer. Annealing, is performed to form a first metal-semiconductor compound region on the source/drain region and a second metal-semiconductor compound region on the adjacent portion of the insulating layer. The first metal-semiconductor compound region may be thicker than the second metal-semiconductor compound region. The metal source layer may include a metal layer and a metal nitride barrier layer.

摘要翻译： 制造半导体器件的方法包括在半导体衬底上和/或半导体衬底中形成晶体管，其中晶体管包括源极/漏极区域和设置在与源极/漏极区域相邻的沟道区域上的栅极图案。 在晶体管上形成绝缘层并图案化以暴露源/漏区域。 在暴露的源极/漏极区域和绝缘层的相邻部分上形成半导体源极层。 在半导体源层上形成金属源层。 进行退火以在源极/漏极区域上形成第一金属 - 半导体化合物区域和在绝缘层的相邻部分上形成第二金属 - 半导体化合物区域。 第一金属 - 半导体化合物区域可以比第二金属 - 半导体化合物区域厚。 金属源层可以包括金属层和金属氮化物阻挡层。