-
1.发明申请公开(公告)号：US20130071297A1
公开(公告)日：2013-03-21
申请号：US13527842
申请日：2012-06-20
Applicant: J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Seung Hoon Sung , Min Hwan Kim
Inventor： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Seung Hoon Sung , Min Hwan Kim
CPC classification number: B01J19/0093 , B01J2219/00783 , B01J2219/00842 , B01J2219/00853 , B01J2219/00891 , C01B13/115 , C25D11/02 , C25D11/022 , C25D11/026 , C25D11/12 , C25D11/18 , C25D11/26 , H01J11/18 , H01J11/22 , H01J11/34 , H01J17/066 , H01J17/16 , H01J37/32055 , H05H2001/2412 , H05H2001/2418
Abstract: A microplasma device includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel. At least one of the electrodes is encapsulated within the thick metal oxide layer. A method of fabricating a microcavity or microchannel plasma device includes anodizing a flat or gently curved or gently sloped metal substrate to form a thick layer of metal oxide consisting essentially of nanopores that are perpendicular to the surface of the metal substrate. Material removal is conducted to remove metal oxide material to form a microcavity or microchannel in the thick layer of metal oxide.
Abstract translation: 微型装置包括至少部分地在基本上由无缺陷氧化物组成的厚金属氧化物层内限定的微腔或微通道。 电极相对于微腔或微通道布置以刺激所述微腔或微通道中的血浆产生。 至少一个电极被封装在厚的金属氧化物层内。 一种制造微腔或微通道等离子体装置的方法包括阳极氧化平坦或轻柔地弯曲或缓慢倾斜的金属基底，以形成基本上由纳米孔组成的厚层，金属氧化物垂直于金属基底的表面。 进行材料去除以除去金属氧化物材料以在金属氧化物的厚层中形成微腔或微通道。
-
Patent Agency Ranking
公开(公告)号：US08957572B2
公开(公告)日：2015-02-17
申请号：US13532390
申请日：2012-06-25
Applicant: J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Jeffrey H. Ma
Inventor： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Jeffrey H. Ma
CPC classification number: H01J37/32467 , H01J9/18 , H01J37/3244 , H01J37/32513 , H01J37/32568 , H05H1/2406 , H05H2001/2418 , H05H2001/2462
Abstract: Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.
Abstract translation: 本发明的优选实施例包括各种材料中的微血管射流装置和阵列，以及低温微血浆喷射装置和阵列。 这些包括优选的实施方案，单个微血浆喷射装置和在具有细长微腔的整体式聚合物嵌段中形成的装置阵列。 阵列可以被密集地包装，例如在几平方厘米的区域中具有100个喷嘴。 另外的实施方案包括在金属氧化物本身中具有微喷嘴的金属/金属氧化物微量喷射装置。 本发明还提供了微型喷射装置的制造方法，并且已经证明这些方法能够产生与材料绝缘电极整体的定制的微型喷嘴轮廓。
-
3.发明授权Arrays of metal and metal oxide microplasma devices with defect free oxide 有权具有缺陷氧化物的金属和金属氧化物微质体装置阵列公开(公告)号：US08968668B2
公开(公告)日：2015-03-03
申请号：US13527842
申请日：2012-06-20
Applicant: J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Seung Hoon Sung , Min Hwan Kim
Inventor： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Seung Hoon Sung , Min Hwan Kim
CPC classification number: B01J19/0093 , B01J2219/00783 , B01J2219/00842 , B01J2219/00853 , B01J2219/00891 , C01B13/115 , C25D11/02 , C25D11/022 , C25D11/026 , C25D11/12 , C25D11/18 , C25D11/26 , H01J11/18 , H01J11/22 , H01J11/34 , H01J17/066 , H01J17/16 , H01J37/32055 , H05H2001/2412 , H05H2001/2418
Abstract: A microplasma device of the invention includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown.
Abstract translation: 本发明的微血管装置包括至少部分地限定在基本上由无缺氧氧化物组成的厚金属氧化物层内的微腔或微通道。 电极相对于微腔或微通道布置，以在施加适当电压时刺激所述微腔或微通道中的等离子体产生，并且至少一个电极被封装在厚金属氧化物层内。 可以形成大阵列，并且由于在氧化物中缺少微裂纹以避免电介质击穿，因此它们具有很强的鲁棒性。
-
公开(公告)号：US08994270B2
公开(公告)日：2015-03-31
申请号：US12924404
申请日：2010-09-27
Applicant: Il-Gyo Koo , Cameron A. Moore , George J. Collins , Jin-Hoon Cho
Inventor： Il-Gyo Koo , Cameron A. Moore , George J. Collins , Jin-Hoon Cho
CPC classification number: H01J37/32018 , A61B18/042 , H01J37/32366 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01J37/32559 , H01J37/32568 , H01J37/32577 , H01J2237/332 , H01J2237/334 , H05H1/24 , H05H1/2406 , H05H2001/2412 , H05H2001/2431 , H05H2001/2443 , H05H2245/122
Abstract: The present disclosure provides for a plasma system. The plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.
Abstract translation: 本公开提供了一种等离子体系统。 等离子体系统包括等离子体装置，可电离介质源和电源。 等离子体装置包括内部电极和外部电极，同轴地设置在内部电极周围。 内部电极包括远侧部分和覆盖内部电极的至少一部分的绝缘层。 可电离介质源耦合到等离子体装置并且被配置为向其提供可电离介质。 电源耦合到内电极和外电极，并且被配置为点燃等离子体装置处的可离子化介质以形成具有围绕暴露的远端部分的电子鞘层的等离子体流出物。
-
公开(公告)号：US20150008825A1
公开(公告)日：2015-01-08
申请号：US13532390
申请日：2012-06-25
Applicant: J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Jeffrey H. Ma
Inventor： J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Jeffrey H. Ma
CPC classification number: H01J37/32467 , H01J9/18 , H01J37/3244 , H01J37/32513 , H01J37/32568 , H05H1/2406 , H05H2001/2418 , H05H2001/2462
Abstract: Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.
Abstract translation: 本发明的优选实施例包括各种材料中的微血管射流装置和阵列，以及低温微血浆喷射装置和阵列。 这些包括优选的实施方案，单个微血浆喷射装置和在具有细长微腔的整体式聚合物嵌段中形成的装置阵列。 阵列可以被密集地包装，例如在几平方厘米的区域中具有100个喷嘴。 另外的实施方案包括在金属氧化物本身中具有微喷嘴的金属/金属氧化物微量喷射装置。 本发明还提供了微型喷射装置的制造方法，并且已经证明这些方法能够产生与材料绝缘电极整体的定制的微型喷嘴轮廓。
-
公开(公告)号：US20110101862A1
公开(公告)日：2011-05-05
申请号：US12924404
申请日：2010-09-27
Applicant: Il-Hyo Koo , Cameron A. Moore , George J. Collins , Jin-Hoon Cho
Inventor： Il-Hyo Koo , Cameron A. Moore , George J. Collins , Jin-Hoon Cho
CPC classification number: H01J37/32018 , A61B18/042 , H01J37/32366 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01J37/32559 , H01J37/32568 , H01J37/32577 , H01J2237/332 , H01J2237/334 , H05H1/24 , H05H1/2406 , H05H2001/2412 , H05H2001/2431 , H05H2001/2443 , H05H2245/122
Abstract: The present disclosure provides for a plasma system. The plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.
Abstract translation: 本公开提供了一种等离子体系统。 等离子体系统包括等离子体装置，可电离介质源和电源。 等离子体装置包括内部电极和外部电极，同轴地设置在内部电极周围。 内部电极包括远侧部分和覆盖内部电极的至少一部分的绝缘层。 可电离介质源耦合到等离子体装置并且被配置为向其提供可电离介质。 电源耦合到内电极和外电极，并且被配置为点燃等离子体装置处的可离子化介质以形成具有围绕暴露的远端部分的电子鞘层的等离子体流出物。
-
-
-
-
-
Search Results
6
records
(took 0.025 seconds)
