Seed crystal for producing monocrystals and method for producing SiC
monocrystals or monocrystalline SiC layers
    2.
    发明授权
    Seed crystal for producing monocrystals and method for producing SiC monocrystals or monocrystalline SiC layers 失效
    用于生产单晶的晶种和用于生产SiC单晶或单晶SiC层的方法

    公开(公告)号:US5985026A

    公开(公告)日:1999-11-16

    申请号:US23955

    申请日:1998-02-17

    摘要: A seed crystal assembly for producing monocrystals and a method for producing SiC monocrystals or monocrystalline SiC layers include a seed crystal with a surface having a first partial region intended as a crystallization surface for a monocrystal grown out of a gas phase and a second partial region with a coating that is chemically resistant to the seed crystal and to the gas phase and does not melt at the growth temperatures. As a result, thermal degradation of the seed crystal is avoided and the quality of the monocrystals which are produced is increased.

    摘要翻译: 用于制造单晶的晶种组合物和SiC单晶或单晶SiC层的制造方法包括晶种,其表面具有作为从气相生长的单晶的结晶表面的第一部分区域,第二部分区域具有 一种对晶种和气相具有化学耐受性且在生长温度下不熔化的涂层。 结果,避免了晶种的热降解,并且生产的单晶的质量增加。

    Process and device for sublimation growing of silicon carbide
monocrystals
    9.
    发明授权
    Process and device for sublimation growing of silicon carbide monocrystals 失效
    碳化硅单晶的升华生长工艺和装置

    公开(公告)号:US5989340A

    公开(公告)日:1999-11-23

    申请号:US913278

    申请日:1997-08-27

    IPC分类号: C30B23/00 C35B35/00

    摘要: A reaction chamber (2) is enclosed by a gas-tight wall (20), made of silicon carbide obtained by a CVD process at least on the inside (21) facing the reaction chamber (2). At least part of the silicon carbide of the wall (20) is sublimated and grown on a seed crystal (3) as a silicon carbide monocrystal (4).

    摘要翻译: PCT No.PCT / DE95 / 01576 Sec。 371日期1997年8月27日第 102(e)日期1997年8月27日PCT提交1995年11月14日PCT公布。 公开号WO96 / 17113 日期:2006年6月6日反应室(2)由至少在面向反应室(2)的内侧(21)上通过CVD工艺制成的碳化硅制成的气密壁(20)包围。 壁(20)的碳化硅的至少一部分被升华并在作为碳化硅单晶(4)的晶种(3)上生长。

    Device for producing SiC single crystals
    10.
    发明授权
    Device for producing SiC single crystals 失效
    SiC单晶生产装置

    公开(公告)号:US5707446A

    公开(公告)日:1998-01-13

    申请号:US530291

    申请日:1995-09-29

    摘要: SiC single crystals are produced in a reaction chamber, in which there is a seed crystal for the separation of a SiC single crystal from the gas phase. The reaction chamber is connected to a storage chamber, which is at least partly filled with a supply of SiC, by a gas channel with a predetermined cross-section for conveying the SiC in the gas phase. The supply of SiC is sublimated in a heating device and a temperature gradient is adjusted in the reaction chamber. It is, thus, possible to produce SiC single crystals with any desired cross-sectional area and of high crystalline quality and single-crystal yield, because the conveyance rate of the gas molecules can be precisely adjusted.

    摘要翻译: PCT No.PCT / DE94 / 00311 Sec。 371 1995年9月29日第 102(e)1995年9月29日PCT PCT 1994年3月21日PCT公布。 公开号WO94 / 23096 日期1994年10月13日在反应室中产生SiC单晶,其中存在用于从气相中分离SiC单晶的晶种。 反应室通过具有预定横截面的气体通道连接至至少部分地填充有SiC供应的储存室,用于在气相中输送SiC。 SiC的供应在加热装置中升华,并且在反应室中调节温度梯度。 因此,可以精确地调整气体分子的输送速率,从而可以制造具有所需横截面积和高结晶质量和单晶产率的SiC单晶。