System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same
    6.
    发明授权
    System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same 失效
    使用电子回旋共振在环境温度下进行化学气相沉积的系统和使用其沉积金属复合膜的方法

    公开(公告)号:US06851939B2

    公开(公告)日:2005-02-08

    申请号:US10124057

    申请日:2002-04-17

    摘要: A system for chemical vapor deposition at ambient temperature using electron cyclotron resonance (ECR) comprising: an ECR system; a sputtering system for providing the ECR system with metal ion; an organic material supply system for providing organic material of gas or liquid phase; and a DC bias system for inducing the metal ion and the radical ion on a substrate is provided, and a method for fabricating metal composite film comprising: a step of providing a process chamber with the gas as plasma form using the ECR; a step of providing the chamber with the metal ion and the organic material; a step of generating organic material ion and radical ion by reacting the metal ion and the organic material with the plasma; and a step of chemically compounding the organic material ion and the radical ion after inducing them on a surface of a specimen is also provided.

    摘要翻译: 使用电子回旋共振(ECR)在环境温度下进行化学气相沉积的系统,包括:ECR系统; 用于向ECR系统提供金属离子的溅射系统; 用于提供气相或液相的有机材料的有机材料供应系统; 提供了用于在基板上诱导金属离子和自由基离子的DC偏压系统,以及用于制造金属复合膜的方法,包括:使用ECR为处理室提供气体作为等离子体形式的步骤; 向室提供金属离子和有机材料的步骤; 通过使金属离子和有机材料与等离子体反应产生有机材料离子和自由基离子的步骤; 还提供了将有机材料离子和自由基离子诱导到试样的表面上后化学混合的步骤。