摘要:
A chemical mechanical polishing aqueous dispersion including (A) silica particles, and (B1) an organic acid, the sodium content, the potassium content, and the ammonium ion content of the silica particles (A) determined by ICP atomic emission spectrometry, ICP mass spectrometry, or ammonium ion quantitative analysis using ion chromatography having a relationship in which the sodium content is 5 to 500 ppm and at least one of the potassium content and the ammonium ion content is 100 to 20,000 ppm.
摘要:
A fuel cell assembly has a housing defining an electricity generation/combustion chamber, and electricity generation/combustion means disposed within the housing. A fuel gas and an oxygen-containing gas are supplied to the electricity generation/combustion means, and a combustion gas formed within the electricity generation/combustion chamber is discharged from the electricity generation/combustion chamber. A heat exchanger having a first channel and a second channel is disposed on at least one surface of the housing, the combustion gas is discharged from the interior of the electricity generation/combustion chamber through the first channel of the heat exchanger, and one of the oxygen-containing gas and the fuel gas is supplied to the electricity generation/combustion means through the second channel of the heat exchanger. A plurality of electricity generation units are arranged in parallel within the housing, and each of the electricity generation units includes a cell stack constituting the electricity generation/combustion means.
摘要:
The laser beam with a wavelength having a higher energy than the band gap energy of the material forming the carrier moving layer is irradiated to activate the impurities contained in the constituent layer of the field effect transistor in the method of producing the field effect transistor. The method of the invention does not apply the heating of the substrate or the sample stage to raise the temperature of the semiconductor layer using the thermal conductivity so as to activate the impurities. Thus, the implanted impurities can be activated without deteriorating the performance of the device and reliability.
摘要:
A stacked piezoelectric element obtained by alternately stacking a piezoelectric ceramic layer and an electrode layer, wherein said electrode layer mainly comprises an electrically conducting base metal electrode material, and the region held between the electrode layer positioned at the top of each ceramic layer and the electrode layer positioned at the bottom of each ceramic layer contains a material having no piezoelectricity, in which a constituent element of said material having no piezoelectricity is uniformly dispersed so as not to have local distribution of a distributed strength exceeding 2 times the distributed strength which is distributed in a largest number of places and is not 0.
摘要:
In an engine ignition unit, a transistor and a current detecting resistor are connected to primary and secondary windings of an ignition coil, respectively. The current detecting resistor is used for detecting a current flowing between the opposing electrodes of spark plug. At an ignition by the spark plug, high-frequency square wave signals are generated by an oscillator after an ignition signal is cut off. The square wave signals turn on and off the transistor. By this operation, a battery voltage is intermittently applied to the primary winding and an ion current is measured. A frequency of the square wave signals is set close to a resonant frequency of an ion current path including the spark plug, the secondary winding of the ignition coil and the current detecting resistor.
摘要:
The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.
摘要:
A projection exposure apparatus for transferring a pattern on a mask onto a substrate, including a projection optical system having a first reflection optical element for bending an optical axis, a first optical system arranged between the mask and the first reflection optical element, and a second optical system arranged between the first reflection optical element and the substrate; a frame for integrally supporting a first barrel for holding the first optical system and a second barrel for holding the second optical system, and a connecting member for connecting the first barrel and the second barrel at positions different from the frame.
摘要:
A holder improving the optical performance of a reflecting optical member in a projection optical system which projects an image of a pattern formed on a mask onto a photosensitive substrate, and an exposure apparatus having the holder. A support mechanism supports a back surface of the reflecting optical member, which is reverse to a reflecting surface thereof, at at least three points. The support points are positioned on a circumference away from the center of the reflecting surface by a distance at least 0.6 times the distance from the center of the reflecting surface to the outer periphery of the reflecting optical member such that the support points are circumferentially spaced along the circumference at equal intervals. Alternatively, a holding member supports the reflecting optical member and forms a closed chamber in combination with the reflecting optical member. The pressure in the closed chamber at the back of the reflecting surface of the reflecting optical member is regulated to a predetermined level. The reflecting optical member is integrally formed with a mounting portion which is secured to the projection optical system.
摘要:
In a radio telephone equipment which includes a portable radiotelephone (100) and a booster (400), an output from the portable radiotelephone (100) whose output level is set according to a level control signal transmitted from a base station is amplified with a preset amplification factor by an automatic gain control circuit (22) provided in the booster (400). As a result, since the amplification factor of the amplifier in the booster and the portable radiotelephone are independently controlled, the booster can be connected to even a portable radiotelephone which is designed without considering that it will be connected to the booster.
摘要:
A lens barrel holding apparatus for fixing a lens barrel having at least one optical element. The apparatus fixes a lens barrel to a lens barrel holding bed. The lens barrel has a flange portion formed along the circumferential direction of the outer peripheral portion of the lens barrel. The lens barrel holding bed has a cylindrical recess of a diameter larger than the outer diameter of the flange portion. The apparatus includes a plurality of bar-like first supporting members for coupling the bottom surface of the recess and the flange portion together. Also included is a second supporting member that has at least three bar members disposed on the upper part of the flange portion along the circumferential direction of the flange portion so as to surround the lens barrel. The at least three bar members are coupled to the flange portion and to the lens barrel holding bed.