摘要:
Disclosed herein is a liquid crystal display apparatus in which a transmission region and a reflection region disposed in parallel. The apparatus includes first and second substrates and a liquid crystal layer disposed between the first and second substrates. The second substrate has at least a counter electrode, an interlayer insulating film and a pixel electrode for forming a fringe field for driving molecules of the liquid crystal. At least one parameter relating to the interlayer insulating film formed on the second substrate is set different between the transmission region side interlayer insulating film and the reflection region side interlayer insulating film so that driving voltages for the transmission and reflection regions are substantially equal to each other.
摘要:
A liquid crystal display device includes: a liquid crystal layer sandwiched between a first substrate and a second substrate; and a reflective display area on the first substrate side, the reflective display area being provided with a common electrode and a pixel electrode having a plurality of slits so as to apply an electric field to the liquid crystal layer, wherein between the first substrate and the pixel electrode, a reflective film and an interlayer insulating film, both films having projecting patterns on a front surface side, are arranged in this order from the first substrate side, and the pixel electrode and the common electrode are arranged so that electric field intensities between the pixel electrode and the common electrode are made equal in the reflective display area.
摘要:
Disclosed herein is a display apparatus including a display section; a light radiating section; a plurality of light converging lenses; and a plurality of light receiving devices, wherein the display section includes pixel areas each used for creating a pixel section, and sensor areas each used for creating one of the light receiving devices; the light radiating section outputs light and radiates the output light to the display section from a particular-side surface of the display section; each of the light converging lenses is created in one of the sensor areas each located in the display section and converges light generated by the light radiating section on a focal point inside the display section, passing on the converged light to the other-side surface of the display section; and each of the light receiving devices is created in one of the sensor areas to serve as a device for receiving light which arrives at the other-side surface of the display section as light reflected by a subject of detection.
摘要:
A liquid crystal display device includes: a liquid crystal layer sandwiched between a first substrate and a second substrate; and a reflective display area on the first substrate side, the reflective display area being provided with a common electrode and a pixel electrode having a plurality of slits so as to apply an electric field to the liquid crystal layer, wherein between the first substrate and the pixel electrode, a reflective film and an interlayer insulating film, both films having projecting patterns on a front surface side, are arranged in this order from the first substrate side, and the pixel electrode and the common electrode are arranged so that electric field intensities between the pixel electrode and the common electrode are made equal in the reflective display area.
摘要:
A display device able to maximize an area of a luminous region in a pixel and realize an image display in bright and high-definition, wherein luminous elements having a first electrode defining a luminous region; a transparent second electrode facing and arranged to the first electrode; a luminous layer arranged between the first electrode and the second electrode are arranged in a first and second direction in matrix, a plurality of first electrode interconnections extending in the first direction and connected to a plurality of the first electrodes arranged in the first direction is arranged in the display region, and a plurality of second electrode interconnections arranged in parallel to the first electrode to extend in the second direction and commonly connected to a plurality of the second electrodes arranged in the second direction is also arranged.
摘要:
A polycrystalline thin film of good quality is obtained by improving a crystallization process of a semiconductor thin film using laser light. After conducting a film forming step of forming a non-single crystal semiconductor thin film on a surface of a substrate, an annealing step is conducted by irradiating with laser light to convert the non-single crystal semiconductor thin film to a polycrystalline material. The annealing step is conducted by changing and adjusting the cross sectional shape of the laser light to a prescribed region. The semiconductor thin film is irradiated once or more with a pulse of laser light having an emission time width from upstand to downfall of 50 ns or more and having a constant cross sectional area, so as to convert the semiconductor thin film contained in an irradiated region corresponding to the cross sectional area to a polycrystalline material at a time. At this time, the energy intensity of laser light from upstand to downfall is controlled to apply a desired change. According to the procedures, a polycrystalline material having a large particle diameter or a uniform particle diameter can be obtained. In some cases, upon irradiation with laser light, the substrate may be maintained in a non-oxidative atmosphere, or may be heated or cooled.
摘要:
When time-division driving, which allows the number of output pins of a driver IC to be reduced, is applied to an active-matrix LCD apparatus, a time-division number is set to an odd number, preferably to the n-th (n: natural number) power of three, and a time-sequential signal (dot inversion signal) output from the driver IC is time-divided by a time-division switch and sent to signal lines 12-1, 12-2, 12-3, . . . to implement complete dot inversion driving.
摘要:
In a method of manufacturing semiconductor chips for display, a semiconductor thin film is first formed on an insulating substrate, and then a series of processes including a heat-treatment process for the semiconductor thin film are carried out to form integrated thin film transistors on a sectioned area for one chip. Thereafter, pixel electrodes for one picture (frame) are formed within the sectioned area. During the series of processes, a laser pulse is irradiated onto the sectioned area by one shot to perform a heat treatment on the semiconductor thin film for one chip collectively and simultaneously (i.e., perform a batch heat treatment on the semiconductor thin film). Through the batch heat treatment, the crystallization of the semiconductor thin film is promoted. In addition, after the semiconductor thin film is doped with impurities, the activation of impurities doped in the semiconductor thin film can be performed by the batch heat treatment.
摘要:
A thin film semiconductor device comprising a thin film transistor (TFT) having a thin film semiconductor on an insulation substrate to define an element region, and a hygroscopic interlayer dielectric which covers the element. A hydrogenation treatment which comprises the interlayer dielectric provided thereon a cap film for blocking hydrogen diffusion, so that water entrapped by the interlayer dielectric may be decomposed to generate hydrogen which is allowed to diffuse into the thin film transistor provided on the side opposite to that of the cap film.
摘要:
In a method of manufacturing semiconductor chips for display, a semiconductor thin film is first formed on an insulating substrate, and then a series of processes including a heat-treatment process for the semiconductor thin film are carried out to form integrated thin film transistors on a sectioned area for one chip. Thereafter, pixel electrodes for one picture (frame) are formed within the sectioned area. During the series of processes, a laser pulse is irradiated onto the sectioned area by one shot to perform a heat treatment on the semiconductor thin film for one chip collectively and simultaneously (i.e., perform a batch heat treatment on the semiconductor thin film). Through the batch heat treatment, the crystallization of the semiconductor thin film is promoted. In addition, after the semiconductor thin film is doped with impurities, the activation of impurities doped in the semiconductor thin film can be performed by the batch heat treatment.