公开(公告)号：US4933553A

公开(公告)日：1990-06-12

申请号：US319670

申请日：1989-03-07

申请人： Junichiro Tomizawa ,  Susumu Ozasa

发明人： Junichiro Tomizawa ,  Susumu Ozasa

IPC分类号： H01J37/153 ,  H01J37/21

CPC分类号： H01J37/21 ,  H01J37/153

摘要： A focusing apparatus of electron microscope for focusing an electron beam through a focusing lens onto a sample, having a deflecting means for making the electron beam scan on the sample, an astigmatism correcting means of the electron beam, a detecting means for detecting the 2nd electrons from the sample when the sample is scanned by the electron beam, and an optimum exciting current determining means of the focusing lens. The optimum exciting current is obtained by determining the position of the centroid of an area surrounded by a curve Y=f (I) and a fixed straight line. The curve Y shows the relationship between the exciting current for the focusing lens and an electron beam radius corresponding signal which is obtained on the basis of a signal from the detecting means and inversely corresponds to a radius of the electron beam on the surface of the sample.The focusing apparatus enable the exact and simple determination of the optimum exciting current for the focusing lens corresponding to the circle of least confusion.

公开(公告)号：US4642461A

公开(公告)日：1987-02-10

申请号：US676313

申请日：1984-11-29

申请人： Junji Endo ,  Akira Tonomura ,  Susumu Ozasa ,  Tsuyoshi Matsuda ,  Chikara Kimura ,  Nobuyuki Osakabe

发明人： Junji Endo ,  Akira Tonomura ,  Susumu Ozasa ,  Tsuyoshi Matsuda ,  Chikara Kimura ,  Nobuyuki Osakabe

IPC分类号： H01J37/06 ,  H01J37/073 ,  H01J37/248 ,  H01J37/26 ,  G01N23/00

CPC分类号： H01J37/073

摘要： A field emission type electron microscope using a multi-stage acceleration tube wherein an acceleration voltage to be applied to at least one, always inclusive of a first-stage acceleration electrode, of acceleration electrodes is changed in interlocked relationship with a change in a field emission voltage to be applied to a field emission electrode, so that power of an electrostatic lens can be kept constant.

摘要翻译： 使用多级加速管的场致发射型电子显微镜，其中施加到加速电极的至少一个总是包括第一级加速电极的加速电压与场致发射的变化互锁的关系改变 施加到场发射电极的电压，使得静电透镜的功率可以保持恒定。

公开(公告)号：US4589773A

公开(公告)日：1986-05-20

申请号：US333295

申请日：1981-12-22

申请人： Satoshi Ido ,  Minpei Fujinami ,  Yasuo Kato ,  Yoshio Sakitani ,  Susumu Ozasa

发明人： Satoshi Ido ,  Minpei Fujinami ,  Yasuo Kato ,  Yoshio Sakitani ,  Susumu Ozasa

IPC分类号： G03B27/34 ,  G01B11/00 ,  G01B11/02 ,  G01C3/06 ,  H01L21/027 ,  H01L21/30 ,  G01B15/00

CPC分类号： G01B11/026

摘要： A position detecting system suitable for the position control of the surface of a workpiece mounted in an electron beam exposure system is disclosed which includes an electrically-driven light source, a first optical system for focusing a light beam from the light source on a workpiece, a position-controlling table for mounting thereon the workpiece, a second optical system for focusing light reflected from the workpiece on a predetermined image surface, a photodetector having a light receiving surface arranged on the image surface, and a negative feedback amplifier for controlling the light source by the output of the photodetector.

摘要翻译： 公开了适用于安装在电子束曝光系统中的工件的表面的位置控制的位置检测系统，其包括电驱动光源，用于将来自光源的光束聚焦在工件上的第一光学系统， 用于在其上安装工件的位置控制台，用于将从工件反射的光聚焦在预定图像表面上的第二光学系统，具有布置在图像表面上的光接收表面的光电检测器，以及用于控制光的负反馈放大器 通过光电检测器的输出源。

公开(公告)号：US4577111A

公开(公告)日：1986-03-18

申请号：US516091

申请日：1983-07-22

申请人： Norio Saitou ,  Susumu Ozasa ,  Takashi Matsuzaka

发明人： Norio Saitou ,  Susumu Ozasa ,  Takashi Matsuzaka

IPC分类号： G03F7/20 ,  H01J37/30 ,  H01J37/317 ,  H01L21/027 ,  H01L21/30 ,  H01J37/26

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3174 ,  H01L21/30 ,  H01J2237/1505 ,  H01J2237/152 ,  H01J2237/30472 ,  H01J2237/31776

摘要： An apparatus for electron beam lithography comprises at least one mask equipped with a polygonal aperture to be subjected to an electron beam from an electron beam generator, an electron lens system for demagnifying and imaging the polygonal aperture of the mask, and a solenoid coil for electron beam rotation adjustment placed between the mask and the final-stage electron lens.

摘要翻译： 用于电子束光刻的装置包括至少一个掩模，其配备有要经受来自电子束发生器的电子束的多边形孔，用于对掩模的多边形孔径进行缩小和成像的电子透镜系统和用于电子的螺线管线圈 光束旋转调节放置在掩模和终末电子透镜之间。

公开(公告)号：US4400622A

公开(公告)日：1983-08-23

申请号：US225269

申请日：1981-01-15

申请人： Yoshinobu Takeuchi ,  Katsuhiro Kuroda ,  Susumu Ozasa

发明人： Yoshinobu Takeuchi ,  Katsuhiro Kuroda ,  Susumu Ozasa

IPC分类号： H01J37/141 ,  H01J37/21 ,  H01J37/305 ,  H01L21/027 ,  H01J3/20

CPC分类号： H01J37/141

摘要： An electron lens system wherein at least two coils are arranged in the vicinity of an electron-optical lens and are excited in directions opposite to each other, thereby making it possible to adjust the focal distance of the lens without including a rotation attributed to the electron-optical lens in an electron beam which passes through the lens.

摘要翻译： 一种电子透镜系统，其中至少两个线圈布置在电子 - 光学透镜附近并且在彼此相反的方向上被激励，从而使得可以调节透镜的焦距而不包括归因于电子的旋转 - 透过透镜的电子束中的光学透镜。

公开(公告)号：US4801847A

公开(公告)日：1989-01-31

申请号：US763133

申请日：1985-07-29

申请人： Noriyuki Sakudo ,  Katsumi Tokiguchi ,  Hidemi Koike ,  Osami Okada ,  Norio Saito ,  Susumu Ozasa

发明人： Noriyuki Sakudo ,  Katsumi Tokiguchi ,  Hidemi Koike ,  Osami Okada ,  Norio Saito ,  Susumu Ozasa

IPC分类号： H01J37/30 ,  H01J37/317 ,  H05H7/02 ,  H05H7/18 ,  H05H9/00 ,  H01J25/10

CPC分类号： H05H7/02 ,  H01J37/3007 ,  H01J37/3171 ,  H05H7/18 ,  H05H9/00

摘要： A charged particle accelerator is provided with quadrupole electrodes with surfaces that are opposed to each other and are undulated, and with an external resonance circuit. The external resonance circuit consists of a capacitor formed by the opposing electrodes, a variable capacitor provided in parallel with said capacitor, and a coil. The resonance frequency is variable. A direct current and an alternating current may be applied in a superposed manner to the quadrupole electrodes. The thus constructed accelerator can be employed for an ion implanter to implant a heavy-current ion beam of several hundred KeV to several MeV.

摘要翻译： PCT No.PCT / JP84 / 00557 Sec。 371日期：1985年7月29日第 102（e）日期1985年7月29日PCT 1984年11月22日PCT公布。 公开号WO85 / 02489 日期：1985年6月6日。带电粒子加速器具有四极电极，四极电极具有彼此相对的并且起伏的表面，并具有外部谐振电路。 外部谐振电路包括由相对电极形成的电容器，与所述电容器并联设置的可变电容器和线圈。 共振频率是可变的。 直流电流和交流电可以叠加施加到四极电极。 这样构造的加速器可以用于离子注入机，以将几百KeV的大电流离子束注入几MeV。

公开(公告)号：US4443703A

公开(公告)日：1984-04-17

申请号：US347719

申请日：1982-02-10

申请人： Nobuo Shimazu ,  Tsuneo Okubo ,  Norio Saitou ,  Susumu Ozasa

发明人： Nobuo Shimazu ,  Tsuneo Okubo ,  Norio Saitou ,  Susumu Ozasa

IPC分类号： H01J37/147 ,  H01J37/153 ,  H01J37/304 ,  H01J37/305 ,  H01L21/027

CPC分类号： H01J37/147 ,  H01J37/304

摘要： A method and apparatus of deflection calibration for a charged particle beam exposure apparatus having an electromagnetic deflector and an electrostatic deflector both for deflecting a charged particle beam and a movable stage structure. The electromagnetic deflector is previously subjected to a calibration operation known per se. With a fiducial mark positioned in a predetermined location, the beam is deflected by the calibrated electromagnetic deflector instead of moving the stage structure, the beam is then deflected by the electrostatic deflector to detect the location of the fiducial mark, and deflection data are measured of the electrostatic deflection for the detection of the location of the fiducial mark. According to the present invention the calibration is performed in a short time without causing degradation of the precision of, e.g., lithography due to heat generated by movement of the stage structure.

摘要翻译： 一种具有用于偏转带电粒子束和可移动平台结构的电磁偏转器和静电偏转器的带电粒子束曝光装置的偏转校准方法和装置。 电磁偏转器预先经过本身已知的校准操作。 将基准标记定位在预定位置时，光束被校准的电磁偏转器偏转，而不是移动平台结构，然后光束被静电偏转器偏转以检测基准标记的位置，并且测量偏转数据 用于检测静电偏转的位置的基准标记。 根据本发明，在短时间内执行校准，而不会导致由于台架结构的移动产生的热量导致的光刻的精度的降低。

公开(公告)号：US4437008A

公开(公告)日：1984-03-13

申请号：US256682

申请日：1981-04-23

申请人： Tadahito Matsuda ,  Masahide Okumura ,  Hisatake Yokouchi ,  Susumu Ozasa ,  Yasuo Kato

发明人： Tadahito Matsuda ,  Masahide Okumura ,  Hisatake Yokouchi ,  Susumu Ozasa ,  Yasuo Kato

IPC分类号： H01J37/147 ,  H01J37/24 ,  H01J37/302 ,  H01J3/14 ,  G06M3/14

CPC分类号： H01J37/24 ,  H01J37/302

摘要： In an electron beam control system wherein manual adjusting means is used for adjusting currents to flow through two deflection coils which serve to deflect an electron beam in directions of two, x and y axes, respectively; an electron beam control system wherein the manual adjusting means comprises a joy stick type variable resistor which can simultaneously deliver coil deflection signal components in the directions of the two axes through a single operation, and the signal components from the variable resistor are applied to the corresponding deflection coils as adjusting currents.

摘要翻译： 在电子束控制系统中，其中使用手动调节装置来调节流过两个偏转线圈的电流，这两个偏转线圈分别用于在两个x和y轴的方向上偏转电子束; 电子束控制系统，其中手动调节装置包括操纵杆式可变电阻器，其可以通过单次操作同时在两个轴线的方向上传送线圈偏转信号分量，并且来自可变电阻器的信号分量被施加到相应的 偏转线圈作为调整电流。

公开(公告)号：US4629930A

公开(公告)日：1986-12-16

申请号：US517696

申请日：1983-07-27

申请人： Noriyuki Sakudo ,  Osami Okada ,  Susumu Ozasa ,  Katsumi Tokiguchi ,  Hidemi Koike ,  Shunroku Taya ,  Mitsunori Komatsumoto ,  Mitsuo Komatsu

发明人： Noriyuki Sakudo ,  Osami Okada ,  Susumu Ozasa ,  Katsumi Tokiguchi ,  Hidemi Koike ,  Shunroku Taya ,  Mitsunori Komatsumoto ,  Mitsuo Komatsu

IPC分类号： H01J27/02 ,  H01J27/16 ,  H05H7/08

CPC分类号： H01J27/16 ,  H01J27/022

摘要： A plasma ion source includes a discharge chamber in which a plasma is produced by plasma generator, with an acceleration electrode being disposed adjacent to the discharge chamber in order to extract ions from the produced plasma. A deceleration electrode is disposed adjacent to the acceleration electrode to decelerate the extracted ions, and a ground electrode is disposed adjacent to the deceleration electrode. An insulator container is disposed so as to surround the discharge chamber and the respective electrodes, and a shield ring electrode of ground potential is disposed in the vicinity of the deceleration electrode and along an inner wall surface of the insulator container in order to prevent any discharge from arising across the deceleration electrode and the ground electrode.

摘要翻译： 等离子体离子源包括其中由等离子体发生器产生等离子体的放电室，其中加速电极邻近放电室设置，以从所产生的等离子体中提取离子。 减速电极与加速电极相邻地设置，以使所提取的离子减速，并且接地电极与减速电极相邻配置。 绝缘体容器设置成围绕放电室和各个电极，并且将地电位的屏蔽环电极设置在减速电极附近并且沿着绝缘体容器的内壁表面设置，以防止任何放电 来自减速电极和接地电极。

公开(公告)号：US4489241A

公开(公告)日：1984-12-18

申请号：US386579

申请日：1982-06-09

申请人： Tadahito Matsuda ,  Tsuneo Okubo ,  Susumu Ozasa ,  Norio Saitou ,  Haruo Yoda

发明人： Tadahito Matsuda ,  Tsuneo Okubo ,  Susumu Ozasa ,  Norio Saitou ,  Haruo Yoda

IPC分类号： H01J37/304 ,  H01L21/027 ,  H01L21/30 ,  H01L23/544 ,  H01J37/317

CPC分类号： H01L23/544 ,  H01J37/3045 ,  H01L21/0277 ,  H01L21/30 ,  H01L2223/54453 ,  H01L2924/0002

摘要： An exposure method with an electron beam exposure apparatus in which an electron beam is emitted onto a substrate such as a silicon wafer on which an electron-beam sensitive resist is coated, thereby directly forming or writing patterns. A substrate having thereon a number of chips are divided into blocks, which each contain a plurality of chips. Marks are provided on each of the blocks, the positions of the marks are detected and the writing exposure positions of the chips within each block are modified on the basis of the detection results. According to this invention, efficient writing exposure can be made with high accuracy.

摘要翻译： 具有电子束曝光装置的曝光方法，其中电子束被发射到诸如其上涂覆有电子束敏感抗蚀剂的硅晶片的基板上，从而直接形成或书写图案。 其上具有多个芯片的基板被分成块，每个块包含多个芯片。 在每个块上提供标记，检测标记的位置，并且基于检测结果修改每个块内的码片的写入曝光位置。 根据本发明，可以高精度地进行有效的写入曝光。