Methods of forming topographical features using segregating polymer mixtures
    3.
    发明授权
    Methods of forming topographical features using segregating polymer mixtures 有权
    使用分离聚合物混合物形成地形特征的方法

    公开(公告)号:US08734904B2

    公开(公告)日:2014-05-27

    申请号:US12957008

    申请日:2010-11-30

    IPC分类号: B81C1/00 B82Y40/00 H01L21/027

    摘要: Methods are disclosed for forming topographical features. In one method, a pre-patterned structure is provided which comprises i) a support member having a surface and ii) an element for topographically guiding segregation of a polymer mixture including a first polymer and a second polymer, the element comprising a feature having a sidewall adjoined to the surface. The polymer mixture is disposed on the pre-patterned structure, wherein the disposed polymer mixture has contact with the sidewall and the surface. The first polymer and the second polymer are segregated in a plane parallel to the surface, thereby forming a segregated structure comprising a first polymer domain and a second polymer domain. The first polymer domain and/or the second polymer domain are lithographically patterned, thereby forming topographical features comprising at least one of i) a first feature comprising a lithographically patterned first polymer domain and ii) a second feature comprising a lithographically patterned second polymer domain.

    摘要翻译: 公开了形成形貌特征的方法。 在一种方法中,提供预先图案化的结构,其包括i)具有表面的支撑构件和ii)用于拓扑地引导包括第一聚合物和第二聚合物的聚合物混合物的偏析的元件,所述元件包括具有 侧壁与表面相邻。 聚合物混合物设置在预图案化结构上,其中所设置的聚合物混合物与侧壁和表面接触。 第一聚合物和第二聚合物在平行于表面的平面中分离,从而形成包含第一聚合物结构域和第二聚合物结构域的分离结构。 第一聚合物结构域和/或第二聚合物结构域被光刻图案化,从而形成包括以下至少一个的拓扑特征:i)包含光刻图案化的第一聚合物结构域的第一特征和ii)包含光刻图案化的第二聚合物结构域的第二特征。

    Methods of directed self-assembly, and layered structures formed therefrom
    4.
    发明授权
    Methods of directed self-assembly, and layered structures formed therefrom 有权
    定向自组装的方法和由其形成的分层结构

    公开(公告)号:US08623458B2

    公开(公告)日:2014-01-07

    申请号:US12642018

    申请日:2009-12-18

    IPC分类号: B81C1/00 C08J5/18 C08J5/00

    摘要: A layered structure comprising a self-assembled material is formed by a method that includes forming a photochemically, thermally and/or chemically treated patterned photoresist layer disposed on a first surface of a substrate. The treated patterned photoresist layer comprises a non-crosslinked treated photoresist. An orientation control material is cast on the treated patterned photoresist layer, forming a layer containing orientation control material bound to a second surface of the substrate. The treated photoresist and, optionally, any non-bound orientation control material are removed by a development process, resulting in a pre-pattern for self-assembly. A material capable of self-assembly is cast on the pre-pattern. The casted material is allowed to self-assemble with optional heating and/or annealing to produce the layered structure.

    摘要翻译: 包括自组装材料的层状结构通过包括形成设置在衬底的第一表面上的光化学,热和/或化学处理的图案化光致抗蚀剂层的方法形成。 经处理的图案化光刻胶层包括非交联处理的光致抗蚀剂。 将取向控制材料浇铸在经处理的图案化的光致抗蚀剂层上,形成包含与基材的第二表面结合的取向控制材料的层。 经处理的光致抗蚀剂和任选的任何未结合的取向控制材料通过显影过程被去除,从而形成用于自组装的预图案。 能够自组装的材料在预制图案上铸造。 允许铸造材料通过任选的加热和/或退火自组装以产生分层结构。

    Method of preparing cyclic carbonates, cyclic carbamates, cyclic ureas, cyclic thiocarbonates, cyclic thiocarbamates, and cyclic dithiocarbonates
    5.
    发明授权
    Method of preparing cyclic carbonates, cyclic carbamates, cyclic ureas, cyclic thiocarbonates, cyclic thiocarbamates, and cyclic dithiocarbonates 有权
    环状碳酸酯,环状氨基甲酸酯,环状脲,环状硫代碳酸酯,环状硫代氨基甲酸酯和环状二硫代碳酸酯的制备方法

    公开(公告)号:US08476428B2

    公开(公告)日:2013-07-02

    申请号:US13451225

    申请日:2012-04-19

    IPC分类号: C07D319/06 C07D265/06

    摘要: A method of preparing a cyclic monomer, comprising: forming a first mixture comprising a precursor compound, bis(pentafluorophenyl)carbonate, and a catalyst; wherein the precursor compound has a structure comprising a) two or more carbons, and b) two functional groups selected from the group consisting of primary amine, secondary amine, thiol group, hydroxyl group, and combinations thereof; and agitating the first mixture at a temperature effective to form a second mixture comprising the cyclic monomer, the cyclic monomer selected from the group consisting of a cyclic carbonate, a cyclic carbamate, a cyclic urea, a cyclic thiocarbonate, a cyclic thiocarbamate, and a cyclic dithiocarbonate.

    摘要翻译: 一种制备环状单体的方法,包括:形成包含前体化合物,双(五氟苯基)碳酸酯和催化剂的第一混合物; 其中所述前体化合物具有包含a)两个或更多个碳的结构,和b)选自伯胺,仲胺,硫醇基,羟基及其组合的两个官能团; 并在有效形成包含环状单体的第二混合物的温度下搅拌第一混合物,所述环状单体选自环状碳酸酯,环状氨基甲酸酯,环状脲,环状硫代碳酸酯,环状硫代氨基甲酸酯和 环状二硫代碳酸酯。

    METHOD FOR DESIGNING OPTICAL LITHOGRAPHY MASKS FOR DIRECTED SELF-ASSEMBLY
    8.
    发明申请
    METHOD FOR DESIGNING OPTICAL LITHOGRAPHY MASKS FOR DIRECTED SELF-ASSEMBLY 有权
    用于指导自组装的光学绘图掩模的方法

    公开(公告)号:US20120331428A1

    公开(公告)日:2012-12-27

    申请号:US13606055

    申请日:2012-09-07

    IPC分类号: G06F17/50

    摘要: A method and a computer system for designing an optical photomask for forming a prepattern opening in a photoresist layer on a substrate wherein the photoresist layer and the prepattern opening are coated with a self-assembly material that undergoes directed self-assembly to form a directed self-assembly pattern. The methods includes: generating a mask design shape from a target design shape; generating a sub-resolution assist feature design shape based on the mask design shape; using a computer to generate a prepattern shape based on the sub-resolution assist feature design shape; and using a computer to evaluate if a directed self-assembly pattern of the self-assembly material based on the prepattern shape is within specified ranges of dimensional and positional targets of the target design shape on the substrate.

    摘要翻译: 一种用于设计光学掩模的方法和计算机系统,用于在基底上的光致抗蚀剂层中形成预模式开口,其中光致抗蚀剂层和预图案开口用自组装材料涂覆,所述自组装材料经过定向自组装以形成定向自身 装配模式 所述方法包括:从目标设计形状生成掩模设计形状; 基于掩模设计形状产生子分辨率辅助特征设计形状; 使用计算机基于子分辨率辅助特征设计形状生成预绘图形状; 并且使用计算机来评估基于预图案形状的自组装材料的定向自组装图案是否在基板上的目标设计形状的尺寸和位置目标的指定范围内。

    Multiple biopsy apparatus and related method of use
    9.
    发明授权
    Multiple biopsy apparatus and related method of use 有权
    多次活检装置及相关使用方法

    公开(公告)号:US08262587B2

    公开(公告)日:2012-09-11

    申请号:US12896627

    申请日:2010-10-01

    IPC分类号: A61B10/02

    摘要: An endoluminal biopsy device is provided with a proximal actuation mechanism attached to a distal sampler by at least one elongate member. The distal sampler includes a distal inner portion defining a plurality of chambers, each configured to receive a tissue sample, and a distal outer portion defining a cutting mechanism opening having a cutting edge adjacent the cutting mechanism opening. The distal outer portion is configured so that, when the cutting mechanism opening aligns with one of the plurality of chambers, the distal outer portion covers the remaining chambers. A related method for the use of such an endoluminal biopsy device also is provided.

    摘要翻译: 腔内活检装置设置有通过至少一个细长构件附接到远端取样器的近侧致动机构。 远端采样器包括限定多个室的远侧内部部分,每个室被构造成容纳组织样本,远侧外部部分限定切割机构开口,该切割机构开口具有与切割机构开口相邻的切割边缘。 远端外部部分构造成使得当切割机构开口与多个腔室中的一个对准时,远侧外部部分覆盖剩余的腔室。 还提供了使用这种腔内活检装置的相关方法。