Substrate for sample analyses
    5.
    发明授权
    Substrate for sample analyses 有权
    底物进行样品分析

    公开(公告)号:US07597852B2

    公开(公告)日:2009-10-06

    申请号:US11219445

    申请日:2005-09-02

    IPC分类号: B01L3/00

    摘要: Apparatus and methods for screening a library of materials. Materials are provided in a plurality of locations on a substrate. The locations include first regions that are sufficiently transparent to a first form of radiation to permit analysis of the portion of the sample material supported in the first region using a first analytical technique, and second regions that are sufficiently transparent to a second form of radiation to permit analysis of a portion of the sample supported in the second region using a second analytical technique, but are insufficiently transparent to the first form of radiation to permit analysis of the portion of the sample material supported in the second region using the first analytical technique. Sample materials are screened at one or more sample locations of the substrate using the first analytical technique in the first region and the second analytical technique in the second region.

    摘要翻译: 用于筛选材料库的装置和方法。 材料设置在基板上的多个位置。 所述位置包括对于第一形式的辐射足够透明的第一区域,以允许使用第一分析技术对支撑在第一区域中的样品材料的部分进行分析,以及对第二辐射形式足够透明的第二区域 允许使用第二分析技术对支撑在第二区域中的一部分样品进行分析,但对第一形式的辐射不够透明,以允许使用第一分析技术分析支撑在第二区域中的样品材料的一部分。 使用第一区域中的第一分析技术和第二区域中的第二分析技术在基板的一个或多个样品位置处筛选样品材料。