公开(公告)号：US20030054588A1

公开(公告)日：2003-03-20

申请号：US10005308

申请日：2001-12-03

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Satyadev R. Patel ,  Andrew G. Huibers ,  Steven S. Chiang

IPC: H01L021/44

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

公开(公告)号：US20020197761A1

公开(公告)日：2002-12-26

申请号：US10154150

申请日：2002-05-22

Applicant: REFLECTIVITY, INC.

Inventor： Satyadev R. Patel ,  Andrew G. Huibers ,  Gregory P. Schaadt ,  Peter J. Heureux

IPC: H01L021/00 ,  H01L021/302 ,  H01L021/461

CPC classification number: B81C1/00476 ,  B81C1/00547 ,  B81C2201/0109 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/112 ,  B82Y30/00

Abstract: An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.

Abstract translation: 公开了一种诸如用于形成微机械装置的蚀刻方法。 该方法的一个实施例是用于释放微机械结构，包括：提供衬底; 在衬底上直接或间接提供牺牲层; 在所述牺牲层上提供一个或多个微机械结构层; 执行第一蚀刻以去除牺牲层的一部分，所述第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体，以允许蚀刻剂气体在物理或化学和物理上移除牺牲层的该部分; 执行第二蚀刻以去除牺牲层中的附加牺牲材料，第二蚀刻包括提供化学上但不物理蚀刻附加牺牲材料的气体。 该方法的另一实施例是用于在衬底上或衬底内蚀刻硅材料，包括：执行第一蚀刻以去除硅的一部分，第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体以允许蚀刻剂 物理或化学和物理的气体去除硅的部分; 执行第二蚀刻以去除附加的硅，第二蚀刻包括提供蚀刻剂气体，其化学地但不物理地蚀刻附加的硅。

公开(公告)号：US20040012838A1

公开(公告)日：2004-01-22

申请号：US10305631

申请日：2002-11-26

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Andrew G. Huibers

IPC: G02B026/00

CPC classification number: B82Y30/00

Abstract: A projection system, a spatial light modulator, and a method for forming a MEMS device are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micro-mirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers if desired. In one embodiment of the invention, one of the substrates is a light transmissive substrate and a light blocking layer that is preferably a light absorbing layer is provided on the light transmissive substrate to selectively block light from passing through the substrate. The light blocking layer can be formed as a pattern, such as a grid or strips for blocking light from entering gaps between adjacent micro-mirrors.

Abstract translation: 公开了投影系统，空间光调制器和用于形成MEMS器件的方法。 空间光调制器可以具有与包括微镜阵列的基板之一粘合在一起的两个基板。 如果需要，在沉积吸气剂材料和/或固体或液体润滑剂在一个或两个晶片上之后，两个基底可以在晶片层上结合。 在本发明的一个实施例中，其中一个衬底是透光衬底，并且在透光衬底上设置优选为光吸收层的遮光层，以选择性地阻挡光通过衬底。 光阻挡层可以形成为图案，例如用于阻挡光进入相邻微镜之间的间隙的栅格或条带。

公开(公告)号：US20020105729A1

公开(公告)日：2002-08-08

申请号：US10044451

申请日：2002-01-11

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Peter W. Richards ,  Andrew G. Huibers ,  Gregory R. Muir

IPC: G02B027/14

CPC classification number: H04N9/3114 ,  G02B26/008

Abstract: A color wheel is disclosed that has at least one segment that occupies, for a given radius, a percentage of the circumference of the wheel at that radius, which percentage varies continuously or in multiple steps from a radially inward point to a radially outer point on the wheel. In one embodiment, the color wheel has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the transitions from one filter segment to the next is curved or stepped. A color wheel also is disclosed that has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the segments is a higher brightness segment than the others and has sides facing adjacent filter segments that do not lie on the radius of the wheel. A projection system is also disclosed that has a light source, a unique color wheel, a spatial light modulator, and projection optics.

Abstract translation: 公开了一种色轮，其具有至少一个段，对于给定的半径占据在该半径处的轮的圆周的百分比，该百分比从径向内部点到径向外部点连续地或以多个步长 车轮。 在一个实施例中，色轮具有围绕轮的圆周彼此相邻的多个过滤器段，其中从一个过滤器段到下一个的过渡段中的至少一个是弯曲的或阶梯的。 还公开了一种色轮，其具有围绕车轮圆周彼此相邻的多个过滤器段，其中至少一个段是比其它段更高的亮度段，并且具有面向相邻过滤段的侧面，其不位于 轮的半径。 还公开了一种具有光源，独特色轮，空间光调制器和投影光学器件的投影系统。

公开(公告)号：US20040100680A1

公开(公告)日：2004-05-27

申请号：US10305509

申请日：2002-11-26

Applicant: REFLECTIVITY, INC., California corporation

Inventor： Andrew G. Huibers ,  Satyadev R. Patel ,  Robert M. Duboc JR.

IPC: G02B026/00

CPC classification number: G02B26/0841 ,  B82Y30/00 ,  Y10T428/30

Abstract: A projection system, a spatial light modulator, and a method for forming micromirrors are disclosed. A substrate comprises circuitry and electrodes for electrostatically deflecting micromirror elements that are disposed within an array of such elements forming the spatial light modulator. In one embodiment, the substrate is a silicon substrate having circuitry and electrodes thereon for electrostatically actuating adjacent micromirror elements, and the substrate is fully or selectively covered with a light absorbing material.

公开(公告)号：US20030134449A1

公开(公告)日：2003-07-17

申请号：US10338561

申请日：2003-01-07

Applicant: REFLECTIVITY, INC., a California Corporation

Inventor： Andrew G. Huibers

IPC: H01L021/00

CPC classification number: B81C3/002

Abstract: A method for making a MEMS device comprises forming a plurality of micromechanical elements on a first substrate; forming circuitry and electrodes on a second substrate, the first and second substrates extending in a plane in X and Y directions; aligning the first and second substrates in the X and Y directions and moving the substrates toward each other in a Z direction and bonding the first and second substrates with a gap therebetween in the Z direction to form an assembly; singulating the assembly into assembly portions; and altering the gap for each assembly portion. Another embodiment involves aligning the first and second substrates in the X and Y directions and moving the substrates toward each other in a Z direction and bonding the first and second substrates with a gap therebetween in the Z direction to form an assembly; actuating and testing the micromechanical elements of the assembly; and altering the gap for each assembly. A further embodiment involves aligning the first and second substrates in the X and Y directions and moving the substrates toward each other in a Z direction and bonding the first and second substrates with a gap therebetween in the Z direction to form an assembly; wherein the micromechanical elements are actuated while bonding of the substrates.

Abstract translation: 制造MEMS器件的方法包括在第一衬底上形成多个微机械元件; 在第二基板上形成电路和电极，所述第一和第二基板在X和Y方向上的平面中延伸; 使第一和第二基板沿X方向和Y方向对齐，并且沿Z方向彼此移动基板，并且在Z方向上将第一和第二基板之间的间隙接合以形成组件; 将组件分成组装部分; 并改变每个组装部分的间隙。 另一实施例涉及使第一和第二基板沿X方向和Y方向对准，并使基板沿Z方向彼此相对移动，并且在Z方向上将第一和第二基板之间的间隙接合以形成组件; 启动和测试组件的微机械元件; 并改变每个装配的间隙。 另一实施例涉及在第一和第二基板之间沿X方向和Y方向对准并沿Z方向彼此移动基板，并且在Z方向上将第一和第二基板之间的间隙接合以形成组件; 其中所述微机械元件在所述基板的接合的同时被致动。

公开(公告)号：US20020176150A1

公开(公告)日：2002-11-28

申请号：US10153138

申请日：2002-05-20

Applicant: REFLECTIVITY, INC.

Inventor： Andrew G. Huibers

IPC: G02B026/00

CPC classification number: G02B26/0833 ,  G02B26/08 ,  G02B26/0841 ,  Y10S359/904

Abstract: A spatial light modulator includes an upper optically transmissive substrate held above a lower substrate containing addressing circuitry. One or more electrostatically deflectable elements are suspended by hinges from the upper substrate. In operation, individual mirrors are selectively deflected and serve to spatially modulate light that is incident to, and then reflected back through, the upper substrate. Motion stops may be attached to the reflective deflectable elements so that the mirror does not snap to the bottom substrate. Instead, the motion stop rests against the upper substrate thus limiting the deflection angle of the reflective deflectable elements.

Abstract translation: 空间光调制器包括保持在包含寻址电路的下基板上的上透光基板。 一个或多个静电可偏转元件通过铰链从上基板悬挂。 在操作中，单独的反射镜被选择性地偏转并且用于空间调制入射到上基板上并随后被上反射回的光。 运动止挡件可以附接到反射偏转元件，使得反射镜不卡扣到底部基板。 相反，运动停止件靠在上基板上，从而限制反射可偏转元件的偏转角。

公开(公告)号：US20020109821A1

公开(公告)日：2002-08-15

申请号：US10052012

申请日：2002-01-16

Applicant: REFLECTIVITY, INC., a California Corporation

Inventor： Andrew G. Huibers ,  Peter W. Richards

IPC: G03B021/14

CPC classification number: H04N9/3114 ,  G02B26/008 ,  G02B26/023

Abstract: A projection system is disclosed that has a light source of multiple wavelengths, a spatial light modulator and projection optics for projecting an image to be viewed by a viewer or to be displayed on a target. Also provided are one or more color sequencing devices which filter the light multiple times. Whether a single or plural color sequencing elements are provided, a single light beam passes at least twice through a sequence of light filters. In one embodiment, two color wheels provide the ability to filter the light multiple times. By changing the physical position or phase of one series of filters relative to another, the brightness and color saturation of the image projected through the projection optics can be changed. The changes in brightness and color saturation can be performed manually by mechanically changing the phase (or position) of the color sequencing device(s) relative to the light beam. Such changes can be performed step-wise of gradually through a continuum of brightness vs. color saturation points.

Abstract translation: 公开了具有多个波长的光源的投影系统，空间光调制器和用于投影由观看者观看或要显示在目标上的图像的投影光学器件。 还提供了一种或多种多次过滤光的颜色排序装置。 是否提供单个或多个颜色排序元件，单个光束通过一系列滤光器至少通过两次。 在一个实施例中，两个色轮提供多次过滤光的能力。 通过改变一系列滤光镜相对于另一系列的物理位置或相位，可以改变通过投影光学器件投影的图像的亮度和色彩饱和度。 亮度和色彩饱和度的变化可以通过机械地改变颜色排序装置相对于光束的相位（或位置）来手动执行。 这样的变化可以逐步地通过连续的亮度与色彩饱和度点逐步地执行。

公开(公告)号：US20040100677A1

公开(公告)日：2004-05-27

申请号：US10305536

申请日：2002-11-26

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Andrew G. Huibers ,  Satyadev R. Patel

IPC: G02B026/00

CPC classification number: G02B26/0833 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  H01L24/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01041 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/10329 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A projection system, a spatial light modulator, and a method for forming a micromirror array such as for a projection display are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micro-mirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers if desired. In one embodiment of the invention, one of the substrates is a light transmissive substrate and a light absorbing layer is provided on the light transmissive substrate to selectively block light from passing through the substrate. The light absorbing layer can form a pattern, such as a frame around an array of micro-mirrors.

Abstract translation: 公开了投影系统，空间光调制器和用于形成诸如投影显示器的微镜阵列的方法。 空间光调制器可以具有与包括微镜阵列的基板之一粘合在一起的两个基板。 如果需要，在沉积吸气剂材料和/或固体或液体润滑剂在一个或两个晶片上之后，两个基底可以在晶片层上结合。 在本发明的一个实施例中，一个基板是透光基板，并且在透光基板上设置光吸收层，以选择性地阻挡光通过基板。 光吸收层可以形成图案，例如围绕微镜阵列的框架。

公开(公告)号：US20040069747A1

公开(公告)日：2004-04-15

申请号：US10269149

申请日：2002-10-11

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Niles K. MacDonald ,  Hongqin Shi

IPC: G01L021/30 ,  G01R031/00

CPC classification number: H01J37/32963 ,  B81C1/00476 ,  B81C1/00587 ,  B81C99/0065 ,  B81C2201/0132 ,  B81C2201/0138 ,  H01J37/32449 ,  H01J37/32935

Abstract: Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the endpoint of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber

Abstract translation: 通过与制造微结构中的工艺气体接触从工件材料去除层或区域的工艺通过精确地确定去除步骤的终点的能力增强。 气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。 通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。 气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室