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公开(公告)号:US20110180127A1
公开(公告)日:2011-07-28
申请号:US13016006
申请日:2011-01-28
申请人: Fen Wan , Shuqiang Yang , Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Michael N. Miller , Darren D. Donaldson
发明人: Fen Wan , Shuqiang Yang , Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Michael N. Miller , Darren D. Donaldson
IPC分类号: H01L31/02 , H01L31/0232
CPC分类号: H01L51/4213 , B82Y10/00 , H01L51/0017 , H01L51/0037 , H01L51/0047 , H01L51/442 , H01L51/447 , Y02E10/549
摘要: Fabricating a solar cell stack includes forming a nanopatterned polymeric layer on a first surface of a silicon wafer and etching the first surface of the silicon wafer to transfer a pattern of the nanopatterned polymeric layer to the first surface of the silicon wafer. A layer of reflective electrode material is formed on a second surface of the silicon wafer. The nanopatterned first surface of the silicon wafer undergoes a buffered oxide etching. After the buffered oxide etching, the nanopatterned first surface of the silicon wafer is treated to decrease a contact angle of water on the nanopatterned first surface. Electron donor material is deposited on the nanopatterned first surface of the silicon wafer to form an electron donor layer, and a transparent electrode material is deposited on the electron donor layer to form a transparent electrode layer on the electron donor layer.
摘要翻译: 制造太阳能电池堆包括在硅晶片的第一表面上形成纳米图案的聚合物层并蚀刻硅晶片的第一表面以将纳米图案化的聚合物层的图案转移到硅晶片的第一表面。 在硅晶片的第二表面上形成反射电极材料层。 硅晶片的纳米图案化的第一表面经历缓冲氧化物蚀刻。 在缓冲氧化物蚀刻之后,处理硅晶片的纳米图案化的第一表面以降低纳米图案化的第一表面上的水的接触角。 电子给体材料沉积在硅晶片的纳米图案化的第一表面上以形成电子供体层,并且在电子给体层上沉积透明电极材料,以在电子给体层上形成透明电极层。
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公开(公告)号:US20120214066A1
公开(公告)日:2012-08-23
申请号:US13398442
申请日:2012-02-16
申请人: Michael N. Miller , Fen Wan , Vikramjit Singh , Darren D. Donaldson , Gerard M. Schmid , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Michael N. Miller , Fen Wan , Vikramjit Singh , Darren D. Donaldson , Gerard M. Schmid , Sidlgata V. Sreenivasan , Frank Y. Xu
CPC分类号: B82Y30/00 , H01M4/134 , H01M4/1395 , H01M4/386
摘要: A silicon nanowire array including a multiplicity of silicon nanowires extending from a silicon substrate. Cross-sectional shape of the silicon nanowires and spacing between the silicon nanowires can be selected to maximize the ratio of the surface area of the silicon nanowires to the volume of the nanowire array. Methods of forming the silicon nanowire array include a nanoimprint lithography process to form a template for the silicon nanowire array and an electroless etching process to etch the template formed by the nanoimprint lithography process.
摘要翻译: 一种硅纳米线阵列,包括从硅衬底延伸的多个硅纳米线。 可以选择硅纳米线的横截面形状和硅纳米线之间的间隔,以最大化硅纳米线的表面积与纳米线阵列的体积的比率。 形成硅纳米线阵列的方法包括形成硅纳米线阵列的模板的纳米压印光刻工艺和蚀刻由纳米压印光刻工艺形成的模板的无电蚀刻工艺。
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公开(公告)号:US09196765B2
公开(公告)日:2015-11-24
申请号:US14716233
申请日:2015-05-19
申请人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号: H01L31/0236 , C23C14/34 , H01L31/20
CPC分类号: H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
摘要翻译: 描述了具有纳米结构阵列的纳米结构太阳能电池的制造系统和方法,包括具有金字塔纳米结构重复图案的纳米结构太阳能电池,为具有改进的PCE的低成本薄膜太阳能电池提供。
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公开(公告)号:US09070803B2
公开(公告)日:2015-06-30
申请号:US13105422
申请日:2011-05-11
申请人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号: H01L31/00 , H01L31/0352 , B82Y20/00 , H01L31/0224 , H01L31/0236 , H01L31/0376 , H01L31/0392 , H01L31/075 , H01L31/076 , H01L31/20 , H01L31/0463
CPC分类号: H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
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公开(公告)号:US20150255640A1
公开(公告)日:2015-09-10
申请号:US14716233
申请日:2015-05-19
申请人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号: H01L31/0236 , H01L31/20 , C23C14/34
CPC分类号: H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
摘要翻译: 描述了具有纳米结构阵列的纳米结构太阳能电池的制造系统和方法,包括具有金字塔纳米结构重复图案的纳米结构太阳能电池,为具有改进的PCE的低成本薄膜太阳能电池提供。
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公开(公告)号:US20110277827A1
公开(公告)日:2011-11-17
申请号:US13105422
申请日:2011-05-11
申请人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人: Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号: H01L31/06 , H01L31/0216 , H01L31/0236 , B82Y99/00
CPC分类号: H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
摘要翻译: 描述了具有纳米结构阵列的纳米结构太阳能电池的制造系统和方法,包括具有金字塔纳米结构重复图案的纳米结构太阳能电池,为具有改进的PCE的低成本薄膜太阳能电池提供。
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公开(公告)号:US08980751B2
公开(公告)日:2015-03-17
申请号:US13014508
申请日:2011-01-26
申请人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
发明人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/42
摘要: Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
摘要翻译: 可以通过暴露于受控组合物的气体气氛中的来自能量源的真空紫外(VUV)辐射来去除衬底上的聚合材料。 在这种去除之后,还描述了用于纳米压印的附加蚀刻技术。
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公开(公告)号:US20110183521A1
公开(公告)日:2011-07-28
申请号:US13014508
申请日:2011-01-26
申请人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
发明人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
IPC分类号: H01L21/311 , H01J37/20
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/42
摘要: Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
摘要翻译: 可以通过暴露于受控组合物的气体气氛中的来自能量源的真空紫外(VUV)辐射来去除衬底上的聚合材料。 在这种去除之后,还描述了用于纳米压印的另外的蚀刻技术。
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公开(公告)号:US20090140458A1
公开(公告)日:2009-06-04
申请号:US12275998
申请日:2008-11-21
申请人: Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人: Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要: An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
摘要翻译: 压印光刻模板或压印叠层包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料的孔隙率至少约为10%。 多孔模板,多孔印迹叠层或两者可用于压印光刻工艺,以便于将模板和压印叠层之间的气体扩散到模板,压印叠层或两者中,使得压印叠层之间的可聚合材料 并且模板在压印堆栈和模板之间快速形成基本上连续的层。
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公开(公告)号:US09778562B2
公开(公告)日:2017-10-03
申请号:US12275998
申请日:2008-11-21
申请人: Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人: Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要: An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
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