SEMICONDUCTOR DEVICE
    1.
    发明申请
    SEMICONDUCTOR DEVICE 有权
    半导体器件

    公开(公告)号:US20120056330A1

    公开(公告)日:2012-03-08

    申请号:US13186049

    申请日:2011-07-19

    IPC分类号: H01L23/48

    摘要: A semiconductor device may include a substrate and a through electrode. The substrate may have a first surface and a second surface opposite to the first surface, the substrate including circuit patterns formed on the first surface. The through electrode penetrates the substrate and may be electrically connected to the circuit pattern, the through electrode including a first plug that extends from the first surface in a thickness direction of the substrate and a second plug that extends from the second surface in the thickness direction of the substrate so as to be connected to the first plug.

    摘要翻译: 半导体器件可以包括衬底和通孔。 衬底可以具有与第一表面相对的第一表面和第二表面,所述衬底包括形成在第一表面上的电路图案。 贯通电极穿透基板并且可以电连接到电路图案,所述通孔包括在基板的厚度方向上从第一表面延伸的第一插塞和在厚度方向上从第二表面延伸的第二插塞 以便连接到第一插头。

    Semiconductor device
    6.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US08592988B2

    公开(公告)日:2013-11-26

    申请号:US13186049

    申请日:2011-07-19

    IPC分类号: H01L23/48

    摘要: A semiconductor device may include a substrate and a through electrode. The substrate may have a first surface and a second surface opposite to the first surface, the substrate including circuit patterns formed on the first surface. The through electrode penetrates the substrate and may be electrically connected to the circuit pattern, the through electrode including a first plug that extends from the first surface in a thickness direction of the substrate and a second plug that extends from the second surface in the thickness direction of the substrate so as to be connected to the first plug.

    摘要翻译: 半导体器件可以包括衬底和通孔。 衬底可以具有与第一表面相对的第一表面和第二表面,所述衬底包括形成在第一表面上的电路图案。 贯通电极穿透基板并且可以电连接到电路图案,所述通孔包括在基板的厚度方向上从第一表面延伸的第一插塞和在厚度方向上从第二表面延伸的第二插塞 以便连接到第一插头。