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    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    1.
    发明申请
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US20050030512A1

    公开(公告)日：2005-02-10

    申请号：US10896367

    申请日：2004-07-22

    申请人： Koen Jacobus Maria Zaal ,  Tjarko Van Empel ,  Joost Ottens ,  Jan Hopman

    发明人： Koen Jacobus Maria Zaal ,  Tjarko Van Empel ,  Joost Ottens ,  Jan Hopman

    IPC分类号： H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  G03B27/62

    CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

    摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.

    摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突起，其被布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品;以及至少一个夹紧电极，用于产生用于夹紧物品的静电夹紧力 反对文章持有人。 夹持电极包括用于局部地改变静电夹持力的电场改变器，用于调平衬底的局部高度变化。

    Lithographic apparatus and device manufacturing method
    2.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20060102277A1

    公开(公告)日：2006-05-18

    申请号：US10988832

    申请日：2004-11-16

    申请人： Koen Jacobus Maria Zaal ,  Joost Ottens ,  Jan Hopman

    发明人： Koen Jacobus Maria Zaal ,  Joost Ottens ,  Jan Hopman

    IPC分类号： B32B37/00

    CPC分类号： G03F7/70716 ,  B32B38/0012 ,  B32B38/06 ,  B32B2315/02 ,  G03F7/70708 ,  Y10T428/24479

    摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to condition a radiation beam, and an article support configured to support an article to be placed in a beam path of the radiation beam. The article support includes a plurality of bonded layers. At least one of the bonded layers includes a plurality of recesses facing another of the bonded layers, so as to reduce a bonding surface between the bonded layers.

    摘要翻译： 公开了一种光刻设备。 该装置包括布置成调节辐射束的照明系统和被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件。 物品支撑件包括多个粘合层。 至少一个接合层包括面对另一个接合层的多个凹槽，以便减少接合层之间的接合表面。

    Using unflatness information of the substrate table or mask table for decreasing overlay
    4.
    发明申请
    Using unflatness information of the substrate table or mask table for decreasing overlay 有权
    使用衬底表或掩模台的不平坦信息减少重叠

    公开(公告)号：US20060114436A1

    公开(公告)日：2006-06-01

    申请号：US10998179

    申请日：2004-11-29

    申请人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

    发明人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70783 ,  G03F7/707

    摘要： The invention relates to a lithographic system that includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. The invention allows feed forward correction of non-flatness induced wafer grid distortion during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.

    摘要翻译： 本发明涉及一种光刻系统，其包括用于提供投影辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上具有图案的掩模，用于保持 基板和用于将图案化的光束投影到基板的目标部分上的投影系统。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 本发明允许在对准和曝光期间非平坦度引起的晶片格栅失真的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。

    Lithographic apparatus and device manufacturing method
    5.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20050117141A1

    公开(公告)日：2005-06-02

    申请号：US10926402

    申请日：2004-08-26

    申请人： Joost Ottens ,  Tjarko Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Koen Jacobus Zaal

    发明人： Joost Ottens ,  Tjarko Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Koen Jacobus Zaal

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/62

    CPC分类号： G03F7/707 ,  G03F7/70825

    摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.

    摘要翻译： 公开了一种光刻设备。 该装置包括用于调节辐射束的照明系统和用于支撑待放置在辐射束中的基本平坦的制品的物品支撑件。 物品支撑件包括用于支撑物品的多个支撑突起和位于支撑突起的边界附近的至少一个保护构件，用于在物品释放期间至少保护支撑突起的边界部分。 该装置还包括用于从所述物品支撑件释放所述物品的释放装置。