公开(公告)号：US07973280B2

公开(公告)日：2011-07-05

申请号：US12378138

申请日：2009-02-11

Applicant: Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

Inventor： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

IPC: G01N23/00 ,  H01J27/00

CPC classification number: H01J37/3056 ,  G01N1/286 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron beam lens barrel, which can observe or measure the conditions of a sample with an electron beam in the process of etching with an ion beam, wherein first, an observation image is obtained that includes the entire process area formed by secondary signals generated by an electron beam, secondly, an irradiation permit area and an irradiation inhibit area are defined in the observation image, and thirdly, electron beam irradiation is restricted only to the irradiation permit area.

Abstract translation: 提供了一种设备，其精确地将离子束蚀刻导入具有易于通过电子束照射而改变的性质的样品，而不会损失操作容易性和生产量。 一种装置包括离子束透镜镜筒和电子束透镜镜筒，其可以在用离子束蚀刻的过程中观察或测量具有电子束的样品的条件，其中首先获得包括 在观察图像中定义由电子束产生的二次信号形成的整个处理区域，其次，照射许可区域和照射禁止区域，第三，电子束照射仅限于照射许可区域。

公开(公告)号：US20090206254A1

公开(公告)日：2009-08-20

申请号：US12378138

申请日：2009-02-11

Applicant: Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

Inventor： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

IPC: G01N23/00 ,  A61N5/00

CPC classification number: H01J37/3056 ,  G01N1/286 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron beam lens barrel, which can observe or measure the conditions of a sample with an electron beam in the process of etching with an ion beam, wherein first, an observation image is obtained that includes the entire process area formed by secondary signals generated by an electron beam, secondly, an irradiation permit area and an irradiation inhibit area are defined in the observation image, and thirdly, electron beam irradiation is restricted only to the irradiation permit area.

Abstract translation: 提供了一种设备，其精确地将离子束蚀刻导入具有易于通过电子束照射而改变的性质的样品，而不会损失操作容易性和生产量。 一种装置包括离子束透镜镜筒和电子束透镜镜筒，其可以在用离子束蚀刻的过程中观察或测量具有电子束的样品的条件，其中首先获得包括 在观察图像中定义由电子束产生的二次信号形成的整个处理区域，其次，照射许可区域和照射禁止区域，第三，电子束照射仅限于照射许可区域。

公开(公告)号：US07442942B2

公开(公告)日：2008-10-28

申请号：US11509520

申请日：2006-08-24

Applicant: Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

Inventor： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

IPC: H01J37/20

CPC classification number: H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

Abstract translation: 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

公开(公告)号：US07060397B2

公开(公告)日：2006-06-13

申请号：US10452541

申请日：2003-06-02

Applicant: Yo Yamamoto ,  Kouji Iwasaki ,  Masamichi Oi

Inventor： Yo Yamamoto ,  Kouji Iwasaki ,  Masamichi Oi

IPC: G03F9/00 ,  G03C5/00

CPC classification number: G03F1/20 ,  G03F1/74 ,  G03F1/82 ,  H01J2237/31742 ,  Y10S430/143

Abstract: A method of correcting a defective portion of an exposure window in a lithography mask, such as an EPL mask, includes a first step of irradiating a defective portion of the exposure window using a charge particle beam to perform correction processing, and a second step of irradiating another portion of the exposure window with the charged particle beam to eliminate attached matter therefrom, the attached matter consisting of particles ejected from the defective portion of the exposure window as a result of irradiation with the charged particle beam during the first step. The first step and the second step are sequentially repeated N times, wherein N is an integer of 2 or more, to thereby reduce the time needed for eliminating the attached matter.

Abstract translation: 一种校正诸如EPL掩模的光刻掩模中的曝光窗口的缺陷部分的方法包括：第一步骤，使用电荷粒子束照射曝光窗口的缺陷部分以执行校正处理，第二步骤 用带电粒子束照射曝光窗口的另一部分以从其中除去附着物，所述附着物质由在第一步骤期间被带电粒子束的照射而从曝光窗口的缺陷部分喷出的颗粒组成。 第一步骤和第二步骤依次重复N次，其中N为2以上的整数，从而减少了除去附着物所需的时间。

公开(公告)号：US08558045B2

公开(公告)日：2013-10-15

申请号：US12595924

申请日：2008-03-28

Applicant: Shinichi Yamada ,  Tomohiro Yamada ,  Yuji Ogawa ,  Takuya Hatagishi ,  Yo Yamamoto ,  Yoshio Sugiyama

Inventor： Shinichi Yamada ,  Tomohiro Yamada ,  Yuji Ogawa ,  Takuya Hatagishi ,  Yo Yamamoto ,  Yoshio Sugiyama

IPC: C07C2/76

CPC classification number: C07C2/76 ,  B01J23/686 ,  B01J29/068 ,  B01J29/076 ,  B01J29/44 ,  B01J29/48 ,  B01J29/7876 ,  B01J37/0009 ,  B01J37/0201 ,  B01J37/08 ,  B01J2229/12 ,  B01J2229/123 ,  B01J2229/18 ,  B01J2229/20 ,  B01J2229/32 ,  C07C2529/40 ,  C07C2529/44 ,  C07C2529/48 ,  C07C2529/70 ,  C07C2529/74 ,  C07C2529/78 ,  Y02P20/52 ,  C07C15/06 ,  C07C15/24 ,  C07C15/08 ,  C07C15/04 ,  C07C15/00

Abstract: A catalyst for aromatizing a lower hydrocarbon, in order to increase the amount of production of useful aromatic compounds, such as benzene and toluene, by improving the methane conversion rate, the benzene formation rate, the naphthalene formation rate and the BTX formation rate (or a total formation rate of benzene, toluene and xylene) is such that molybdenum and silver are loaded on a metallosilicate as a substrate. It is more preferable to obtain the aromatizing catalyst by loading molybdenum and silver after modifying a zeolite formed of the metallosilicate with a silane compound that has a molecular diameter larger than a pore diameter of the zeolite and that has an amino group, which selectively reacts at a Bronsted acid point of the zeolite, and a straight-chain hydrocarbon group.

Abstract translation: 通过提高甲烷转化率，苯形成速率，萘形成速率和BTX形成速率（或者，通过提高甲烷的转化率，萘形成速率和BTX形成速率），可以提高芳族化合物如苯和甲苯的生成量 苯，甲苯和二甲苯的总形成速率）使得钼和银被负载在作为基材的金属硅酸盐上。 更优选的是，通过在用金属硅酸盐形成的沸石改性沸石之后加载钼和银来获得芳构化催化剂，所述硅烷化合物的分子直径大于沸石的孔径，并且具有氨基，其选择性地在 沸石的布朗斯台德酸点和直链烃基。

公开(公告)号：US20110275873A1

公开(公告)日：2011-11-10

申请号：US13144803

申请日：2010-01-15

Applicant: Yo Yamamoto ,  Tomohiro Yamada

Inventor： Yo Yamamoto ,  Tomohiro Yamada

IPC: C07C4/00

CPC classification number: B01J38/10 ,  B01J29/48 ,  B01J29/90 ,  B01J37/0201 ,  B01J2229/42 ,  C07C2/76 ,  C07C2529/40 ,  C07C2529/48 ,  C10G45/68 ,  C10G2400/30 ,  Y02P20/52 ,  Y02P20/584 ,  C07C15/04

Abstract: [Task] To produce an aromatic hydrocarbon stably for a long time while maintaining a high aromatic hydrocarbon yield, when producing an aromatic hydrocarbon by a catalytic reaction of a lower hydrocarbon with a catalyst.[Solving Means] An aromatic hydrocarbon is produced by providing a reaction step to obtain an aromatic hydrocarbon by conducting a catalytic reaction of a lower hydrocarbon with a catalyst and a regeneration step to regenerate the catalyst used in the reaction step, and by repeating the reaction step and the regeneration step. In the reaction step, carbon dioxide or carbon monoxide is added to the lower hydrocarbon, and the reaction temperature is made to be higher than 800° C.

Abstract translation: [任务]为了在通过低级烃与催化剂的催化反应制备芳烃时长时间稳定生产芳族烃，同时保持高的芳族烃产率。 [解决方案]通过提供通过进行低级烃与催化剂的催化反应和再生步骤以再生反应步骤中使用的催化剂并通过重复反应来获得芳族烃的反应步骤来制备芳族烃 步骤和再生步骤。 在反应步骤中，向低级烃中加入二氧化碳或一氧化碳，使反应温度高于800℃。

公开(公告)号：US20090242757A1

公开(公告)日：2009-10-01

申请号：US12310149

申请日：2007-08-03

Applicant: Takashi Ogawa ,  Yo Yamamoto ,  Hiroshi Matsumura

Inventor： Takashi Ogawa ,  Yo Yamamoto ,  Hiroshi Matsumura

IPC: G01N23/00 ,  H01J3/14

CPC classification number: H01J37/09 ,  H01J37/15 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/024 ,  H01J2237/0458

Abstract: There are provided a charged particle beam apparatus and a method of adjusting an axis of an aperture capable of adjusting a position of a center axis of the aperture easily and accurately in a short period of time.A charged particle beam apparatus 1 includes a charged particle source 9, an aperture 18, an object lens 12, observing means 32, an aperture driving portion 19, and a control portion 30. The control portion 30 includes spot pattern forming means 33 for forming a plurality of spot patterns on a surface N1 of a sample N by irradiating a charged particle beam I, analyzing means for calculating a position of a spot center of the spot pattern and a geometrical center position of a halo, and adjusting position determining means 35 for calculating an adjusting position based on a position of intersecting lines of connecting the positions of the spot centers of the respective spot patterns and the center position of the halo, in which a position of the aperture 18 is adjusted by moving the center axis of the aperture 18 to the adjusting position.

Abstract translation: 提供了一种带电粒子束装置和一种在短时间内容易且准确地调整能够调节孔径的中心轴的位置的孔的轴线的方法。 带电粒子束装置1包括带电粒子源9，孔18，物镜12，观察装置32，孔径驱动部分19和控制部分30.控制部分30包括用于形成的斑点图案形成装置33 通过照射带电粒子束I的样品N的表面N1上的多个斑点图案，用于计算斑点图案的斑点中心的位置和光晕的几何中心位置的分析装置，以及调节位置确定装置35 用于基于连接各个斑点图案的光点中心的位置和光晕的中心位置的相交线的位置来计算调节位置，其中通过移动光圈的中心轴来调节光圈18的位置 孔18到调节位置。

公开(公告)号：US07518125B2

公开(公告)日：2009-04-14

申请号：US11501629

申请日：2006-08-09

Applicant: Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

Inventor： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

IPC: G01N23/00

CPC classification number: G01N1/32

Abstract: A processing apparatus uses a focused charged particle beam to process a micro sample that is supported on a micro mount part. The micro mount part is supported on a micro sample stage and locally cooled by a cooling unit. The micro mount part is thermally independent of the micro sample stage and, due to its small size, can be cooled rapidly by the cooling unit.

Abstract translation: 处理装置使用聚焦带电粒子束来处理支撑在微安装部件上的微样品。 微型安装部分支撑在微量样品台上，并由冷却单元局部冷却。 微型安装部件与微型样品台热独立，并且由于其小尺寸，可以通过冷却单元快速冷却。

公开(公告)号：US20070040128A1

公开(公告)日：2007-02-22

申请号：US11501629

申请日：2006-08-09

Applicant: Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

Inventor： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

IPC: H01J37/20

CPC classification number: G01N1/32

Abstract: A sample to be observed or processed with a focused charged particle beam is formed small, and only the micro sample is locally cooled. Alternatively, a sample mount part is used which has the structure that can relax a thermal drift.

Abstract translation: 用聚焦带电粒子束观察或加工的样品形成较小，并且只有微样品局部冷却。 或者，使用具有可以放松热漂移的结构的样品安装部件。

公开(公告)号：US09214316B2

公开(公告)日：2015-12-15

申请号：US13622023

申请日：2012-09-18

Applicant: Yo Yamamoto ,  Xin Man ,  Tatsuya Asahata

Inventor： Yo Yamamoto ,  Xin Man ,  Tatsuya Asahata

IPC: H01J37/00 ,  H01J37/22 ,  G01N23/225 ,  H01J37/30 ,  H01J37/305 ,  G01N23/04

CPC classification number: H01J37/222 ,  G01N23/04 ,  G01N23/225 ,  G01N2223/045 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/31745

Abstract: A composite charged particle beam apparatus comprises an FIB column having an ion beam irradiation axis and an SEM column having an electron beam irradiation axis, the FIB and SEM columns being arranged relative to one another so that the beam irradition axes intersect with each other substantially at a right angle. A sample stage is provided for mounting a sample, and a detector detects secondary particles generated from the sample when irradiated with the ion beam or the electron beam. An observation image formation portion forms an FIB image and an SEM image based on a detection signal of the detector. A display portion displays the FIB image and the SEM image in which a horizontal direction of the sample in the FIB image and said horizontal direction of the sample in the SEM image are the same thereby making it possible for an operator to easily comprehend the positional relationship of the observation image of the sample.

Abstract translation: 复合带电粒子束装置包括具有离子束照射轴的FIB柱和具有电子束照射轴的SEM柱，FIB和SEM列相对于彼此布置，使得束辐照轴基本上彼此相交 一个直角 提供了用于安装样品的样品台，并且当用离子束或电子束照射时，检测器检测从样品产生的二次颗粒。 观察图像形成部基于检测器的检测信号，形成FIB图像和SEM图像。 显示部显示FIB图像中的样本的水平方向和SEM图像中的样本的水平方向相同的FIB图像和SEM图像，由此能够使操作者容易地理解位置关系 的样品的观察图像。