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1.发明授权Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder 有权基片支架，光刻设备，器件制造方法以及衬底保持器的制造方法公开(公告)号：US09423699B2
公开(公告)日：2016-08-23
申请号：US13323520
申请日：2011-12-12
申请人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
发明人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
CPC分类号： G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层提供用于形成诸如薄膜电子部件的电子部件的光滑表面。 平坦化层可以设置在多个子层中。 平坦化层可以平滑超过由坯料去除材料而形成的粗糙度，以在衬底保持器上形成毛刺。
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2.发明申请SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 有权基板支架，光刻装置，装置制造方法及制造基板支架的方法公开(公告)号：US20120274920A1
公开(公告)日：2012-11-01
申请号：US13455870
申请日：2012-04-25
申请人： Jan BEX , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
发明人： Jan BEX , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
CPC分类号： G03F7/70708 , G03F7/70716 , G03F7/7085 , G03F7/70875
摘要： A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface.
摘要翻译： 一种制造用于光刻设备的衬底保持器的方法，所述方法包括提供具有表面的主体和从所述表面突出的多个毛刺，并且具有端面以支撑衬底，提供邻近所述主体的载体表面 表面，并且在主体表面的至少一部分上形成导电层，并在载体表面的至少一部分上形成整体部分。
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3.发明授权Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder 有权基片支架，光刻设备，器件制造方法以及衬底保持器的制造方法公开(公告)号：US09354528B2
公开(公告)日：2016-05-31
申请号：US13455870
申请日：2012-04-25
申请人： Jan Bex , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
发明人： Jan Bex , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
CPC分类号： G03F7/70708 , G03F7/70716 , G03F7/7085 , G03F7/70875
摘要： A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface.
摘要翻译： 一种制造用于光刻设备的衬底保持器的方法，所述方法包括提供具有表面的主体和从所述表面突出的多个毛刺，并且具有端面以支撑衬底，提供邻近所述主体的载体表面 表面，并且在主体表面的至少一部分上形成导电层，并在载体表面的至少一部分上形成整体部分。
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4.发明授权Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder 有权基片支架，光刻设备，器件制造方法以及衬底保持器的制造方法公开(公告)号：US09256139B2
公开(公告)日：2016-02-09
申请号：US13398582
申请日：2012-02-16
申请人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Siegfried Alexander Tromp , Jacobus Josephus Leijssen , Elisabeth Corinne Rodenburg , Maurice Wilhelmus Leonardus Hendricus Feijts , Hendrik Huisman
发明人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Siegfried Alexander Tromp , Jacobus Josephus Leijssen , Elisabeth Corinne Rodenburg , Maurice Wilhelmus Leonardus Hendricus Feijts , Hendrik Huisman
CPC分类号： G03F7/70716 , B05D3/02 , G01J5/0285 , G01J5/20 , G03F7/70341 , G03F7/70708
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.
摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 薄膜堆叠包括（可选）隔离层，形成电极的金属层，传感器，加热器，晶体管或逻辑器件以及顶部隔离层。
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5.发明申请SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 有权基板支架，光刻装置，装置制造方法及制造基板支架的方法公开(公告)号：US20120212725A1
公开(公告)日：2012-08-23
申请号：US13398582
申请日：2012-02-16
申请人： Raymond Wilhelmus Louis LAFARRE , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKlNA , Yogesh Pramod KARADE , Siegfried Alexander TROMP , Jacobus Josephus LEIJSSEN , Elisabeth Corinne RODENBURG , Maurice Wilhelmus Leonardus Hendric FEIJTS , Hendrik HUISMAN
发明人： Raymond Wilhelmus Louis LAFARRE , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKlNA , Yogesh Pramod KARADE , Siegfried Alexander TROMP , Jacobus Josephus LEIJSSEN , Elisabeth Corinne RODENBURG , Maurice Wilhelmus Leonardus Hendric FEIJTS , Hendrik HUISMAN
CPC分类号： G03F7/70716 , B05D3/02 , G01J5/0285 , G01J5/20 , G03F7/70341 , G03F7/70708
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.
摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 薄膜堆叠包括（可选）隔离层，形成电极的金属层，传感器，加热器，晶体管或逻辑器件以及顶部隔离层。
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6.发明公开公开(公告)号：US20230251579A1
公开(公告)日：2023-08-10
申请号：US18299534
申请日：2023-04-12
申请人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
发明人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC分类号： G03F7/00 , B23K26/354 , B23K26/342 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00 , B22F7/06
CPC分类号： G03F7/70341 , B23K26/354 , B23K26/342 , G03F7/70416 , G03F7/707 , G03F7/70708 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , G03F7/70716 , B05D3/06 , B05D5/00 , G03F7/70733 , B33Y10/00 , B33Y80/00 , B22F7/062 , G03F7/708 , B22F10/25
摘要： A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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公开(公告)号：US20150029485A1
公开(公告)日：2015-01-29
申请号：US14373291
申请日：2013-01-17
申请人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
发明人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
CPC分类号： B22F7/062 , B05D3/06 , B05D5/00 , B22F3/1055 , B23K26/342 , B23K26/354 , B23Q3/18 , B33Y10/00 , B33Y80/00 , G03F7/20 , G03F7/70341 , G03F7/70416 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/708
摘要： An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
摘要翻译： 用于光刻设备的物体保持器（100）具有具有表面（400a）的主体（400）。 在薄膜堆叠（410,440,450）的表面上或孔中形成有用于支撑物体的多个毛刺（406）。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损伤的隆起的修复或其他方法。
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8.发明申请SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 有权基板支架，光刻装置，装置制造方法及制造基板支架的方法公开(公告)号：US20130094009A1
公开(公告)日：2013-04-18
申请号：US13648069
申请日：2012-10-09
申请人： Raymond Wilhelmus Louis LAFARRE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE , Elisabeth Corinne RODENBURG , Peter VAN DELFT
发明人： Raymond Wilhelmus Louis LAFARRE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE , Elisabeth Corinne RODENBURG , Peter VAN DELFT
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , B05D1/005 , G03F7/70341 , G03F7/70691 , G03F7/707
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.
摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 平坦化层具有基本均匀的厚度和/或其外表面的峰谷距离小于10μm。 可以通过施加不同浓度的两种溶液来形成平坦化层。 表面处理可以施加到毛圈以排斥平坦化层材料的溶液。
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9.发明授权Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder 有权基片支架，光刻设备，器件制造方法以及衬底保持器的制造方法公开(公告)号：US09316927B2
公开(公告)日：2016-04-19
申请号：US13648069
申请日：2012-10-09
申请人： Raymond Wilhelmus Louis LaFarre , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg , Peter Van Delft
发明人： Raymond Wilhelmus Louis LaFarre , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg , Peter Van Delft
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , B05D1/005 , G03F7/70341 , G03F7/70691 , G03F7/707
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.
摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 平坦化层具有基本均匀的厚度和/或其外表面具有小于10μm的峰谷距离。 可以通过施加不同浓度的两种溶液来形成平坦化层。 表面处理可以施加到毛圈以排斥平坦化层材料的溶液。
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10.发明申请SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 有权基板支架，光刻装置，装置制造方法及制造基板支架的方法公开(公告)号：US20120147353A1
公开(公告)日：2012-06-14
申请号：US13323520
申请日：2011-12-12
申请人： Raymond Wilhelmus Louis LAFARRE , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE
发明人： Raymond Wilhelmus Louis LAFARRE , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE
CPC分类号： G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层提供用于形成诸如薄膜电子部件的电子部件的光滑表面。 平坦化层可以设置在多个子层中。 平坦化层可以平滑超过由坯料去除材料而形成的粗糙度，以在衬底保持器上形成毛刺。
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