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公开(公告)号：US20200371437A1
公开(公告)日：2020-11-26
申请号：US16766490
申请日：2018-11-23
Applicant: ARKEMA FRANCE
Inventor： Xavier CHEVALIER , Ilias ILIOPOULOS
Abstract: The invention relates to a method for manufacturing a flat polymeric stack, said stack comprising one or more first and one second layer of (co)polymer (20, 30) stacked one on the other, the first underlying (co)polymer layer (20) not having undergone any prior treatment allowing its crosslinking, at least one of the (co)polymer layers initially being in a liquid or viscous state, said method being characterized in that the upper layer (30), known as the top coat (TC), is deposited on the first layer (20) in the form of a prepolymer composition (pre-TC), comprising one or more monomer(s) and/or dimer(s) and/or oligomer(s) and/or polymer(s) in solution, and in that it is then subjected to a stimulus capable of causing a crosslinking reaction of the molecular chains within said layer (30, TC).
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2.发明申请公开(公告)号：US20180203348A1
公开(公告)日：2018-07-19
申请号：US15545068
申请日：2016-01-21
Applicant: ARKEMA FRANCE
Inventor： Xavier CHEVALIER , Raber INOUBLI , Christophe NAVARRO , Celia NICOLET
CPC classification number: G03F7/0002 , B05D1/005 , B05D3/0254 , C08L53/00 , C08L2205/02 , C09D153/00 , G03F1/68 , G03F7/162 , G03F7/168
Abstract: The present invention relates to a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.
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3.发明申请公开(公告)号：US20180173094A1
公开(公告)日：2018-06-21
申请号：US15579063
申请日：2016-05-26
Applicant: ARKEMA FRANCE , CENTER NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) , INSTITUT POLYTECHNIQUE DE BORDEAUX , UNIVERSITE DE BORDEAUX
Inventor： Xavier CHEVALIER , Celia NICOLET , Christophe NAVARRO , Georges HADZIIOANNOU
CPC classification number: G03F7/0002 , G03F7/168 , G03F7/2002
Abstract: The invention relates to a process for controlling the surface energy at the upper interface of a block copolymer (BCP1), the lower interface of which is in contact with a preneutralized surface of a substrate, in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, the said process consisting in covering the upper surface of the block copolymer (BCP1) with an upper surface neutralization layer (TC) and being characterized in that the said upper surface neutralization layer (TC) comprises a second block copolymer (BCP2).
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4.发明申请公开(公告)号：US20170307973A1
公开(公告)日：2017-10-26
申请号：US15510204
申请日：2015-09-09
Applicant: Arkema France
Inventor： Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: G03F7/00 , C09D153/00 , C09D125/14 , G03F1/50 , B05D3/00
CPC classification number: G03F7/0002 , B05D3/002 , C09D125/14 , C09D153/00 , G03F1/50
Abstract: The present invention relates to a method for controlling the level of defects in films obtained using a composition comprising a blend of block copolymers and polymers deposited on a surface. The polymers comprise at least one monomer identical to those present in one or other block of the block copolymers.
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公开(公告)号：US20200379339A1
公开(公告)日：2020-12-03
申请号：US16766491
申请日：2018-11-23
Applicant: ARKEMA FRANCE
Inventor： Xavier CHEVALIER
IPC: G03F1/48 , C08F287/00 , G03F1/80
Abstract: The invention relates to a method for manufacturing a flat polymeric stack, said stack comprising one or more first and one second layer of (co)polymer (20, 30) stacked one on the other, the first underlying (co)polymer layer (20) not having undergone any prior treatment allowing its crosslinking, at least one of the (co)polymer layers initially being in a liquid or viscous state, said method being characterized in that the upper layer (30), known as the top coat (TC), is deposited on the first layer (20) in the form of a prepolymer composition (pre-TC), comprising one or more monomer(s) and/or dimer(s) and/or oligomer(s) and/or polymer(s) in solution, and in that it is then subjected to a heat treatment capable of causing a crosslinking reaction of the molecular chains within said layer (30, TC).
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Patent Agency Ranking
公开(公告)号：US20170145250A1
公开(公告)日：2017-05-25
申请号：US15317803
申请日：2015-06-01
Applicant: Arkema France
Inventor： Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: C09D153/00 , G03F7/00 , B05D1/00 , C08F297/02
CPC classification number: C09D153/00 , B05D1/005 , B82Y30/00 , B82Y40/00 , C08F297/026 , C08J5/18 , C08J2325/08 , C08J2333/08 , C08L53/00 , G03F7/0002
Abstract: The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).
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7.发明申请PROCESS THAT ENABLES THE CREATION OF NANOMETRIC STRUCTURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开使用嵌段共聚物自组装制备纳米结构的方法公开(公告)号：US20160333221A1
公开(公告)日：2016-11-17
申请号：US15103740
申请日：2014-12-11
Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) , UNIVERSITE DE BORDEAUX , INSTITUT POLYTECHNIQUE DE BORDEAUX , ARKEMA FRANCE
Inventor： Muhammad MUMTAZ , Karim AISSOU , Cyril BROCHON , Eric CLOUTET , Guillaume FLEURY , Georges HADZIIOANNOU , Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: C09D183/00 , G03F7/00 , B81C1/00 , C08G77/00
CPC classification number: C09D183/00 , B81C1/00428 , B81C2201/0149 , B82Y40/00 , C08G77/00 , C09D153/00 , G03F7/0002
Abstract: The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which is crystallizable or has at least one liquid crystal phase.
Abstract translation: 本发明涉及一种能够通过嵌段共聚物的自组装形成纳米结构的方法，其中至少一个嵌段是可结晶的或具有至少一个液晶相。
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8.发明申请PROCESS FOR CONTROLLING THE PERIOD CHARACTERIZING THE MORPHOLOGY OBTAINED FROM A BLEND OF BLOCK COPOLYMERS AND OF CO(POLYMERS) OF ONE OF THE BLOCKS 有权控制块状共聚物和块体之一的CO（聚合物）混合物获得的形态的期间的方法公开(公告)号：US20150030971A1
公开(公告)日：2015-01-29
申请号：US14340075
申请日：2014-07-24
Applicant: Arkema France
Inventor： Christophe NAVARRO , Xavier CHEVALIER , Celia NICOLET
CPC classification number: B05D3/046 , B05D3/0254 , B05D3/0493 , C08F2/001 , C08F297/026 , C09D153/00 , G03F1/68 , G03F7/00 , G03F7/0002 , C08L25/06
Abstract: The present invention relates to a process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co)polymers of one of the blocks on a surface employing a particular way of carrying out the synthesis of the blend of block copolymers and of (co)polymers of one of the blocks.
Abstract translation: 本发明涉及一种用于控制表面形貌的时期的方法，其特征在于使用嵌段共聚物的共混物和表面上的一个嵌段的（共））聚合物，其特征在于使用特定的方式进行嵌段共聚物的共混物 和其中一个嵌段的（共）聚合物。
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9.发明申请PROCESS FOR THE NANOSTRUCTURING OF A BLOCK COPOLYMER FILM USING A NONSTRUCTURED BLOCK COPOLYMER BASED ON STYRENE AND ON METHYL METHACRYLATE, AND NANOSTRUCTURED BLOCK COPOLYMER FILM 有权使用基于苯乙烯和甲基丙烯酸甲酯的非构造嵌段共聚物和嵌段共聚物膜的嵌段共聚物膜的纳米结构方法公开(公告)号：US20170002127A1
公开(公告)日：2017-01-05
申请号：US15105245
申请日：2014-12-15
Applicant: ARKEMA FRANCE
Inventor： Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: C08F297/02 , B82Y40/00 , B82Y30/00 , C09D153/00 , G03F7/00
CPC classification number: C08F297/026 , B82Y30/00 , B82Y40/00 , C08J5/18 , C08J2353/00 , C09D153/00 , G03F7/0002 , Y10S438/945 , Y10S524/905 , Y10S525/915
Abstract: The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.
Abstract translation: 本发明涉及在预定温度下纳米结构域纳米结构化的嵌段共聚物膜，其由在所述预定温度下非结构化的碱性嵌段共聚物获得，并且其至少一个嵌段包含苯乙烯，并且其至少另一个嵌段包含甲基丙烯酸甲酯。 嵌段共聚物膜可用于形成纳米光刻掩模。
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公开(公告)号：US20160319158A1
公开(公告)日：2016-11-03
申请号：US15103748
申请日：2014-12-10
Applicant: ARKEMA FRANCE , UNIVERSITE DE BORDEAUX , INSTITUT POLYTECHNIQUE DE BORDEAUX , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
Inventor： Guillaume FLEURY , Christophe NAVARRO , Georges HADZIIOANNOU , Celia NICOLET , Xavier CHEVALIER , Chrystilla REBOUL , Veronica CASTILLO , Gilles PECASTAINGS
IPC: C09D187/00 , B05D3/06 , H01L21/027 , B01J31/06
CPC classification number: C09D187/005 , B01J31/06 , B05D3/06 , B81C1/00031 , B81C2201/0149 , C08F293/005 , C08F2438/02 , C08J9/26 , C09D153/00 , G03F7/0002 , H01L21/0271
Abstract: The invention relates to a process for producing a film of self-assembled block copolymers on a substrate, said process consisting in carrying out a simultaneous deposition of block copolymer and of random copolymer by means of a solution containing a blend of block copolymer and of random copolymer of different chemical nature and which are immiscible, then in carrying out an annealing treatment allowing the promotion of the phase segregation inherent in the self-assembly of block copolymers.
Abstract translation: 本发明涉及在基材上制备自组装嵌段共聚物的膜的方法，所述方法包括通过含有嵌段共聚物和随机的共混物的溶液同时沉积嵌段共聚物和无规共聚物 共聚物，其不同的化学性质并且不混溶，然后进行退火处理，允许促进嵌段共聚物的自组装固有的相分离。
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