公开(公告)号：US20180171134A1

公开(公告)日：2018-06-21

申请号：US15579112

申请日：2016-05-26

申请人： ARKEMA FRANCE ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  UNIVERSITE DE BORDEAUX ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

发明人： Xavier Chevalier ,  Celia NICOLET ,  Christophe NAVARRO ,  Georges HADZIIOANNOU

IPC分类号： C08L53/00 ,  G03F7/00 ,  C08L27/12

CPC分类号： C08L53/005 ,  C08G2261/126 ,  C08G2261/136 ,  C08G2261/1426 ,  C08G2261/146 ,  C08L27/12 ,  C08L33/10 ,  C08L2203/16 ,  G01R33/46 ,  G03F7/0002

摘要： The invention relates to a process for reducing the defectivity of a block copolymer (BCP1) film, the lower surface of which is in contact with a preneutralized surface (N) of a substrate (S) and the upper surface of which is covered by an upper surface neutralization layer (TC) in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, where the upper surface neutralization layer (TC) employed to cover the upper surface of the block copolymer (BCP1) film comprises a second block copolymer (BCP2).

公开(公告)号：US20180203348A1

公开(公告)日：2018-07-19

申请号：US15545068

申请日：2016-01-21

申请人： ARKEMA FRANCE

发明人： Xavier CHEVALIER ,  Raber INOUBLI ,  Christophe NAVARRO ,  Celia NICOLET

IPC分类号： G03F7/00 ,  B05D1/00 ,  B05D3/02 ,  C09D153/00 ,  G03F7/16 ,  C08L53/00 ,  G03F1/68

CPC分类号： G03F7/0002 ,  B05D1/005 ,  B05D3/0254 ,  C08L53/00 ,  C08L2205/02 ,  C09D153/00 ,  G03F1/68 ,  G03F7/162 ,  G03F7/168

摘要： The present invention relates to a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.

公开(公告)号：US20180173094A1

公开(公告)日：2018-06-21

申请号：US15579063

申请日：2016-05-26

申请人： ARKEMA FRANCE ,  CENTER NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  UNIVERSITE DE BORDEAUX

发明人： Xavier CHEVALIER ,  Celia NICOLET ,  Christophe NAVARRO ,  Georges HADZIIOANNOU

IPC分类号： G03F7/00 ,  G03F7/16 ,  G03F7/20

CPC分类号： G03F7/0002 ,  G03F7/168 ,  G03F7/2002

摘要： The invention relates to a process for controlling the surface energy at the upper interface of a block copolymer (BCP1), the lower interface of which is in contact with a preneutralized surface of a substrate, in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, the said process consisting in covering the upper surface of the block copolymer (BCP1) with an upper surface neutralization layer (TC) and being characterized in that the said upper surface neutralization layer (TC) comprises a second block copolymer (BCP2).

公开(公告)号：US20170307973A1

公开(公告)日：2017-10-26

申请号：US15510204

申请日：2015-09-09

申请人： Arkema France

发明人： Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC分类号： G03F7/00 ,  C09D153/00 ,  C09D125/14 ,  G03F1/50 ,  B05D3/00

CPC分类号： G03F7/0002 ,  B05D3/002 ,  C09D125/14 ,  C09D153/00 ,  G03F1/50

摘要： The present invention relates to a method for controlling the level of defects in films obtained using a composition comprising a blend of block copolymers and polymers deposited on a surface. The polymers comprise at least one monomer identical to those present in one or other block of the block copolymers.

公开(公告)号：US20170145250A1

公开(公告)日：2017-05-25

申请号：US15317803

申请日：2015-06-01

申请人： Arkema France

发明人： Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC分类号： C09D153/00 ,  G03F7/00 ,  B05D1/00 ,  C08F297/02

CPC分类号： C09D153/00 ,  B05D1/005 ,  B82Y30/00 ,  B82Y40/00 ,  C08F297/026 ,  C08J5/18 ,  C08J2325/08 ,  C08J2333/08 ,  C08L53/00 ,  G03F7/0002

摘要： The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).

公开(公告)号：US20160333221A1

公开(公告)日：2016-11-17

申请号：US15103740

申请日：2014-12-11

申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) ,  UNIVERSITE DE BORDEAUX ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  ARKEMA FRANCE

发明人： Muhammad MUMTAZ ,  Karim AISSOU ,  Cyril BROCHON ,  Eric CLOUTET ,  Guillaume FLEURY ,  Georges HADZIIOANNOU ,  Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC分类号： C09D183/00 ,  G03F7/00 ,  B81C1/00 ,  C08G77/00

CPC分类号： C09D183/00 ,  B81C1/00428 ,  B81C2201/0149 ,  B82Y40/00 ,  C08G77/00 ,  C09D153/00 ,  G03F7/0002

摘要： The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which is crystallizable or has at least one liquid crystal phase.

摘要翻译： 本发明涉及一种能够通过嵌段共聚物的自组装形成纳米结构的方法，其中至少一个嵌段是可结晶的或具有至少一个液晶相。

公开(公告)号：US20150030971A1

公开(公告)日：2015-01-29

申请号：US14340075

申请日：2014-07-24

申请人： Arkema France

发明人： Christophe NAVARRO ,  Xavier CHEVALIER ,  Celia NICOLET

IPC分类号： B05D3/04 ,  B05D3/02 ,  G03F1/68

CPC分类号： B05D3/046 ,  B05D3/0254 ,  B05D3/0493 ,  C08F2/001 ,  C08F297/026 ,  C09D153/00 ,  G03F1/68 ,  G03F7/00 ,  G03F7/0002 ,  C08L25/06

摘要： The present invention relates to a process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co)polymers of one of the blocks on a surface employing a particular way of carrying out the synthesis of the blend of block copolymers and of (co)polymers of one of the blocks.

摘要翻译： 本发明涉及一种用于控制表面形貌的时期的方法，其特征在于使用嵌段共聚物的共混物和表面上的一个嵌段的（共））聚合物，其特征在于使用特定的方式进行嵌段共聚物的共混物 和其中一个嵌段的（共）聚合物。

公开(公告)号：US20170002127A1

公开(公告)日：2017-01-05

申请号：US15105245

申请日：2014-12-15

申请人： ARKEMA FRANCE

发明人： Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC分类号： C08F297/02 ,  B82Y40/00 ,  B82Y30/00 ,  C09D153/00 ,  G03F7/00

CPC分类号： C08F297/026 ,  B82Y30/00 ,  B82Y40/00 ,  C08J5/18 ,  C08J2353/00 ,  C09D153/00 ,  G03F7/0002 ,  Y10S438/945 ,  Y10S524/905 ,  Y10S525/915

摘要： The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.

摘要翻译： 本发明涉及在预定温度下纳米结构域纳米结构化的嵌段共聚物膜，其由在所述预定温度下非结构化的碱性嵌段共聚物获得，并且其至少一个嵌段包含苯乙烯，并且其至少另一个嵌段包含甲基丙烯酸甲酯。 嵌段共聚物膜可用于形成纳米光刻掩模。

公开(公告)号：US20160319158A1

公开(公告)日：2016-11-03

申请号：US15103748

申请日：2014-12-10

申请人： ARKEMA FRANCE ,  UNIVERSITE DE BORDEAUX ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

发明人： Guillaume FLEURY ,  Christophe NAVARRO ,  Georges HADZIIOANNOU ,  Celia NICOLET ,  Xavier CHEVALIER ,  Chrystilla REBOUL ,  Veronica CASTILLO ,  Gilles PECASTAINGS

IPC分类号： C09D187/00 ,  B05D3/06 ,  H01L21/027 ,  B01J31/06

CPC分类号： C09D187/005 ,  B01J31/06 ,  B05D3/06 ,  B81C1/00031 ,  B81C2201/0149 ,  C08F293/005 ,  C08F2438/02 ,  C08J9/26 ,  C09D153/00 ,  G03F7/0002 ,  H01L21/0271

摘要： The invention relates to a process for producing a film of self-assembled block copolymers on a substrate, said process consisting in carrying out a simultaneous deposition of block copolymer and of random copolymer by means of a solution containing a blend of block copolymer and of random copolymer of different chemical nature and which are immiscible, then in carrying out an annealing treatment allowing the promotion of the phase segregation inherent in the self-assembly of block copolymers.

摘要翻译： 本发明涉及在基材上制备自组装嵌段共聚物的膜的方法，所述方法包括通过含有嵌段共聚物和随机的共混物的溶液同时沉积嵌段共聚物和无规共聚物 共聚物，其不同的化学性质并且不混溶，然后进行退火处理，允许促进嵌段共聚物的自组装固有的相分离。

公开(公告)号：US20160168305A1

公开(公告)日：2016-06-16

申请号：US14971661

申请日：2015-12-16

申请人： Arkema France

发明人： Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC分类号： C08F297/02 ,  G03F7/004

CPC分类号： C08F297/026 ,  B81C2201/0149 ,  B82Y30/00 ,  C09D153/00 ,  G03F7/0002 ,  G03F7/004

摘要： A method for controlling the synthesis of a block copolymer containing at least two blocks, with at least one nonpolar block and at least one polar block, said method making it possible in particular to control the ratio between the blocks and the molecular weight of each of the blocks, said copolymer being a block copolymer intended to be used as a mask in a method of nanolithography by direct self-assembly (DSA), said control being achieved by semicontinuous anionic polymerization in an aprotic nonpolar medium and comprising the following steps: synthesizing a first nonpolar block in the form of a macro-initiator, preparing a solution of said macro-initiator previously synthesized by mixing it with an alkali metal alcoholate in an aprotic nonpolar solvent, preparing a solution of a polar monomer in an aprotic nonpolar solvent, injecting the two solutions previously prepared of macro-initiator and of polar monomer into a micro-mixer, connected to a polymerization reactor, at a constant flow ratio, recovering the copolymer obtained.

摘要翻译： 用于控制含有至少两个嵌段的嵌段共聚物的合成方法，其中至少一个非极性嵌段和至少一个极性嵌段，所述方法使得可以特别地控制嵌段之间的比例和每个嵌段的分子量 所述共聚物是在直接自组装（DSA）的纳米光刻方法中用作掩模的嵌段共聚物，所述对照通过非质子非极性介质中的半连续阴离子聚合实现，并包括以下步骤：合成 以大分子引发剂的形式存在的第一非极性嵌段，通过将非离子非极性溶剂中的碱金属醇化物混合而制备前述合成的所述大分子引发剂的溶液，在非质子非极性溶剂中制备极性单体的溶液， 将预先制备的大分子引发剂和极性单体的两种溶液注入与聚合反应器连接的微型混合器中， t流量比，回收得到的共聚物。