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公开(公告)号：US12032299B2
公开(公告)日：2024-07-09
申请号：US17784566
申请日：2020-12-03
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Igor Matheus Petronella Aarts , Kaustuve Bhattacharyya , Ralph Brinkhof , Leendert Jan Karssemeijer , Stefan Carolus Jacobus Antonius Keij , Haico Victor Kok , Simon Gijsbert Josephus Mathijssen , Henricus Johannes Lambertus Megens , Samee Ur Rehman
CPC classification number: G03F7/70633 , G03F7/706837 , G03F9/7034 , G03F9/7092
Abstract: A metrology method relating to measurement of a structure on a substrate, the structure being subject to one or more asymmetric deviation. The method includes obtaining at least one intensity asymmetry value relating to the one or more asymmetric deviations, wherein the at least one intensity asymmetry value includes a metric related to a difference or imbalance between the respective intensities or amplitudes of at least two diffraction orders of radiation diffracted by the structure; determining at least one phase offset value corresponding to the one or more asymmetric deviations based on the at least one intensity asymmetry value; and determining one or more measurement corrections for the one or more asymmetric deviations from the at least one phase offset value.
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公开(公告)号：US11175593B2
公开(公告)日：2021-11-16
申请号：US17049707
申请日：2019-04-03
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Reinald Huisman , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Yuxiang Lin , Vu Quang Tran , Sebastianus Adrianus Goorden , Justin Lloyd Kreuzer , Christopher John Mason , Igor Matheus Petronella Aarts , Krishanu Shome , Irit Tzemah
Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
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3.发明授权公开(公告)号：US10481507B2
公开(公告)日：2019-11-19
申请号：US16328750
申请日：2017-08-18
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Abstract: A method, including printing an apparatus mark onto a structure while the structure is at least partly within a lithographic apparatus. The structure may be part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. The method further includes measuring the apparatus mark using a sensor system within the apparatus.
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公开(公告)号：US20150212425A1
公开(公告)日：2015-07-30
申请号：US14430021
申请日：2013-08-27
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： Michael Andrew Chieda , Stephen Roux , Teun Peterus Adrianus De Wilt , Igor Matheus Petronella Aarts
CPC classification number: G03F7/70191 , G01B11/2513 , G01D5/347 , G03F7/70716 , G03F7/70783 , G03F7/7085
Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an encoder head designed to scan over a surface of the patterning device to determine a distortion in a first direction along a length of the patterning device and a distortion in a second direction substantially perpendicular to the surface of the patterning device.
Abstract translation: 光刻设备包括配置成调节辐射束的照明系统，构造成保持图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持衬底的工作台以及配置成将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括编码器头，其设计成在图案形成装置的表面上扫描以确定沿着图案形成装置的长度的第一方向的变形和基本上垂直于图案形成装置的表面的第二方向的变形。
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公开(公告)号：US11493852B2
公开(公告)日：2022-11-08
申请号：US17415711
申请日：2019-12-12
Applicant: ASML Holding N.V.
Inventor： Zahrasadat Dastouri , Greger Göte Andersson , Krishanu Shome , Igor Matheus Petronella Aarts
IPC: G03F9/00
Abstract: A method of applying a measurement correction includes determining an orthogonal subspace used to characterize the measurement as a plot of data. A first axis of the orthogonal subspace corresponds to constructive interference output from an interferometer of the metrology system plus a first error variable and a second axis of the orthogonal subspace corresponds to destructive interference output from the interferometer of the metrology system plus a second error variable. The method also includes determining a slope of the plot of data and determining a fitted line to the plot of data in the orthogonal subspace based on the slope.
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Patent Agency Ranking
公开(公告)号：US20210397103A1
公开(公告)日：2021-12-23
申请号：US17297691
申请日：2019-11-26
Applicant: ASML Holding N.V.
Inventor： Greger Göte Andersson , Krishanu Shome , Zahrasadat Dastouri , Igor Matheus Petronella Aarts
Abstract: A method of applying a measurement correction includes determining an orthogonal subspace used to characterize a first principal component of the measurement and a second principal component of the measurement, and rotating the orthogonal subspace by a first angle such that the first principle component rotates to become a first factor vector and the second principle component rotates to become a second factor vector. An asymmetry vector is generated by rotating the second factor vector by a second angle, where the asymmetry vector and the first factor vector define a non-orthogonal subspace. An asymmetry contribution is determined in the measurement based on the projection of the measurement onto the first factor vector in the non-orthogonal subspace. The method also includes subtracting the asymmetry contribution from the measurement.
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公开(公告)号：US11971665B2
公开(公告)日：2024-04-30
申请号：US17432019
申请日：2020-02-06
Applicant: ASML Holding N.V.
Inventor： Joshua Adams , Yuxiang Lin , Krishanu Shome , Gerrit Johannes Nijmeijer , Igor Matheus Petronella Aarts
IPC: G03F9/00
CPC classification number: G03F9/7065 , G03F9/7076 , G03F9/7088
Abstract: An alignment method includes directing an illumination beam with a first polarization state to form a diffracted beam with a second polarization state from an alignment target, and passing the diffracted beam through a polarization analyzer. The alignment method further includes measuring a polarization state of the diffracted beam and determining a location of the alignment target from the measured polarization state relative to its initial polarization state. The alignment target includes a plurality of diffraction gratings with a single pitch and two or more duty cycles, wherein the pitch is smaller than a wavelength of the illumination beam, and the location of the alignment target corresponds to the duty cycle of the diffraction grating.
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公开(公告)号：US11899380B2
公开(公告)日：2024-02-13
申请号：US17770575
申请日：2020-09-28
Applicant: ASML Holding N.V.
Inventor： Krishanu Shome , Igor Matheus Petronella Aarts , Junwon Lee
CPC classification number: G03F9/7046 , G01J9/02 , G03F9/7049 , G03F9/7088 , G01J2009/028
Abstract: An apparatus for and method of sensing alignment marks in which a self-referencing interferometer based sensor outputs standing images of the alignment marks and camera device is used to capture the images as output by the sensor and a detector is used to obtain phase information about the alignment marks from the images as output by the sensor.
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公开(公告)号：US11513446B2
公开(公告)日：2022-11-29
申请号：US17297691
申请日：2019-11-26
Applicant: ASML Holding N.V.
Inventor： Greger Göte Andersson , Krishanu Shome , Zahrasadat Dastouri , Igor Matheus Petronella Aarts
Abstract: A method of applying a measurement correction includes determining an orthogonal subspace used to characterize a first principal component of the measurement and a second principal component of the measurement, and rotating the orthogonal subspace by a first angle such that the first principle component rotates to become a first factor vector and the second principle component rotates to become a second factor vector. An asymmetry vector is generated by rotating the second factor vector by a second angle, where the asymmetry vector and the first factor vector define a non-orthogonal subspace. An asymmetry contribution is determined in the measurement based on the projection of the measurement onto the first factor vector in the non-orthogonal subspace. The method also includes subtracting the asymmetry contribution from the measurement.
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公开(公告)号：US10802208B2
公开(公告)日：2020-10-13
申请号：US16094244
申请日：2017-03-17
Applicant: ASML HOLDING N.V.
Inventor： King Pui Leung , Tao Chen , Ronan James Havelin , Igor Matheus Petronella Aarts , Adel Joobeur , Joseph Carbone
Abstract: A measurement apparatus, including: a tapered optical fiber, the tapered optical fiber having an input to receive radiation and having an output to provide spectrally broadened output radiation toward a measurement target, the tapered optical fiber configured to spectrally broaden the radiation received at the input; and a detector system configured to receive a redirected portion of the output radiation from the measurement target.
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