利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

40 条记录 (耗时 0.029 秒)

    Switching power supply for gas laser
    1.
    发明授权
    Switching power supply for gas laser 有权
    气体激光开关电源

    公开(公告)号：US06304475B1

    公开(公告)日：2001-10-16

    申请号：US09252452

    申请日：1999-02-18

    申请人： Akihiko Iwata ,  Junichi Nishimae ,  Masaaki Tanaka ,  Takashi Kumagai ,  Masato Matsubara

    发明人： Akihiko Iwata ,  Junichi Nishimae ,  Masaaki Tanaka ,  Takashi Kumagai ,  Masato Matsubara

    IPC分类号： H02M75387

    CPC分类号： H01S3/0975

    摘要： A laser power supply apparatus supplies AC power to a gas contained in a laser device by way of a pair of dielectric layers, without having to use a transformer to form a high-frequency discharge in a gas to excite the gas, to cause the laser device to radiate. The laser power supply apparatus includes an inverter having arms, each arm including high-speed semiconductor switches connected in series, for directly converting a DC high voltage from a DC power supply to a series of AC output pulses having a much higher AC voltage than the DC high voltage and supplied to the laser device by simultaneously turning on and off those high-speed semiconductor switches in each of the arms, and for furnishing the series of AC output pulses to the laser device at a pair of output terminals.

    摘要翻译： 激光供电装置通过一对电介质层向包含在激光装置中的气体提供AC电力，而不必使用变压器在气体中形成高频放电以激发气体，从而使激光 设备辐射。 激光电源装置包括具有臂的逆变器，每个臂包括串联连接的高速半导体开关，用于将直流电压直流转换成具有比该直流电源高得多的交流电压的一系列交流输出脉冲 DC高电压，并且通过同时打开和关闭每个臂中的那些高速半导体开关并将一系列AC输出脉冲提供给激光装置，并在一对输出端子处提供给激光装置。

    Plasma apparatus
    2.
    发明授权
    Plasma apparatus 失效
    等离子体仪器

    公开(公告)号：US4890294A

    公开(公告)日：1989-12-26

    申请号：US147726

    申请日：1988-01-25

    申请人： Junichi Nishimae ,  Kenji Yoshizawa ,  Masakazu Taki ,  Yoshihiro Ueda ,  Tadashi Yanagi ,  Akihiko Iwata

    发明人： Junichi Nishimae ,  Kenji Yoshizawa ,  Masakazu Taki ,  Yoshihiro Ueda ,  Tadashi Yanagi ,  Akihiko Iwata

    IPC分类号： H01J37/32 ,  H01S3/03 ,  H01S3/0975 ,  H05H1/46

    CPC分类号： H01J37/32192 ,  H01J37/32339 ,  H01S3/0315 ,  H01S3/0975 ,  H05H1/46

    摘要： The invention relates to a plasma apparatus where plasma is generated utilizing microwave discharge and laser excitation is performed and plasma processing is performed. More specifically, in a plasma apparatus where a microwave from a microwave oscillator is transmitted through a microwave transmission path to a microwave circuit, and plasma is generated by a microwave discharge within the microwave circuit, a plasma generating medium for generating the plasma is filled in a space formed between a conductor wall constituting a part of the microwave circuit and a dielectric installed opposite to the conductor wall, and the microwave circuit forms microwave mode having an electric field component orthogonal to the boundary between the dielectric and the plasma.

    摘要翻译： 本发明涉及一种使用微波放电产生等离子体并进行激光激发并进行等离子体处理的等离子体装置。 更具体地，在微波振荡器的微波通过微波传输路径传输到微波电路的等离子体装置中，并且通过微波电路内的微波放电产生等离子体，用于产生等离子体的等离子体产生介质被填充 在构成微波电路的一部分的导体壁与与导体壁相对设置的电介质之间形成的空间，微波电路形成具有与电介质和等离子体之间的边界正交的电场分量的微波模式。

    Gas laser device
    5.
    发明授权
    Gas laser device 有权
    气体激光装置

    公开(公告)号：US08885684B2

    公开(公告)日：2014-11-11

    申请号：US14123903

    申请日：2011-06-20

    申请人： Yoichi Tanino ,  Junichi Nishimae ,  Tatsuya Yamamoto ,  Shuichi Fujikawa

    发明人： Yoichi Tanino ,  Junichi Nishimae ,  Tatsuya Yamamoto ,  Shuichi Fujikawa

    IPC分类号： H01S3/22 ,  H01S3/041 ,  H01S3/036 ,  H01S3/03 ,  H01S3/223 ,  H01S3/0971 ,  H01S3/07 ,  H01S3/081

    CPC分类号： H01S3/041 ,  H01S3/03 ,  H01S3/036 ,  H01S3/076 ,  H01S3/081 ,  H01S3/0816 ,  H01S3/0971 ,  H01S3/2232

    摘要： A CO2 gas laser device according to the present invention amplifies CO2 laser light that oscillates repeatedly in short pulses having a pulse width of 100 ns or less, and cools a CO2 laser gas which is excited by continuous discharge by circulating the CO2 laser gas by means of forced convection. Therein, an angle θ defined by the optical axis of the amplified CO2 laser beam and the flow direction of the CO2 laser gas caused by the forced convection is determined by both a discharge cross sectional area and a discharge length of a volume in which the CO2 laser gas is excited by discharge, whereby increasing the gain of pulsed laser to achieve pulsed laser light having an extremely high average output power.

    摘要翻译： 根据本发明的二氧化碳气体激光装置放大以脉冲宽度为100ns以下的短脉冲重复振荡的CO 2激光，并通过循环CO 2激光气体的方式冷却通过连续放电而激发的CO 2激光气体 的强制对流。 其中，角度和角度; 由放大的CO 2激光束的光轴限定，并且由强制对流引起的CO 2激光气体的流动方向由放电截面积和其中激发CO 2激光气体的体积的放电长度 从而增加脉冲激光器的增益以实现具有极高平均输出功率的脉冲激光。

    Gas laser device
    6.
    发明授权
    Gas laser device 有权
    气体激光装置

    公开(公告)号：US08873599B2

    公开(公告)日：2014-10-28

    申请号：US13824432

    申请日：2011-08-26

    申请人： Tatsuya Yamamoto ,  Naoki Miyamoto ,  Junichi Nishimae ,  Shuichi Fujikawa

    发明人： Tatsuya Yamamoto ,  Naoki Miyamoto ,  Junichi Nishimae ,  Shuichi Fujikawa

    IPC分类号： H01S3/22 ,  H01S3/036 ,  H01S3/038 ,  H01S3/223

    CPC分类号： H01S3/038 ,  H01S3/036 ,  H01S3/2232 ,  H01S2301/203

    摘要： A tri-axially orthogonal gas laser device in which an optical axis of an optical resonator, a direction in which a laser gas is supplied into the optical resonator, and a direction of discharge for exciting the laser gas are mutually orthogonal to one another, the device including: an exciting unit including a blower supplying the laser gas in −X direction to the optical axis of the optical resonator, and a discharge electrode pair which is shifted on a gas upstream side with respect to the optical axis; and an exciting unit including a blower for supplying the laser gas in +X direction to the optical axis of the optical resonator, and a discharge electrode pair which is shifted on a gas upstream side with respect to the optical axis

    摘要翻译： 将光谐振器的光轴，向光谐振器供给激光气体的方向以及使激光气体激发的方向相互正交的三轴正交气体激光装置相互正交， 该装置包括：激励单元，其包括向所述光学谐振器的光轴向-X方向供给激光气体的鼓风机;以及在相对于所述光轴的气体上游侧移动的放电电极对; 以及激励单元，其包括用于将激光气体沿+ X方向供给到光谐振器的光轴的鼓风机，以及在相对于光轴的气体上游侧移动的放电电极对

    LASER MACHINING DEVICE
    7.
    发明申请
    LASER MACHINING DEVICE 有权
    激光加工设备

    公开(公告)号：US20130341309A1

    公开(公告)日：2013-12-26

    申请号：US14003678

    申请日：2012-03-13

    申请人： Tatsuya Yamamoto ,  Junichi Nishimae ,  Shuichi Fujikawa

    发明人： Tatsuya Yamamoto ,  Junichi Nishimae ,  Shuichi Fujikawa

    IPC分类号： B23K26/00

    CPC分类号： B23K26/00 ,  B23K26/046 ,  B23K26/0643 ,  B23K26/0665 ,  B23K26/707

    摘要： A laser machining apparatus, including: a laser light source; a transparent member that is set on an optical path of a laser beam and transmits the laser beam; a contact type temperature difference sensor, set on a surface of the transparent member outside an irradiation range of the laser beam, for detecting a temperature difference between a surface of the transparent member, which is spaced apart from a center of the transparent member by a first distance, and another surface of the transparent member, which is spaced apart from the center of the transparent member by a second distance larger than the first distance; and a controller correcting a focal position based on the temperature difference detected by the contact type temperature difference sensor to stabilize a beam diameter of the laser beam condensed onto a machining object.

    摘要翻译： 一种激光加工装置，包括：激光光源; 透明构件，其被设置在激光束的光路上并透射激光束; 接触式温度差传感器，设置在所述透明构件的表面上，位于所述激光束的照射范围之外，用于检测所述透明构件的与所述透明构件的中心间隔开的表面之间的温度差 第一距离和透明构件的另一个表面，其与透明构件的中心距离大于第一距离的第二距离; 以及控制器，基于由接触型温度差传感器检测的温度差校正焦点位置，以稳定在加工对象物上聚光的激光束的光束直径。

    Uneven-pattern reading apparatus
    8.
    发明授权
    Uneven-pattern reading apparatus 失效
    不均匀读取装置

    公开(公告)号：US06414749B1

    公开(公告)日：2002-07-02

    申请号：US09459925

    申请日：1999-12-14

    申请人： Tatsuki Okamoto ,  Yukio Sato ,  Junichi Nishimae ,  Hiroyuki Kawano

    发明人： Tatsuki Okamoto ,  Yukio Sato ,  Junichi Nishimae ,  Hiroyuki Kawano

    IPC分类号： G06K974

    CPC分类号： G06K9/00046

    摘要： An uneven-pattern reading apparatus includes a detecting prism having a detecting surface on which an uneven pattern is placed, an incident surface upon which an incident light beam for illuminating the uneven pattern is incident, and an emergent surface from which a light beam reflected from the uneven pattern on the detecting surface is emergent, angles between the respective detecting, incident, and emergent surfaces providing that the incident light beam is applied to the uneven pattern and the light reflected from the detecting surface is emergent from the emergent surface; an incident-light-beam converger for causing an incident light beam from a light source to be incident upon the incident surface after collimating or converging the incident light beam; an imaging device for detecting a reflected image emergent from the detecting prism; a converging optical system for collimating or converging the emergent light beam emergent from the emergent surface; and a processing device for identifying the uneven pattern on the basis of the image picked up by the imaging device, wherein an imaging surface of the imaging device is located closer to an emergent surface side than a focusing position of the converging optical system.

    摘要翻译： 不均匀图案读取装置包括：检测棱镜，其具有设置有不平坦图案的检测面，入射面，用于照射不均匀图案的入射光束入射的入射面;以及出射表面， 检测表面上的不均匀图案出现，使得入射光束被施加到不均匀图案并且从检测表面反射的光的各个检测入射和出射表面之间的角度从出射表面出射; 用于使来自光源的入射光束在入射光束准直或会聚之后入射到入射面上的入射光束会聚; 用于检测从所述检测棱镜出射的反射图像的成像装置; 用于使出射光束从出射表面出射的准直或会聚的会聚光学系统; 以及处理装置，用于基于由成像装置拾取的图像来识别不均匀图案，其中，成像装置的成像表面位于比会聚光学系统的聚焦位置更靠近出射表面侧。

    Microwave discharge light source device
    9.
    发明授权
    Microwave discharge light source device 失效
    微波放电光源设备

    公开(公告)号：US5144199A

    公开(公告)日：1992-09-01

    申请号：US637636

    申请日：1991-01-04

    申请人： Masakazu Taki ,  Kenji Yoshizawa ,  Junichi Nishimae

    发明人： Masakazu Taki ,  Kenji Yoshizawa ,  Junichi Nishimae

    IPC分类号： C23C16/48 ,  H01J65/04

    CPC分类号： H01J65/044 ,  C23C16/482

    摘要： A microwave discharge light source device in which one side of a discharge space in which a plasma emission takes place is defined by a transparent dielectric member. A transparent microwave reflecting member is disposed in a position such as to face the discharge space through the dielectric member. A microwave having an electric field component in the direction of thickness of the dielectric member is introduced into the dielectric member through the coupling at an end surface of the dielectric member so that a microwave electric field is formed in the discharge space, and so that the plasma emission medium emits light by electric discharge. The light thus emitted is extracted through the transparent microwave reflecting member.

    摘要翻译： 其中发生等离子体发射的放电空间的一侧由透明电介质构件限定的微波放电光源装置。 透明微波反射部件设置在通过电介质部件与放电空间相对的位置。 具有电介质部件厚度方向的电场成分的微波通过电介质部件的端面的耦合引入电介质部件，使得在放电空间内形成微波电场， 等离子体发射介质通过放电发光。 通过透明微波反射部件提取发出的光。