公开(公告)号：US5570031A

公开(公告)日：1996-10-29

申请号：US336903

申请日：1994-11-10

申请人： Makoto Sasaki ,  Hirofumi Fukui ,  Masami Aihara ,  Koichi Fukuda ,  Yasuhiko Kasama ,  Tadahiro Ohmi

发明人： Makoto Sasaki ,  Hirofumi Fukui ,  Masami Aihara ,  Koichi Fukuda ,  Yasuhiko Kasama ,  Tadahiro Ohmi

IPC分类号： H01L21/302 ,  G01R29/12 ,  G01R31/28 ,  H01L21/203 ,  H01L21/205 ,  H01L21/3065 ,  H01L21/66 ,  G01R31/302 ,  G01R19/00

CPC分类号： G01R29/12 ,  G01R31/2831 ,  H01L22/14 ,  H01L2924/0002

摘要： There is provided a surface potential measuring apparatus cable of accurately measuring the potential of a substrate regardless of the material of the substrate, and a plasma equipment capable of accurately measuring and controlling ion energy. The substrate surface potential measuring apparatus measures the surface potential of a substrate in a plasma processing apparatus and includes a terminal electrically connected to a suscepter electrode for holding the substrate, a first condenser disposed between the terminal and the ground and a potential measuring device for measuring the potential of the terminal. The surface potential of the substrate is found from the potential of the suscepter electrode measured by the potential measuring means.

摘要翻译： 提供了一种能够精确地测量衬底的电位的表面电位测量装置电缆，而不管衬底的材料如何，以及能够精确地测量和控制离子能量的等离子体设备。 基板表面电位测量装置测量等离子体处理装置中的基板的表面电位，并且包括电连接到用于保持基板的可变电极的端子，设置在端子和地之间的第一冷凝器和用于测量的电位测量装置 终端的潜力。 基于由电位测量装置测量的电容器的电位，找到衬底的表面电位。

公开(公告)号：US5609737A

公开(公告)日：1997-03-11

申请号：US289713

申请日：1994-08-12

申请人： Hirofumi Fukui ,  Masanori Miyazaki ,  Masami Aihara ,  Chisato Iwasaki ,  Koichi Fukuda ,  Yasuhiko Kasama

发明人： Hirofumi Fukui ,  Masanori Miyazaki ,  Masami Aihara ,  Chisato Iwasaki ,  Koichi Fukuda ,  Yasuhiko Kasama

IPC分类号： H01L21/205 ,  C23C14/34 ,  C23C16/02 ,  C23C16/44 ,  C23C16/509 ,  H01L21/203 ,  H01L21/31 ,  H01L21/336 ,  H01L21/77 ,  H01L31/20 ,  C23C16/00

CPC分类号： H01L29/66765 ,  C23C14/34 ,  C23C16/0245 ,  C23C16/4405 ,  C23C16/5096 ,  H01J37/34 ,  H01L31/202 ,  H01J2237/32 ,  H01L27/1214 ,  Y02E10/50 ,  Y02P70/521

摘要： A method for manufacturing thin films in which a first film is formed on a substrate using chemical-vapor deposition (CVD), and a second film is formed on the substrate using sputtering, wherein the processes are sequentially performed in the same deposition chamber without exposing the substrate to an oxidative atmosphere. The deposition chamber includes a first electrode, and a second electrode located under the first electrode. During the CVD process, a dummy target is mounted on the first electrode and the substrate is mounted on the second electrode, a reactive gas is introduced into the chamber, and high frequency electrical power is applied to both the first and second electrodes, thereby causing the constituents of the reactive gas to deposit on the substrate to form the first film. Subsequently, any remaining reactive gas is removed from the chamber and an automated mechanism removes the dummy target from the first electrode and stores the dummy target in a storage chamber. A sputtering electrode is then mounted on the first electrode and a sputtering gas is introduced into the reaction chamber. High frequency electrical power is then applied to both the first and second electrodes, thereby causing the sputtering gas and sputtering target to deposit the second film on the substrate.

摘要翻译： 一种用于制造薄膜的方法，其中使用化学气相沉积（CVD）在基板上形成第一膜，并且使用溅射在所述基板上形成第二膜，其中所述工艺在相同的沉积室中依次进行而不暴露 底物转化为氧化性气氛。 沉积室包括第一电极和位于第一电极下方的第二电极。 在CVD工艺期间，将虚拟目标物安装在第一电极上，并且将基板安装在第二电极上，将反应性气体引入室中，并且将高频电力施加到第一和第二电极两者，由此引起 反应气体的成分沉积在基底上以形成第一膜。 随后，将任何剩余的反应气体从室中除去，并且自动化机构从第一电极移除虚设目标物并将虚拟目标物存储在储存室中。 然后将溅射电极安装在第一电极上，并将溅射气体引入反应室。 然后将高频电力施加到第一和第二电极，由此使溅射气体和溅射靶将第二膜沉积在基板上。

公开(公告)号：US5755938A

公开(公告)日：1998-05-26

申请号：US556188

申请日：1995-11-09

申请人： Hirofumi Fukui ,  Masanori Miyazaki ,  Masami Aihara ,  Chisato Iwasaki ,  Koichi Fukuda ,  Yasuhiko Kasama

发明人： Hirofumi Fukui ,  Masanori Miyazaki ,  Masami Aihara ,  Chisato Iwasaki ,  Koichi Fukuda ,  Yasuhiko Kasama

IPC分类号： H01L21/205 ,  C23C14/34 ,  C23C16/02 ,  C23C16/44 ,  C23C16/509 ,  H01L21/203 ,  H01L21/31 ,  H01L21/336 ,  H01L21/77 ,  H01L31/20 ,  C23C16/00

CPC分类号： H01L29/66765 ,  C23C14/34 ,  C23C16/0245 ,  C23C16/4405 ,  C23C16/5096 ,  H01J37/34 ,  H01L31/202 ,  H01J2237/32 ,  H01L27/1214 ,  Y02E10/50 ,  Y02P70/521

摘要： An apparatus which allows a first film to be formed on a substrate by chemical vapor deposition (CVD) and a second film to be formed on the substrate by sputtering, wherein the processes are performed sequentially in the same deposition chamber without exposing the substrate to an oxidative atmosphere. The deposition chamber includes a first electrode and a second electrode located under the first electrode. A transfer mechanism loads a dummy target onto the first electrode and the substrate onto the second electrode prior to a CVD process. The dummy target is resistant to sputtering and thus does not contaminate the film deposited on the substrate during CVD. After CVD and prior to sputtering, the transfer mechanism unloads the dummy target and replaces it with a sputtering target for film formation by sputtering. Both the dummy target and sputtering target can be loaded and unloaded from a single pressurized storage chamber. Thus, film formation by both sputtering and CVD can be accomplished by using a single deposition chamber without removing the substrate between processes.

摘要翻译： 一种允许通过化学气相沉积（CVD）在衬底上形成第一膜和通过溅射形成在衬底上的第二膜的装置，其中在相同的沉积室中顺序地进行处理，而不将衬底暴露于 氧化气氛。 沉积室包括位于第一电极下方的第一电极和第二电极。 转移机构在CVD工艺之前将虚拟靶加载到第二电极上的第一电极和衬底上。 虚拟靶对溅射是耐受的，因此在CVD期间不会污染沉积在衬底上的膜。 在CVD之后并且在溅射之前，转移机构卸载虚拟靶并用用溅射的成膜溅射靶代替它。 虚拟靶和溅射靶都可以从单个加压储存室装载和卸载。 因此，通过溅射和CVD的成膜可以通过使用单个沉积室而不在工艺之间移除基板来实现。

公开(公告)号：US5605576A

公开(公告)日：1997-02-25

申请号：US336631

申请日：1994-11-09

申请人： Makoto Sasaki ,  Hirofumi Fukui ,  Masami Aihara ,  Tadahiro Ohmi

发明人： Makoto Sasaki ,  Hirofumi Fukui ,  Masami Aihara ,  Tadahiro Ohmi

IPC分类号： H05H1/46 ,  C23C14/35 ,  C23C14/40 ,  C23C16/50 ,  C23C16/509 ,  C23F4/00 ,  H01J37/34 ,  H01L21/203 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00

CPC分类号： H01J37/3441 ,  C23C14/35 ,  C23C16/509 ,  H01J37/3405

摘要： An object of the present invention is to increase the energy efficiency of a plasma apparatus and provide a high-frequency magnetron plasma apparatus which can precisely control plasma. The plasma apparatus has a susceptor electrode, a plasma exciting electrode, magnets mounted on the plasma exciting electrode, and a magnetic shield provided around the plasma exciting electrode, all of which are arranged in a vacuum chamber. The magnetic shield has a high impedance for a high frequency. The magnetic shield is preferably earthed with a direct current, more preferably earthed through an inductance.

摘要翻译： 本发明的目的是提高等离子体装置的能量效率，并提供可以精确控制等离子体的高频磁控管等离子体装置。 等离子体装置具有基座电极，等离子体激励电极，安装在等离子体激励电极上的磁体和设置在等离子体激励电极周围的磁屏蔽，所有这些都设置在真空室中。 磁屏蔽对高频具有高阻抗。 磁屏蔽优选用直流电接地，更优选通过电感接地。

公开(公告)号：US20110036628A1

公开(公告)日：2011-02-17

申请号：US12918169

申请日：2009-02-19

申请人： Masami Aihara

发明人： Masami Aihara

IPC分类号： H01R4/02 ,  B23K35/38 ,  B23K1/00

CPC分类号： B23K1/0016 ,  B23K35/0222 ,  B23K35/0244 ,  B23K35/025 ,  B23K35/36 ,  B23K35/3612 ,  B23K35/3613 ,  C21D2251/00 ,  H05K3/3442 ,  H05K3/3484 ,  H05K3/3489 ,  H05K2201/068 ,  Y02P10/212

摘要： Disclosed is a solder bonding structure which is capable of retaining sufficient solder bonding strength and ensuring high bonding reliability even in severe environments having an extremely large temperature difference. In the solder bonding structure, an electronic component 4 is mounted on a main surface 1a of a substrate having an electrode section 2 and an insulating film 3, and the electrode section 2 and the electronic component 4 are electrically bonded to each other through a solder section 5, and a flux residue 6 exuded from the solder section 5 is present between the electronic component 4 and the insulating film 3. The flux contains an acrylic resin, an activating agent, and a thixotropic agent having a hydroxyl group. The glass transition point of the acrylic resin is not higher than −40° C., or not lower than the softening temperature of the flux residue. The flux residue has a maximum value of 300×10−6/K or less of linear thermal expansion coefficient within a temperature range from −40° C. to the softening temperature of the flux residue.

摘要翻译： 公开了一种能够保持足够的焊接接合强度并且即使在具有非常大的温度差的恶劣环境中也确保高的接合可靠性的焊接接合结构。 在焊接结构中，电子部件4安装在具有电极部2和绝缘膜3的基板的主面1a上，电极部2和电子部件4通过焊料彼此电接合 并且在电子部件4和绝缘膜3之间存在从焊料部5渗出的焊剂残渣6。焊剂含有丙烯酸树脂，活化剂和具有羟基的触变剂。 丙烯酸树脂的玻璃化转变点不高于-40℃，或不低于焊剂残留物的软化温度。 焊剂残留物在-40℃至焊剂残留物的软化温度范围内的线性热膨胀系数的最大值为300×10 -6 / K以下。

公开(公告)号：US20090110017A1

公开(公告)日：2009-04-30

申请号：US12275750

申请日：2008-11-21

申请人： Masami Aihara

发明人： Masami Aihara

IPC分类号： H01S5/00 ,  H01L21/02

CPC分类号： H01L33/0079 ,  H01L33/44

摘要： A semiconductor light-emitting element includes a semiconductor layer including a light-emitting layer, a refractive index gradient layer provided on a light extraction surface of the semiconductor layer, and a holding substrate bounded to an outer surface of the refractive index gradient layer with an adhesion layer interposed therebetween. A refractive index of the refractive index gradient layer is changed continuously or stepwise in a film thickness direction such that a semiconductor-layer-side refractive index is substantially equivalent to a refractive index of the semiconductor layer and a holding-substrate-side refractive index is substantially equivalent to a refractive index of the holding substrate. The refractive index gradient layer is formed by vapor plating.

摘要翻译： 半导体发光元件包括：半导体层，包括发光层，设置在半导体层的光提取表面上的折射率梯度层;以及保持基板，其与折射率梯度层的外表面界定， 粘合层插入其间。 折射率梯度层的折射率在膜厚方向上连续地或逐步地变化，使得半导体层侧折射率基本上等于半导体层的折射率，保持基板侧的折射率为 基本上等于保持基板的折射率。 折射率梯度层通过蒸镀形成。

公开(公告)号：US5282146A

公开(公告)日：1994-01-25

申请号：US694136

申请日：1991-05-01

申请人： Masami Aihara ,  Masatoshi Sekine ,  Tsutomu Takei ,  Hiroaki Nishi ,  Kazuyoshi Kohno ,  Takeshi Kitahara ,  Atsushi Masuda

发明人： Masami Aihara ,  Masatoshi Sekine ,  Tsutomu Takei ,  Hiroaki Nishi ,  Kazuyoshi Kohno ,  Takeshi Kitahara ,  Atsushi Masuda

IPC分类号： G06F11/25 ,  G01R31/3183 ,  G06F17/50 ,  G06F15/60

CPC分类号： G01R31/318357 ,  G01R31/318307 ,  G06F17/5022

摘要： Disclosed is a test assistant system for a logical design process comprising a description storage data base for storing statements expressing logical functions of circuit components to be tested, a compiler for compiling the statements to output object data, a data base for storing the object data, a test pattern generator for generating test patterns by using the object data stored in the data base, a test pattern data base for storing the test patterns, each having a level number, a simulator for executing a simulation for the logical function by using the test patterns stored in the test pattern data base, and a display for displaying the object data, the test patterns, the information used in the simulation, and relationships among them. The data base comprises a region for storing a statement correspondence table expressing statements as descriptions of the logical functions of the circuit components, a region for storing a circuit component table expressing a circuit component corresponding to the function described in the statement, a region for storing a dependent relationship table expressing the dependent relationship between the statements, and a correspondence relationship table expressing the correspondence relationship between the statement correspondence table and the circuit component table.

摘要翻译： 公开了一种用于逻辑设计过程的测试辅助系统，包括用于存储表示要测试的电路组件的逻辑功能的语句的描述存储数据库，用于编译语句以输出对象数据的编译器，用于存储对象数据的数据库， 用于通过使用存储在数据库中的对象数据来生成测试模式的测试模式发生器，用于存储测试模式的测试模式数据库，每个具有级别号码，用于通过使用测试执行用于逻辑功能的模拟的模拟器 存储在测试模式数据库中的模式，以及用于显示对象数据，测试模式，模拟中使用的信息以及它们之间的关系的显示。 数据库包括用于存储表示语句的语句对应表的区域，作为对电路组件的逻辑功能的描述的区域，用于存储表示对应于语句中描述的功能的电路组件的电路组件表的区域，用于存储 表示语句之间的依赖关系的依赖关系表和表示语句对应表与电路分量表之间的对应关系的对应关系表。

公开(公告)号：US07301601B2

公开(公告)日：2007-11-27

申请号：US10850714

申请日：2004-05-20

申请人： Jibing Lin ,  Suning Tang ,  Yuanji Tang ,  Masami Aihara

发明人： Jibing Lin ,  Suning Tang ,  Yuanji Tang ,  Masami Aihara

IPC分类号： G02F1/13 ,  G02F1/1335

CPC分类号： G02F1/13342 ,  G02F1/133615 ,  G02F1/31 ,  G02F2203/06

摘要： A thin holographic optical switch used in a liquid crystal display device contains opposing transparent substrates transparent electrodes between the substrates and a diffraction grating between the electrodes. The diffraction grating contains regions of transparent polymerized photopolymers and cholesteric liquid crystal micro-droplets. Refractive indexes of the photopolymers and liquid crystal are substantially the same when the electrodes have the same potential. The holographic optical switch transmits broadband LED light when the potential difference between the electrodes is zero and is polarization independent. The holographic optical switch diffracts broadband LED light when the potential difference between the electrodes is non-zero and is polarization independent.

摘要翻译： 在液晶显示装置中使用的薄全息光学开关包括在基板之间的相对的透明基板和电极之间的衍射光栅。 衍射光栅包含透明聚合光聚合物和胆甾型液晶微滴的区域。 当电极具有相同的电位时，光聚合物和液晶的折射率基本相同。 当电极之间的电位差为零并且与偏振无关时，全息光学开关传输宽带LED光。 当电极之间的电位差为非零并且与偏振无关时，全息光学开关衍射宽带LED光。

公开(公告)号：US20050259216A1

公开(公告)日：2005-11-24

申请号：US10850713

申请日：2004-05-20

申请人： Jibing Lin ,  Suning Tang ,  Yuanji Tang ,  Masami Aihara ,  Naoki Ito

发明人： Jibing Lin ,  Suning Tang ,  Yuanji Tang ,  Masami Aihara ,  Naoki Ito

IPC分类号： G02F1/13 ,  G02F1/1334 ,  G02F1/13357 ,  G02F1/31

CPC分类号： G02F1/31 ,  G02F1/13342 ,  G02F1/133615 ,  G02F2203/06

摘要： A thin holographic optical switch used in a liquid crystal display device contains opposing transparent substrates transparent electrodes between the substrates and a diffraction grating between the electrodes. The diffraction grating contains regions of transparent polymerized photopolymers and cholesteric liquid crystal micro-droplets. Refractive indexes of the photopolymers and liquid crystal are substantially the same when the electrodes have the same potential. The holographic optical switch transmits broadband LED light when the potential difference between the electrodes is zero and is polarization independent. The holographic optical switch diffracts broadband LED light when the potential difference between the electrodes is non-zero and is polarization independent.

摘要翻译： 在液晶显示装置中使用的薄全息光学开关包括在基板之间的相对的透明基板和电极之间的衍射光栅。 衍射光栅包含透明聚合光聚合物和胆甾型液晶微滴的区域。 当电极具有相同的电位时，光聚合物和液晶的折射率基本相同。 当电极之间的电位差为零并且与偏振无关时，全息光学开关传输宽带LED光。 当电极之间的电位差为非零并且与偏振无关时，全息光学开关衍射宽带LED光。

公开(公告)号：US20120291922A1

公开(公告)日：2012-11-22

申请号：US13514076

申请日：2010-12-06

申请人： Eiji Iwamura ,  Kazushi Gotoh ,  Fumio Ishiga ,  Takayasu Yoshioka ,  Masayoshi Utsuno ,  Atsuo Nakamura ,  Teruo Okochi ,  Masaki Sanji ,  Takuji Sukekawa ,  Kenshi Ikedo ,  Yoshiyuki Andoh ,  Takeshi Shirai ,  Kimiaki Mori ,  Rie Wada ,  Kensuke Nakanishi ,  Masami Aihara ,  Seishi Kumamoto

发明人： Eiji Iwamura ,  Kazushi Gotoh ,  Fumio Ishiga ,  Takayasu Yoshioka ,  Masayoshi Utsuno ,  Atsuo Nakamura ,  Teruo Okochi ,  Masaki Sanji ,  Takuji Sukekawa ,  Kenshi Ikedo ,  Yoshiyuki Andoh ,  Takeshi Shirai ,  Kimiaki Mori ,  Rie Wada ,  Kensuke Nakanishi ,  Masami Aihara ,  Seishi Kumamoto

IPC分类号： B23K35/363

CPC分类号： B23K35/3613 ,  B23K35/362 ,  C22C12/00 ,  C22C13/00 ,  H05K3/3484

摘要： A solder paste according to an aspect of the invention includes, within a flux, an activator that has a dibasic acid with a molecular weight of 250 or less, a monobasic acid with a molecular weight of 150 or greater and 300 or less, and a dibasic acid with a molecular weight of 300 or greater and 600 or less; and at least one resin additive selected from the group consisting of high-density polyethylenes and polypropylenes. The solder paste has the resin additive in an amount of 4% by weight or greater and 12% by weight or less when the total amount of the flux is taken as 100% by weight, and has a viscosity of 400 Pa·s or greater at 80° C.

摘要翻译： 根据本发明的一个方面的焊膏在助焊剂中包括具有分子量为250或更小的二元酸，分子量为150以上且300以下的一元酸的活化剂，以及 分子量为300以上且600以下的二元酸; 和至少一种选自高密度聚乙烯和聚丙烯的树脂添加剂。 当焊剂的总量为100重量％时，焊膏的树脂添加量为4重量％以上，12重量％以下，粘度为400Pa·s以上 在80℃