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1.发明授权公开(公告)号：US07355191B2
公开(公告)日：2008-04-08
申请号：US11288868
申请日：2005-11-28
IPC分类号： G01J3/10
CPC分类号： G21K1/06 , B08B7/0071 , B82Y10/00 , G01N21/15 , G03F7/70916 , G03F7/70925 , G21K2201/061 , G21K2201/064 , G21K2201/067 , H05G2/001
摘要： Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation. For the system, a subsystem may be positioned outside the chamber and may be operable to pass energy through the window to heat debris accumulating on the inside surface of the window. In a first embodiment, the subsystem may place a flowing, heated gas in contact with the outside surface of the window. In another embodiment, electromagnetic radiation may be passed through the window.
摘要翻译： 公开了用于清洁极紫外（EUV）光源的室窗的系统和方法。 窗口可以具有面向室内部和相对的外表面的内表面，并且光源可以通过等离子体形成而产生碎屑。 对于该系统，子系统可以定位在室外，并且可操作以将能量传递通过窗口以加热积聚在窗口内表面上的碎屑。 在第一实施例中，子系统可以使流动的加热气体与窗口的外表面接触。 在另一个实施例中，电磁辐射可以通过窗口。
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公开(公告)号：US08035092B2
公开(公告)日：2011-10-11
申请号：US12655987
申请日：2010-01-11
申请人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , Alexander I. Ershov , Oleh Khodykin
发明人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , Alexander I. Ershov , Oleh Khodykin
IPC分类号： H04H1/04
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译： 公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。 该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预先选定的值以下。 在一个实施方案中，气体可以包含氢气，并且在一个具体实施方案中，气体可以包含大于50体积％的氢气。
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公开(公告)号：US20090267005A1
公开(公告)日：2009-10-29
申请号：US12322669
申请日：2009-02-04
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
摘要翻译： 公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。 对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。 在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。
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公开(公告)号：US07518787B2
公开(公告)日：2009-04-14
申请号：US11452558
申请日：2006-06-14
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.
摘要翻译： 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源，第一放大器可以具有以饱和能量（Es，1）和小信号增益（go，1）为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量（Es，2）和小信号增益（go，2）的增益介质，其中（go，1）>（go，2）和（Es，2）>（ Es，1）。 在另一方面，激光光源的激光振荡器可以是空腔倾覆的激光振荡器，例如。 模式锁定激光振荡器，q切换激光振荡器，并且还可以包括时间脉冲展开器。
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5.发明申请Source material collection unit for a laser produced plasma EUV light source 失效用于激光产生等离子体EUV光源的源材料收集单元公开(公告)号：US20080048133A1
公开(公告)日：2008-02-28
申请号：US11509925
申请日：2006-08-25
IPC分类号： H05H1/00
摘要： An EUV light source is disclosed which may comprise a laser source generating a laser beam and a source material, e.g. tin, SnBr4, SnBr2, SnH4, tin-gallium alloys, tin-indium alloys, tin-indium-gallium alloys or combinations thereof, that is irradiated by the laser beam to form a plasma and emit EUV light. The EUV light source may also comprise a beam dump positioned to receive the laser beam and a system controlling the temperature of the beam dump within a pre-selected range. In one embodiment, the source material may be irradiated at an irradiation zone and the source may further comprises a receiving structure formed with a surface shaped to receive source material ejected from the irradiation zone and direct the received source material for subsequent collection. The receiving structure and the beam dump may be formed as a single integrated unit.
摘要翻译： 公开了一种EUV光源，其可以包括产生激光束和源材料的激光源，例如， 锡，SnBr 4，SnBr 2，SnH 4，锡 - 镓合金，锡 - 铟合金，锡铟镓合金或组合 由激光束照射以形成等离子体并发射EUV光。 EUV光源还可以包括定位成接收激光束的光束倾倒装置和控制在预选范围内的光束转储器的温度的系统。 在一个实施例中，源材料可以在照射区域照射，并且源可以进一步包括形成有表面的接收结构，该表面被成形为接收从照射区域喷出的源材料并引导接收的源材料用于随后的收集。 接收结构和光束转储可以形成为单个集成单元。
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公开(公告)号：US20070291350A1
公开(公告)日：2007-12-20
申请号：US11452558
申请日：2006-06-14
申请人： Alexander I. Ershov , Alexander N. Bykanov , Jerzy R. Hoffman , Igor V. Fomenkov , William N. Partlo
发明人： Alexander I. Ershov , Alexander N. Bykanov , Jerzy R. Hoffman , Igor V. Fomenkov , William N. Partlo
IPC分类号： H01S3/00
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.
摘要翻译： 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源极，第一放大器可以具有以饱和能量（E S，S 1）和小信号增益（g 1，...）为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量（E SUB，2 N）和小信号增益（g 0，o 2）的增益介质，其中（g < （o，SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB >）。 在另一方面，激光光源的激光振荡器可以是空腔倾覆的激光振荡器，例如。 模式锁定激光振荡器，q切换激光振荡器，并且还可以包括时间脉冲展开器。
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公开(公告)号：US20120193547A1
公开(公告)日：2012-08-02
申请号：US13441639
申请日：2012-04-06
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
摘要翻译： 公开了一种EUV光源，其可以包括多个目标，例如锡滴，以及产生预脉冲和主脉冲的系统，其中具有用于照射目标的预脉冲以产生扩展的目标。 该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。 该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。 另外，EUV光源还可以包括测量EUV光脉冲脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串的爆发期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的突发。
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公开(公告)号：US07916388B2
公开(公告)日：2011-03-29
申请号：US12004905
申请日：2007-12-20
申请人： Alexander N. Bykanov
发明人： Alexander N. Bykanov
CPC分类号： H01S3/105 , G03F7/70033 , H01S3/005 , H01S3/115 , H01S3/2232 , H01S3/225 , H01S3/2325 , H01S2301/02 , H05G2/003 , H05G2/008
摘要： A device is described herein which may comprise an oscillator having an oscillator cavity length, Lo, and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, Lcombined, where Lcombined=(N+x)*Lo, where “N” is an integer and “x” is a number between 0.4 and 0.6.
摘要翻译： 本文描述了一种器件，其可以包括具有振荡器腔长度Lo并且限定振荡器路径的振荡器; 和与所述振荡器耦合的多通道光放大器以建立包括所述振荡器路径的组合光腔，所述组合腔具有长度L组合，其中L组合=（N + x）* Lo，其中“N”是整数， “x”是介于0.4和0.6之间的数字。
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9.发明授权Systems and methods for target material delivery in a laser produced plasma EUV light source 有权用于激光产生等离子体EUV光源的靶材料输送的系统和方法公开(公告)号：US07872245B2
公开(公告)日：2011-01-18
申请号：US12214736
申请日：2008-06-19
申请人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译： 本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。 光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。 该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。
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10.发明授权System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus 有权系统管理极紫外（EUV）光刻设备的腔室之间的气流公开(公告)号：US07812329B2
公开(公告)日：2010-10-12
申请号：US12002073
申请日：2007-12-14
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70841 , G03F7/70908 , G03F7/70916
摘要： A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.
摘要翻译： 气体流量管理系统可以包括至少部分地围绕第一和第二相应空间的第一和第二封闭壁; 在第一空间中产生等离子体的系统，等离子体发射极紫外光; 限制从第一空间流到第二空间的细长体，所述主体至少部分地围绕通道并且具有允许EUV光从第一空间进入通道的第一开口端，以及允许EUV光从第二空间退出的第二开口端 通道进入第二空间，身体形状以建立相对于第一和第二端具有减小的横截面面积的位置; 以及离开孔的气流，所述孔定位成在主体的第一端和具有减小的横截面积的位置之间的位置处将气体引入通道。
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