-
1.发明申请FORMING AN ELECTRODE HAVING REDUCED CORROSION AND WATER DECOMPOSITION ON SURFACE USING AN ORGANIC PROTECTIVE LAYER 失效使用有机保护层形成具有降低的腐蚀和表面水分解的电极公开(公告)号：US20110312176A1
公开(公告)日：2011-12-22
申请号：US12820543
申请日：2010-06-22
申请人： Ali Afzali-Ardakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Binquan Luan , Glenn J. Martyna , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
发明人： Ali Afzali-Ardakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Binquan Luan , Glenn J. Martyna , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
IPC分类号： H01L21/283 , H01L21/441 , C23C28/00 , C30B23/02 , C23C14/34 , B05D3/14 , B05D5/12 , B05D3/06
CPC分类号： B82Y10/00 , H01L21/76834 , H01L29/0665 , H01L51/0093 , H01L51/0504 , H01L51/102
摘要： Accordingly, the present invention provides a method of forming an electrode having reduced corrosion and water decomposition on a surface thereof. A substrate which has a conductive layer disposed thereon is provided and the conductive layer has an oxide layer with an exposed surface. The exposed surface of the oxide layer contacts a solution of an organic surface active compound in an organic solvent to form a protective layer of the organic surface active compound over the oxide layer. The protective layer has a thickness of from about 0.5 nm to about 5 nm and ranges therebetween depending on a chemical structure of the surface active compound.
摘要翻译： 因此，本发明提供一种在其表面上形成具有降低的腐蚀和水分解的电极的方法。 提供了具有设置在其上的导电层的衬底，并且导电层具有具有暴露表面的氧化物层。 氧化物层的暴露表面接触有机表面活性化合物在有机溶剂中的溶液，以在氧化物层上形成有机表面活性化合物的保护层。 根据表面活性化合物的化学结构，保护层的厚度为约0.5nm至约5nm，并且其范围。
-
2.发明授权Forming an electrode having reduced corrosion and water decomposition on surface using an organic protective layer 失效使用有机保护层形成表面上具有降低的腐蚀和水分解的电极公开(公告)号：US08354336B2
公开(公告)日：2013-01-15
申请号：US12820543
申请日：2010-06-22
申请人： Ali Afzali-Ardakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Binquan Luan , Glenn J. Martyna , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
发明人： Ali Afzali-Ardakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Binquan Luan , Glenn J. Martyna , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
IPC分类号： H01L21/28 , H01L21/3205
CPC分类号： B82Y10/00 , H01L21/76834 , H01L29/0665 , H01L51/0093 , H01L51/0504 , H01L51/102
摘要： Accordingly, the present invention provides a method of forming an electrode having reduced corrosion and water decomposition on a surface thereof. A substrate which has a conductive layer disposed thereon is provided and the conductive layer has an oxide layer with an exposed surface. The exposed surface of the oxide layer contacts a solution of an organic surface active compound in an organic solvent to form a protective layer of the organic surface active compound over the oxide layer. The protective layer has a thickness of from about 0.5 nm to about 5 nm and ranges therebetween depending on a chemical structure of the surface active compound.
摘要翻译： 因此，本发明提供一种在其表面上形成具有降低的腐蚀和水分解的电极的方法。 提供了具有设置在其上的导电层的衬底，并且导电层具有具有暴露表面的氧化物层。 氧化物层的暴露表面接触有机表面活性化合物在有机溶剂中的溶液，以在氧化物层上形成有机表面活性化合物的保护层。 根据表面活性化合物的化学结构，保护层的厚度为约0.5nm至约5nm，并且其范围。
-
3.发明申请REDUCING CORROSION AND WATER DECOMPOSITION ON A SURFACE OF A TITANIUM NITRIDE ELECTRODE 审中-公开降低硝酸钛电极表面的腐蚀和水分解公开(公告)号：US20110308969A1
公开(公告)日：2011-12-22
申请号：US12820574
申请日：2010-06-22
申请人： Ali Afzali-Azdakani , Shafaat Ahmed , Hariklia Deligianni , Stefan Harrer , Binquan Luan , Glenn J. Martyna , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
发明人： Ali Afzali-Azdakani , Shafaat Ahmed , Hariklia Deligianni , Stefan Harrer , Binquan Luan , Glenn J. Martyna , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
IPC分类号： G01N17/04
CPC分类号： G01N17/04
摘要： The present invention provides a method of reducing corrosion and water decomposition on a surface of an electrode having a titanium nitride conductive layer disposed on a substrate and estimating extent of reduction thereof. The electrode is immersed into a solution containing a hydroxyl-functional compound. Thereafter, a voltage is applied to the titanium nitride conductive layer of the electrode. The extent of oxidation of the titanium nitride conductive layer is correlated with the extent of formation of oxide of titanium nitride and/or the extent of oxidation of the titanium nitride conductive layer is correlated with the increase of surface roughness. The extent of water decomposition is correlated with formation of hydrogen and oxygen bubbles.
摘要翻译： 本发明提供了在具有设置在基板上的具有氮化钛导电层的电极的表面上减少腐蚀和水分解的方法，并且估计其还原程度。 将电极浸入含有羟基官能化合物的溶液中。 然后，向电极的氮化钛导电层施加电压。 氮化钛导电层的氧化程度与氮化钛的氧化物的形成程度和/或氮化钛导电层的氧化程度与表面粗糙度的增加有关。 水分解的程度与氢气和氧气泡的形成有关。
-
4.发明授权Forming an electrode having reduced corrosion and water decomposition on surface using a custom oxide layer 失效使用定制的氧化物层形成表面上具有降低的腐蚀和水分解的电极公开(公告)号：US08598018B2
公开(公告)日：2013-12-03
申请号：US12820487
申请日：2010-06-22
申请人： Ali Afzali-Azdakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
发明人： Ali Afzali-Azdakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
IPC分类号： H01L21/20 , H01L21/36 , H01L21/283
CPC分类号： C23C8/02 , C23C8/36 , C23C14/5853 , G01N33/48721
摘要： The present invention provides a method of forming an electrode having reduced corrosion and water decomposition on a surface thereof. A conductive layer is deposited on a substrate. The conductive layer is partially oxidized by an oxygen plasma process to convert a portion thereof to an oxide layer thereby forming the electrode. The oxide layer is free of surface defects and the thickness of the oxide layer is from about 0.09 nm to about 10 nm and ranges therebetween, controllable with 0.2 nm precision.
摘要翻译： 本发明提供一种在其表面上形成具有降低的腐蚀和水分解的电极的方法。 导电层沉积在基底上。 导电层被氧等离子体工艺部分地氧化，将其一部分转化成氧化层，从而形成电极。 氧化物层没有表面缺陷，氧化物层的厚度为约0.09nm至约10nm，并且其间的范围可以0.2nm精度控制。
-
5.发明申请FORMING AN ELECTRODE HAVING REDUCED CORROSION AND WATER DECOMPOSITION ON SURFACE USING A CUSTOM OXIDE LAYER 失效使用自定义氧化层形成具有降低腐蚀性和表面水分解的电极公开(公告)号：US20110312164A1
公开(公告)日：2011-12-22
申请号：US12820487
申请日：2010-06-22
申请人： Ali Afzali-Azdakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
发明人： Ali Afzali-Azdakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
IPC分类号： H01L21/20 , H01L21/36 , C23C14/34 , G03F7/20 , C30B23/02 , C30B25/02 , C23C28/00 , B05D3/06 , C23C14/08
CPC分类号： C23C8/02 , C23C8/36 , C23C14/5853 , G01N33/48721
摘要： The present invention provides a method of forming an electrode having reduced corrosion and water decomposition on a surface thereof. A conductive layer is deposited on a substrate. The conductive layer is partially oxidized by an oxygen plasma process to convert a portion thereof to an oxide layer thereby forming the electrode. The oxide layer is free of surface defects and the thickness of the oxide layer is from about 0.09 nm to about 10 nm and ranges therebetween, controllable with 0.2 nm precision.
摘要翻译： 本发明提供一种在其表面上形成具有降低的腐蚀和水分解的电极的方法。 导电层沉积在基底上。 导电层被氧等离子体工艺部分地氧化，将其一部分转化成氧化层，从而形成电极。 氧化物层没有表面缺陷，氧化物层的厚度为约0.09nm至约10nm，并且其间的范围可以0.2nm精度控制。
-
公开(公告)号：US08940149B2
公开(公告)日：2015-01-27
申请号：US13604060
申请日：2012-09-05
申请人： Shafaat Ahmed , Hariklia Deligianni
发明人： Shafaat Ahmed , Hariklia Deligianni
摘要： Solutions and processes for electrodepositing gallium or gallium alloys includes a plating bath free of complexing agents including a gallium salt, an indium salt, a combination thereof, and a combination of any of the preceding salts with copper, an acid, and a solvent, wherein the pH of the solution is in a range selected from the group consisting of from about zero to about 2.6 and greater than about 12.6 to about 14. An optional metalloid may be included in the solution.
摘要翻译： 用于电镀镓或镓合金的溶液和方法包括不含络合剂的镀浴，所述配合剂包括镓盐，铟盐，其组合以及任何前述盐与铜，酸和溶剂的组合，其中 溶液的pH在选自约0至约2.6且大于约12.6至约14的范围内。溶液中可包含任选的准金属。
-
公开(公告)号：US20120055801A1
公开(公告)日：2012-03-08
申请号：US12874504
申请日：2010-09-02
申请人： Shafaat Ahmed , Hariklia Deligianni
发明人： Shafaat Ahmed , Hariklia Deligianni
IPC分类号： C25D3/54
摘要： Solutions and processes for electrodepositing gallium or gallium alloys includes a plating bath free of complexing agents including a gallium salt, an indium salt, a combination thereof, and a combination of any of the preceding salts with copper, an acid, and a solvent, wherein the pH of the solution is in a range selected from the group consisting of from about zero to about 2.6 and greater than about 12.6 to about 14. An optional metalloid may be included in the solution.
摘要翻译： 用于电镀镓或镓合金的溶液和方法包括不含络合剂的镀浴，所述配合剂包括镓盐，铟盐，其组合以及任何前述盐与铜，酸和溶剂的组合，其中 溶液的pH在选自约0至约2.6且大于约12.6至约14的范围内。溶液中可包含任选的准金属。
-
公开(公告)号：US08871560B2
公开(公告)日：2014-10-28
申请号：US13571048
申请日：2012-08-09
IPC分类号： H01L31/032 , H01L31/0749
CPC分类号： H01L31/0326 , H01L31/1864 , Y02E10/50 , Y02P70/521
摘要： Embodiments relate to a method for annealing a solar cell structure including forming an absorber layer on a molybdenum (Mo) layer of a solar cell base structure. The solar cell base structure includes a substrate and the Mo layer is located on the substrate. The absorber layer includes a semiconductor chalcogenide material. Annealing the solar cell base structure is performed by exposing an outer layer of the solar cell base structure to a plasma.
摘要翻译： 实施例涉及一种用于退火太阳能电池结构的方法，包括在太阳能电池基底结构的钼（Mo）层上形成吸收层。 太阳能电池基体结构包括衬底，Mo层位于衬底上。 吸收层包括半导体硫族化物材料。 通过将太阳能电池基底结构的外层暴露于等离子体来进行太阳能电池基体结构的退火。
-
公开(公告)号：US08840770B2
公开(公告)日：2014-09-23
申请号：US12878811
申请日：2010-09-09
申请人： Shafaat Ahmed , Hariklia Deligianni
发明人： Shafaat Ahmed , Hariklia Deligianni
IPC分类号： C25D3/02 , H01L31/0272 , C25D5/50 , C25D3/54 , C25D3/56 , H01L31/032 , C25D9/04
CPC分类号： C25D9/04 , C25D3/54 , C25D3/56 , C25D5/50 , C25D7/12 , H01L31/0272 , H01L31/0322 , Y02E10/541
摘要： Techniques for electrodepositing selenium (Se)-containing films are provided. In one aspect, a method of preparing a Se electroplating solution is provided. The method includes the following steps. The solution is formed from a mixture of selenium oxide; an acid selected from the group consisting of alkane sulfonic acid, alkene sulfonic acid, aryl sulfonic acid, heterocyclic sulfonic acid, aromatic sulfonic acid and perchloric acid; and a solvent. A pH of the solution is then adjusted to from about 2.0 to about 3.0. The pH of the solution can be adjusted to from about 2.0 to about 3.0 by adding a base (e.g., sodium hydroxide) to the solution. A Se electroplating solution, an electroplating method and a method for fabricating a photovoltaic device are also provided.
摘要翻译： 提供了用于电沉积含硒（Se）的膜的技术。 一方面，提供了一种制备Se电镀溶液的方法。 该方法包括以下步骤。 溶液由氧化硒的混合物形成; 选自烷烃磺酸，烯烃磺酸，芳基磺酸，杂环磺酸，芳族磺酸和高氯酸的酸; 和溶剂。 然后将溶液的pH调节至约2.0至约3.0。 通过向溶液中加入碱（例如氢氧化钠），可将溶液的pH调节至约2.0至约3.0。 还提供了Se电镀溶液，电镀方法和制造光伏器件的方法。
-
公开(公告)号：US08545689B2
公开(公告)日：2013-10-01
申请号：US12874504
申请日：2010-09-02
申请人： Shafaat Ahmed , Hariklia Deligianni
发明人： Shafaat Ahmed , Hariklia Deligianni
摘要： Solutions and processes for electrodepositing gallium or gallium alloys includes a plating bath free of complexing agents including a gallium salt, an indium salt, a combination thereof, and a combination of any of the preceding salts with copper, an acid, and a solvent, wherein the pH of the solution is in a range selected from the group consisting of from about zero to about 2.6 and greater than about 12.6 to about 14. An optional metalloid may be included in the solution.
-
-
-
-
-
-
-
-
-
搜索结果
25 条记录 (耗时 0.036 秒)