RECORDING/REPRODUCTION DEVICE
    4.
    发明申请
    RECORDING/REPRODUCTION DEVICE 审中-公开
    记录/复制设备

    公开(公告)号:US20100286989A1

    公开(公告)日:2010-11-11

    申请号:US12810947

    申请日:2008-12-05

    IPC分类号: G06F17/00 G10L21/00

    摘要: An audio data processor (120) performs a decoding process and a compression (encoding) process with respect to audio data in units of frames each containing a predetermined number of samples. The resultant encoded data is temporarily accumulated in an encoded data buffer (110). A song boundary detector (106) detects a frame boundary which should be used as a song boundary based on song position information corresponding to the audio data and feature information output from a feature extraction signal processor (107). A frame boundary divider (111) modifies the encoded data accumulated in the encoded data buffer so that a frame boundary of the encoded data matches the detected frame boundary.

    摘要翻译: 音频数据处理器(120)以包含预定数量样本的帧为单位执行关于音频数据的解码处理和压缩(编码)处理。 所得到的编码数据被临时累积在编码数据缓冲器(110)中。 歌曲边界检测器(106)基于与特征提取信号处理器(107)输出的音频数据和特征信息相对应的歌曲位置信息来检测应当被用作歌曲边界的帧边界。 帧边界分频器(111)修改在编码数据缓冲器中累积的编码数据,使得编码数据的帧边界与检测到的帧边界匹配。

    Polishing composition and polishing method using the same
    5.
    发明授权
    Polishing composition and polishing method using the same 有权
    抛光组合物和抛光方法使用相同

    公开(公告)号:US07481950B2

    公开(公告)日:2009-01-27

    申请号:US10673779

    申请日:2003-09-29

    IPC分类号: C09K5/00

    摘要: A polishing composition of the present invention, which is used in precision polishing the surface of a wafer for semiconductor devices, remarkably reduces haze that occurs on the surface of the wafer. The polishing composition includes silicon dioxide, an alkaline compound, a water-soluble polymer, and water. The silicon dioxide is colloidal silica or fumed silica. The average primary particle diameter DSA of the colloidal silica is from 5 to 30 nm, and the average secondary particle diameter DN4 of the colloidal silica is from 5 to 120 nm. The average primary particle diameter DSA of the fumed silica is from 5 to 30 nm, and the average secondary particle diameter DN4 of the fumed silica is from 5 to 200 nm.

    摘要翻译: 用于精密抛光半导体器件的晶片表面的本发明的抛光组合物显着地减少了晶片表面发生的雾度。 抛光组合物包括二氧化硅,碱性化合物,水溶性聚合物和水。 二氧化硅是胶体二氧化硅或热解二氧化硅。 胶体二氧化硅的平均一次粒径DSA为5〜30nm,胶体二氧化硅的平均二次粒径DN4为5〜120nm。 热解二氧化硅的平均一次粒径DSA为5〜30nm,热解法二氧化硅的平均二次粒径DN4为5〜200nm。

    Testing method and testing apparatus for liquid crystal panel
    6.
    发明授权
    Testing method and testing apparatus for liquid crystal panel 有权
    液晶面板测试方法和测试仪器

    公开(公告)号:US07307444B2

    公开(公告)日:2007-12-11

    申请号:US11190029

    申请日:2005-07-26

    IPC分类号: G01R31/00

    摘要: The present invention provides a technique enabling the amount of time required to evaluate the light fastness of a liquid crystal panel to be shortened. A method of testing the light fastness of a liquid crystal panel comprising a pair of substrates and a liquid crystal layer interposed between the substrates comprises the steps of: irradiating a test subject area of the liquid crystal panel with a laser beam, with at least one of the wavelength, the irradiation energy, and the irradiation duration of the laser beam set as a variable parameter; irradiating the liquid crystal panel with an observation beam and detecting the condition of the observation beam after passing through the liquid crystal panel; and evaluating the light fastness of the liquid crystal panel on the basis of a difference in the condition of the observation beam corresponding to the setting of the variable parameter of the laser beam.

    摘要翻译: 本发明提供了能够缩短液晶面板的耐光性评价所需的时间的技术。 一种测试包括一对基板和介于基板之间的液晶层的液晶面板的耐光性的方法包括以下步骤:用激光束照射液晶面板的测试对象区域,至少一个 的波长,照射能量和激光束的照射持续时间设置为可变参数; 用观察光束照射液晶面板,并检测通过液晶面板后的观察光束的状态; 并根据与激光束的可变参数的设定对应的观察光束的条件差来评价液晶面板的耐光性。

    Polishing composition and polishing method
    7.
    发明申请
    Polishing composition and polishing method 失效
    抛光组合物和抛光方法

    公开(公告)号:US20070181851A1

    公开(公告)日:2007-08-09

    申请号:US11701640

    申请日:2007-02-02

    申请人: Shuhei Yamada

    发明人: Shuhei Yamada

    CPC分类号: C09G1/04

    摘要: The polishing composition contains polyoxyethylene sorbitan mono-fatty acid ester, silicon dioxide, water soluble cellulose, an alkaline compound, and water. The content of polyoxyethylene sorbitan mono-fatty acid ester in the polishing composition is less than 0.0025% by mass. The polishing composition is appropriate for final polishing of silicon wafers.

    摘要翻译: 抛光组合物含有聚氧乙烯脱水山梨糖醇单脂肪酸酯,二氧化硅,水溶性纤维素,碱性化合物和水。 聚氧乙烯脱水山梨醇单脂肪酸酯在抛光组合物中的含量小于0.0025质量%。 抛光组合物适用于硅晶片的最终抛光。

    Light source unit and projector
    8.
    发明授权
    Light source unit and projector 有权
    光源单元和投影机

    公开(公告)号:US07108400B2

    公开(公告)日:2006-09-19

    申请号:US10935318

    申请日:2004-09-08

    IPC分类号: F21V29/00

    摘要: A light source unit is provided that is adapted for efficient cooling and for illumination of high luminance, and a projector including the same. A light source unit including a solid-state light source and a lens further includes a first fluid flowing in the vicinity of the solid-state light source thereby absorbing heat generated from the solid-state light source, and a second fluid flowing in the vicinity of the first fluid thereby absorbing the heat contained in the first fluid.

    摘要翻译: 提供适于高效冷却和高亮度照明的光源单元,以及包括该光源单元的投影仪。 包括固态光源和透镜的光源单元还包括在固态光源附近流动的第一流体,从而吸收从固态光源产生的热量和在附近流动的第二流体 从而吸收第一流体中所含的热量。

    Testing method and testing apparatus for liquid crystal panel
    9.
    发明申请
    Testing method and testing apparatus for liquid crystal panel 有权
    液晶面板测试方法和测试仪器

    公开(公告)号:US20060055931A1

    公开(公告)日:2006-03-16

    申请号:US11190029

    申请日:2005-07-26

    IPC分类号: G01N21/00

    摘要: The present invention provides a technique enabling the amount of time required to evaluate the light fastness of a liquid crystal panel to be shortened. A method of testing the light fastness of a liquid crystal panel comprising a pair of substrates and a liquid crystal layer interposed between the substrates comprises the steps of: irradiating a test subject area of the liquid crystal panel with a laser beam, with at least one of the wavelength, the irradiation energy, and the irradiation duration of the laser beam set as a variable parameter; irradiating the liquid crystal panel with an observation beam and detecting the condition of the observation beam after passing through the liquid crystal panel; and evaluating the light fastness of the liquid crystal panel on the basis of a difference in the condition of the observation beam corresponding to the setting of the variable parameter of the laser beam.

    摘要翻译: 本发明提供了能够缩短液晶面板的耐光性评价所需的时间的技术。 一种测试包括一对基板和介于基板之间的液晶层的液晶面板的耐光性的方法包括以下步骤:用激光束照射液晶面板的测试对象区域,至少一个 的波长,照射能量和激光束的照射持续时间设置为可变参数; 用观察光束照射液晶面板,并检测通过液晶面板后的观察光束的状态; 并根据与激光束的可变参数的设定对应的观察光束的条件差来评价液晶面板的耐光性。

    Polishing composition
    10.
    发明申请
    Polishing composition 有权
    抛光组成

    公开(公告)号:US20050054203A1

    公开(公告)日:2005-03-10

    申请号:US10934670

    申请日:2004-09-03

    申请人: Shuhei Yamada

    发明人: Shuhei Yamada

    CPC分类号: C09G1/02 H01L21/30625

    摘要: The present invention relates to a polishing composition that can be preferably used to polish a silicon wafer. The polishing composition includes a block polyether represented by the chemical formula HO-(EO)a—(PO)b-(EO)c—H, wherein EO represents an oxyethylene group, PO represents an oxypropylene group, each of a and c represents the polymerization degree of ethylene oxide, b represents the polymerization degree of propylene oxide, and each of a, b, and c is an integer of 1 or greater; silicon dioxide; a basic compound; at least either one of hydroxyethyl cellulose and polyvinyl alcohol; and water.

    摘要翻译: 本发明涉及一种可优选用于抛光硅晶片的抛光组合物。 抛光组合物包括由化学式HO-(EO)a-(PO)b-(EO)cH表示的嵌段聚醚,其中EO表示氧化乙烯基,PO表示氧化亚丙基,a和c各自表示聚合 环氧乙烷的程度,b表示环氧丙烷的聚合度,a,b和c各自为1以上的整数, 二氧化硅; 一个基本的化合物; 羟乙基纤维素和聚乙烯醇中的至少一种; 和水。