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    Charged Particle Inspection Method and Charged Particle System
    8.
    发明申请
    Charged Particle Inspection Method and Charged Particle System 审中-公开
    带电粒子检测方法和带电粒子系统

    公开(公告)号：US20090256075A1

    公开(公告)日：2009-10-15

    申请号：US11991547

    申请日：2006-09-06

    申请人： Thomas Kemen ,  Rainer Knippelmeyer ,  Stefan Schubert

    发明人： Thomas Kemen ,  Rainer Knippelmeyer ,  Stefan Schubert

    IPC分类号： G01N23/00 ,  G01K1/08

    CPC分类号： H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

    摘要： The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

    摘要翻译： 带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔 板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心 的第二多孔板的孔径。 本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数目的带电粒子子束对物体进行检查的带电粒子检查方法。

    Particle-optical apparatus and method for operating the same
    10.
    发明授权
    Particle-optical apparatus and method for operating the same 失效
    粒子光学装置及其操作方法

    公开(公告)号：US06891168B2

    公开(公告)日：2005-05-10

    申请号：US10639741

    申请日：2003-08-13

    申请人： Rainer Knippelmeyer

    发明人： Rainer Knippelmeyer

    IPC分类号： H01J37/12 ,  G21K1/08 ,  H01J37/14 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28 ,  H01J37/305

    CPC分类号： H01J37/141 ,  G21K1/08 ,  H01J37/12 ,  H01J37/14 ,  H01J37/1475 ,  H01J37/1477 ,  H01J2237/121 ,  H01J2237/1504

    摘要： An apparatus and a method to manipulate at least one beam of charged particles are provided. The apparatus comprises two rows of field source members 13 which are disposed periodically at a distance from each other such that there exist planes of symmetry S, S′ with respect to which the field source members 13 are symmetrically disposed. The field has a component which is displaceable in the x-direction. To provide such field, a pattern of source strengths according to the formula F1(x)=Fm(x)+Fc(x) is applied to the field source members, wherein Fm is a component which is substantially independent of the displacement x0 and Fc is a correction component which is dependent on x0.

    摘要翻译： 提供了一种操纵至少一个带电粒子束的装置和方法。 该装置包括两排场源元件13，它们周期性地彼此间隔设置，使得存在对称S，S'的平面，场源元件13对称地设置对准面。 该场具有可在x方向上移位的分量。 为了提供这样的场，根据公式F 1（x）= F m（x）+ F c（x） x）被施加到场源成员，其中F m是基本上独立于位移x 0和F C 1的分量 取决于x <0>的校正分量。