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    Process chamber having multiple gas distributors and method
    1.
    发明授权
    Process chamber having multiple gas distributors and method 失效
    具有多个气体分配器和方法的处理室

    公开(公告)号：US06676760B2

    公开(公告)日：2004-01-13

    申请号：US09930938

    申请日：2001-08-16

    申请人： Arnold V. Kholodenko ,  Dan Katz ,  Wing L. Cheng

    发明人： Arnold V. Kholodenko ,  Dan Katz ,  Wing L. Cheng

    IPC分类号： C23C1600

    CPC分类号： C23C16/45519 ,  C23C16/455

    摘要： A substrate processing chamber has a substrate support to support a substrate, and an exhaust conduit about the substrate support. A first process gas distributor directs a first process gas, such as a non-reactive gas, about the substrate perimeter and toward the exhaust conduit at a first flow rate to form a curtain of non-reactive gas about the substrate. A second process gas distributor directs a second process gas, such as reactive CVD or etchant gas, toward a central portion of the substrate at a second flow rate which is lower than the first flow rate. A gas energizer energizes the first and second process gases in the chamber. A controller operates the substrate support, gas flow meters, gas energizer, and throttle valve, to process the substrate in the energized gas.

    摘要翻译： 基板处理室具有用于支撑基板的基板支撑件和围绕基板支撑件的排气导管。 第一工艺气体分配器以第一流量引导诸如非反应性气体的第一工艺气体，例如基板周边和朝向排气管道，以在衬底周围形成非反应性气体帘幕。 第二工艺气体分配器以比第一流量低的第二流量向衬底的中心部分引导第二工艺气体，例如反应性CVD或蚀刻剂气体。 气体激发器激励腔室中的第一和第二处理气体。 控制器操作衬底支撑件，气体流量计，气体激励器和节流阀，以处理通电气体中的衬底。

    Multimodal Ultrasound Training System
    3.
    发明申请
    Multimodal Ultrasound Training System 有权
    多模式超声训练系统

    公开(公告)号：US20120237913A1

    公开(公告)日：2012-09-20

    申请号：US13481712

    申请日：2012-05-25

    申请人： Eric Savitsky ,  Dan Katz ,  Gabriele Nataneli ,  Kresimir Petrinec

    发明人： Eric Savitsky ,  Dan Katz ,  Gabriele Nataneli ,  Kresimir Petrinec

    IPC分类号： G09B23/28

    CPC分类号： G09B23/286 ,  A61B8/4427 ,  A61B8/58

    摘要： An ultrasound training system having a data capture module, a digital asset management module, a validation module, didactic content, a media asset production module, an integration layer, an internet-based portal, a software client, and a peripheral probe. The combination of the disclosed elements creates a system that enables the creation and delivery of high-quality ultrasound education and training in a low-cost, widely deployable, and scalable manner, with a facilitated method for processing orders and financial transactions between customers and content providers.

    摘要翻译： 具有数据采集模块，数字资产管理模块，验证模块，教学内容，媒体资产生产模块，集成层，基于因特网的门户，软件客户端和外围探针的超声训练系统。 所公开的元素的组合创建了一种能够以低成本，广泛部署和可扩展的方式创建和提供高质量的超声波教育和培训的系统，其中用于处理客户和内容之间的订单和金融交易的便利方法 提供者

    PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD GAS DISTRIBUTION SHOWERHEAD
    6.
    发明申请
    PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD GAS DISTRIBUTION SHOWERHEAD 审中-公开
    具有超导电感天线和超高压气体分布的等离子体反应器

    公开(公告)号：US20080236490A1

    公开(公告)日：2008-10-02

    申请号：US11693089

    申请日：2007-03-29

    申请人： ALEXANDER PATERSON ,  Valentin N. Todorow ,  Theodoros Panagopoulos ,  Brian K. Hatcher ,  Dan Katz ,  Edward P. Hammond ,  John P. Holland

    发明人： ALEXANDER PATERSON ,  Valentin N. Todorow ,  Theodoros Panagopoulos ,  Brian K. Hatcher ,  Dan Katz ,  Edward P. Hammond ,  John P. Holland

    IPC分类号： C23C16/00

    CPC分类号： H01J37/3244 ,  H01J37/32091 ,  H01J37/321

    摘要： A plasma reactor for processing a workpiece includes a gas distribution showerhead having a lid, a manifold having a top surface facing the lid and a bottom surface opposing the top surface. Top surface channels in the manifold top surface form a first set of plural paths extending from a first gas input point to plural path ends of the top surface channels. Gas distribution orifices extend axially through the manifold at respective ones of the path ends. Bottom surface channels in the manifold bottom surface form plural paths extending from locations at each of the gas distribution orifices to plural gas distribution path ends. The showerhead further includes a showerhead piece facing the manifold bottom surface and having plural gas injection orifices extending through the showerhead piece.

    摘要翻译： 用于加工工件的等离子体反应器包括具有盖的气体分配喷头，具有面向盖的顶表面的歧管和与顶表面相对的底表面。 歧管顶表面中的顶表面通道形成从第一气体输入点延伸到顶表面通道的多个路径端的多个路径的第一组。 气体分配孔在相应的路径端轴向延伸穿过歧管。 歧管底表面中的底表面通道形成从每个气体分配孔处的位置延伸到多个气体分配路径端部的多个路径。 淋浴头还包括面向歧管底面的喷头片，并具有延伸穿过喷头片的多个气体喷射孔。

    Gas distribution plate electrode for a plasma receptor
    9.
    发明授权
    Gas distribution plate electrode for a plasma receptor 有权
    用于等离子体受体的气体分布板电极

    公开(公告)号：US06677712B2

    公开(公告)日：2004-01-13

    申请号：US10442386

    申请日：2003-05-20

    申请人： Dan Katz ,  Douglas A. Buchberger, Jr. ,  Yan Ye ,  Robert B. Hagen ,  Xiaoye Zhao ,  Ananda H. Kumar ,  Kang-Lie Chiang ,  Hamid Noorbakhsh ,  Shiang-Bau Wang

    发明人： Dan Katz ,  Douglas A. Buchberger, Jr. ,  Yan Ye ,  Robert B. Hagen ,  Xiaoye Zhao ,  Ananda H. Kumar ,  Kang-Lie Chiang ,  Hamid Noorbakhsh ,  Shiang-Bau Wang

    IPC分类号： H01J724

    CPC分类号： H01J37/3244

    摘要： The invention is embodied in a plasma reactor for processing a semiconductor wafer, the reactor having a gas distribution plate including a front plate in the chamber and a back plate on an external side of the front plate, the gas distribution plate comprising a gas manifold adjacent the back plate, the back and front plates bonded together and forming an assembly. The assembly includes an array of holes through the front plate and communicating with the chamber, at least one gas flow-controlling orifice through the back plate and communicating between the manifold and at least one of the holes, the orifice having a diameter that determines gas flow rate to the at least one hole. In addition, an array of pucks is at least generally congruent with the array of holes and disposed within respective ones of the holes to define annular gas passages for gas flow through the front plate into the chamber, each of the annular gas passages being non-aligned with the orifice.

    摘要翻译： 本发明体现在用于处理半导体晶片的等离子体反应器中，该反应器具有气体分配板，该气体分配板包括在该腔室中的前板和在前板的外侧上的后板，该气体分配板包括邻近的气体歧管 背板，后板和前板结合在一起并形成组件。 组件包括穿过前板并与腔室连通的孔阵列，至少一个通过后板的气体流量控制孔，并在歧管和至少一个孔之间连通，孔口具有确定气体的直径 至少一个孔的流速。 此外，一组圆盘至少大体上与孔阵列一致，并且设置在孔的相应孔内，以限定用于气体流过前板进入腔室的环形气体通道，每个环形气体通道是非限制性的， 与孔对齐。

    Embedded motion sensing technology for integration within commercial ultrasound probes
    10.
    发明授权
    Embedded motion sensing technology for integration within commercial ultrasound probes 有权

    公开(公告)号：US11631342B1

    公开(公告)日：2023-04-18

    申请号：US17374795

    申请日：2021-07-13

    申请人： Eric Savitsky ,  Dan Katz ,  Gabriele Nataneli

    发明人： Eric Savitsky ,  Dan Katz ,  Gabriele Nataneli

    IPC分类号： G09B23/28 ,  A61B8/00

    摘要： An ultrasound system including an ultrasound machine and an ultrasound probe. The ultrasound probe includes an ultrasound transducer, ultrasound circuitry, a six degree of freedom (6-DOF) sensor, and a probe housing. The probe housing encases the ultrasound transducer and the 6-DOF sensor. By embedding motion-sensing technology directly within the housing of the ultrasound transducer, the position and orientation of the ultrasound probe can be tracked in an automated manner in relation to an indicator mark on the ultrasound screen. This allows assisting technologies to mitigate human error that arises from misalignment of the transducer indicator.