Disk scanning apparatus for batch ion implanters
    1.
    发明授权
    Disk scanning apparatus for batch ion implanters 失效
    批量离子注入机的磁盘扫描装置

    公开(公告)号:US4899059A

    公开(公告)日:1990-02-06

    申请号:US366202

    申请日:1989-06-09

    IPC分类号: H01J37/317 H01L21/673

    摘要: A mechanical scanning system for a batch ion implanter includes a disk for mounting wafers at sites near its periphery and a disk drive assembly for rotating the disk. The disk and the disk drive assembly are supported in an end station vacuum chamber by a scan arm which extends through a sealed opening in an access door. A scan drive assembly attached to the access door scans the scan arm and the disk in an arc-shaped path. Simultaneous rotation and scanning of the disk cause the ion beam to be distributed over the surfaces of the wafers mounted on the disk. A pivot drive assembly rotates the scan arm and the disk about a pivot axis between an implant position and a load/unload position. The implant angle can be changed without opening or venting the vacuum chamber by loosening the attachment of the scan drive assembly to the access door and rotating the scan drive assembly, the scan arm and the disk about the pivot axis. The access door can be moved on rails to an open position for access to the disk.

    摘要翻译: 用于批量离子注入机的机械扫描系统包括用于在其周边附近的位置安装晶片的盘和用于旋转盘的盘驱动组件。 磁盘和磁盘驱动器组件通过扫描臂支撑在端站真空室中,扫描臂延伸穿过进入门中的密封开口。 附接到检修门的扫描驱动组件以弧形路径扫描扫描臂和盘。 盘的同时旋转和扫描使得离子束分布在安装在盘上的晶片的表面上。 枢转驱动组件围绕植入位置和装载/卸载位置之间的枢轴旋转扫描臂和盘。 通过松开扫描驱动组件到访问门的附件并使扫描驱动组件,扫描臂和盘绕枢转轴线旋转,可以改变植入角度而不打开或排出真空室。 检修门可以在导轨上移动到打开位置,以便进入磁盘。

    Wafer retaining platen having peripheral clamp and wafer lifting means
    2.
    发明授权
    Wafer retaining platen having peripheral clamp and wafer lifting means 失效
    具有外围夹具和晶片提升装置的晶片固定压板

    公开(公告)号:US5350427A

    公开(公告)日:1994-09-27

    申请号:US76509

    申请日:1993-06-14

    摘要: An apparatus for releasably holding a workpiece in semiconductor process systems such as a batch ion implanter which comprises a linkage mechanism mounted onto the backside of the platen for clamping the wafer against the fence of the supporting means and pusher means mounted on wafer lift means for engagement with the lever mechanism for locking and unlocking the device, and sensing any misclamp of the workpiece.

    摘要翻译: 一种用于可释放地将工件保持在诸如间歇离子注入机的半导体工艺系统中的装置,其包括安装在压板的背面上的连杆机构,用于将晶片夹紧在支撑装置的挡板上,并且安装在晶片升降装置上的推动装置用于接合 具有用于锁定和解锁设备的杠杆机构,并感测工件的任何错误的夹紧。

    Disk scanning apparatus for batch ion implanters
    3.
    发明授权
    Disk scanning apparatus for batch ion implanters 失效
    批量离子注入机的磁盘扫描装置

    公开(公告)号:US4965862A

    公开(公告)日:1990-10-23

    申请号:US407855

    申请日:1989-09-15

    摘要: A mechanical scanning system for a batch ion implanter includes a disk for mounting wafers at sites near its periphery and a disk drive assembly for rotating the disk. The disk and the disk drive assembly are supported in an end station vacuum chamber by a scan arm which extends through a sealed opening in an access door. A scan drive assembly attached to the access door scans the scan arm and the disk in an arc-shaped path. Simultaneous rotation and scanning of the disk cause the ion beam to be distributed over the surfaces of the wafers mounted on the disk. A pivot drive assembly rotates the scan arm and the disk about a pivot axis between an implant position and a load/unload position. A bellows seals the scan arm to the vacuum chamber while tranmitting arc-shaped movement into the vacuum chamber. A bellows guide apparatus guides an intermediate portion of the bellows so as to limit lateral distortion caused by pressure differences applied to the bellows in combination with asymmetrical deflection thereof.

    摘要翻译: 用于批量离子注入机的机械扫描系统包括用于在其周边附近的位置安装晶片的盘和用于旋转盘的盘驱动组件。 磁盘和磁盘驱动器组件通过扫描臂支撑在端站真空室中,扫描臂延伸穿过进入门中的密封开口。 附接到检修门的扫描驱动组件以弧形路径扫描扫描臂和盘。 盘的同时旋转和扫描使得离子束分布在安装在盘上的晶片的表面上。 枢转驱动组件围绕植入位置和装载/卸载位置之间的枢轴旋转扫描臂和盘。 波纹管将扫描臂密封到真空室,同时使弧形运动进入真空室。 波纹管引导装置引导波纹管的中间部分,以便限制由施加到波纹管的压力差引起的横向变形与其不对称偏转的组合。

    Vacuum pick for semiconductor wafers
    4.
    发明授权
    Vacuum pick for semiconductor wafers 失效
    半导体晶圆真空吸盘

    公开(公告)号:US4620738A

    公开(公告)日:1986-11-04

    申请号:US766458

    申请日:1985-08-19

    CPC分类号: B65G47/91

    摘要: A vacuum pick suitable for removing semiconductor wafers from and replacing wafers in a cassette holder. The vacuum pick includes a thin profile housing having a wafer support surface with a cavity therein, a resilient, flexible member covering a portion of the cavity to form an enclosure, and a rigid chuck mounted on the flexible member so as to permit movement of the chuck relative to the housing. The chuck includes a wafer-receiving surface connected through a passage to the enclosure. When a vacuum is applied to the enclosure, the wafer and the chuck are retracted against the housing and held firmly in place. The chuck tilts relative to the housing when it contacts a tilted wafer, thereby insuring reliable attachment to the wafer.

    摘要翻译: 一种真空吸头,适用于从盒座中取出半导体晶片并替换晶片。 真空拾取器包括具有其中具有空腔的晶片支撑表面的薄型壳体,覆盖空腔的一部分以形成外壳的弹性柔性构件,以及安装在柔性构件上的刚性卡盘,以允许 卡盘相对于外壳。 卡盘包括通过通向外壳的通道连接的晶片接收表面。 当真空被施加到外壳时,晶片和卡盘被缩回抵靠壳体并且牢固地保持就位。 当卡盘接触倾斜的晶片时,卡盘相对于壳体倾斜,从而确保可靠地附接到晶片。

    PRE-ALIGNED NOZZLE/SKIMMER
    6.
    发明申请
    PRE-ALIGNED NOZZLE/SKIMMER 审中-公开
    预对准喷嘴/ SKIMMER

    公开(公告)号:US20100243913A1

    公开(公告)日:2010-09-30

    申请号:US12415883

    申请日:2009-03-31

    IPC分类号: H01J27/00 G21K1/00 A61N5/00

    摘要: The pre-aligned nozzle/skimmer module includes an internal pre-aligned nozzle assembly and internal pre-aligned skimmer cartridge assembly to more accurately control the formation of the Gas Cluster Ion Beam (GCIB). The nozzle/skimmer module can be pre-aligned to more accurately position the GCIB. The pre-aligned nozzle/skimmer module more accurately controls the formation of the gas clusters of a pre-aligned Gas Cluster Ion Beam (GCIB).

    摘要翻译: 预对准喷嘴/分离器模块包括内部预对准喷嘴组件和内部预对准撇渣器组件,以更精确地控制气体聚簇离子束(GCIB)的形成。 喷嘴/撇渣器模块可以进行预对准,以更精确地定位GCIB。 预对齐喷嘴/分离器模块更精确地控制预对准气体簇离子束(GCIB)的气体簇的形成。

    METHOD AND APPARATUS FOR SCANNING A WORKPIECE THROUGH AN ION BEAM
    8.
    发明申请
    METHOD AND APPARATUS FOR SCANNING A WORKPIECE THROUGH AN ION BEAM 有权
    通过离子束扫描工件的方法和装置

    公开(公告)号:US20070262267A1

    公开(公告)日:2007-11-15

    申请号:US11565267

    申请日:2006-11-30

    IPC分类号: G05G21/00

    摘要: A method and apparatus 300 for better controlling scanning of a workpiece 330 through an ion beam path 306 provide for mounting a workpiece 330 on an elongated member, partially repetitively rotating the elongated member 500 around a point of rotation 368 to make repetitive scans of the workpiece 330 along and arcuate path 504 and bending the elongated member 500 at a joint 322 to move the one and out of the ion beam path 306 to facilitate attachment and removal of individual workpieces 330. A motor 315 used for the rotating may be suspended within a partial vacuum enclosure 304 against gravity for raising and lowering the elongated member and 500 a workpiece 306 for linear vertical scanning.

    摘要翻译: 用于更好地控制通过离子束路径306的工件330的扫描的方法和装置300提供将工件330安装在细长构件上,部分地重复地使细长构件500围绕旋转点368旋转以对工件进行重复扫描 330和弓形路径504,并且在接头322处将细长构件500弯曲以将离子束路径306中的一个移出并离开离子束路径306,以便于各个工件330的附接和移除。用于旋转的马达315可以悬挂在 部分真空外壳304反对用于升高和降低细长构件的重力,以及500个用于线性垂直扫描的工件306。

    Multiple nozzle gas cluster ion beam system
    9.
    发明授权
    Multiple nozzle gas cluster ion beam system 有权
    多喷嘴气体簇离子束系统

    公开(公告)号:US08981322B2

    公开(公告)日:2015-03-17

    申请号:US12428945

    申请日:2009-04-23

    IPC分类号: G21K5/04 H01J37/08 H01J37/317

    摘要: Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of operation to grow, modify, deposit, or dope a layer upon a substrate. The multiple nozzle and skimmer assembly includes at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted therefrom into a single gas cluster beam and/or angled to converge each beam toward a single intersecting point to form a set of intersecting gas cluster beams, and to direct the single and/or intersecting gas cluster beam into a gas skimmer.

    摘要翻译: 公开了一种用于在气体簇离子束(GCIB)系统中引入过程气体混合物或多种工艺气体混合物的多喷嘴和撇渣器组件,以及相关的操作方法,用于生长,修饰,沉积或掺杂层 底物。 多个喷嘴和撇浮器组件包括至少两个彼此非常接近地布置的喷嘴,其至少部分地将从其发射的气体束束至少部分地聚结成单个气体束束和/或成角度以将每个射束朝着单个交叉点收敛以形成一组 的交叉气体束束,并将单个和/或相交的气体束束引导到气体分离器中。

    Scanner for GCIB system
    10.
    发明授权
    Scanner for GCIB system 有权
    GCIB系统扫描仪

    公开(公告)号:US08791430B2

    公开(公告)日:2014-07-29

    申请号:US13411329

    申请日:2012-03-02

    IPC分类号: B01J19/12

    摘要: Disclosed are an apparatus, system, and method for scanning a substrate or other workpiece through a gas-cluster ion beam (GCIB), or any other type of ion beam. The workpiece scanning apparatus is configured to receive and hold a substrate for irradiation by the GCIB and to scan it through the GCIB in two directions using two movements: a reciprocating fast-scan movement, and a slow-scan movement. The slow-scan movement is actuated using a servo motor and a belt drive system, the belt drive system being configured to reduce the failure rate of the workpiece scanning apparatus.

    摘要翻译: 公开了一种用于通过气体簇离子束(GCIB)或任何其它类型的离子束扫描衬底或其它工件的装置,系统和方法。 工件扫描装置被配置为接收和保持用于GCIB照射的基板,并且通过两次运动通过GCIB在两个方向上进行扫描:往复式快速扫描运动和慢扫描运动。 使用伺服电动机和皮带驱动系统来驱动缓慢扫描运动,所述皮带驱动系统被配置为降低工件扫描装置的故障率。