Near-infrared light emitting diodes and detectors employing CdSnP{HD 2{B :InP heterodiodes
    1.
    发明授权
    Near-infrared light emitting diodes and detectors employing CdSnP{HD 2{B :InP heterodiodes 失效
    使用CdSnP {HD 2 {B:InP异二极管)的近红外发光二极管和检测器

    公开(公告)号:US3913212A

    公开(公告)日:1975-10-21

    申请号:US38202173

    申请日:1973-07-23

    Abstract: There are disclosed diodes for detection and diodes for emission of near-infrared radiation. Such a diode employs an epitaxial layer of n-type cadmium tin phosphide grown on a p-type InP substrate, which is the light-transmitting window of the device. Also diclosed is a tipping technique of epitaxial growth in which the conditions of the substrate crystal and the tin-rich melt are controlled to obtain high quality heterojunctions. A mixture of tin, phosphorus, and cadmium is prepared in a separate saturation procedure to minimize substrate degradation during epitaxial growth. The indium phosphide substrates are high quality and ptype with predominantly cadmium or zinc doping. In some diodes the CdSnP2 epitaxial layers contain some indium traceable to dissolution of the indium phosphide substrate by the tin solution prior to nucleation and growth of the epitaxial layer. Later diodes grown from solutions containing controlled amounts of indium intentionally added to the presaturated melt, efficiently emitted infrared light near 1.0 Mu .

    Abstract translation: 公开了用于检测的二极管和用于发射近红外辐射的二极管。 这种二极管采用在作为器件的透光窗口的p型InP衬底上生长的n型镉锡磷化物的外延层。 另外还是外延生长的倾覆技术,其中基体晶体和富含锡的熔体的条件被控制以获得高质量的异质结。 在独立的饱和程序中制备锡,磷和镉的混合物,以使外延生长过程中的底物降解最小化。 磷化铟基底是高质量的,p型主要是镉或锌掺杂。

    Near-infrared light emitting diodes and detectors employing CdSnP{HD 2{B :InP heterodiodes
    2.
    发明授权
    Near-infrared light emitting diodes and detectors employing CdSnP{HD 2{B :InP heterodiodes 失效
    使用CdSnP {HD 2 {B:InP异二极管)的近红外发光二极管和检测器

    公开(公告)号:US3922553A

    公开(公告)日:1975-11-25

    申请号:US49917274

    申请日:1974-08-21

    Abstract: There are disclosed diodes for detection and diodes for emission of near-infrared radiation. Such a diode employs an epitaxial layer of n-type cadmium tin phosphide grown on a p-type InP substrate, which is the light-transmitting window of the device. Also disclosed is a tipping technique of epitaxial growth in which the conditions of the substrate crystal and the tin-rich melt are controlled to obtain high quality heterojunctions. A mixture of tin, phosphorus, and cadmium is prepared in a separate saturation procedure to minimize substrate degradation during epitaxial growth. The indium phosphide substrates are high quality and p-type with predominantly cadmium or zinc doping. In some diodes the CdSnP2 epitaxial layers contain some indium traceable to dissolution of the indium phosphide substrate by the tin solution prior to nucleation and growth of the epitaxial layer. Later diodes grown from solutions containing controlled amounts of indium intentionally added to the presaturated melt, efficiently emitted infrared light near 1.0 Mu .

    Abstract translation: 公开了用于检测的二极管和用于发射近红外辐射的二极管。 这种二极管采用在作为器件的透光窗口的p型InP衬底上生长的n型镉锡磷化物的外延层。 还公开了外延生长的倾翻技术,其中基体晶体和富含锡的熔体的条件被控制以获得高质量的异质结。 在独立的饱和程序中制备锡,磷和镉的混合物,以使外延生长过程中的底物降解最小化。 磷化铟基底是高质量的,p型主要是镉或锌掺杂。

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