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公开(公告)号：US09952440B2
公开(公告)日：2018-04-24
申请号：US14819804
申请日：2015-08-06
发明人： Takahiro Matsumoto
CPC分类号： G02B27/0933 , G02B27/0905 , G02B27/0927 , G02B27/0961 , G02B27/0966 , G02F2203/12 , G03F7/0002 , G03F9/7042
摘要： An imprint apparatus includes: a heating unit configured to heat an imprint region where an imprint process on a substrate is performed and change a shape of the imprint region. The heating unit includes a first optical system configured to emit a light beam extending in a first direction and a second direction perpendicular to an optical axis, a changing unit configured to change a ratio of widths of the light beam emitted from the first optical system in the first direction and the second direction, and an intensity distribution adjusting unit configured to adjust an intensity distribution of the light beam the ratio of which has been changed, and the heating unit heats the imprint region by irradiating the imprint region with the light beam from the intensity distribution adjusting unit.
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公开(公告)号：US09566741B2
公开(公告)日：2017-02-14
申请号：US14887472
申请日：2015-10-20
IPC分类号： B41L35/14 , B29C59/02 , G03F7/00 , B82Y10/00 , B82Y40/00 , B29C59/16 , B29K101/00 , B29L9/00 , B29L31/34
CPC分类号： H01L21/682 , B29C35/0805 , B29C59/026 , B29C59/16 , B29C2035/0822 , B29K2101/00 , B29L2009/00 , B29L2031/34 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0271 , H01L21/324 , H01L21/67115 , H01L21/6715 , H01L21/6838 , H01L22/20 , H01L23/544
摘要： An imprint method of forming a pattern of a resin on a substrate held on a holding surface. An uncured resin on the substrate is brought in contact with a mold. A partial region of the substrate is thermally deformed by irradiating the region with light so as to change an outer circumferential shape of the region. The uncured resin is cured on the region by irradiating light having a wavelength different from the deforming light. The mold is released from the cured resin on the region in contact with the mold. In at least a portion of a period during the deforming step, a region different from the region is held at a first suction force, while the region is held at a second suction force less than the first. The first suction force and the second suction force act between the substrate and the holding surface.
摘要翻译： 在保持在保持表面上的基板上形成树脂图案的压印方法。 使基板上的未固化树脂与模具接触。 通过用光照射该区域来使基板的局部区域发生热变形，从而改变该区域的外周形状。 通过照射具有与变形光不同的波长的光，在该区域上固化未固化的树脂。 在与模具接触的区域上的固化树脂上释放模具。 在变形步骤期间的至少一部分时间段中，与该区域不同的区域被保持在第一抽吸力，同时该区域保持在小于第一抽吸力的第二抽吸力。 第一吸力和第二吸力作用在基板和保持表面之间。
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3.发明授权公开(公告)号：US10401744B2
公开(公告)日：2019-09-03
申请号：US14324806
申请日：2014-07-07
摘要： The present invention provides a method for calibrating an encoder which includes a scale and a light receiving unit configured to receive light reflected by the scale, and detects a change in relative position between the scale and the light receiving unit, the method comprising a measurement step of measuring a deformation amount of a surface shape of the scale, a specifying step of specifying, based on a measurement result in the measurement step, a range which includes a portion of a surface of the scale, where the deformation amount exceeds a threshold, and within which a detection value of the encoder is corrected, and a determination step of determining a correction value for correcting the detection value of the encoder within the range specified in the specifying step.
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公开(公告)号：US09625836B2
公开(公告)日：2017-04-18
申请号：US14327650
申请日：2014-07-10
发明人： Wataru Yamaguchi , Takahiro Matsumoto , Hideki Ina
CPC分类号： G03F9/7034 , G01B9/0209 , G01B11/0675 , G03F7/7085 , G03F9/7049
摘要： An interferometer includes: an optical system configured to generate interfering light by dividing light from a light source, and combining reference light and measurement light; a detector configured to detect the interfering light generated by the optical system; and an optical member configured to give spatial coherence to the light from the light source before the detector detects the light from the light source. The optical member gives higher spatial coherence in a second direction serving as a direction of a line of intersection of a cross section of a beam of the light incident on the optical member, and a plane including optical paths of the light from the light source before being divided by the optical system, the reference light, the measurement light, and the interfering light, than in a first direction perpendicular to the plane.
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公开(公告)号：US20170092524A1
公开(公告)日：2017-03-30
申请号：US15372515
申请日：2016-12-08
IPC分类号： H01L21/68 , B29C35/08 , H01L21/67 , H01L21/324 , H01L21/027 , H01L23/544 , H01L21/66 , B29C59/02 , H01L21/683
CPC分类号： H01L21/682 , B29C35/0805 , B29C59/026 , B29C59/16 , B29C2035/0822 , B29K2101/00 , B29L2009/00 , B29L2031/34 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0271 , H01L21/324 , H01L21/67115 , H01L21/6715 , H01L21/6838 , H01L22/20 , H01L23/544
摘要： An imprint apparatus forms a pattern of an imprint material on a substrate by using a mold. A substrate holding unit holds the substrate by a suction force between the substrate and a holding surface and includes a first suction unit for sucking a rear surface of a first region of the substrate with a first suction force and a second suction unit for sucking a rear surface of a second region of the substrate with a second suction force. A deformation mechanism deforms a shape of the first region in a direction along the holding surface when forming the pattern of the imprint material on the first region. An adjusting unit adjusts the first and second suction forces. The first suction force is less than the second in at least a portion of a period during the deforming of the shape of the first region by the deformation mechanism.
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6.发明申请IMPRINT APPARATUS, IMPRINTING METHOD, AND MANUFACTURING METHOD OF ARTICLE 审中-公开IMPRINT APPARATUS，IMPRINTING METHOD AND AND MANUFACTURING METHOD OF ARTICLE公开(公告)号：US20170057153A1
公开(公告)日：2017-03-02
申请号：US15236169
申请日：2016-08-12
IPC分类号： B29C59/02 , H01L21/3105 , C03B11/05 , B29C59/00 , G03F7/004
CPC分类号： H01L21/3105 , G03F7/0002 , G03F7/004
摘要： An imprint apparatus according to an exemplary embodiment of the present disclosure, the imprinting apparatus forming a pattern on a region of a substrate to be processed using a mold, the imprint apparatus including a mount portion on which the substrate is mounted, and a heating unit that heats the region to be processed. On the basis of information related to a difference in shape between a pattern area of the mold and the region to be processed and information related to a contact pressure exerted between the substrate and the mount portion, the heating unit heats the region to be processed such that the difference in shape between the pattern area of the mold and the region to be processed is reduced.
摘要翻译： 根据本公开的示例性实施例的压印装置，所述压印装置使用模具在待处理的基板的区域上形成图案，所述压印装置包括其上安装有所述基板的安装部分和加热单元 加热要处理的区域。 基于与模具的图案区域和待处理区域之间的形状差异的信息以及与施加在基板和安装部分之间的接触压力相关的信息，加热单元加热待处理的区域 模具的图案区域和待处理区域之间的形状差异减小。
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公开(公告)号：US20160297117A1
公开(公告)日：2016-10-13
申请号：US15100666
申请日：2015-01-20
CPC分类号： B29C43/58 , B29C35/0805 , B29C43/52 , B29C2035/0827 , B29C2043/5816 , B29C2043/585 , B29L2031/34 , G01B11/14 , G02B5/1861 , G02B5/20 , G02B27/141 , G03F7/0002 , H01L21/565
摘要： The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.
摘要翻译： 本发明提供了一种压印装置，其通过使用模具将压印材料模塑在基板的注射区域上，该模具包括检测单元，该检测单元被配置为检测模具的第一标记和基板的第二标记被照射的第一光 并测量第一标记和第二标记之间的位置偏差;加热单元，其被配置为用用于加热基板的第二光和照射区域变形来照射基板;以及控制单元，其被配置为控制模具和基板之间的对准 关于位置偏差，其中检测单元或加热单元的参数被设置为在检测到第一光并且用第二光照射基板时由检测单元检测第二光。
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公开(公告)号：US20160039143A1
公开(公告)日：2016-02-11
申请号：US14887472
申请日：2015-10-20
CPC分类号： H01L21/682 , B29C35/0805 , B29C59/026 , B29C59/16 , B29C2035/0822 , B29K2101/00 , B29L2009/00 , B29L2031/34 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0271 , H01L21/324 , H01L21/67115 , H01L21/6715 , H01L21/6838 , H01L22/20 , H01L23/544
摘要： An imprint method for transferring a pattern formed on a mold onto a resin on a substrate. The substrate is held on a holding surface. A resin on the substrate is brought in contact with the mold. A partial region of the substrate is thermally deformed in a deforming step by irradiating the partial region with light. The resin is cured. The resin in contact with the mold is released. In at least a portion of the period during the deforming step, a region different from the partial region is held at a predetermined suction force, while holding the partial region at a suction force lower than the predetermined suction force.
摘要翻译： 用于将形成在模具上的图案转印到基板上的树脂上的压印方法。 基板被保持在保持表面上。 使基板上的树脂与模具接触。 通过用光照射部分区域，基板的局部区域在变形步骤中热变形。 树脂固化。 与模具接触的树脂被释放。 在变形步骤期间的至少一部分时间段内，将不同于局部区域的区域保持在预定的吸力，同时保持部分区域处于低于预定吸力的吸力。
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公开(公告)号：US20150022796A1
公开(公告)日：2015-01-22
申请号：US14327650
申请日：2014-07-10
发明人： Wataru Yamaguchi , Takahiro Matsumoto , Hideki Ina
CPC分类号： G03F9/7034 , G01B9/0209 , G01B11/0675 , G03F7/7085 , G03F9/7049
摘要： An interferometer includes: an optical system configured to generate interfering light by dividing light from a light source, and combining reference light and measurement light; a detector configured to detect the interfering light generated by the optical system; and an optical member configured to give spatial coherence to the light from the light source before the detector detects the light from the light source. The optical member gives higher spatial coherence in a second direction serving as a direction of a line of intersection of a cross section of a beam of the light incident on the optical member, and a plane including optical paths of the light from the light source before being divided by the optical system, the reference light, the measurement light, and the interfering light, than in a first direction perpendicular to the plane.
摘要翻译： 干涉仪包括：光学系统，被配置为通过分离来自光源的光，并组合参考光和测量光来产生干涉光; 检测器，被配置为检测由所述光学系统产生的干涉光; 以及光学构件，被配置为在所述检测器检测到来自所述光源的光之前给来自所述光源的光的空间相干性。 光学构件在入射到光学构件的光束的横截面与包括来自光源的光的光路的平面的交叉方向的第二方向上给出更高的空间相干性，之前 被光学系统划分，参考光，测量光和干涉光，而不是垂直于平面的第一方向。
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10.发明申请POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING DEVICE 有权位置检测装置，印刷装置和制造装置的方法公开(公告)号：US20130163004A1
公开(公告)日：2013-06-27
申请号：US13719061
申请日：2012-12-18
发明人： Takahiro Matsumoto
IPC分类号： G01B11/14
CPC分类号： G01B11/14 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , G03F9/7049
摘要： A position detection apparatus that illuminates diffraction gratings formed on two objects with light from a light source and receives diffracted light from the diffraction gratings to acquire relative positions of the two objects includes: an optical system configured to cause plus n-th order diffracted light and minus n-th order diffracted light from each of the diffraction gratings to interfere with each other, where n is a natural number; a light receiving unit; and a processing unit, wherein the light receiving unit receives a two-beam interference light from each of the diffraction gratings, and wherein the processing unit acquires the relative positions of the two objects by using the two-beam interference light at an area where two-beam interference lights of the diffracted light from the respective diffraction gratings do not overlap each other among the two-beam interference lights of the diffracted light from each of the diffraction gratings.
摘要翻译： 一种位置检测装置，其利用来自光源的光照射形成在两个物体上的衍射光栅，并且从衍射光栅接收衍射光以获得两个物体的相对位置，包括：光学系统，其被配置为产生正n级衍射光， 来自每个衍射光栅的负n阶衍射光彼此干涉，其中n是自然数; 光接收单元; 以及处理单元，其中所述光接收单元接收来自每个所述衍射光栅的双光束干涉光，并且其中所述处理单元通过在两个对象的两个区域处使用所述双光束干涉光来获取所述两个物体的相对位置 来自各衍射光栅的衍射光的光束干涉光在来自每个衍射光栅的衍射光的双光束干涉光中彼此不重叠。
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