-
公开(公告)号：US4757208A
公开(公告)日：1988-07-12
申请号：US837127
申请日：1986-03-07
申请人： Charles M. McKenna , James E. Wood , John L. Bartelt , Ross D. Olney , J. William Ward , Charles W. Slayman
发明人： Charles M. McKenna , James E. Wood , John L. Bartelt , Ross D. Olney , J. William Ward , Charles W. Slayman
IPC分类号： H01J37/20 , H01J37/08 , H01J37/305 , H01J37/317 , H01L21/027 , H01L21/30
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/055 , H01J2237/1516 , H01J2237/303 , H01J2237/31755 , H01J2237/31788
摘要： A masked ion beam lithography (MIBL) system and method is disclosed which is considerably more compact and economical than prior ion implantation devices. An H.sup.+ ion beam is extracted from a source in the form of an angularly expanding beam, and is transmitted through two lenses that sequentially accelerate the ions to energies in the range of 200-300 keV. The first lens focuses the beam so that it emerges from a crossover point with an amplified angular divergence at least three times the divergence of the initial beam, thereby considerably reducing the necessary column length. The second lens collimates the beam so that it can be directed onto a mask to expose resist on an underlying semiconductor substrate. A series of extraction electrodes are used to provide an initial point source beam with a desired angular expansion, and a specially designed sector magnet is positioned between the extraction mechanism and the first lens to remove particles heavier than H.sup.+ from the beam. Voltage ratios across the lenses and extraction electrodes can be varied in tandem, permitting control over the final beam energy by a simple voltage adjustment. The beam is aligned with the column axis and then steered into alignment with the mask channeling axis by a pair of octupole lenses.
摘要翻译： 公开了掩蔽离子束光刻（MIBL）系统和方法，其比先前的离子注入装置更紧凑和经济。 H +离子束以角度扩展的光束形式从光源中提取出来，并通过两个透镜传播，该透镜将离子依次加速到200-300keV范围内的能量。 第一透镜聚焦光束，使得其从具有放大的角度发散的交叉点出现至少是初始光束的发散的三倍，从而显着地减少必要的色谱柱长度。 第二透镜使光束准直，使得其可以被引导到掩模上以在下面的半导体衬底上曝光抗蚀剂。 一系列提取电极用于提供具有所需角度膨胀的初始点源光束，并且特殊设计的扇形磁体位于提取机构和第一透镜之间，以从光束去除比H +更重的颗粒。 透镜和引出电极之间的电压比可以串联变化，允许通过简单的电压调节来控制最终的束能量。 光束与列轴对准，然后通过一对八极透镜转向与掩模引导轴对准。
-
公开(公告)号：US4687940A
公开(公告)日：1987-08-18
申请号：US842103
申请日：1986-03-20
IPC分类号： H01J37/30 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3174 , H01J2237/0458 , H01J2237/31711 , H01J2237/31713 , H01J2237/31755
摘要： An ion beam microfabrication system is described which is capable of operating in either a flooded beam mode, in which a relatively high current beam is used to yield a rapid throughput, or in a low current, high resolution focused ion beam mode. With a focused beam a small, relatively low current ion spot is deflected in a predetermined pattern over a portion of the wafer to produce more detailed patterning that is not achievable in the flooded beam mode. A lens is added to the beam column to modify the beam collimation between the focused and flooded modes, and switching between modes is accomplished by simply actuating or de-actuating the lens. The beam is formed with a larger acceptance angle and total current in the flooded than the focused mode.
摘要翻译： 描述了能够以淹没波束模式操作的离子束微细加工系统，其中使用相对高的电流束以产生快速通量，或者以低电流，高分辨率聚焦离子束模式。 利用聚焦光束，在晶片的一部分上以预定图案偏转小的相对低电流的离子斑点以产生在淹没光束模式中不可实现的更详细的图案化。 将透镜添加到光束列以修改聚焦和淹没模式之间的光束准直，并且通过简单地致动或去激活透镜来实现模式之间的切换。 在聚焦模式下，波束形成在较大的接收角和淹没中的总电流。
-
公开(公告)号：US4728193A
公开(公告)日：1988-03-01
申请号：US940390
申请日：1986-12-11
申请人： John L. Bartelt , Ross D. Oleny
发明人： John L. Bartelt , Ross D. Oleny
CPC分类号： G03F9/7049
摘要： An interferometric alignment and position detector system for determining relative location of an object is provided. A composite diffraction grating is provided with the object. A laser can provide a collimated coherent light beam directed so as to impinge on the composite diffraction grating. A beam splitter can collect at least two pairs of diffracted light beams from the composite diffraction grating and can combine the pairs of diffracted light beams to provide interference fringe patterns. Apparatus is provided for detecting the interference fringe patterns to provide a measurement of the intensity distribution from which the relative location can be established.
摘要翻译： 提供了用于确定物体的相对位置的干涉式对准和位置检测器系统。 复合衍射光栅设置有该物体。 激光器可以提供定向的撞击在复合衍射光栅上的准直相干光束。 分束器可以从复合衍射光栅收集至少两对衍射光束，并且可以组合衍射光束对以提供干涉条纹图案。 提供了用于检测干涉条纹图案以提供能够建立相对位置的强度分布的测量的装置。
-
公开(公告)号：US4740267A
公开(公告)日：1988-04-26
申请号：US17380
申请日：1987-02-20
申请人： Wolfgang Knauer , John L. Bartelt
发明人： Wolfgang Knauer , John L. Bartelt
IPC分类号： C23C14/32 , C23C14/22 , C23C16/48 , C23F4/04 , H01L21/285 , H01L21/3065 , H01L21/306 , B05D3/06 , B44C1/22 , C23C14/00
CPC分类号： C23C14/221 , H01L21/28512 , H01L21/28518 , H01L21/3065 , H01J2237/0812 , Y10S438/961
摘要： Chemical reactions are accomplished at a surface of a substrate by supplying both a chemical reactant and energy by means of a cluster beam of a volatile material. Discrete units containing a volatile reactant are formed into clusters, ionized, accelerated to high energy, and impacted against the surface. The clusters disintegrate, and the reactant species reacts at the surface, under the influence of the energy transferred by the accelerated cluster. The clustered species may be the only reactant, as in a decomposition reaction, or additional reactants may be supplied from the surface or from other external sources, as in a film deposition, etching reaction, or catalysis reaction.
摘要翻译： 化学反应通过借助于挥发性物质的聚束束同时提供化学反应物和能量而在基底的表面上完成。 含有挥发性反应物的分散单元形成簇，离子化，加速至高能量并冲击表面。 团簇分解，反应物种在表面受到加速簇转移能量的影响而反应。 如在分解反应中，聚集物质可以是唯一的反应物，或者可以从表面或从其它外部来源提供另外的反应物，如在膜沉积，蚀刻反应或催化反应中。
-
5.发明授权Compensated, SBS-free optical beam amplification and delivery apparatus and method 失效补偿，无SBS的光束放大和传送装置及方法
公开(公告)号：US5208699A
公开(公告)日：1993-05-04
申请号：US811199
申请日：1991-12-20
申请人： David A. Rockwell , John L. Bartelt
发明人： David A. Rockwell , John L. Bartelt
CPC分类号： H01S3/2333 , H01S3/10076
摘要： An optical beam amplification and delivery system and method employs a central station with a laser oscillator, a laser amplifier and a phase conjugate mirror (PCM). Low power, near diffraction limited laser beams are delivered to each of a plurality of local stations through single-mode polarization preserving fibers. From the local stations the low power beams are transmitted back to the central station through high power multi-mode optical fibers. At the central station the received beams are amplified, phase conjugated and transmitted back through the amplifier and multi-mode fibers to their respective local stations. Distortions imposed upon the beams by the multi-mode fibers during transmission back to the central station, and by the amplifier, are compensated during the return path, providing high power yet near diffraction limited beam quality at the local stations. Attenuation through stimulated Brillouin scattering (SBS) is inhibited by selecting an appropriate aggregate diameter for the multi-mode fibers.
-
公开(公告)号：US5303574A
公开(公告)日：1994-04-19
申请号：US988397
申请日：1992-12-09
CPC分类号： G01N3/56 , Y10T428/8305 , Y10T83/866
摘要： An article (40), such as a piece of manufacturing tooling, is modified prior to use by treating a portion of its surface (38) to be worn so that the treated surface worn more than a preselected amount has a different appearance than the treated surface worn less than the preselected amount, using a treatment process in which the treated surface is at least as wear resistant as the untreated surface. In one approach, the surface (38) is treated by implanting ions to a preselected depth. The ions are chosen so that the substrate has a different color at depths less than the preselected depth than does the substrate at depths greater than the preselected depth. After wear, the treated surface is visually inspected for color variations that indicate wear to more than the preselected depth. The surface treatment can also be accomplished by ion implanting or ion beam mixing a previously deposited surface coating.
摘要翻译： 诸如一件制造工具的制品（40）在使用前通过处理其表面（38）的一部分被磨损而被改性，使得被处理的表面磨损超过预选量的外观与处理的外观不同 表面磨损小于预选量，使用处理过程，其中经处理的表面至少与未处理表面一样耐磨。 在一种方法中，通过将离子注入预选深度来处理表面（38）。 选择离子使得衬底在深度小于预选深度的深度处的深度不同于在大于预选深度的深度处的衬底的不同颜色。 磨损后，目视检查处理过的表面的颜色变化，指示磨损超过预选深度。 表面处理也可以通过离子注入或离子束混合预先沉积的表面涂层来实现。
-
7.发明授权Dissimilar superimposed grating precision alignment and gap measurement systems 失效不相似的叠加光栅精密对准和间隙测量系统
公开(公告)号：US4596467A
公开(公告)日：1986-06-24
申请号：US590135
申请日：1984-03-16
申请人： John L. Bartelt
发明人： John L. Bartelt
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A substrate having a diffraction grating of a first periodicity formed thereon, a mask having a diffraction grating of a second periodicity formed thereon, the mask and substrate being positioned such that the respective mask and substrate gratings are generally parallel opposing one another on the mask and substrate, means for providing collimated coherent light directed so as to impinge on the mask and substrate gratings, and means for separately collecting, recombining, and detecting the intensity of at least a first given order of diffracted light beams as respectively diffracted by the mask and substrate gratings.
摘要翻译： 一种具有形成在其上的具有第一周期的衍射光栅的衬底，具有形成在其上的第二周期性的衍射光栅的掩模，所述掩模和衬底被定位成使得相应的掩模和衬底光栅在掩模上大致平行相对地彼此平行， 衬底，用于提供被引导以撞击掩模和衬底光栅的准直相干光的装置，以及用于分别收集，重组和检测由掩模衍射的至少第一给定次级衍射光束的强度的装置，以及 衬底光栅。
-
公开(公告)号：US4318976A
公开(公告)日：1982-03-09
申请号：US200652
申请日：1980-10-27
申请人： Jing S. Shu , Wei Lee , Gilbert L. Varnell , John L. Bartelt
发明人： Jing S. Shu , Wei Lee , Gilbert L. Varnell , John L. Bartelt
CPC分类号： G03F7/0388
摘要： A negative, high energy radiation resist based on styrene-allyl methacrylate copolymers and substitutional modifications thereof, yielding a linear copolymer with highly sensitive allyl pendant groups together with a thermally stable, solvent resistant backbone. This resist exhibits improved e-beam sensitivity without the attendant problems of swelling during development and flow during heat processing.
摘要翻译： 一种基于苯乙烯 - 甲基丙烯酸烯丙酯共聚物的负极高能量辐射抗蚀剂及其取代修饰，产生具有高度敏感性的烯丙基侧基的线型共聚物以及耐热稳定的耐溶剂主链。 该抗蚀剂表现出改进的电子束灵敏度，而不会在热处理期间在显影和流动期间出现溶胀的问题。
-
-
-
-
-
-
-
搜索结果
8 条记录 (耗时 0.027 秒)
