摘要:
A pyramid bump structure for electrically coupling to a bond pad on a carrier comprises a conductive block disposed at the bond pad and an oblique pyramid insulation layer covered at one side of the conductive block. The oblique pyramid insulation layer comprises a bottom portion and a top portion, and outer diameter of the oblique pyramid insulation layer is tapered from the bottom portion to the top portion. When the carrier is connected with a substrate and an anisotropic conductive film disposed at the substrate, the pyramid bump structure may rapidly embed into the anisotropic conductive film to raise the flow rate of the anisotropic conductive film. Further, a short phenomenon between adjacent bumps can be avoided to raise the yield rate of package process.
摘要:
A pyramid bump structure for electrically coupling to a bond pad on a carrier comprises a conductive block disposed at the bond pad and an oblique pyramid insulation layer covered at one side of the conductive block. The oblique pyramid insulation layer comprises a bottom portion and a top portion, and outer diameter of the oblique pyramid insulation layer is tapered from the bottom portion to the top portion. When the carrier is connected with a substrate and an anisotropic conductive film disposed at the substrate, the pyramid bump structure may rapidly embed into the anisotropic conductive film to raise the flow rate of the anisotropic conductive film. Further, a short phenomenon between adjacent bumps can be avoided to raise the yield rate of package process.
摘要:
A wrench is formed with a polygonal first engaging hole that is defined by a plurality of engaging surfaces and that is adapted for engaging a head of a first bolt. Each engaging surface has a pair of plane surface portions and an intermediate surface portion interconnecting the plane surface portions and defining a groove. The grooves of the engaging surfaces collaboratively define a polygonal second engaging hale for engaging a head of a second bolt. The intermediate surface portion of each engaging surface cooperates with the corresponding plane surface portions to form two angular intersections adapted to abut respectively against side surfaces of the head of the second bolt that define a corresponding corner of the head of the second bolt.
摘要:
A lift-off structure for substrate of a photoelectric device and method thereof, which making it possible to enable an etching solution to flow through not only external etch channel but also internal etch channel to etch a sacrificial layer in order to increase the overall etching speed and decrease the overall time of lifting a substrate off.
摘要:
A base body comprises two frames to put lens and solar cells. The working process is simple and the weight and the cost of the base body is reduced.
摘要:
An apparatus for integrated input/output circuit and a verification method thereof are provided. The apparatus effectively reduces the chip area occupation and cost, and decreases the resistance on an electrical transmission path of the integrated input/output circuit to improve the circuit efficiency. The apparatus comprises a metal structure and a plurality of integrated circuit components. Wherein, the integrated circuit comprises the integrated circuit components and the metal structure that has a bonding pad. In addition, the integrated circuit components are disposed directly under the metal structure and coupled to the metal structure. In which, the metal structure provides an electrical transmission path for the integrated circuit.
摘要:
A light-emitting device and method for fabricating the same are revealed. The light-emitting device includes an epitaxial structure, a P-type ohmic contact electrode and an N-type ohmic contact electrode. The epitaxial structure includes a plurality of epitaxial layers capable of emitting light and P-type contact layer. The P-type ohmic contact electrode includes a first nickel layer deposited on the epitaxial structure, a first platinum layer deposited on the first nickel layer, and a first gold layer deposited on the first platinum layer. According to the fabricating method of the light-emitting device, an epitaxial structure is first formed on the surface of a substrate, a P-type ohmic contact electrode is then formed on the epitaxial structure, and an N-type ohmic contact electrode is formed on the other surface of the substrate. Finally, an annealing process is performed at a temperature between 220° C. and 330° C.
摘要:
A yield analysis method. First, a wafer having multiple dies is inspected to obtain wafer defect data containing defect information for every die in the wafer. Then a wafer map and an overall yield are generated according to the wafer defect data. The wafer map displays defective dies and defect-free dies in the wafer. Then, first and second systematic limited yields are calculated in accordance with the wafer defect data and the wafer map, wherein the first systematic limited yield is calculated excluding defective dies with localized distribution, and the second systematic limited yield is calculated excluding defective dies with repeated distribution. Then a random defect limited yield is determined in accordance with the overall yield, the first systematic limited yield, and the second systematic limited yield.