摘要:
The invention relates to a parking brake, especially for a motor vehicle. Said parking brake (1) comprises a cable traction device in order to actuate the brake and opposite cable deflection by means of at least two deflection rollers (6, 7, 19, 20). The deflection rollers (6, 7, 19, 20) are arranged in such a manner that the connection line can be rotated between the rotational axis of at least two deflection rollers (7, 8, 19, 20) with respect to the drive main axis (18). As a result, a parking brake which is simple to construct and which requires a minimum amount of space is produced. Said parking brake can tighten two brake cables with an essentially equal force in an opposite direction.
摘要:
A fusible link in an integrated semiconductor circuit and a process for producing the fusible link contemplate the disposition of a fusible link, which is constructed with a cross-sectional constriction as a desired fusing point for its conductor track, in a void. A surface of the void and/or a bare conductor track can be covered with a protection layer, to prevent corrosion. The advantages of such a fusible link are a lower ignition energy and increased reliability. The fusible link may be used as a memory element of a PROM.
摘要:
To simplify the design and assembly of an adjustment drive with a gear wheel mounted to rotate in a gear housing with a gear housing lid and with a driver provided with a power take-off element (e.g., a pinion) being in a drive connection with it on the output side, directly or indirectly, present invention provides that the driver is simultaneously structured as a power take-off shaft and is mounted to rotate with at least one bearing region in the gear housing or in the gear housing lid, respectively. In a further embodiment, the gear wheel is a one-piece component of the driver and is preferably placed into a drive connection with it via spring web type spokes in the form of tangential stop damping.
摘要:
A field effect transistor (FET) and fabrication method are disclosed. The FET includes a drift region formed in a substrate. A trench adjoins the drift region and contains at least one control region and a connection region. An inversion channel region is isolated from the control region. A portion of the trench extends to the same depth as a second trench that insulates the FET from other components formed in the substrate. Insulating material is disposed between the trench below the control region and the control region. An insulating layer insulates the FET from the substrate. The trench and/or the connection region may extend into the insulating layer or may be isolated from the insulating layer via the drift region.
摘要:
A method for programming a bus-compatible electronic motor vehicle controller that is equipped with at least one microcomputer to implement its control function and with ROM and RAM in order to accommodate and handle applications software required for the control function, and is also equipped with at least one bus protocol chip, the ROM being programmed such that the applications software communicates with a bus via the bus protocol chip and via a specific instruction and communications interface forming a first interface of the bus protocol chip. The method includes providing a second interface, which is independent of the bus protocol chip, and defining the second interface as a further, universal instruction and communications interface. The first and second interfaces are coupled with a driver module that is independent of the applications software and adapted to the bus protocol chip and has the properties of an adapter. The applications software are matched and aligned exclusively to the second interface with respect to the bus communication and the applications software is produced independently of the bus protocol chip. The applications software and the driver module are linked to one another by a link process. Program code is obtained as a result of the link process. The program code is stored such that the program code is resident in the ROM.
摘要:
Integrated transistor and method for the production is disclosed. An explanation is given of, inter alia, a transistor having an electrically insulating isolating trench extending from a main area in the direction of a connection region remote from the main area. Moreover, the transistor contains an auxiliary trench extending from the main area as far as the connection region remote from the main area. The transistor requires a small chip area and has outstanding electrical properties.
摘要:
An explanation is given of, inter alia, a method for fabricating an integrated pin photodiode which contains a buried region (20) and a terminal region (32) leading to the buried region (20). This fabrication method enables the pin photodiode (14) to be integrated in a simple manner. Moreover, there is the possibility that process steps for fabricating the pin diode can also be utilized for fabricating shielding wells (22, 56).
摘要:
A capacitor for an integrated circuit with microstructure has a first and a second electrode separated by a dielectric layer. The dielectric layer is produced during the structuring of the first electrodes by an etching process. The dielectric layer comprises a polymer structure which is formed during the etching process, and/or etching products of the electrode metal. The first electrode may be cylindrical and surrounded by a hollow-cylindrical dielectric layer. The capacitor may be integrated in a memory field with a multiplicity of such capacitors.
摘要:
A method for producing complementary MOS and bipolar transistors on the same semiconductor wafer, includes producing buried zones of differing conductivity, producing n- and p-doped wells for corresponding transistors, and producing field oxide regions and insulated gate electrodes of the MOS transistors. After production of the field oxide regions, highly doped n-regions extending from a surface of the semiconductor wafer to a buried n-doped zone are produced with a first mask for producing a collector zone of an npn transistor and a base zone of a pnp transistor. After the production of the insulated gate electrodes, a first silicon layer is applied over the entire surface and doped with p-atoms. An auxiliary layer is applied on the first silicon layer over the entire surface. The auxiliary layer and the first silicon layer are structured with a second mask. A base contact zone of the npn transistor, source and drain zones of a p-MOS transistor, and a collector zone and an emitter zone of the pnp transistor are simultaneously produced, by diffusion out from the structured first silicon layer. The first silicon layer is laterally insulated, and a second silicon layer is produced, doped with n-atoms, and structured with a mask. An emitter zone and a collector terminal zone of the npn transistor, a base terminal of the pnp transistor, and source and drain zones of an n-MOS transistor are simultaneously produced by diffusion out from the structured second silicon layer.