Abstract:
In order to use an etching solution of less complicated composition for recovering used wafers, embodiments of the present invention provide a recovering method, and also provide a kind of wafer, which is used as a process control wafer or dummy wafer, and fabrication methods. In one embodiment, a wafer-recovering method comprises providing a first wafer, wherein the first wafer has a base, a first conductive layer on the base, and a second conductive layer on the first conductive layer. The method further comprises removing the first and second conductive layers with an acidic solution to obtain a second wafer; and washing the second wafer with a liquid. The second conductive layer is formed on the first conductive layer in a deposition process, and the first conductive layer is more easily removed by the acidic solution than the second conductive layer.
Abstract:
In order to use an etching solution of less complicated composition for recovering used wafers, embodiments of the present invention provide a recovering method, and also provide a kind of wafer, which is used as a process control wafer or dummy wafer, and fabrication methods. In one embodiment, a wafer-recovering method comprises providing a first wafer, wherein the first wafer has a base, a first conductive layer on the base, and a second conductive layer on the first conductive layer. The method further comprises removing the first and second conductive layers with an acidic solution to obtain a second wafer; and washing the second wafer with a liquid. The second conductive layer is formed on the first conductive layer in a deposition process, and the first conductive layer is more easily removed by the acidic solution than the second conductive layer.
Abstract:
A power management method is suitable for an electronic device including a controller, a processor and a battery, and includes following steps. A first power is provided to the electronic device by a power adapter, and a maximum value of the first power is smaller than a maximum value of a rated consumed power of the electronic device. A power state of a second power of the battery is obtained by the controller. A control signal is generated according to the power state, and the processor adjusts an operation performance of the processor based on the control signal. The operation performance of the processor is continuously adjusted according to the power state.
Abstract:
A method for delivering a confidential e-mail is disclosed. The application software loads a first e-mail, checks if an attached file of the first e-mail is encrypted, opens a second e-mail for delivering a password of the attached file when the attached file is encrypted, and loads at least one receiver of the first e-mail to the second e-mail for sending the second e-mail.
Abstract:
This invention provides a package structure of three-dimensional stacking dice and its manufacturing method. This invention employs the Through-Silicon-Vias (TSVs) technology to establish vertical electrical connection of the three-dimensional stacking dice and a redistribution layer between a blind hole-on-pad and a vertical through hole formed by the TSVs technology to direct the electrical connection from a first surface to an opposite second surface of this structure. In addition, this invention employs a conductive bump completely covering the pads jointed together between the stacking dice to avoid breakage of the pads. The reliability of the three-dimensional stacking dice of the present invention is increased.
Abstract:
A power management method is suitable for an electronic device including a controller, a processor and a battery, and includes following steps. A first power is provided to the electronic device by a power adapter, and a maximum value of the first power is smaller than a maximum value of a rated consumed power of the electronic device. A power state of a second power of the battery is obtained by the controller. A control signal is generated according to the power state, and the processor adjusts an operation performance of the processor based on the control signal. The operation performance of the processor is continuously adjusted according to the power state.
Abstract:
A method for delivering a confidential e-mail is disclosed. The application software loads a first e-mail, checks if an attached file of the first e-mail is encrypted, opens a second e-mail for delivering a password of the attached file when the attached file is encrypted, and loads at least one receiver of the first e-mail to the second e-mail for sending the second e-mail.
Abstract:
The present invention relates to a method for determining rapidly and accurately the polishing time of a chemical mechanical polishing process for polishing target wafers to avoid any problems of under-polishing or over-polishing. An aspect of the present invention is directed to a method for determining a chemical mechanical polishing time for removing a target polishing thickness H from an uneven surface of a target wafer. The method comprises polishing a control wafer by a chemical mechanical polishing to obtain a progressive relationship of polishing thickness and respective polishing time therefor. A first polishing time T1 is determined for removing a first thickness H1 from the target wafer, in which the first thickness H1 with substantially the uneven surface removed is smaller than the target polishing thickness H of the target wafer to be removed. In some embodiments, the first polishing time T1 is determined by polishing the target wafer to remove the first thickness H1 by chemical mechanical polishing. The method comprises calculating an image polishing thickness H1′ to be removed from the control wafer with respect to the first polishing time T1 according to the progressive relationship of the polishing thickness and respective polishing time for the control wafer. A second polishing thickness H2=(H−H1) is added to the image polishing thickness H1′ to obtain an equivalent polishing thickness H1′ for the control wafer. A target polishing time is determined for removing the target polishing thickness H from the target wafer by interpolating the progressive relationship of the polishing thickness and respective polishing time for the control wafer based on the equivalent polishing thickness H′.
Abstract:
A personal computer system and an operation method thereof for multiple outputs are provided. In the present method, input data generated by each of a plurality of input devices of the personal computer system are received. According to an identification information of each of the input devices, each of the input data is respectively transmitted to one of a plurality of application programs. After that, each of the application programs separately generates an output result according to the received input data and displays the output result on a corresponding application program interface, wherein all of the application program interfaces displaying the corresponding output results are in one and the same display screen of the personal computer system.
Abstract:
A method for charging and maintaining a rechargeable battery is provided. The method includes the steps of enabling a life extending mode; determining whether the electric potential of the battery is less than or substantially equal to a predetermined charging level; charging the battery when the battery is connected with a power supply; and maintaining the electric potential of the battery at the predetermined battery level, in which the predetermined battery level is set at approximately from 50% to 70% of the full capacity of the battery.