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公开(公告)号：US20110039206A1
公开(公告)日：2011-02-17
申请号：US12782466
申请日：2010-05-18
Applicant: Cong LIU , Cheng-Bai Xu
Inventor： Cong LIU , Cheng-Bai Xu
CPC classification number: G03F7/0397
Abstract: Provided are new resins that comprise multi-ring, aromatic and/or multi-cyclic ester unit which preferably are photoacid-labile. Also provided are chemically-amplified positive photoresist that comprise such resins as well as multi-ring, aromatic and/or multi-cyclic ester monomers.
Abstract translation: 提供了包含多环，芳族和/或多环酯单元的新树脂，其优选是光致酸不稳定的。 还提供了包含这种树脂以及多环，芳族和/或多环酯单体的化学放大正性光致抗蚀剂。
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公开(公告)号：US20110250538A1
公开(公告)日：2011-10-13
申请号：US12965368
申请日：2010-12-10
Applicant: Mingqi LI , Emad AQAD , Cong LIU , Joseph MATTIA , Cheng-Bai XU , George G. BARCLAY
Inventor： Mingqi LI , Emad AQAD , Cong LIU , Joseph MATTIA , Cheng-Bai XU , George G. BARCLAY
IPC: G03F7/004 , C07J9/00 , C07D493/18 , G03F7/20 , C07D333/46
CPC classification number: G03F7/0045 , C07C303/32 , C07C309/06 , C07C309/12 , C07C321/30 , C07C381/12 , C07C2603/74 , C07D333/46 , C07D335/02 , C07D337/04 , C07D493/20 , C07J31/006 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
Abstract: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
Abstract translation: 提供了新的方法用于合成光酸产生剂化合物（“PAG”），新的光酸产生剂化合物和包含这种PAG化合物的光致抗蚀剂组合物。 在特定方面，提供含锍（S +）光酸产生剂和合成锍光酸发生剂的方法。
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3.发明申请PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权光电发生器，光电元件，涂覆基板和形成电子器件的方法公开(公告)号：US20130344438A1
公开(公告)日：2013-12-26
申请号：US13925926
申请日：2013-06-25
Applicant: Emad AQAD , Irvinder KAUR , Cong LIU , Cheng-bai XU , Mingqi LI , Gregory P. PROKOPOWICZ
Inventor： Emad AQAD , Irvinder KAUR , Cong LIU , Cheng-bai XU , Mingqi LI , Gregory P. PROKOPOWICZ
CPC classification number: G03F7/004 , G03F7/0045 , G03F7/0395 , G03F7/20
Abstract: A photoacid generator has the formula (I): wherein R1, R2, R3, L1, L2, L3 X, Z+, a, b, c, d, p, q, and r, are defined herein. A photoresist comprises the photoacid generator, and a coated article comprises the photoresist. The photoresist can be used to form an electronic device.
Abstract translation: 光酸产生剂具有式（I）：其中R1，R2，R3，L1，L2，L3X，Z +，a，b，c，d，p，q和r在本文中定义。 光致抗蚀剂包括光致酸产生剂，并且涂覆制品包括光致抗蚀剂。 光致抗蚀剂可用于形成电子器件。
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4.发明申请公开(公告)号：US20120156595A1
公开(公告)日：2012-06-21
申请号：US13297261
申请日：2011-11-15
Applicant: Joon-Seok OH , Deyan WANG , Cong LIU , Mingqi LI , Chunyi WU , Cheng-Bai XU
Inventor： Joon-Seok OH , Deyan WANG , Cong LIU , Mingqi LI , Chunyi WU , Cheng-Bai XU
CPC classification number: G03F7/0392 , G03F7/0382 , G03F7/0395 , G03F7/0397 , G03F7/2041
Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sugar substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Abstract translation: 提供了可用于浸没式光刻的新的光致抗蚀剂组合物。 本发明优选的光致抗蚀剂组合物包含一种或多种具有糖替代的材料。 本发明的特别优选的光致抗蚀剂可以在浸没光刻处理期间将抗蚀剂材料的浸出降低到与抗蚀剂层接触的浸没流体中。
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公开(公告)号：US20110250542A1
公开(公告)日：2011-10-13
申请号：US12968130
申请日：2010-12-14
Applicant: Cong LIU , Cheng-Bai XU
Inventor： Cong LIU , Cheng-Bai XU
CPC classification number: G03F7/0045 , C07C309/17 , C07C311/48 , C07C313/04 , C07C321/28 , C07C381/12 , C07C2603/74 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/162 , G03F7/20 , G03F7/30 , G03F7/322
Abstract: New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.
Abstract translation: 提供新的双（磺酰基）酰亚胺和三（磺酰基）甲基化光致酸发生剂化合物（“PAG”）以及包含这种PAG化合物的光致抗蚀剂组合物。
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Patent Agency Ranking
公开(公告)号：US20100323294A1
公开(公告)日：2010-12-23
申请号：US12820331
申请日：2010-06-22
Applicant: Mingqi LI , Cheng-Bai XU , Emad AQAD , Cong LIU
Inventor： Mingqi LI , Cheng-Bai XU , Emad AQAD , Cong LIU
CPC classification number: G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.
Abstract translation: 本发明涉及包含这些化合物的新的光酸产生剂化合物和光致抗蚀剂组合物。 特别地，本发明涉及包含多环内酯部分的光酸产生剂化合物。
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公开(公告)号：US20120129108A1
公开(公告)日：2012-05-24
申请号：US13296949
申请日：2011-11-15
Applicant: Emad AQAD , Mingqi LI , Cheng-Bai XU , Deyan WANG , Cong LIU , Joon Seok OH , Shintaro YAMADA
Inventor： Emad AQAD , Mingqi LI , Cheng-Bai XU , Deyan WANG , Cong LIU , Joon Seok OH , Shintaro YAMADA
IPC: G03F7/20 , C08G75/00 , C07C309/19
CPC classification number: C07C381/12 , C07C63/72 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/08 , C07C309/12 , C07C309/17 , C07C309/19 , C07C309/20 , C07C309/23 , C07C309/24 , C07C2602/42 , C08F220/22 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/38
Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.
Abstract translation: 本发明涉及包含这些化合物的新的光酸产生剂化合物和光致抗蚀剂组合物。 特别地，本发明涉及包含可碱基裂解基团的光酸产生剂化合物。
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8.发明申请COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY 审中-公开包含基础反应成分的组合物和光刻胶的方法公开(公告)号：US20120122030A1
公开(公告)日：2012-05-17
申请号：US13297258
申请日：2011-11-15
Applicant: Deyan WANG , Cong LIU , Mingqi LI , Joon Seok OH , Cheng-Bai XU , Doris H. KANG , Clark H. CUMMINS , Matthias S. OBER
Inventor： Deyan WANG , Cong LIU , Mingqi LI , Joon Seok OH , Cheng-Bai XU , Doris H. KANG , Clark H. CUMMINS , Matthias S. OBER
CPC classification number: G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/0397
Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more base reactive groups and (i) one or more polar groups distinct from the base reactive groups, and/or (ii) at least one of the base reactive groups is a non-perfluorinated base reactive group. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Abstract translation: 提供了可用于浸没式光刻的新的光致抗蚀剂组合物。 本发明优选的光致抗蚀剂组合物包含一种或多种包含一种或多种碱性反应性基团的材料，和（i）与碱性反应性基团不同的一种或多种极性基团，和/或（ii）至少一种碱性反应性基团是 非全氟化碱反应性基团。 本发明的特别优选的光致抗蚀剂可以在浸没光刻处理期间将抗蚀剂材料的浸出降低到与抗蚀剂层接触的浸没流体中。
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公开(公告)号：US20130038483A1
公开(公告)日：2013-02-14
申请号：US13584348
申请日：2012-08-13
Applicant: Cong LIU , Yu-Kai CHOU
Inventor： Cong LIU , Yu-Kai CHOU
IPC: H03M1/38
Abstract: An analog-to-digital converter is provided. The analog-to-digital converter includes a sampling-voltage providing circuit, a first comparison circuit, a second comparison circuit, and an encoder circuit. The sampling-voltage providing circuit provides a group of first comparison voltages and a group of second comparison voltages. The first comparison circuit performs a first comparison operation to an analog-signal input quantity according to the group of first comparison voltages to generate a first comparison digital quantity. The second comparison circuit selects second comparison voltages among the group of second comparison voltages according to the first comparison digital quantity and performs a second comparison operation to the analog-signal input quantity according to the selected second comparison voltages to generate a second comparison digital quantity. The encoder circuit encodes the first comparison digital quantity and the second comparison digital quantity and generates a digital quantity corresponding to the analog-signal input quantity.
Abstract translation: 提供了一个模拟 - 数字转换器。 模数转换器包括采样电压提供电路，第一比较电路，第二比较电路和编码器电路。 采样电压提供电路提供一组第一比较电压和一组第二比较电压。 第一比较电路根据第一比较电压组对模拟信号输入量执行第一比较操作，以产生第一比较数字量。 第二比较电路根据第一比较数字量选择第二比较电压组中的第二比较电压，并根据所选择的第二比较电压对模拟信号输入量进行第二比较操作，以产生第二比较数字量。 编码器电路对第一比较数字量和第二比较数字量进行编码，并产生与模拟信号输入量对应的数字量。
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10.发明申请公开(公告)号：US20090060128A1
公开(公告)日：2009-03-05
申请号：US12204491
申请日：2008-09-04
Applicant: Kejun KANG , Ziran ZHAO , Hua PENG , Zhiqiang CHEN , Yuanjing LI , Yinong LIU , Li ZHANG , Yaohong LIU , Zhizhong LIANG , Dongmao LI , Cong LIU , Huabin TAN , Yongpeng LIU , Xinhui DUAN , Xueyou ZHOU
Inventor： Kejun KANG , Ziran ZHAO , Hua PENG , Zhiqiang CHEN , Yuanjing LI , Yinong LIU , Li ZHANG , Yaohong LIU , Zhizhong LIANG , Dongmao LI , Cong LIU , Huabin TAN , Yongpeng LIU , Xinhui DUAN , Xueyou ZHOU
IPC: G01N23/04
CPC classification number: G01V5/005
Abstract: A device for inspecting contraband in an aviation cargo containers includes: a turntable located at an object inspecting position and configured to carry the object to be inspected and bring the object into rotation; an object conveying system; a scanning system including a radiation source and a detector which can synchronously move in the vertical direction; a turntable drive/control system which drives and controls rotation of said turntable so that the turntable can continuously rotate about its rotation axis or rotate to any predetermined angular position; a scanning drive/control system which drives and controls the radiation source and the detector into synchronous movement in the vertical direction so that the radiation source and the detector can continuously move in the vertical direction or move to any predetermined vertical position. The device of the present invention can scan the object and form images in various scanning modes to meet different needs.
Abstract translation: 一种用于检查航空货物集装箱中的违禁品的装置，包括：位于物体检查位置的转盘，其构造成承载被检查物体并使物体旋转; 物体输送系统; 包括能够沿垂直方向同步移动的辐射源和检测器的扫描系统; 转盘驱动/控制系统，其驱动和控制所述转台的旋转，使得转盘可以围绕其旋转轴线连续旋转或旋转到任何预定的角位置; 扫描驱动/控制系统，其将辐射源和检测器驱动并控制在垂直方向上的同步运动，使得辐射源和检测器可以在垂直方向上连续移动或移动到任何预定的垂直位置。 本发明的装置可以扫描对象并以各种扫描模式形成图像以满足不同的需要。
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