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公开(公告)号：US4780899A
公开(公告)日：1988-10-25
申请号：US852051
申请日：1986-04-15
CPC分类号： G21K1/06 , G21K2201/062 , G21K2201/067
摘要： A crystal for an X-ray analysis apparatus is mounted on a carrier of an amorphous material whose bonding surface preferably obtains its desired geometry by grinding and polishing. Using a suitably transparent carrier, use can be made of a UV-curable type of adhesive which is irradiated through the carrier. The thickness of the layer of glue can be checked, if desired, via the same path. Because no disturbing background radiation is generated by an amorphous carrier, local irregularities are avoided, and better thermal adaptation of carrier and crystal material is feasible, such a crystal will contribute to a substantially higher resolution when used in an X-ray analysis apparatus.
摘要翻译： 用于X射线分析装置的晶体安装在非晶材料的载体上，其结合面优选通过研磨和抛光获得所需的几何形状。 使用适当透明的载体，可以使用通过载体照射的可UV固化型粘合剂。 如果需要，可以通过相同的路径检查胶层的厚度。 由于无定形载体不产生干扰背景辐射，因此避免了局部不规则，并且载体和晶体材料的热适应性更好，这样的晶体在X射线分析装置中使用时会有更高的分辨率。
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公开(公告)号：US4810318A
公开(公告)日：1989-03-07
申请号：US11416
申请日：1987-02-03
IPC分类号： C04B37/00 , B32B7/04 , C03C27/06 , C03C27/10 , C09J5/00 , C09J5/02 , G02B1/10 , G02B5/00 , G02B5/08 , G02B5/28 , G02B5/30 , B32B31/00
CPC分类号： B32B7/04 , C03C27/06 , Y10T156/10 , Y10T29/49885
摘要： By means of a method of bonding a first part and a second part together, in which at least one thin layer is provided on at least one of the parts and is activated by a slight polishing treatment, after which the likewise activated surface of the second part is bonded to the activated surface of the first part by mechanical wringing, a rigid bond can be obtained in which the spacing between the parts can be accurately adjusted.
摘要翻译： 通过将第一部分和第二部分结合在一起的方法，其中在至少一个部分上提供至少一个薄层，并通过轻微的抛光处理而被激活，之后第二部分和第二部分的同样激活的表面 部分通过机械拧紧与第一部分的活化表面接合，可以获得刚性接合，其中可以精确地调节部件之间的间距。
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3.发明授权Method of manufacturing an X-ray optical element for an X-ray analysis apparatus 失效一种用于X射线分析装置的X射线光学元件的制造方法
公开(公告)号：US5757883A
公开(公告)日：1998-05-26
申请号：US637248
申请日：1996-04-24
申请人： Jan Haisma , Johannes F. M. D'Achard Van Enschut , Cornelis L. Adema , Jan C. Gijsbers , Pieter K. De Bokx
发明人： Jan Haisma , Johannes F. M. D'Achard Van Enschut , Cornelis L. Adema , Jan C. Gijsbers , Pieter K. De Bokx
IPC分类号： G01N23/20 , G01N23/207 , G02B1/00 , G02B1/10 , G21K1/06
CPC分类号： G21K1/062 , B82Y10/00 , G01N23/207 , G21K2201/061 , G21K2201/062 , G21K2201/064 , G21K2201/067
摘要： A method of manufacturing an X-ray optical element. The element consists of a body of a material having a shape memory. At a high temperature, i.e. a temperature beyond the transition temperature of the material, the body is pressed so as to impart a first, desired shape. A surface of the body is thus shaped for example, as a logarithmic spiral or as another curved shape. After cooling to a low temperature, i.e. a temperature below the transition temperature of the material, a second, machinable shape is imparted to the body, preferably a flat surface. A number of precision operations can be performed on this second, machinable shape, for example polishing to a surface roughness of 0.5 nm RMS. Subsequent to this precision operation, the body is heated and resumes its first, desired shape which is retained after cooling. The body can be provided, if desired, with a comparatively thin surface layer which is also polished in the flat shape and which bends when the body resumes the desired shape. This layer can be chosen on the basis of desired mechanical (polishability) or X-ray optical properties. The X-ray optical element may comprise notably a multilayer mirror for X-ray purposes, thus forming a high- precision crystal for wavelength analysis.
摘要翻译： 一种制造X射线光学元件的方法。 该元件由具有形状记忆的材料的主体组成。 在高温下，即超过材料转变温度的温度下，压制本体以赋予第一所需形状。 因此，身体的表面例如成形为对数螺旋形或另一种弯曲形状。 在冷却到低温，即低于材料的转变温度的温度之后，将第二可加工的形状赋予主体，优选地是平坦的表面。 可以在该第二可机加工形状上进行许多精密操作，例如抛光至0.5nm RMS的表面粗糙度。 在这种精密操作之后，主体被加热并且恢复其在冷却之后保持的其第一所需形状。 如果需要，可以提供主体具有相对较薄的表面层，该表面层也被抛光成扁平形状并且当主体恢复期望的形状时弯曲。 该层可以根据期望的机械（抛光性）或X射线光学性质来选择。 X射线光学元件可以特别包括用于X射线目的的多层反射镜，从而形成用于波长分析的高精度晶体。
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公开(公告)号：US5028558A
公开(公告)日：1991-07-02
申请号：US336170
申请日：1989-04-11
申请人： Jan Haisma , Cornelis L. Adema , Johan G. De Bruin , Theodorus M. Michielsen , Gijsbertus A. C. M. Spierings
发明人： Jan Haisma , Cornelis L. Adema , Johan G. De Bruin , Theodorus M. Michielsen , Gijsbertus A. C. M. Spierings
IPC分类号： H01L21/306 , H01L21/02 , H01L21/18 , H01L21/20 , H01L21/304 , H01L27/12
CPC分类号： H01L21/187 , H01L21/2007 , H01L21/304 , Y10S148/012
摘要： A method of manufacturing a silicon-on-insulator semiconductor body is characterized by the steps consisting in that a carrier body is temporarily connected to a supporting body with accurately flat and parallel major surfaces and having a thickness of at least 1/8 of the largest dimension of the carrier body, in that the free major surface of the carrier body is mechanically polished to a precision of at least 1/2 .mu.m flatness, in that the carrier body is detached from the supporting body and the polished major surface is temporarily connected to the supporting body and the other major surface of the carrier body is mechanically polished to a precision of at least 1/2 .mu.m flatness and a parallelism between the major surfaces of at least 1/2 .mu.m whereupon a semiconductor body is connected through a major surface permanently to a major surface of the carrier body, in that then the semiconductor body is mechanically ground to a thickness of at least 50 .mu.m larger than the desired ultimate layer thickness and is then alternately polished tribochemically and mechanically to a thickness of about 10 .mu.m larger than the ultimately desired layer thickness, and in that there is ultimately polished tribochemically until the desired layer thickness of the semiconductor body is attained.
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公开(公告)号：US5637028A
公开(公告)日：1997-06-10
申请号：US213776
申请日：1994-03-16
CPC分类号： G11B5/3163 , C09G1/02 , C09K3/1463 , Y10S977/777 , Y10S977/888
摘要： Method of polishing a surface (5a) of a noble metal or an alloy comprising mainly noble metal, in which a polishing means is moved across the surface while exerting a polishing pressure for obtaining a plane and smooth polished surface without any defects. A composition comprising demineralized water with 20 to 40% by weight of an organic liquid comprising a poly-alcohol or a derivative thereof, for example, glycerol, and particles which can be encapsulated and have a Knoop's hardness of between 5 and 50 GPa, for example Al.sub.2 O.sub.3 grains, is used as a polishing means.
摘要翻译： 抛光贵金属或主要包含贵金属的合金的表面（5a）的方法，其中抛光装置在表面上移动，同时施加用于获得平面的抛光压力和光滑的抛光表面而没有任何缺陷。 包含20至40重量％的包含聚醇或其衍生物，例如甘油的有机液体的软化水和可以包封并且具有5至50GPa的诺普硬度的颗粒的组合物，用于 例如Al 2 O 3颗粒用作抛光装置。
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6.发明授权Tunable Fabry-Perot interferometer and X-ray display device having such an interferometer 失效具有这种干涉仪的可调式法布里 - 珀罗干涉仪和X射线显示装置
公开(公告)号：US4547801A
公开(公告)日：1985-10-15
申请号：US468233
申请日：1983-02-22
摘要： In a tunable Fabry-Perot interferometer, the supports for two parallel mirrors consist of bundles of optical fibers with the mirrors being provided on the ends of the fibers. This structure may be used advantageously in an X-ray display device wherein the structure is located between the display screen on which the visible X-ray image is displayed and a television camera tube. By using the Fabry-Perot interferometer as a light attenuator in such a device, problems where the camera tube is overridden when making an X-ray record can be prevented by causing the reflection coefficient of the mirrors in the visible range of the spectrum to be 99% or more. Also, the half width of the transmission wavelength pass-band of the Fabry-Perot interferometer can be made less than 50 nm.
摘要翻译： 在可调谐的法布里 - 珀罗干涉仪中，用于两个平行镜的支撑件由光纤束组成，其中镜子设置在光纤的端部上。 该结构可以有利地用于X射线显示装置，其中该结构位于显示可见X射线图像的显示屏和电视摄像机管之间。 通过在这种装置中使用法布里 - 珀罗干涉仪作为光衰减器，可以通过使光谱的可见光范围内的反射镜的反射系数成为可以防止在进行X射线记录时相机管被覆盖的问题 99％以上。 此外，法布里 - 珀罗干涉仪的透射波长通带的半值宽度可以小于50nm。
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