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公开(公告)号:US07889539B2
公开(公告)日:2011-02-15
申请号:US12653486
申请日:2009-12-14
申请人: Darrell Rinerson , Wayne Kinney , Edmond Ward , Steve Kuo-Ren Hsia , Steven W. Longcor , Christophe Chevallier , John E. Sanchez, Jr. , Philip Swab
发明人: Darrell Rinerson , Wayne Kinney , Edmond Ward , Steve Kuo-Ren Hsia , Steven W. Longcor , Christophe Chevallier , John E. Sanchez, Jr. , Philip Swab
CPC分类号: H01L27/2463 , G11C11/16 , G11C11/5685 , G11C13/0002 , G11C13/0007 , G11C13/004 , G11C13/0069 , G11C13/0097 , G11C2013/009 , G11C2213/15 , G11C2213/31 , G11C2213/32 , G11C2213/71 , G11C2213/77 , G11C2213/79 , H01L27/24 , H01L27/2481 , H01L45/04 , H01L45/06 , H01L45/1233 , H01L45/1253 , H01L45/146 , H01L45/147 , H01L45/1633 , H01L45/1658
摘要: A memory cell including conductive oxide electrodes is disclosed. The memory cell includes a memory element operative to store data as a plurality of resistive states. The memory element includes a layer of a conductive metal oxide (CMO) (e.g., a perovskite) in contact with an electrode that may comprise one or more layers of material. At least one of those layers of material can be a conductive oxide (e.g., a perovskite such as LaSrCoO3-LSCoO or LaNiO3-LNO) that is in contact with the CMO. The conductive oxide layer can be selected as a seed layer operative to provide a good lattice match with and/or a lower crystallization temperature for the CMO. The conductive oxide layer may also be in contact with a metal layer (e.g., Pt). The memory cell additionally exhibits non-linear IV characteristics, which can be favorable in certain arrays, such as non-volatile two-terminal cross-point memory arrays.
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公开(公告)号:US07082052B2
公开(公告)日:2006-07-25
申请号:US10773549
申请日:2004-02-06
申请人: Darrell Rinerson , Wayne Kinney , Edmond Ward , Steve Kuo-Ren Hsia , Steven W. Longcor , Christophe Chevallier , John E. Sanchez, Jr. , Philip Swab
发明人: Darrell Rinerson , Wayne Kinney , Edmond Ward , Steve Kuo-Ren Hsia , Steven W. Longcor , Christophe Chevallier , John E. Sanchez, Jr. , Philip Swab
IPC分类号: G11C11/14
CPC分类号: H01L27/2463 , G11C11/16 , G11C11/5685 , G11C13/0002 , G11C13/0007 , G11C13/004 , G11C13/0069 , G11C13/0097 , G11C2013/009 , G11C2213/15 , G11C2213/31 , G11C2213/32 , G11C2213/71 , G11C2213/77 , G11C2213/79 , H01L27/24 , H01L27/2481 , H01L45/04 , H01L45/06 , H01L45/1233 , H01L45/1253 , H01L45/146 , H01L45/147 , H01L45/1633 , H01L45/1658
摘要: A treated conductive element is provided. A conductive element can be treated by depositing either a reactive metal or a very thin layer of material on the conductive element. The reactive metal (or very thin layer of material) would typically be sandwiched between the conductive element and an electrode. The structure additionally exhibits non-linear IV characteristics, which can be favorable in certain arrays.
摘要翻译: 提供经处理的导电元件。 可以通过在导电元件上沉积反应性金属或非常薄的材料层来处理导电元件。 反应性金属(或非常薄的材料层)通常将夹在导电元件和电极之间。 该结构还具有非线性IV特性,这在某些阵列中是有利的。
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公开(公告)号:US07326979B2
公开(公告)日:2008-02-05
申请号:US10665882
申请日:2003-09-19
申请人: Darrell Rinerson , Wayne Kinney , John E. Sanchez, Jr. , Steven W. Longcor , Steve Kuo-Ren Hsia , Edmond Ward , Christophe Chevallier
发明人: Darrell Rinerson , Wayne Kinney , John E. Sanchez, Jr. , Steven W. Longcor , Steve Kuo-Ren Hsia , Edmond Ward , Christophe Chevallier
IPC分类号: H01L29/76
CPC分类号: G11C13/003 , G11C11/5685 , G11C13/0007 , G11C2213/31 , G11C2213/72 , G11C2213/74 , G11C2213/76 , H01L27/2418 , H01L27/2436 , H01L45/04 , H01L45/1233 , H01L45/1253 , H01L45/147 , H01L45/165
摘要: A multi-resistive state element that uses a treated interface is provided. A memory plug includes at least two electrodes that sandwich a multi-resistive state element. Using different treatments on both electrode/multi-resistive state element interfaces improves the memory properties of the entire memory device.
摘要翻译: 提供了使用处理接口的多电阻状态元素。 存储插头包括夹着多电阻状态元件的至少两个电极。 在电极/多电阻状态元件接口上使用不同的处理可改善整个存储器件的存储器特性。
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公开(公告)号:US07394679B2
公开(公告)日:2008-07-01
申请号:US11473005
申请日:2006-06-22
申请人: Darrell Rinerson , Wayne Kinney , Edmond Ward , Steve Kuo-Ren Hsia , Steven W. Longcor , Christophe Chevallier , John E. Sanchez, Jr. , Philip Swab
发明人: Darrell Rinerson , Wayne Kinney , Edmond Ward , Steve Kuo-Ren Hsia , Steven W. Longcor , Christophe Chevallier , John E. Sanchez, Jr. , Philip Swab
IPC分类号: G11C11/00
CPC分类号: H01L27/2463 , G11C11/16 , G11C11/5685 , G11C13/0002 , G11C13/0007 , G11C13/004 , G11C13/0069 , G11C13/0097 , G11C2013/009 , G11C2213/15 , G11C2213/31 , G11C2213/32 , G11C2213/71 , G11C2213/77 , G11C2213/79 , H01L27/24 , H01L27/2481 , H01L45/04 , H01L45/06 , H01L45/1233 , H01L45/1253 , H01L45/146 , H01L45/147 , H01L45/1633 , H01L45/1658
摘要: A treated conductive element is provided. A conductive element can be treated by depositing either a reactive metal or a very thin layer of material on the conductive element. The reactive metal (or very thin layer of material) would typically be sandwiched between the conductive element and an electrode. The structure additionally exhibits non-linear IV characteristics, which can be favorable in certain arrays.
摘要翻译: 提供经处理的导电元件。 可以通过在导电元件上沉积反应性金属或非常薄的材料层来处理导电元件。 反应性金属(或非常薄的材料层)通常将夹在导电元件和电极之间。 该结构还具有非线性IV特性,这在某些阵列中是有利的。
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公开(公告)号:US07186569B2
公开(公告)日:2007-03-06
申请号:US10605977
申请日:2003-11-11
申请人: Darrell Rinerson , Christophe Chevallier , Steve Kuo-Ren Hsia , Wayne Kinney , Steven W. Longcor , Emond Ward
发明人: Darrell Rinerson , Christophe Chevallier , Steve Kuo-Ren Hsia , Wayne Kinney , Steven W. Longcor , Emond Ward
IPC分类号: H01L21/00
CPC分类号: H01L27/101 , G11C11/5685 , G11C13/0007 , G11C2213/31 , G11C2213/77 , G11C2213/79 , H01L27/11502 , H01L27/11507 , H01L27/2436 , H01L27/2481 , H01L45/04 , H01L45/1233 , H01L45/147 , H01L45/1625 , H01L45/1641 , H01L45/1675
摘要: A conductive memory stack is provided. The memory stack includes a bottom electrode, a top electrode and a multi-resistive state element. The multi-resistive state element is sandwiched between the electrodes such that the top face of the bottom electrode is in contact with the multi-resistive state element's bottom face and the bottom face of the top electrode is in contact with the multi-resistive state element's top face. The bottom electrode, the top electrode and the multi-resistive state element all have sides that are adjacent to their faces. Furthermore, the sides are at least partially covered by a sidewall layer.
摘要翻译: 提供导电存储器堆叠。 存储器堆叠包括底部电极,顶部电极和多电阻状态元件。 多电阻状态元件被夹在电极之间,使得底部电极的顶面与多电阻状态元件的底面接触,并且顶部电极的底面与多电阻状态元件的底面接触 顶面。 底部电极,顶部电极和多电阻状态元件都具有与其表面相邻的侧面。 此外,侧面至少部分地被侧壁层覆盖。
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公开(公告)号:US08675389B2
公开(公告)日:2014-03-18
申请号:US13272985
申请日:2011-10-13
申请人: Christophe Chevallier , Steve Kuo-Ren Hsia , Wayne Kinney , Steven Longcor , Darrell Rinerson , John Sanchez, Jr. , Philip Swab , Edmond Ward
发明人: Christophe Chevallier , Steve Kuo-Ren Hsia , Wayne Kinney , Steven Longcor , Darrell Rinerson , John Sanchez, Jr. , Philip Swab , Edmond Ward
IPC分类号: G11C11/21
CPC分类号: H01L27/2463 , G11C11/16 , G11C11/5685 , G11C13/0002 , G11C13/0007 , G11C13/004 , G11C13/0069 , G11C13/0097 , G11C2013/009 , G11C2213/15 , G11C2213/31 , G11C2213/32 , G11C2213/71 , G11C2213/77 , G11C2213/79 , H01L27/24 , H01L27/2481 , H01L45/04 , H01L45/06 , H01L45/1233 , H01L45/1253 , H01L45/146 , H01L45/147 , H01L45/1633 , H01L45/1658
摘要: A memory cell including conductive oxide electrodes is disclosed. The memory cell includes a memory element operative to store data as a plurality of resistive states. The memory element includes a layer of a conductive metal oxide (CMO) (e.g., a perovskite) in contact with an electrode that may comprise one or more layers of material. At least one of those layers of material can be a conductive oxide (e.g., a perovskite such as LaSrCoO3—LSCoO or LaNiO3—LNO) that is in contact with the CMO. The conductive oxide layer can be selected as a seed layer operative to provide a good lattice match with and/or a lower crystallization temperature for the CMO. The conductive oxide layer may also be in contact with a metal layer (e.g., Pt). The memory cell additionally exhibits non-linear IV characteristics, which can be favorable in certain arrays, such as non-volatile two-terminal cross-point memory arrays.
摘要翻译: 公开了一种包括导电氧化物电极的存储单元。 存储单元包括用于将数据存储为多个电阻状态的存储元件。 存储元件包括与可包括一层或多层材料的电极接触的导电金属氧化物(CMO)(例如,钙钛矿)层。 这些材料层中的至少一层可以是与CMO接触的导电氧化物(例如,诸如LaSrCoO3-LSCoO或LaNiO3-LNO的钙钛矿)。 可以选择导电氧化物层作为晶种层,以为CMO提供良好的晶格匹配和/或较低的结晶温度。 导电氧化物层也可以与金属层(例如Pt)接触。 存储单元还具有非线性IV特性,这在某些阵列中是有利的,例如非易失性两端交叉点存储阵列。
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公开(公告)号:US08611130B2
公开(公告)日:2013-12-17
申请号:US13301490
申请日:2011-11-21
申请人: Darrell Rinerson , Christophe Chevallier , Steve Kuo-Ren Hsia , Wayne Kinney , Steven Longcor , John Sanchez, Jr. , Philip Swab , Edmond Ward
发明人: Darrell Rinerson , Christophe Chevallier , Steve Kuo-Ren Hsia , Wayne Kinney , Steven Longcor , John Sanchez, Jr. , Philip Swab , Edmond Ward
CPC分类号: H01L27/2463 , G11C11/16 , G11C11/5685 , G11C13/0002 , G11C13/0007 , G11C13/004 , G11C13/0069 , G11C13/0097 , G11C2013/009 , G11C2213/15 , G11C2213/31 , G11C2213/32 , G11C2213/71 , G11C2213/77 , G11C2213/79 , H01L27/24 , H01L27/2481 , H01L45/04 , H01L45/06 , H01L45/1233 , H01L45/1253 , H01L45/146 , H01L45/147 , H01L45/1633 , H01L45/1658
摘要: A treated conductive element is provided. A conductive element can be treated by depositing either a reactive metal or a very thin layer of material on the conductive element. The reactive metal (or very thin layer of material) would typically be sandwiched between the conductive element and an electrode. The structure additionally exhibits non-linear IV characteristics, which can be favorable in certain arrays.
摘要翻译: 提供经处理的导电元件。 可以通过在导电元件上沉积反应性金属或非常薄的材料层来处理导电元件。 反应性金属(或非常薄的材料层)通常将夹在导电元件和电极之间。 该结构还具有非线性IV特性,这在某些阵列中是有利的。
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公开(公告)号:US07528405B2
公开(公告)日:2009-05-05
申请号:US11714555
申请日:2007-03-05
IPC分类号: H01L29/06
CPC分类号: H01L27/101 , G11C11/5685 , G11C13/0007 , G11C2213/31 , G11C2213/77 , G11C2213/79 , H01L27/11502 , H01L27/11507 , H01L27/2436 , H01L27/2481 , H01L45/04 , H01L45/1233 , H01L45/147 , H01L45/1625 , H01L45/1641 , H01L45/1675
摘要: A conductive memory stack is provided. The memory stack includes a bottom electrode, a top electrode and a multi-resistive state element. The multi-resistive state element is sandwiched between the electrodes such that the top face of the bottom electrode is in contact with the multi-resistive state element's bottom face and the bottom face of the top electrode is in contact with the multi-resistive state element's top face. The bottom electrode, the top electrode and the multi-resistive state element all have sides that are adjacent to their faces. Furthermore, the sides are at least partially covered by a sidewall layer.
摘要翻译: 提供导电存储器堆叠。 存储器堆叠包括底部电极,顶部电极和多电阻状态元件。 多电阻状态元件被夹在电极之间,使得底部电极的顶面与多电阻状态元件的底面接触,并且顶部电极的底面与多电阻状态元件的底面接触 顶面。 底部电极,顶部电极和多电阻状态元件都具有与其表面相邻的侧面。 此外,侧面至少部分地被侧壁层覆盖。
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公开(公告)号:US20090303772A1
公开(公告)日:2009-12-10
申请号:US12456627
申请日:2009-06-18
申请人: Darrell Rinerson , Christophe Chevallier , Wayne Kinney , Roy Lambertson , John E. Sanchez, JR. , Lawrence Schloss , Philip Swab , Edmond Ward
发明人: Darrell Rinerson , Christophe Chevallier , Wayne Kinney , Roy Lambertson , John E. Sanchez, JR. , Lawrence Schloss , Philip Swab , Edmond Ward
CPC分类号: H01L45/08 , G06F17/5045 , G11C11/5685 , G11C13/0007 , G11C13/0009 , G11C13/004 , G11C13/0069 , G11C2013/0045 , G11C2013/005 , G11C2013/009 , G11C2213/11 , G11C2213/31 , G11C2213/32 , G11C2213/53 , G11C2213/54 , G11C2213/56 , G11C2213/71 , G11C2213/79 , H01L27/2436 , H01L27/2481 , H01L45/085 , H01L45/1233 , H01L45/1246 , H01L45/1253 , H01L45/146 , H01L45/147 , H01L45/1625
摘要: A memory using mixed valence conductive oxides is disclosed. The memory includes a mixed valence conductive oxide that is less conductive in its oxygen deficient state and a mixed electronic ionic conductor that is an electrolyte to oxygen and promotes an electric field effective to cause oxygen ionic motion.
摘要翻译: 公开了使用混合价态导电氧化物的记忆体。 存储器包括在其缺氧状态下导电性较差的混合价态导电氧化物和作为电解质的氧的混合电子离子导体并且促进有效引起氧离子运动的电场。
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公开(公告)号:US07330370B2
公开(公告)日:2008-02-12
申请号:US11021600
申请日:2004-12-23
IPC分类号: G11C11/00
CPC分类号: G11C11/16
摘要: A memory array with enhanced functionality is presented. Each cell in the array includes a pair of memory element electrodes. A read current across the pair of memory element electrodes is indicative of stored information and different write voltage levels across the pair of memory element electrodes are employed to store nonvolatile information. The array has at least one enhanced functionality portion that performs operations selected from the group consisting of reference, error correction, device specific storage, defect mapping tables, and redundancy.
摘要翻译: 介绍了增强功能的内存阵列。 阵列中的每个单元包括一对存储元件电极。 一对存储元件电极上的读取电流表示存储的信息,并且跨该对存储元件电极的不同写入电压电平被用于存储非易失性信息。 该阵列具有至少一个增强功能部分,其执行从由参考,纠错,设备特定存储,缺陷映射表和冗余组成的组中选择的操作。
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